JPH04147643A - Vacuum coupler with built-in discharge preventing contact, pallet, and method of feeding power to pallet - Google Patents

Vacuum coupler with built-in discharge preventing contact, pallet, and method of feeding power to pallet

Info

Publication number
JPH04147643A
JPH04147643A JP2271705A JP27170590A JPH04147643A JP H04147643 A JPH04147643 A JP H04147643A JP 2271705 A JP2271705 A JP 2271705A JP 27170590 A JP27170590 A JP 27170590A JP H04147643 A JPH04147643 A JP H04147643A
Authority
JP
Japan
Prior art keywords
vacuum
contact
pallet
opening
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2271705A
Other languages
Japanese (ja)
Inventor
Tatsuya Kunioka
達也 國岡
Nobuo Shimazu
信生 島津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP2271705A priority Critical patent/JPH04147643A/en
Publication of JPH04147643A publication Critical patent/JPH04147643A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent glow discharge without deteriorating the vacuum degree of a vacuum container by communicating a feeder connected with a contact provided on a contact cover in an opening with the opening and providing a vacuum pipeline connected with the contact cover. CONSTITUTION:The coupler is provided with a contact cover 9, which has an opening 16, a contact 6 provided on the contact cover 9 through a contact pressing spring 7 in the opening 16, feeder 11 electrically connected with the contact 6 and a vacuum pipeline 10 connected with the contact cover 9 by communicating with the opening 16, and the feeder 11 is provided in the vacuum pipeline 10. When an exhaust system for a vacuum chuck is connected with the vacuum pipeline 10 for the vacuum chuck to exhaust air, a wafer 1 is sucked on the surface of a pallet 2, and when a certain time is passed, the vacuum degree in the opening 16 in the contact cover 9 and in the vacuum pipeline 10 for the vacuum chuck becomes higher than the vacuum degree which easily causes glow discharge. Then, a voltage to apply on an electrostatic chuck contact 5 is increased to the desired value and a vacuum container is started to be vacuum.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は放電防止接点内蔵真空継ぎ手、パレット及びパ
レットへの給電方法に係る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a vacuum joint with a built-in discharge prevention contact, a pallet, and a method of supplying power to the pallet.

【関連する技術] ウェハを平坦度良く保持することを可能たらしめる真空
チャック・静電チャック内蔵のパレットとしては、第2
図に示す技術が提案されている(特願平2−37799
号)。
[Related technology] The second pallet with a built-in vacuum chuck/electrostatic chuck that makes it possible to hold wafers with good flatness
The technology shown in the figure has been proposed (Japanese Patent Application No. 2-37799
issue).

ところで、この技術では、大気中で真空チャック、静電
チャックを共に働かせて、そのままの状態で雰囲気を真
空に引いている。この真空に引いていく過程ではグロー
放電を起こし易い真空度の領域(数torr〜0.01
torr)を必ず通過する。しがるに、パレット内の静
電チャックには数百Vの高電圧が印加されているので、
この真空度の領域を通過する際には、接点、端子や給電
線11等の真空容器内に露出している部分の近傍(第2
図でハツチングで示した部分)でグロー放電が起きる。
By the way, in this technology, a vacuum chuck and an electrostatic chuck are operated together in the atmosphere to evacuate the atmosphere without changing it. In the process of drawing the vacuum, the vacuum range (several torr to 0.01 torr) is likely to cause glow discharge.
torr). However, since a high voltage of several hundred volts is applied to the electrostatic chuck inside the pallet,
When passing through this vacuum area, close to the contacts, terminals, feeder line 11, etc. exposed in the vacuum container (second
Glow discharge occurs in the area shown by hatching in the figure.

グロー放電が起きると印加電圧が下がり静電チャックと
しての効果が無くなり、さらには高圧電源回路の故障等
を引き起こす。
When glow discharge occurs, the applied voltage decreases, making it ineffective as an electrostatic chuck, and further causing failure of the high-voltage power supply circuit.

