JPH0413860A - External member of aluminum, etc., with coating film - Google Patents
External member of aluminum, etc., with coating filmInfo
- Publication number
- JPH0413860A JPH0413860A JP11814990A JP11814990A JPH0413860A JP H0413860 A JPH0413860 A JP H0413860A JP 11814990 A JP11814990 A JP 11814990A JP 11814990 A JP11814990 A JP 11814990A JP H0413860 A JPH0413860 A JP H0413860A
- Authority
- JP
- Japan
- Prior art keywords
- film
- base material
- coating
- intermediate film
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 43
- 238000000576 coating method Methods 0.000 title claims abstract description 43
- 229910052782 aluminium Inorganic materials 0.000 title claims description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims description 17
- 239000000463 material Substances 0.000 claims description 44
- 230000001681 protective effect Effects 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 4
- 239000003973 paint Substances 0.000 abstract description 17
- 238000005260 corrosion Methods 0.000 abstract description 13
- 230000007797 corrosion Effects 0.000 abstract description 13
- 239000000758 substrate Substances 0.000 abstract description 10
- 229910052751 metal Inorganic materials 0.000 abstract description 7
- 239000002184 metal Substances 0.000 abstract description 7
- 150000002739 metals Chemical class 0.000 abstract description 5
- 238000005034 decoration Methods 0.000 abstract description 4
- 229920005989 resin Polymers 0.000 abstract description 2
- 239000011347 resin Substances 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 16
- 239000007789 gas Substances 0.000 description 15
- 238000005240 physical vapour deposition Methods 0.000 description 14
- 229910052786 argon Inorganic materials 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- CYKMNKXPYXUVPR-UHFFFAOYSA-N [C].[Ti] Chemical compound [C].[Ti] CYKMNKXPYXUVPR-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000002453 shampoo Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、口紅類、化粧肌類、シャンプー容器類、ネ
ックレス・ブローチ類、食品・薬品容器類等のキャップ
、ラベル、本体など、基材の表面が装飾あるいは表示を
目的とする被膜で覆われている外装品に関する。[Detailed Description of the Invention] [Field of Industrial Application] This invention is applicable to caps, labels, bodies, etc. of lipsticks, makeup skin products, shampoo containers, necklaces/brooches, food/medicine containers, etc., and base materials. This product relates to an exterior product whose surface is covered with a coating for decoration or display purposes.
上記外装品は、乾式の手段による形成である為その形成
時における公害発生の問題が少ないという特長のある点
から、基材の表面に物理的蒸発成膜法(以下PVDとも
記す)によって被膜を形成することが行なわれている。The above-mentioned exterior products are formed by dry means, so there is less problem of pollution during formation, so a coating is applied to the surface of the base material by physical evaporation deposition method (hereinafter also referred to as PVD). It is being formed.
上記PVDによる被膜は、上記基材がチタンやステンレ
ス等の硬度の高い材料であるとその被膜の高硬度という
特長が遺憾なく発揮される為、外装品の使用時において
表面に傷が付き難く、美しい外観を長期にわたって維持
できる点で好ましい。When the base material is made of a highly hard material such as titanium or stainless steel, the PVD film exhibits its high hardness to its fullest, making it difficult for the surface to be scratched when the exterior product is used. It is preferable because a beautiful appearance can be maintained for a long period of time.
しかし上記のような外装品の基材としては、加工性が良
く、安価で、軽量であるという利点からアルミニウム類
が多く用いられる。ところがアルミニウム類は硬度が低
い為、その表面にPVDによる被膜を形成しても、その
PVDによる被膜本来の高硬度という特長が発揮され難
い問題点があった。However, aluminum is often used as a base material for the above-mentioned exterior products because of its good workability, low cost, and light weight. However, since aluminum has a low hardness, even if a PVD film is formed on its surface, the inherent high hardness of the PVD film cannot be fully demonstrated.
