JPH04162491A - Flexible printed board and its manufacture - Google Patents

Flexible printed board and its manufacture

Info

Publication number
JPH04162491A
JPH04162491A JP28754890A JP28754890A JPH04162491A JP H04162491 A JPH04162491 A JP H04162491A JP 28754890 A JP28754890 A JP 28754890A JP 28754890 A JP28754890 A JP 28754890A JP H04162491 A JPH04162491 A JP H04162491A
Authority
JP
Japan
Prior art keywords
formulas
formula
flexible printed
polyimide resin
tables
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP28754890A
Other languages
Japanese (ja)
Other versions
JP2927531B2 (en
Inventor
Yasushi Ito
裕史 伊藤
Hitoshi Nojiri
仁志 野尻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
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Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP28754890A priority Critical patent/JP2927531B2/en
Publication of JPH04162491A publication Critical patent/JPH04162491A/en
Application granted granted Critical
Publication of JP2927531B2 publication Critical patent/JP2927531B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To improve heat resistance electric characteristics, mechanical proper ties and economical efficiency by laminating a base film layer made of polyim ide resin, a middle layer made of thermoplastic polyimide resin and a conductive layer. CONSTITUTION:A flexible printed board is composed of a base film layer made of polyimide resin, a middle layer made of thermoplastic polyimide resin which has the unit structure expressed by a formula I, and a conductive layer. The precursor solution of the thermoplastic polyimide resin expressed by the formula I is coated on the base film layer made of polyimide, dried and permitted to be imide. Then, the substrate is formed by hot pressing with the conductive layer.

Description

【発明の詳細な説明】 〔産業上の利用技術] 本発明は、ポリイミド層、熱可塑ポリイミド層、及び導
体層からなり、耐熱性、電気特性、機械物性、及び経済
性に優れたフレキシブルプリント基板及びその製造方法
に関する。
Detailed Description of the Invention [Industrial Application Technique] The present invention provides a flexible printed circuit board that is composed of a polyimide layer, a thermoplastic polyimide layer, and a conductor layer and has excellent heat resistance, electrical properties, mechanical properties, and economic efficiency. and its manufacturing method.

〔従来の技術〕[Conventional technology]

近年、電子機器は、ユーザーのニーズにともない小型化
、軽量化への道を歩んでいる。従って、その中に用いら
れている電子部品あるいは配線材料に関しても、当然、
小型化、高密度化が要求されている。リジットなプリン
ト基板より薄く柔らかいという特徴を持つフレキシブル
プリント基板に関しても例外ではない。
In recent years, electronic devices have been on the path to becoming smaller and lighter in line with user needs. Therefore, regarding the electronic components or wiring materials used therein, it is natural that
There is a demand for smaller size and higher density. Flexible printed circuit boards, which are thinner and softer than rigid printed circuit boards, are no exception.

現在使用されているフレキシブルプリント基板は、一般
に銅箔等の金属箔と有機ポリマー等の絶縁フィルムを接
着剤で接着して製造されており、この際の接着剤として
はアクリル系、エポキシ系のもの等が使われている。こ
のため、フレキシブルプリント基板全体の耐熱性は接着
剤の耐熱性によって決まり、ポリイミドヘースフイルム
の優れた耐熱性、難燃性等を充分に発揮できていない。
Flexible printed circuit boards currently in use are generally manufactured by bonding metal foil such as copper foil and insulating film such as organic polymer with adhesive, and the adhesive used in this case is acrylic or epoxy. etc. are used. For this reason, the heat resistance of the entire flexible printed circuit board is determined by the heat resistance of the adhesive, and the excellent heat resistance, flame retardance, etc. of the polyimide heath film cannot be fully demonstrated.