したがって、グロー放電が起きないように確実に対策を
行う必要がある。
Therefore, it is necessary to take certain measures to prevent glow discharge from occurring.

そこで、給電線11にはセラミック溶着被覆電線等を用
い、貫通端子13と給電線11の接続部分はエポキシ系
等の充填剤でモールドするなどの放電対策を行うことが
試みられる。また、パレット2と給電線11の接続部の
接点6のように、脱着しなければならない部分にはモー
ルドを実施することができないので第3図に示すような
グロー放電防止用の接点覆い9がついた接点6を使用す
ることが試みられる。
Therefore, attempts have been made to take measures against electric discharge, such as using a ceramic welded coated wire or the like for the power supply line 11 and molding the connecting portion between the through terminal 13 and the power supply line 11 with an epoxy filler or the like. Also, since it is not possible to mold parts that must be attached and detached, such as the contacts 6 at the connection between the pallet 2 and the power supply line 11, a contact cover 9 is provided to prevent glow discharge as shown in FIG. An attempt is made to use the attached contact 6.

しかし、第2図あるいは第3図に示す技術では、充填剤
15や溶着被覆型#s11からのアウトガスが真空容器
内に直接放出され真空容器の真空度の低下・汚染が起こ
る。
However, in the technique shown in FIG. 2 or 3, outgas from the filler 15 and the welded coating mold #s11 is directly released into the vacuum container, resulting in a decrease in the vacuum degree of the vacuum container and contamination.

また、第3図に示すような放電防止方法では、隙間のな
いように接点6を覆わなければならないが、このように
すると接点覆い9の内部が閉空間17となり、この閉空
間17内に大気が閉じ込められる。内部に大気が閉じ込
められると、真空容器内と閉空間17との間の差圧によ
りパレット2の裏面に応力が掛かったり閉空間17から
徐々にリークが生じて真空容器内の真空度低下の原因と
なる。
In addition, in the discharge prevention method shown in FIG. 3, the contacts 6 must be covered without any gaps, but in this case, the inside of the contact cover 9 becomes a closed space 17, and this closed space 17 does not contain air. is trapped. When the atmosphere is trapped inside, stress is applied to the back of the pallet 2 due to the pressure difference between the inside of the vacuum container and the closed space 17, and leakage gradually occurs from the closed space 17, causing a decrease in the degree of vacuum inside the vacuum container. becomes.

[発明が解決しようとする課題] 本発明は、上記の問題を解決するためになされたもので
ある。
[Problems to be Solved by the Invention] The present invention has been made to solve the above problems.

本発明は、真空チャック・静電チャックをグロー放電を
起こさないで機能させることが可能な放電防止用接点内
蔵真空継ぎ手、パレット及びパレットへの給電方法を提
供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a vacuum joint with a built-in discharge prevention contact, a pallet, and a method for supplying power to the pallet, which allows a vacuum chuck/electrostatic chuck to function without causing glow discharge.

本発明は、真空容器の真空度を低下させたり、真空容器
内部を汚染することがない放電防止用接点内蔵真空継ぎ
手、パレット及びパレットへの給電方法を提供すること
を目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a vacuum joint with a built-in discharge prevention contact, a pallet, and a method for supplying power to the pallet, without reducing the vacuum degree of the vacuum vessel or contaminating the inside of the vacuum vessel.

本発明は、給電線の着脱が容易に行える放電防止用接点
内蔵真空継ぎ手及びパレットを提供することを目的とす
る。
SUMMARY OF THE INVENTION An object of the present invention is to provide a vacuum joint and a pallet with built-in discharge prevention contacts that allow easy attachment and detachment of a power supply line.

したがって2本発明は、例えば、電子ビーム描画装置等
の半導体製造装置に適用することが可能であり、精度の
向上ならびに機構の簡素化に寄与する。
Therefore, the present invention can be applied to, for example, a semiconductor manufacturing apparatus such as an electron beam lithography apparatus, and contributes to improving accuracy and simplifying the mechanism.