本発明は上記従来技術の問題点(技術的課題)を解決す
る為になされたt)ので、アルミニウム等の基材の上に
中間膜を形成し、その上に被IIりを形成することによ
って、基材の硬度が低くてもPVDによる被膜本来の高
硬度の特長が発揮されるようにL7た被膜付アルミニウ
ム等外装品を提供することを目的とするものである。The present invention has been made in order to solve the problems (technical problems) of the prior art described above. The object of the present invention is to provide an exterior product such as aluminum with a L7 coating so that even if the hardness of the base material is low, the inherent high hardness of the PVD coating can be exhibited.
上記目的を達成する為に、本願発明は前記請求の範囲記
載の通りの手段を講じたものであって、その作用は次の
通りである。In order to achieve the above object, the present invention takes the measures as described in the claims above, and its effects are as follows.
基材と被膜との間に介在する中間膜は、基材が低硬度、
低耐蝕性等の性質を有していても、PVDにより形成さ
れた被膜の高硬度、高耐蝕性等の特長の発揮を助ける。The intermediate film interposed between the base material and the coating is
Even if it has properties such as low corrosion resistance, it helps the film formed by PVD to exhibit its features such as high hardness and high corrosion resistance.
従って基材に対する被膜全体の硬度や耐蝕性等の性能が
高まる。Therefore, the hardness and corrosion resistance of the entire coating on the base material are improved.
〔実施例」 以下本願の実施例を示す図面について説明する。〔Example" The drawings showing the embodiments of the present application will be described below.
第1図は被膜付アルミニウム等外装品の一部を拡大して
示すものである。この第1図において、1は基材で、−
例としてアルミニウムで形成されている1、その他に、
銅、亜鉛、鉛、錫、銀、金等の金属製の場合もある。ま
たそねらの金属の1種以上を含む合金の場合もある。更
に又、金属に限らず、ABSやポリプロピレン等のプラ
スチック、樹脂類も用いられる。これらは何れも低融点
(アルミニウムの場合660℃)、低硬度(Hv(5g
) (荷重、5 gでのビッカース硬度)・30〜70
)、低耐蝕性等の性質の一つ或いは複数を備えるもので
あり、本例ではこれらの材料をアルミニウム等と総称す
る。2は基材1の」二に形成した中間膜て、被膜を支え
る為のものであり、基材Iまりも高い硬度例えばHv(
5g:1=100〜500を有している。該中間膜2は
例えば塗料の膜である。」二足塗料としては目標とする
特性に応して多くの種類から選定可能であるが、特にP
VD処理時にかかる熱(例えば70’Cから350℃)
、PVDの真空雰囲気内(例えばlXl0−2からI
X 10−’mBar程度)での使用(真空中でのガ
ス放出の少ない物)を考慮して選定され、例えばアルキ
ド樹脂塗料、熱硬化アクリル樹脂塗料、エポキシ・シリ
コーン樹脂塗料、シリコーン樹脂塗料、エポキシ樹脂塗
料、フッ素樹脂塗料などが用いられる。上記中間膜2と
しては塗料被膜の外に酸化被膜が用いられる場合もある
。3は中間膜2の上に形成した装飾用の被膜で、PVD
によって形成されている。該被膜3は装飾用の他に表示
用の場合もあるが、本件明細書中ではそれらをまとめて
装飾用と呼ぶ。上記被膜3の材質は、高硬度、耐蝕性、
装飾性などの目的に応じて下記の様な例の種類などから
選定される。FIG. 1 is an enlarged view of a part of an exterior product such as coated aluminum. In this FIG. 1, 1 is a base material, -
For example, 1 is made of aluminum, and in addition,
It may also be made of metals such as copper, zinc, lead, tin, silver, and gold. It may also be an alloy containing one or more types of metals. Furthermore, not only metals but also plastics and resins such as ABS and polypropylene can be used. All of these have low melting points (660°C in the case of aluminum) and low hardness (Hv (5g
) (Vickers hardness at 5 g load)・30~70
), low corrosion resistance, etc., and in this example, these materials are collectively referred to as aluminum or the like. 2 is an intermediate film formed on the second part of the base material 1 to support the coating, and the base material I also has a high hardness, for example, Hv (
5g:1=100-500. The intermediate film 2 is, for example, a paint film. ” Biped paints can be selected from many types depending on the target properties, but P
Heat required during VD processing (e.g. 70'C to 350°C)
, in the vacuum atmosphere of PVD (e.g. from lXl0-2 to I
For example, alkyd resin paint, thermosetting acrylic resin paint, epoxy/silicone resin paint, silicone resin paint, epoxy Resin paints, fluororesin paints, etc. are used. As the intermediate film 2, an oxide film may be used in addition to the paint film. 3 is a decorative film formed on the intermediate film 2, which is made of PVD.