これらを改善する方法として、特開昭60−17547
8や特開昭61−98782に開示されているような接
着剤を改良する方法や、特開昭62−208690に開
示されているように対称型芳香族メタ置換第1級アミン
と対称型芳香族パラ置換第1級アミンを使った共重合体
を用いる方法がある。また製造方法の改善として、特開
昭62−104840には、熱可塑ポリイミドフィルム
を接着層として用いる例が開示されている。しかし、耐
熱性、電気特性、機械物性、経済性全てに優れたフレキ
シブルプリント基板は未だ提案されていないのが実情で
ある。
As a method to improve these problems, Japanese Patent Application Laid-Open No. 60-17547
8 and JP-A No. 61-98782, and symmetric aromatic meta-substituted primary amines and symmetric aromatic aromatics as disclosed in JP-A No. 62-208690. There is a method using a copolymer using a group para-substituted primary amine. Further, as an improvement to the manufacturing method, Japanese Patent Application Laid-Open No. 62-104840 discloses an example in which a thermoplastic polyimide film is used as an adhesive layer. However, the reality is that a flexible printed circuit board that is excellent in heat resistance, electrical properties, mechanical properties, and economic efficiency has not yet been proposed.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

〉発明は、上記実情に鑑みてなされたものであり、本発
明は、接着剤層として熱可塑ポリイミド層を用いた耐熱
性、電気特性、機械物性、及び経浴外に優れるフレキシ
ブルプリント基板及びその製造方法を提供することを目
的とする。
〉The invention was made in view of the above-mentioned circumstances, and the present invention provides a flexible printed circuit board that uses a thermoplastic polyimide layer as an adhesive layer and has excellent heat resistance, electrical properties, mechanical properties, and compatibility with bathing and other purposes. The purpose is to provide a manufacturing method.

〔課題を解決するための手段〕[Means to solve the problem]

本発明者等は上記課題を解決するために鋭意研究を行な
った結果、本発明に到達したものである。  ゛即ち、
本発明の第1は、ポリイミド樹脂からなるベースフィル
ム層と、一般式(I) (式中、R1は−C−、−O−、−S −。
The present inventors conducted intensive research to solve the above problems, and as a result, they arrived at the present invention.゛That is,
The first aspect of the present invention is a base film layer made of a polyimide resin, and a compound having the general formula (I) (wherein R1 is -C-, -O-, -S-).

CF3 CH:lCH,CH3 直結から選ばれる少なくとも1種の基。R2は、CH,
CF3         0 又は直結から選ばれる少なくとも1種の基。)で示され
る単位構造を有する熱可塑ポリイミド樹脂からなる中間
層と、導体層とからなるフレキシブルプリント基+反を
、 本発明の第2は、ポリイミド樹脂からなるベースフィル
ム層に、一般式(I) (式中、R3は−C−、−O−、−S −。
CF3 CH: At least one group selected from lCH, CH3 direct bond. R2 is CH,
At least one group selected from CF3 0 or directly connected. ) The second aspect of the present invention is to provide a base film layer made of a polyimide resin with a flexible printed group consisting of an intermediate layer made of a thermoplastic polyimide resin having a unit structure represented by the formula (I) and a conductor layer. ) (wherein, R3 is -C-, -O-, -S-.

 F 3 直結から選ばれる少なくとも1種の基。R2は、又は直
結から選ばれる少なくとも1種の基。)で示される熱可
塑ポリイミド樹脂の前駆体溶液を塗布し、乾燥、イミド
化させた後、導体層と加熱加圧することを特徴とするフ
レキシブルプリン1一基板の製造方法を、 それぞれ内容とするものである。
At least one group selected from F 3 directly connected. R2 is at least one group selected from or directly bonded. ) A method for manufacturing a flexible printed circuit board, characterized in that the thermoplastic polyimide resin precursor solution shown in (1) is applied, dried, imidized, and then heated and pressurized with a conductive layer. It is.