〔課題を解決するための手段〕[Means to solve the problem]

上記課題を解決するための本発明の第1の要旨は、開口
部を有する接点覆いと、該開口部内において付勢手段を
介して該接点覆いに取り付けられた接点と、該接点に電
気的に接続された給電線と、該開口部と連通させて該接
点覆いに接続された真空配管とを有し、該給電線を該真
空配管内に配したことを特徴とする放電防止接点内蔵真
空継ぎ手に存在する。
A first aspect of the present invention for solving the above-mentioned problems is to provide a contact cover having an opening, a contact attached to the contact cover via a biasing means within the opening, and an electrical connection to the contact. A vacuum joint with a built-in discharge prevention contact, comprising a connected power supply line and a vacuum pipe connected to the contact cover in communication with the opening, and the power supply line is disposed within the vacuum pipe. exists in

本発明の第2の要旨は、真空チャックと静電チャックと
を内蔵したパレットにおいて、真空チャック用溝の排気
口の近傍に静電チャック用接点を有することを特徴とす
る真空チャックと静電チャックを内蔵するパレットに存
在する。
A second gist of the present invention is a pallet incorporating a vacuum chuck and an electrostatic chuck, characterized in that the vacuum chuck and the electrostatic chuck have a contact point for the electrostatic chuck near the exhaust port of the groove for the vacuum chuck. Exists in a palette that has a built-in.

本発明の第3の要旨は、グロー放電を起こし易い部分を
、グロー放電を起こし易い真空度より高い真空にした後
に静電チャック用給電を行うことを特徴とする真空チャ
ックと静電チャックを内蔵するパレットへの給電法に存
在する。
The third gist of the present invention is a built-in vacuum chuck and electrostatic chuck characterized in that power is supplied for the electrostatic chuck after the part that is likely to cause glow discharge is brought to a higher degree of vacuum than the degree of vacuum that is likely to cause glow discharge. There is a method for feeding power to the pallet.

本発明の第4の要旨は、開口部を有する接点覆いと、該
開口部内において付勢手段を介して該接点覆いに取り付
けられた接点と、該接点に電気的に接続された給電線と
、該開口部と連通させて該接点覆いに接続された真空配
管とを有し、該給電線を該真空配管内に配した放電防止
電極内蔵真空継ぎ手を、真空チャック用溝の排気口の近
傍に静電チャック用接点を有するパレットに接続し、少
な(とも該真空配管内をグロー放電を起こし易い真空度
の領域より高い高真空にした後に静電チャックへの給電
を行うことを特徴とするパレット給電法に存在する。
A fourth aspect of the present invention is a contact cover having an opening, a contact attached to the contact cover via a biasing means within the opening, and a power supply line electrically connected to the contact. A vacuum joint with a built-in discharge prevention electrode, which has a vacuum pipe connected to the contact cover in communication with the opening, and the power supply line is arranged inside the vacuum pipe, is placed near the exhaust port of the vacuum chuck groove. A pallet that is connected to a pallet having contacts for an electrostatic chuck, and supplies power to the electrostatic chuck after the vacuum piping is brought to a high vacuum (higher than the vacuum level where glow discharge is likely to occur in the vacuum piping). Exists in the Electricity Supply Act.

[作用] 真空・静電チャックにおいては、真空容器が大気圧の状
態で先ず真空チャックを働かせてウェハを固定し、この
真空チャックによる固定が安定した後、静電チャックを
働かせ、静電チャ・ンクが安定してから真空容器を真空
に引き始める。
[Function] In a vacuum/electrostatic chuck, the vacuum chuck is first activated to secure the wafer while the vacuum container is at atmospheric pressure, and after the vacuum chuck has stabilized the wafer, the electrostatic chuck is activated to secure the wafer. Once the tank has stabilized, start evacuating the vacuum container.

本発明では、静電チャックを働かせる前に、グロー放電
を起こし易い部分を、グロー放電を起こし易い真空度よ
りも高真空に到達させ、その後に静電チャックへの給電
を行うためグロー放電を防止することができる。
In the present invention, before the electrostatic chuck is operated, the part where glow discharge is likely to occur is brought to a higher vacuum level than the vacuum level where glow discharge is likely to occur, and then the electrostatic chuck is powered, thereby preventing glow discharge. can do.