is formed by. The coating 3 may be used for display as well as decoration, but in this specification they are collectively referred to as decorative. The material of the coating 3 has high hardness, corrosion resistance,
The type is selected from the examples below depending on the purpose such as decorativeness.
硬質化合物:
1’ i N 窒化チタン −−−一−−−−
−−−金色、ZrN 窒化ジルコニウム −−−−−
一 金色Ti(、N 炭素窒化チタン −−−〜
−−−−−−−−茶または灰色TiAIN窒化ヂタンー
アルミニウムー濃い茶TiC炭化チタン
灰または黒
CrN 窒化クロム
金属色
酸化物: Al2O5酸化アルミニウム上記の如き構造
の外装品にあっては、PVDによって形成されている被
膜3が美しい外観を呈する。しかもその被膜3と基材l
との間に中間膜2が介在する為、基材1が前述の如き低
硬度、低耐蝕性などの性質を有していても、上記中間膜
2が表面のPVDにより形成された被膜3の特長、即ち
高硬度(例えばHv(5g)〜1000〜2500)
、高耐蝕性の発揮を助け、基材1に対する被膜全体の硬
度や耐蝕性などの性能は高いものとなっている。Hard compound: 1' i N titanium nitride --- 1 ---
---Gold, ZrN Zirconium Nitride ---
- Golden Ti (, N Titanium carbon nitride ---
-----------Brown or gray TiAIN Titanium nitride - Aluminum - Dark brown TiC Titanium carbide Gray or black CrN Chromium nitride Metal color oxide: Al2O5 Aluminum oxide For exterior parts with the above structure, PVD is used. The formed coating 3 has a beautiful appearance. Moreover, the coating 3 and the base material l
Since the intermediate film 2 is interposed between the substrate 1 and the base material 1, even if the base material 1 has properties such as low hardness and low corrosion resistance as described above, the intermediate film 2 does not affect the coating 3 formed by PVD on the surface. Features: High hardness (e.g. Hv (5g) ~1000~2500)
This helps in exhibiting high corrosion resistance, and the performance of the entire coating on the base material 1, such as hardness and corrosion resistance, is high.
次に第2図には、上記のような被膜3を形成する為の装
置が略示されている。この装置はイオンブレーティング
あるいはスパッタリング法等のPVDを用いた公知(例
えば特開昭6l−177365)の被膜形成装置と同様
の被膜形成装置である。その構成を簡単に説明すると、
10は反応室で、内部の真空排気及びガス供給源11.
12からの夫々アルゴンガス及び窒素ガス等の雰囲気ガ
スの供給が可能となっている。反応室10内においては
、前記基材Iを保持する為のホルダが基材1を符号13
で示される如き円形の軌跡を描いて移動させられるよう
に備わっている。14.15は被膜3の形成の為に用い
られるターゲットで、上記軌跡13の一部を挾んで対の
状態に設けである。これらのターゲットとしては、形成
すべき被膜3の種類に応じた材質のものが用いられる。FIG. 2 then schematically shows an apparatus for forming a coating 3 as described above. This apparatus is a film forming apparatus similar to a known film forming apparatus (for example, Japanese Patent Laid-Open No. 61-177365) using PVD such as ion blasting or sputtering. To briefly explain its configuration,
10 is a reaction chamber with an internal vacuum exhaust and a gas supply source 11.
Atmosphere gases such as argon gas and nitrogen gas can be supplied from 12, respectively. Inside the reaction chamber 10, a holder for holding the base material I holds the base material 1 with reference numeral 13.