本発明においてヘースフイルム層として使用さ”   
                  rAlれるポリ
イミド樹脂は、そのガラス転移温度が中間層に使う熱可
塑ポリイミド樹脂のガラス転移温度より高ければ特に制
限はなく、具体例としてはポリアミドイミド、ポリエー
テルイミド、ポリエステルイミド、その他共重合やモノ
マーの変性等によって修飾されたポリイミド等が挙げら
れるが、フレキシブルプリント基板に用いるためには、
柔軟性を有し、かつ線膨張係数が金属のそれと近い物性
を有する一般式(II) で示されるポリイミドが好ましい。一般式(II)にお
いて、mは100〜10000、nは100〜1000
0で、m/nが1〜5の値のものが好ましい。
Used as a hair film layer in the present invention"
The polyimide resin used for rAl is not particularly limited as long as its glass transition temperature is higher than the glass transition temperature of the thermoplastic polyimide resin used for the intermediate layer, and specific examples include polyamideimide, polyetherimide, polyesterimide, and other copolymers and monomers. Examples include polyimide modified by modification of
Preferred is a polyimide represented by the general formula (II) which is flexible and has a linear expansion coefficient close to that of metal. In general formula (II), m is 100-10000, n is 100-1000
0 and m/n is preferably 1 to 5.

一般式(n)で示されるポリイミドは、その前駆体であ
るポリアミド酸をイミド化させることによって得られる
。そして、このポリアミド酸は、バラフェニレンジアミ
ン及び4.4′−ジアミノジフェニルエーテルをピロメ
リット酸二無水物と反応させることにより得ることがで
きる。
The polyimide represented by the general formula (n) can be obtained by imidizing its precursor, polyamic acid. This polyamic acid can be obtained by reacting phenylene diamine and 4,4'-diaminodiphenyl ether with pyromellitic dianhydride.

本発明で中間層として使用される熱可塑ポリイミドは、
屈曲基が導入され熱可塑性を示すが、メタ置換構造は存
在せず耐熱性を保持したもので、具体的には一般式(I
)に示す構造を有するものである。
The thermoplastic polyimide used as the intermediate layer in the present invention is
Although it exhibits thermoplasticity due to the introduction of a bending group, it does not have a meta-substituted structure and maintains heat resistance. Specifically, it has the general formula (I
) has the structure shown in

ここで、R1の具体例としては、 CF3         0 CH3CH,CH。Here, as a specific example of R1, CF3 0 CH3CH, CH.

等を挙げることができる。etc. can be mentioned.

R2の具体例としては、 CH3CF 3 CH,CF3 −3−1又は直結 等を挙げることができる。−儀式(I)で示される熱可
塑性ポリイミド樹脂は、例えば(2,2−ビス(4−(
4−アミノフェノキシ)フェニル〕プロパン)や(2,
2−ビス[4−(4−アミノフェノキシ)フェニル〕サ
ルフォン等と3.3’。
Specific examples of R2 include CH3CF3CH, CF3-3-1, or a direct connection. - The thermoplastic polyimide resin represented by formula (I) is, for example, (2,2-bis(4-(
4-aminophenoxy)phenyl]propane) and (2,
2-bis[4-(4-aminophenoxy)phenyl]sulfone and 3.3'.

4.4′−ヘンヅフェノンテトラ力ルホキシジアンヒド
リF等を反応させることにより得ることができる。さら
に、他の熱可塑樹脂を一部共重合したり、ブレンドして
もよい。
It can be obtained by reacting 4.4'-henzuphenone tetrasulfoxy dianhydride F and the like. Furthermore, other thermoplastic resins may be partially copolymerized or blended.

熱可塑ポリイミドは、その前駆体であるポリアミド酸の
脱水閉環反応により得られる。このポリアミド酸は従来
より知られている方法、すなわち対応するジアミンとテ
トラカルボン酸二無水物を1;1の当量比で重合させる
ことにより合成することができる。
Thermoplastic polyimide is obtained by a dehydration ring-closing reaction of its precursor, polyamic acid. This polyamic acid can be synthesized by a conventionally known method, that is, by polymerizing the corresponding diamine and tetracarboxylic dianhydride in an equivalent ratio of 1:1.

重合反応の際用いられる有m?tr媒としては、N。Are there any compounds used during polymerization reactions? As a tr medium, N is used.