かかるチャック法を可能たらしめる一つの手段として本
発明では、真空チャック用の真空配管内に静電チャック
用給電線を配置した継ぎ手を提供するものであり、また
、真空チャック用溝の排気口の近傍に静電チャック用接
点を有するパレットを提供するものである。
As one means for making such a chuck method possible, the present invention provides a joint in which a power supply line for an electrostatic chuck is arranged in a vacuum piping for a vacuum chuck, and also provides a joint in which a power supply line for an electrostatic chuck is arranged in a vacuum pipe for a vacuum chuck. A pallet having electrostatic chuck contacts nearby is provided.

本発明に係るパレットの給電用接点を、本発明に係る真
空継ぎ手の接点覆いで覆って、真空継ぎ手をパレットに
接続し、真空配管内をグロー放電を起こし易い真空度の
領域より高い高真空にした後に静電チャックへの給電を
行えばグロー放電を防止することができる。
The power supply contact of the pallet according to the present invention is covered with the contact cover of the vacuum joint according to the present invention, the vacuum joint is connected to the pallet, and the inside of the vacuum piping is brought to a high vacuum higher than the vacuum level where glow discharge is likely to occur. If power is supplied to the electrostatic chuck after this, glow discharge can be prevented.

さらに、本発明に係る真空継ぎ手とパレットとを上記し
たように組み合わせて使用すれば、充填剤は不要であり
、また溶着被覆電線からのアウトガスは直接真空容器内
に放出されないので真空容器の真空度の低下・汚染が起
きない。
Furthermore, if the vacuum joint according to the present invention and the pallet are used in combination as described above, there is no need for a filler, and the outgas from the weld-coated wire is not directly released into the vacuum container, so the vacuum level of the vacuum container is No deterioration or pollution occurs.

[実施例] 以下に本発明の実施例を図面に基づき詳述する。[Example] Embodiments of the present invention will be described in detail below based on the drawings.

第1図は実施例の構成図である。第1図において1はウ
ェハ、2はパレット、3は真空チャック用溝、4は静電
チャック用電極、5は上側接点、6は下側接点、7は付
勢手段である接点押さえバネ、8は0リング、9は接点
覆い(絶縁体)、10は真空チャック用真空配管、11
は溶着被覆電線、12は真空容器壁、13は貫通端子、
16は開口部である。
FIG. 1 is a block diagram of an embodiment. In FIG. 1, 1 is a wafer, 2 is a pallet, 3 is a groove for a vacuum chuck, 4 is an electrode for an electrostatic chuck, 5 is an upper contact, 6 is a lower contact, 7 is a contact presser spring serving as a biasing means, and 8 0 ring, 9 contact cover (insulator), 10 vacuum piping for vacuum chuck, 11
12 is a vacuum container wall, 13 is a through terminal,
16 is an opening.

本例の真空継ぎ手は、開口部16を有する接点覆い9と
、開口部16内において接点押さえバネ7を介して接点
覆い9に取り付けられた接点6と、接点6に電気的に接
続された給電+tlllと、開口部16と連通させて接
点覆い9に接続された真空配管10とを有し、給1を線
11を真空配管内1゜に配しである。
The vacuum joint of this example includes a contact cover 9 having an opening 16, a contact 6 attached to the contact cover 9 via a contact presser spring 7 within the opening 16, and a power supply electrically connected to the contact 6. +tllll and a vacuum pipe 10 connected to the contact cover 9 in communication with the opening 16, and the supply 1 and the line 11 are arranged 1° inside the vacuum pipe.

一方、本例のパレットは、真空チャック用溝3の排気口
18の近傍に静電チャック用接点5を有している。
On the other hand, the pallet of this example has an electrostatic chuck contact 5 near the exhaust port 18 of the vacuum chuck groove 3.

以上のように構成された実施例についてその構造をより
詳細に説明する。
The structure of the embodiment configured as above will be explained in more detail.