It is equipped so that it can be moved in a circular trajectory as shown in . Reference numerals 14 and 15 denote targets used for forming the coating 3, which are arranged in pairs with a part of the locus 13 interposed therebetween. These targets are made of materials depending on the type of film 3 to be formed.
次に基材1の一例として円筒状のアルミニウム製の口紅
ケースに対する被膜の形成を、工程(a)〜(i)
の順に説明する。Next, as an example of the base material 1, a coating is formed on a cylindrical aluminum lipstick case in steps (a) to (i).
I will explain in this order.
(a)基材1を水酸化ナトリウムまたは硫酸を含有の脱
脂液にて脱脂洗浄したあと水洗い、乾燥する。(a) The base material 1 is degreased and cleaned with a degreasing solution containing sodium hydroxide or sulfuric acid, then washed with water and dried.
(b)次にその基材1の表面にアクリル樹脂塗料を1層
または2層以上で合計15ミクロン程度塗布し、赤外線
乾燥する。(b) Next, one or more layers of acrylic resin paint are applied to the surface of the base material 1 to a total thickness of about 15 microns, and dried by infrared rays.
(c) さらに紫外線硬化型塗料(例えば、ウレタン
アクリレート塗料)を1層または2層以上で合計15ミ
クロン程度塗布し、紫外線照射する。これら(b) 、
(c) の工程により中間膜2ができる。この後、搬
送、保存、試験などの取扱があった場合は、必要に応じ
て、脱脂洗浄を行なう。(c) Further, one or more layers of ultraviolet curable paint (for example, urethane acrylate paint) are applied to a total thickness of about 15 microns, and ultraviolet rays are irradiated. These (b),
The intermediate film 2 is formed by the step (c). After this, if the product is handled during transportation, storage, testing, etc., degrease and clean it as necessary.
(d)次に上記基材1を前記第2図の装置内に備わって
いるホルダにセットし、前記軌跡13に沿って移動する
ようにする。(d) Next, the base material 1 is set in a holder provided in the apparatus shown in FIG. 2, and is moved along the trajectory 13.
(e)次に反応室10内を真空引きし、中間膜2のつい
た基材1を炉内雰囲気の加熱ヒータにて約70°Cまで
加熱する。(e) Next, the inside of the reaction chamber 10 is evacuated, and the base material 1 with the intermediate film 2 attached thereon is heated to about 70° C. using a heater in the furnace atmosphere.
(f)然る後、ガス供給源11から反応室10内にアル
ゴンガスを300〜3503CCM導入して、13.5
611zで250凶から1 、000弱の高周波(RF
)を基材1と反応室10間に印加して、中間膜2の表面
を高周波エツチング(表面清浄処理)する。この後、必
要に応じて過熱防止のためにアルゴンガスのみを300
〜3503CCM導入してIPPMで公転させて冷却す
る。(f) After that, 300 to 3503 CCM of argon gas is introduced into the reaction chamber 10 from the gas supply source 11, and 13.5 CCM of argon gas is introduced into the reaction chamber 10.
611z has a high frequency (RF
) is applied between the base material 1 and the reaction chamber 10 to perform high-frequency etching (surface cleaning treatment) on the surface of the intermediate film 2. After this, if necessary, add only argon gas to 300 ml to prevent overheating.
~3503 CCM is introduced and cooled by orbiting with IPPM.
(g)次にガス供給源12から反応室10内に窒素ガス
を導入すると共に、ジルコニウム製のターゲット14、
15をスパッタリングして、上記基材1上の中間膜2の
上に窒化ジルコニウム(ZrN) (7) 被III
3 ヲ例えば0.2 μmの厚みに成膜する。尚装置の
作動条件の一例は次の通りである。カソード放重電流は
4A/ターゲツト、基材のバイアスはRFで100〜5
(IOW、アルゴンガスは180SCCM 、窒素ガス
は10〜40SCCM、基材の公転速度はIRPM、ト
ータル回転数は5〜20回転である。(g) Next, nitrogen gas is introduced into the reaction chamber 10 from the gas supply source 12, and a target 14 made of zirconium,
15 is sputtered to deposit zirconium nitride (ZrN) (7) on the intermediate film 2 on the base material 1.