N−ジメチルホルムアミド、N、N−ジメチルアセトア
ミド、N、N−ジエチルホルムアミド、N。
N-dimethylformamide, N,N-dimethylacetamide, N,N-diethylformamide, N.

N−ジエチルアセトアミド、N、N−ジメチルメトキシ
アセトアミド、N−メチル−2−ピロリドン、ジメチル
スルホキシド、テトラヒドロフラン、ピリジン等があり
、これらの溶媒は単独または2種以上組み合わせて用い
られる。
Examples include N-diethylacetamide, N,N-dimethylmethoxyacetamide, N-methyl-2-pyrrolidone, dimethyl sulfoxide, tetrahydrofuran, and pyridine, and these solvents may be used alone or in combination of two or more.

熱可塑ポリイミド前駆体であるポリアミド酸は、5〜4
0重量%の間で溶解されており、ブレードコーク−、ナ
イフコーター、ロントコ−ター等でベースフィルムのポ
リイミドフィルムに30〜500μmの均一な厚みに塗
布する。続いて加熱乾燥、後イミド化させる。この際の
温度は、80〜250°Cが好ましく、100〜200
°Cがさらに好ましい。この時、化学閉環剤等を添加し
ておけば、イミド化時間を短縮することができ、作業性
を上げることができる。
Polyamic acid, which is a thermoplastic polyimide precursor, has 5 to 4
It is dissolved in a concentration of 0% by weight and coated on a polyimide film as a base film to a uniform thickness of 30 to 500 μm using a blade coater, knife coater, rotary coater, etc. Subsequently, it is heated and dried and then imidized. The temperature at this time is preferably 80 to 250°C, and 100 to 200°C.
°C is more preferred. At this time, if a chemical ring-closing agent or the like is added, the imidization time can be shortened and workability can be improved.

次に、導体層を積層し加熱加圧する。加熱加圧の方法は
、プレス、ロールによる方法を使用することができる。
Next, conductor layers are laminated and heated and pressurized. As the method of heating and pressing, a method using a press or a roll can be used.

加熱温度は熱可塑ポリイミドの軟化点より高く、ベース
フィルムのポリイミドの熱分解温度より低いことが望ま
しい。昇温方法は連続式でも段階式でもよく、圧力は1
00 kgf/cffl以下が好ましい。
The heating temperature is desirably higher than the softening point of the thermoplastic polyimide and lower than the thermal decomposition temperature of the polyimide of the base film. The heating method may be continuous or stepwise, and the pressure is 1
00 kgf/cffl or less is preferable.

本発明で導体層として用いられる金属箔は、銅、アルミ
ニウム、鉄、金、銀、ニッケル、クロム、モリブデン等
が挙げられる。好ましくは銅箔であり、電解銅箔が価格
及び接着性の点で更に好ましい。
Examples of the metal foil used as the conductor layer in the present invention include copper, aluminum, iron, gold, silver, nickel, chromium, and molybdenum. Copper foil is preferred, and electrolytic copper foil is more preferred in terms of cost and adhesiveness.

金属箔は、サンディング、ニッケルメッキ、またはアル
ミニウムアルコラード、アルミニウムキレート、シラン
カップリング剤等によって機械的あるいは化学的表面処
理をしてもよい。
The metal foil may be mechanically or chemically surface treated by sanding, nickel plating, or aluminum alcoholade, aluminum chelate, silane coupling agent, or the like.

〔実施例〕〔Example〕

以下、実施例により本発明を更に具体的に説明するが、
本発明はこれら実施例に限定されるものではない。
Hereinafter, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited to these examples.

フレキシブルプリント基板としての各種の性能は、下記
方法で測定した。
Various performances as a flexible printed circuit board were measured by the following methods.

ビール強度: JIS  C5016の方法に準して行ない、高温下で
のビール強度は30分間所定温度の恒温槽に入れ、測定
した。
Beer strength: Beer strength at high temperatures was measured by placing the beer in a constant temperature bath at a predetermined temperature for 30 minutes in accordance with the method of JIS C5016.