パレット2と接点覆い9の接続部はシール部材(Oリン
グ)8でシールされている。この0リングは、パレット
と接点覆い9との間の気密性を保持するためのものであ
り、かかる作用を有するものであれば0リングでなくと
もよい。また、接点覆い9と真空チャック用真空配管1
0は溶接で気密に接続されている。したがって、真空チ
ャック用真空配管10に排気系を接続して排気すれば、
接点覆い9を介して真空チャック用溝3内の大気を排気
することができ、ウェハ1を真空チエツクできる。
The connection between the pallet 2 and the contact cover 9 is sealed with a sealing member (O-ring) 8. This O-ring is for maintaining airtightness between the pallet and the contact cover 9, and it is not necessary to use an O-ring as long as it has this function. In addition, a contact cover 9 and a vacuum pipe 1 for the vacuum chuck are also included.
0 is hermetically connected by welding. Therefore, if an exhaust system is connected to the vacuum piping 10 for the vacuum chuck and the exhaust is performed,
The atmosphere in the vacuum chuck groove 3 can be exhausted through the contact cover 9, and the wafer 1 can be vacuum checked.

静電チャック用電極4には、パレット2の裏面に埋め込
まれた上側接点5、接点押さえバネ7を介して接点覆い
9に取り付けられている下側接点6、給電線11、貫通
端子13を通じて電圧が印加される。
Voltage is applied to the electrostatic chuck electrode 4 through an upper contact 5 embedded in the back surface of the pallet 2, a lower contact 6 attached to the contact cover 9 via a contact presser spring 7, a power supply line 11, and a through terminal 13. is applied.

次に実施例についてその動作を説明する。Next, the operation of the embodiment will be explained.

真空容器内が大気圧の状態で真空チャック用真空配管1
0に真空チャック用排気系を接続して排気すると、パレ
ット2の表面にウェハ1が吸着される。ウェハ1が吸着
されて一定時間が経過すると接点覆い9内部の開口部1
6および真空チャック用真空配管10内の真空度がグロ
ー放電を起こし易い真空度よりも高真空になる。この後
、静電チャック接点5に印加する電圧を所望の値まで上
昇させる。上昇させた後、真空容器内を真空に引き始め
る。
Vacuum piping 1 for vacuum chuck when the inside of the vacuum container is at atmospheric pressure
When the vacuum chuck exhaust system is connected to the vacuum chuck 0 and evacuated, the wafer 1 is attracted to the surface of the pallet 2. When the wafer 1 is attracted and a certain period of time has elapsed, the opening 1 inside the contact cover 9 opens.
6 and the degree of vacuum in the vacuum piping 10 for the vacuum chuck becomes higher than the degree of vacuum at which glow discharge is likely to occur. Thereafter, the voltage applied to the electrostatic chuck contact 5 is increased to a desired value. After raising it, the inside of the vacuum container begins to be evacuated.

以上によりグロー放電を起こさせることなく、静電チャ
ックを動作させたまま真空容器を真空に引くことができ
る。
As described above, the vacuum container can be evacuated while the electrostatic chuck is operating without causing glow discharge.

また、主たるアウトガスの原因である充填剤は使用して
おらず、給電#、Illは真空チャック用真空配管10
により真空容器から隔離されているので真空容器の真空
度の低下・汚染は起こらない。
In addition, filler, which is the main cause of outgas, is not used, and the power supply # and Ill are the vacuum piping 10 for the vacuum chuck.
Since it is isolated from the vacuum container, the vacuum degree of the vacuum container will not decrease or contamination will occur.

さらに、第3区と同iに接点5,6を用いてパレット2
に給電しているので、給電綿11の脱着は容易である。
Furthermore, using contacts 5 and 6 in the same manner as in the third section, pallet 2
Since the power supply cotton 11 is supplied with power, it is easy to attach and detach the power supply cotton 11.

[発明の効果] 本発明によれば、真空・静電チャックをグロー放電を起
こさないで機能させることが可能である。
[Effects of the Invention] According to the present invention, it is possible to make a vacuum/electrostatic chuck function without causing glow discharge.