3. Form a film to a thickness of, for example, 0.2 μm. An example of the operating conditions of the device is as follows. Cathode discharge current is 4A/target, substrate bias is RF 100~5
(IOW, argon gas is 180 SCCM, nitrogen gas is 10 to 40 SCCM, base material revolution speed is IRPM, and total rotational speed is 5 to 20 revolutions.
(h)次にガス供給源11から反応室10内にアルゴン
ガスを300〜3503CCM導入し、被膜3の成膜が
済んだ品物(外装品)をIl?PMで工5から30回転
させて品物を冷却する。(h) Next, 300 to 3503 CCM of argon gas is introduced into the reaction chamber 10 from the gas supply source 11, and the item (exterior item) on which the coating 3 has been formed is placed in the Il? Cool the item by turning it 30 times from step 5 on the PM.
(i)次に反応室10を復圧して品物を取り出す。(i) Next, the pressure in the reaction chamber 10 is restored and the product is taken out.
以上で被膜3の形成の全工程が完了する。The entire process of forming the coating 3 is thus completed.
上記のような工程で被膜3の形成を行なう場合、上記中
間膜2はアルミニウム製の基材1の洗浄後の活性かつ軟
らかい表面を覆うことで、次のP■D処理までの運搬中
あるいは取扱中の汚染やキズを防止する。また上記中間
膜2は基材1の表面を覆う際に、その基材1の表面の微
細なキズ等を隠蔽し表面平滑度を向上させる。その結果
、PVD被膜3の完了後の製品においては、その表面光
沢、色調の明るさ、指紋や油分などに対する耐汚染性が
良好なものとなる。When the coating 3 is formed in the process described above, the intermediate film 2 covers the active and soft surface of the aluminum substrate 1 after cleaning, so that it can be protected during transportation or handling until the next P■D treatment. Prevents contamination and scratches inside. Further, when the intermediate film 2 covers the surface of the base material 1, it hides minute scratches and the like on the surface of the base material 1 and improves the surface smoothness. As a result, the product after the completion of the PVD coating 3 has good surface gloss, bright color tone, and stain resistance against fingerprints and oil.
上記の方法で作成した製品は、金色系の良好な装飾・表
示性をもち、併せて硬度、耐摩耗性、耐傷性、耐食性な
どを備える。The product produced by the above method has a golden color with good decoration and display properties, and also has hardness, abrasion resistance, scratch resistance, corrosion resistance, etc.
上記中間膜2の厚みは、目標とする特性により200
μm以下の範囲で選定される。厚すぎるとPVD処理処
理熱での変形や変質、または真空雰囲気中のガス放出で
の成膜不良などが発生しやすい。The thickness of the intermediate film 2 is 200 mm depending on the target characteristics.
It is selected within the range of μm or less. If it is too thick, deformation or deterioration due to the heat of the PVD treatment or film formation failure due to gas release in a vacuum atmosphere is likely to occur.
最低の厚みは前記基材1のキズの隠蔽効果並びに被膜3
にそれ本来の高硬度や耐蝕性を発揮させ得る範囲で選ぶ
。The minimum thickness is determined by the effect of hiding scratches on the base material 1 and the coating 3.
The material should be selected within a range that allows it to exhibit its inherent high hardness and corrosion resistance.
上記被膜3の厚みは例えば3μm以下の範囲で選定され
る。その範囲に選定することにより、累積処理温度によ
る悪影響を防止できる。また厚みが上記の範囲を越える
と、厚み方向の膜の結晶構造が変化し剥離(膜の脱落)
が発生したり、表面凹凸の増加での汚れの付き易さが増
大するが、そのようなことも防止できる。The thickness of the coating 3 is selected, for example, within a range of 3 μm or less. By selecting the temperature within this range, it is possible to prevent the adverse effects caused by the cumulative processing temperature. Also, if the thickness exceeds the above range, the crystal structure of the film in the thickness direction changes and peels off (the film falls off).