線間絶縁抵抗: JIS  C5016に準して行い測定した。Line insulation resistance: Measurement was performed according to JIS C5016.

体積抵抗率: JIS  C6481に準じて行い測定した。Volume resistivity: Measurement was performed according to JIS C6481.

誘電率: JIS  C6481に準して行い測定した。Dielectric constant: Measurement was performed according to JIS C6481.

吸水率: JIS C5016に準して行い測定した。Water absorption rate: Measurement was performed according to JIS C5016.

実施例1 N、N−ジメチルホルムアミド815gに0DA(4,
4’−ジアミノジフェニルエーテル)70.28gを溶
解し、ここにPMDA (ピロメリット酸二無水物)1
02.07gを添加して1時間攪拌した後、p−PDA
(パラフェニレンジアミン)約12.65 gを加え、
粘度を2500 poiseに調整した。ODA : 
p−PDA=3 : 1である。
Example 1 0DA (4,
4'-diaminodiphenyl ether) was dissolved, and PMDA (pyromellitic dianhydride) 1 was dissolved therein.
After adding 02.07 g of p-PDA and stirring for 1 hour,
Add about 12.65 g (para-phenylenediamine),
The viscosity was adjusted to 2500 poise. ODA:
p-PDA=3:1.

このポリアミド酸溶液をキャストした後80°C110
0°C,150°C,200°C,250’C,300
°C1350°C1400°C及び450°Cで各5分
づつ加熱し乾燥、イミド化させた。これをベースフィル
ムとして使用した(膜厚2511m)。
After casting this polyamic acid solution, 80°C110
0°C, 150°C, 200°C, 250'C, 300
The mixture was dried and imidized by heating at 1350°C, 1400°C, and 450°C for 5 minutes each. This was used as a base film (thickness: 2511 m).

次に、N、N−ジメチルボルムアミF’ 244.5g
にBAPP (2,2−ビス(4−(4−アミノフェノ
キシ)フェニル〕プロパンl 31. ] gヲWl解
し、ここにBTDA (3,3’ 、4.4’−ヘンヅ
フェノンテトラ力ルポキシジアンヒドリド)24.41
gを添加して1時間攪拌した。このポリアミド酸溶液の
粘度は600 poiseであった。このポリアミド酸
溶液を上記ベースフィルムに塗布し、80°C1100
°C,150°C1200°Cで各5分づつ加熱し乾燥
、イミド化させた。
Next, 244.5 g of N,N-dimethylborumami F'
to BAPP (2,2-bis(4-(4-aminophenoxy)phenyl)propane 31.), and here BTDA (3,3',4,4'-henzphenonetetrapower report). xydianhydride) 24.41
g and stirred for 1 hour. The viscosity of this polyamic acid solution was 600 poise. This polyamic acid solution was applied to the above base film and heated at 80°C 1100°C.
The mixture was dried and imidized by heating at 150°C and 1200°C for 5 minutes each.

得られたフィルムに銅箔(35μm)を重ね合わセ、ポ
ットプレス機で加熱加圧した。プレス条件は300°C
,50kg/cボで30分である。得られたフレキシブ
ルプリント基板の特性は第1表に示す通りであった。
Copper foil (35 μm) was superimposed on the obtained film and heated and pressed using a pot press. Pressing conditions are 300°C
, 30 minutes at 50 kg/c. The properties of the obtained flexible printed circuit board were as shown in Table 1.

実施例2 N、N−ジメチルホルムアミド244.5 gにBAP
S (2,2−ビス〔4−(4−アミノフェノキシ)フ
ェニル]サルフォン131.8gを溶解し、ここにBT
DA23.7gを添加して1時間攪拌した。溶液の粘度
は400poiseであった。
Example 2 BAP to 244.5 g of N,N-dimethylformamide
S (2,2-bis[4-(4-aminophenoxy)phenyl]sulfone 131.8g was dissolved, and BT
23.7 g of DA was added and stirred for 1 hour. The viscosity of the solution was 400 poise.