しかも真空容器の真空度−を低下させたり、真空容器内
部を汚染することがない。
Moreover, the degree of vacuum of the vacuum container is not lowered, and the inside of the vacuum container is not contaminated.

かつ、給電線の着脱が容易に行える。Moreover, the power supply line can be easily attached and detached.

したがって、本発明は、例えば、電子ビーム描画製雪等
の半導体製造装置に適用することが可能であり、精度の
向上ならびに機構の簡素化に寄与する。
Therefore, the present invention can be applied to, for example, semiconductor manufacturing equipment such as electron beam drawing snowmaking, and contributes to improved accuracy and simplification of the mechanism.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は実施例の構成図である。第2図は関連技術に係
るパレットの構成図である。第3図は他ノ関連技術に係
るパレットの構成図である。 (符号の説明) 1・・・ウェハ、2・・・パレット、3・・・真空チャ
ック用溝、4・・・静電チャック用電極、5・・・上側
接点、6・・・下側接点、7・・・付勢手段(接点押さ
えバネ)、8・・・シール部材(0リング)、9・・・
接点覆い(絶縁体)、10・・・真空チャック用真空配
管、11・・・給電線(溶着被覆W線)、12・・・真
空容器壁、13・・・貫通端子、14・・・パレット架
台、15・・・エポキシ系充填剤、16・・・開口部、
17・・・閉空間、18・・・排気口。 第 1  図 第2図
FIG. 1 is a block diagram of an embodiment. FIG. 2 is a configuration diagram of a pallet according to related technology. FIG. 3 is a configuration diagram of a pallet related to another related technology. (Explanation of symbols) 1...Wafer, 2...Pallet, 3...Groove for vacuum chuck, 4...Electrode for electrostatic chuck, 5...Upper contact, 6...Lower contact , 7... Biasing means (contact pressing spring), 8... Seal member (0 ring), 9...
Contact cover (insulator), 10... Vacuum piping for vacuum chuck, 11... Power supply line (welded coated W wire), 12... Vacuum container wall, 13... Penetration terminal, 14... Pallet Frame, 15... Epoxy filler, 16... Opening,
17... Closed space, 18... Exhaust port. Figure 1 Figure 2

Claims (4)

【特許請求の範囲】[Claims] (1)開口部を有する接点覆いと、該開口部内において
付勢手段を介して該接点覆いに取り付けられた接点と、
該接点に電気的に接続された給電線と、該開口部と連通
させて該接点覆いに接続された真空配管とを有し、該給
電線を該真空配管内に配したことを特徴とする放電防止
接点内蔵真空継ぎ手。
(1) a contact cover having an opening; a contact attached to the contact cover via a biasing means within the opening;
It has a power supply line electrically connected to the contact, and a vacuum pipe connected to the contact cover in communication with the opening, and the power supply line is disposed within the vacuum pipe. Vacuum joint with built-in discharge prevention contact.
(2)真空チャックと静電チャックとを内蔵したパレッ
トにおいて、真空チャック用溝の排気口の近傍に静電チ
ャック用接点を有することを特徴とするパレット。
(2) A pallet incorporating a vacuum chuck and an electrostatic chuck, characterized in that it has an electrostatic chuck contact near the exhaust port of the vacuum chuck groove.
(3)グロー放電を起こし易い部分を、グロー放電を起
こし易い真空度より高い真空にした後に静電チャック用
給電を行うことを特徴とする真空チャックと静電チャッ
クを内蔵するパレットへの給電法。
(3) A method for supplying power to a vacuum chuck and a pallet containing an electrostatic chuck, characterized in that power is supplied for the electrostatic chuck after the area where glow discharge is likely to occur is brought to a higher degree of vacuum than the degree of vacuum at which glow discharge is likely to occur. .
(4)開口部を有する接点覆いと、該開口部内において
付勢手段を介して該接点覆いに取り付けられた接点と、
該接点に電気的に接続された給電線と、該開口部と連通
させて該接点覆いに接続された真空配管とを有し、該給
電線を該真空配管内に配した放電防止電極内蔵真空継ぎ
手を、真空チャック用溝の排気口の近傍に静電チャック
用接点を有するパレットに接続し、少なくとも該真空配
管内をグロー放電を起こし易い真空度の領域より高い高
真空にした後に静電チャックへの給電を行うことを特徴
とするパレット給電法。
(4) a contact cover having an opening; a contact attached to the contact cover via a biasing means within the opening;
A vacuum with a built-in discharge prevention electrode, comprising a power supply line electrically connected to the contact, and a vacuum pipe connected to the contact cover in communication with the opening, and the power supply line is arranged inside the vacuum pipe. The joint is connected to a pallet that has an electrostatic chuck contact near the exhaust port of the vacuum chuck groove, and the electrostatic chuck is applied after at least the inside of the vacuum piping is brought to a high vacuum higher than the vacuum area where glow discharge is likely to occur. A pallet power supply method characterized by supplying power to.
JP2271705A 1990-10-09 1990-10-09 Vacuum coupler with built-in discharge preventing contact, pallet, and method of feeding power to pallet Pending JPH04147643A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2271705A JPH04147643A (en) 1990-10-09 1990-10-09 Vacuum coupler with built-in discharge preventing contact, pallet, and method of feeding power to pallet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2271705A JPH04147643A (en) 1990-10-09 1990-10-09 Vacuum coupler with built-in discharge preventing contact, pallet, and method of feeding power to pallet