However, it is possible to prevent this from occurring, and the ease with which dirt adheres due to the increase in surface irregularities increases.
次に異なる実施例について説明する。第3図に示される
ように、中間膜2と被膜3との間に第2中間膜5を形成
してもよい。この第2中間膜5は例えば窒化クロムの膜
であり、その形成は、例えば前記の装置によって、前記
工程(f) と工程(g)との間で行なう。この場合
前記ターゲット14.15のうちの一方例えばターゲッ
ト14としてクロムのターゲットを用いる。そして前記
工程(f)の後、中間膜2を備えた基材1の温度を比較
的低温(例えば70〜200℃程度)にした状態におい
て、上記クロムのターゲット14をスパッタリングし、
中間膜2の上に第2中間膜5を例えば0.5 μmの厚
みに成膜させる。尚装置の作動条件の一例は次の通りで
ある。カソード放電電流は4A/ターゲツト、基材バイ
アスはRFで100〜5.OOW、アルゴンガスは18
0SCCM 、窒素xスは10〜5osccL基材1の
公転速度はIPPM、トータル回転数は5〜20回転で
ある。Next, different embodiments will be described. As shown in FIG. 3, a second intermediate film 5 may be formed between the intermediate film 2 and the coating 3. The second intermediate film 5 is, for example, a film of chromium nitride, and is formed between the steps (f) and (g) using, for example, the above-mentioned apparatus. In this case, one of the targets 14 and 15, for example, a chromium target is used as the target 14. After the step (f), the chromium target 14 is sputtered while the temperature of the base material 1 provided with the intermediate film 2 is kept at a relatively low temperature (for example, about 70 to 200° C.),
A second intermediate film 5 is formed on the intermediate film 2 to a thickness of, for example, 0.5 μm. An example of the operating conditions of the device is as follows. Cathode discharge current is 4A/target, substrate bias is RF 100~5. OOW, argon gas is 18
0 SCCM, nitrogen x gas is 10 to 5 osccL, the revolution speed of the base material 1 is IPPM, and the total number of revolutions is 5 to 20 revolutions.
この後、必要に応じて過熱防止のためにアルゴンガスの
みを300〜3503CCM導入してIPPMで公転さ
せて冷却する。Thereafter, if necessary, 300 to 3503 CCM of argon gas alone is introduced to prevent overheating, and the tube is cooled by rotating with IPPM.
上記のような第2中間膜5の形成が完了した後、前記工
程(g) をジルコニウム製のターゲット15をスパッ
タリングすることによって実施する。After the formation of the second intermediate film 5 as described above is completed, the step (g) is carried out by sputtering a target 15 made of zirconium.
上記のように第2中聞膜5を形成すると、その上に被膜
3を形成するときの熱が中間膜2に与える影響を緩和す
ることができる。When the second interstitial membrane 5 is formed as described above, the influence of heat on the intermediate membrane 2 when forming the coating 3 thereon can be alleviated.
向上記第2中間膜5の材質は、上記窒化クロムの他にチ
タン、ジルコニウム、アルミニウム、またはそれらの1
種類以上を含む合金、または上記金属あるいは合金の窒
化物、炭化物、炭窒化物であってもよい。また第2中間
膜5の形成は、上記PVDのほか、真空蒸着法や湿式メ
ツキ法によって行なってもよい。The material of the second intermediate film 5 may be titanium, zirconium, aluminum, or one of these in addition to the chromium nitride described above.
It may be an alloy containing more than one type, or a nitride, carbide, or carbonitride of the above metals or alloys. Further, the second intermediate film 5 may be formed by a vacuum evaporation method or a wet plating method in addition to the above-mentioned PVD.
次に他の異なる実施例について説明する。第4図に示さ
れるように、被膜3の上に保護膜6を形成してもよい。Next, other different embodiments will be described. As shown in FIG. 4, a protective film 6 may be formed on the coating 3.