このポリアミド酸溶液を実施例1で用いたベースフィル
ムに塗布し、80°C1100°C1150’C,20
0°Cで各5分づつ加熱し乾燥、イミド化させた。
This polyamic acid solution was applied to the base film used in Example 1 at 80°C, 1100°C, 1150'C, and
The mixture was dried and imidized by heating at 0°C for 5 minutes each.

得られたフィルムを銅箔(35μm)に重ね合わせ、ポ
ットプレス機により加熱加圧した。プレス条件は300
°C850kg/c鞘で30分である。
The obtained film was placed on a copper foil (35 μm) and heated and pressed using a pot press machine. Press conditions are 300
30 minutes at 850 kg/c sheath.

得られたフレキシブルプリン1一基板の特性は第1表に
示す通りであった。
The properties of the obtained flexible print 1 substrate were as shown in Table 1.

比較例1 実施例1で用いたベースフィルムと銅箔をエポキシ系接
着剤を用いて接着しフレキシブルプリント基板を作成し
た。特性を第1表に示す。
Comparative Example 1 The base film used in Example 1 and copper foil were bonded together using an epoxy adhesive to create a flexible printed circuit board. The characteristics are shown in Table 1.

第    1    表 〔発明の効果〕                  
 /第1表の結果からもわかるように、本発明のフレキ
シブルプリント基板は、耐熱性、電気特性、機械物性全
てにわたって優れており、また本発明の製造方法により
、耐熱性、電気特性、機械物性に優れたフレキシブルプ
リント基板を経済的に製造することができる。
Table 1 [Effects of the invention]
/As can be seen from the results in Table 1, the flexible printed circuit board of the present invention has excellent heat resistance, electrical properties, and mechanical properties. A flexible printed circuit board with excellent properties can be manufactured economically.

特許出願人  鐘淵化学工業株式会社Patent applicant Kanebuchi Chemical Industry Co., Ltd.

Claims (1)

【特許請求の範囲】 1.ポリイミド樹脂からなるベースフィルム層と、一般
式( I ) ▲数式、化学式、表等があります▼ (式中、R_1は ▲数式、化学式、表等があります▼,又は 直結から選ばれる少なくとも1種の基。R_2は、▲数
式、化学式、表等があります▼,▲数式、化学式、表等
があります▼,−O−,−S−,▲数式、化学式、表等
があります▼、又は直結から選ばれる少なくとも1種の
基。)で示される単位構造を有する熱可塑ポリイミド樹
脂からなる中間層と、導体層とからなるフレキシブルプ
リント基板。 2.ベースフィルム層としてのポリイミド樹脂が一般式
(II) ▲数式、化学式、表等があります▼ で示される単位構造を有する請求項1記載のフレキシブ
ルプリント基板。 3.一般式(II)のm/nが1〜5の値である請求項2
記載のフレキシブルプリント基板。 4.導体層が銅箔である請求項1記載のフレキシブルプ
リント基板。 5.ポリイミド樹脂からなるベースフィルム層に、一般
式(I) ▲数式、化学式、表等があります▼ (式中。R_1は▲数式、化学式、表等があります▼,
−O−,−S−,▲数式、化学式、表等があります▼,
又は 直結から選ばれる少なくとも1種の基。R_2は、▲数
式、化学式、表等があります▼,▲数式、化学式、表等
があります▼,−O−,−S−,▲数式、化学式、表等
があります▼、又は直結から選ばれる少なくとも1種の
基。)で示される熱可塑ポリイミド樹脂の前駆体溶液を
塗布し、乾燥、イミド化させた後、導体層と加熱加圧す
ることを特徴とするフレキシブルプリント基板の製造方
法。 8.導体層が銅箔である請求項5記載の製造方法。
[Claims] 1. A base film layer made of polyimide resin and a general formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R_1 is ▲There are mathematical formulas, chemical formulas, tables, etc.▼), or at least one type selected from direct connection. Group.R_2 can be selected from ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, -O-, -S-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, or directly connected A flexible printed circuit board comprising a conductor layer and an intermediate layer made of a thermoplastic polyimide resin having a unit structure represented by: 2. 2. The flexible printed circuit board according to claim 1, wherein the polyimide resin as the base film layer has a unit structure represented by the general formula (II) ▲A mathematical formula, a chemical formula, a table, etc.▼. 3. Claim 2, wherein m/n of general formula (II) is a value of 1 to 5.
The flexible printed circuit board described. 4. The flexible printed circuit board according to claim 1, wherein the conductor layer is a copper foil. 5. The base film layer made of polyimide resin has the general formula (I) ▲Mathematical formula, chemical formula, table, etc.▼ (In the formula. R_1 has ▲Mathematical formula, chemical formula, table, etc.▼,
-O-, -S-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼,
or at least one group selected from directly connected. R_2 is ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, -O-, -S-, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, or at least one selected from direct connections One type of group. ) A method for producing a flexible printed circuit board, comprising applying a precursor solution of a thermoplastic polyimide resin, drying and imidizing the resin, and then heating and pressurizing it with a conductor layer. 8. 6. The manufacturing method according to claim 5, wherein the conductor layer is a copper foil.
JP28754890A 1990-10-24 1990-10-24 Flexible printed circuit board and method of manufacturing the same Expired - Lifetime JP2927531B2 (en)