Publications (1)

Publication Number Publication Date
JPH04147643A true JPH04147643A (en) 1992-05-21

Family

ID=17503697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2271705A Pending JPH04147643A (en) 1990-10-09 1990-10-09 Vacuum coupler with built-in discharge preventing contact, pallet, and method of feeding power to pallet

Country Status (1)

Country Link
JP (1) JPH04147643A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005101505A (en) * 2003-03-13 2005-04-14 Ventec-Ges Fuer Venturekapital & Unternehmensberatung Mbh Mobile and transportable type electrostatic substrate holder
JP2007036289A (en) * 2006-10-12 2007-02-08 Ulvac Japan Ltd Vacuum processing method
US7292426B2 (en) 2003-10-01 2007-11-06 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
CN104764619A (en) * 2015-04-07 2015-07-08 中国直升机设计研究所 Connector for helicopter static pressure test
WO2017126534A1 (en) * 2016-01-19 2017-07-27 住友大阪セメント株式会社 Electrostatic chuck device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005101505A (en) * 2003-03-13 2005-04-14 Ventec-Ges Fuer Venturekapital & Unternehmensberatung Mbh Mobile and transportable type electrostatic substrate holder
US7733625B2 (en) 2003-10-01 2010-06-08 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
US7292426B2 (en) 2003-10-01 2007-11-06 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
US7466531B2 (en) 2003-10-01 2008-12-16 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
US7660098B2 (en) 2003-10-01 2010-02-09 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
JP4493638B2 (en) * 2006-10-12 2010-06-30 株式会社アルバック Vacuum processing method
JP2007036289A (en) * 2006-10-12 2007-02-08 Ulvac Japan Ltd Vacuum processing method
CN104764619A (en) * 2015-04-07 2015-07-08 中国直升机设计研究所 Connector for helicopter static pressure test
WO2017126534A1 (en) * 2016-01-19 2017-07-27 住友大阪セメント株式会社 Electrostatic chuck device
CN108475658A (en) * 2016-01-19 2018-08-31 住友大阪水泥股份有限公司 Electrostatic chuck apparatus
JPWO2017126534A1 (en) * 2016-01-19 2018-09-20 住友大阪セメント株式会社 Electrostatic chuck device
US10923381B2 (en) 2016-01-19 2021-02-16 Sumitomo Osaka Cement Co., Ltd. Electrostatic chuck device
CN108475658B (en) * 2016-01-19 2023-12-22 住友大阪水泥股份有限公司 Electrostatic chuck device

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