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Application Number Priority Date Filing Date Title
JP28754890A JP2927531B2 (en) 1990-10-24 1990-10-24 Flexible printed circuit board and method of manufacturing the same

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JPH04162491A true JPH04162491A (en) 1992-06-05
JP2927531B2 JP2927531B2 (en) 1999-07-28

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US5668247A (en) * 1992-12-16 1997-09-16 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Thermoplastic polyimide, polyamide acid, and thermally fusible laminated film for covering conductive wires
JP2002322298A (en) * 2001-04-25 2002-11-08 Kanegafuchi Chem Ind Co Ltd Polyimide film and flexible printed board using the polyimide film
US6492031B1 (en) 1999-03-12 2002-12-10 Dupont-Toray Co. Ltd. Reflector substrate for illumination device and reflector for illumination device
WO2005111164A1 (en) * 2004-05-13 2005-11-24 Kaneka Corporation Adhesive film, flexible metal-clad laminate, and processes for producing these
JP2005350668A (en) * 2004-05-13 2005-12-22 Kaneka Corp Adhesive film, flexible metal-clad laminate, and process for producing the same
JP2006052389A (en) * 2004-07-15 2006-02-23 Kaneka Corp Adhesive film, flexible metal-clad laminate, and method for producing the same laminate

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5668247A (en) * 1992-12-16 1997-09-16 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Thermoplastic polyimide, polyamide acid, and thermally fusible laminated film for covering conductive wires
US6492031B1 (en) 1999-03-12 2002-12-10 Dupont-Toray Co. Ltd. Reflector substrate for illumination device and reflector for illumination device
JP2002322298A (en) * 2001-04-25 2002-11-08 Kanegafuchi Chem Ind Co Ltd Polyimide film and flexible printed board using the polyimide film
WO2005111164A1 (en) * 2004-05-13 2005-11-24 Kaneka Corporation Adhesive film, flexible metal-clad laminate, and processes for producing these
JP2005350668A (en) * 2004-05-13 2005-12-22 Kaneka Corp Adhesive film, flexible metal-clad laminate, and process for producing the same
US7871698B2 (en) 2004-05-13 2011-01-18 Kaneka Corporation Adhesive film, flexible metal-clad laminate, and processes for producing these
TWI383889B (en) * 2004-05-13 2013-02-01 Kaneka Corp Adhesive film and production method therefor and flexible metal-clad laminate and production method therefor
JP2006052389A (en) * 2004-07-15 2006-02-23 Kaneka Corp Adhesive film, flexible metal-clad laminate, and method for producing the same laminate

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