この保護膜6は例えば被膜3上に塗着した透明塗料の膜
であり、そのような保護膜6の形成はハードコート仕上
げとも呼ばれる。上記保護膜6の形成は、前記工程(i
) の後、被膜3の上に例えば紫外線硬化型塗料(例え
ば、ウレタンアクリレート塗料)を1層または2層以上
で合計10〜30ミクロン程度塗布し、紫外線照射で乾
燥させることにより行なう。This protective film 6 is, for example, a film of transparent paint applied on the coating 3, and the formation of such a protective film 6 is also called hard coat finishing. The formation of the protective film 6 is performed in the step (i)
) Then, for example, one or more layers of an ultraviolet curable paint (for example, urethane acrylate paint) are applied to the coating 3 to a total thickness of about 10 to 30 microns, and the coating is dried by ultraviolet irradiation.
上記の保護膜6の適用により、表面光沢の増大、指紋等
による汚れ付着の防止、特定薬品に対する耐蝕保護、あ
るいはキズ保護(耐擦傷性や硬度の向上)を図ることが
できる。上記保護膜6としては透明のシリコーン樹脂の
塗料を用いることもできる。By applying the above-mentioned protective film 6, it is possible to increase the surface gloss, prevent the adhesion of stains due to fingerprints, etc., protect against corrosion against specific chemicals, or protect against scratches (improve scratch resistance and hardness). As the protective film 6, a transparent silicone resin paint can also be used.
以上のように本発明にあっては、基材1の表面を装飾用
の被膜3で覆っであるから、目で見た外観が極めて美し
い特長がある。As described above, in the present invention, since the surface of the base material 1 is covered with the decorative coating 3, it has an extremely beautiful appearance when viewed with the naked eye.
しかも上記基材1はアルミニウム等の低い硬度の材料で
形成されていても、上記基材1の表面には、被膜3を支
える為の、基材1より高硬度の中間膜2が形成され、そ
の中間膜2の上に、上記被膜3が物理的蒸発成膜法によ
って形成されているから、上記物理的蒸発成膜法による
被膜3が本来備えている高硬度という性質を発揮させら
れる特長がある。このことは、例えば使用時において被
膜3の表面に傷が付き難くて、上記美しい外観をいつま
でも維持できる有用性がある。Moreover, even if the base material 1 is made of a material with low hardness such as aluminum, an intermediate film 2 having a higher hardness than the base material 1 is formed on the surface of the base material 1 to support the coating 3. Since the coating 3 is formed on the intermediate film 2 by the physical evaporation method, the coating 3 formed by the physical evaporation method has the characteristic of exhibiting the inherent high hardness. be. This is useful because, for example, the surface of the coating 3 is hard to be damaged during use, and the above-mentioned beautiful appearance can be maintained forever.
図面は本願の実施例を示すもので、第1図は外装品の部
分拡大断面図、第2図は被膜の形成装置を略示する図、
第3図及び第4図は外装品の異なる実施例を示す部分拡
大断面図。
■・・・基材、2・・・中間膜、3・・・装飾用の被膜
。The drawings show an embodiment of the present application, and FIG. 1 is a partially enlarged sectional view of the exterior product, and FIG. 2 is a diagram schematically showing a coating forming apparatus.
FIGS. 3 and 4 are partially enlarged sectional views showing different embodiments of the exterior product. ■... Base material, 2... Intermediate film, 3... Decorative coating.
Claims (3)
飾用の被膜で覆ってある被膜付アルミニウム等外装品に
おいて、上記基材の表面には、被膜を支える為の、基材
より高硬度の中間膜が形成され、その中間膜の上に、上
記被膜が物理的蒸発成膜法によって形成されていること
を特徴とする被膜付アルミニウム等外装品。1. In coated aluminum exterior products where the surface of a base material made of aluminum or the like is covered with a decorative coating, the surface of the base material is coated with an intermediate layer of higher hardness than the base material to support the coating. 1. An exterior product such as coated aluminum, characterized in that a film is formed, and the film is formed on the intermediate film by a physical evaporation method.
影響を防ぐ為の第2中間膜が形成され、その第2中間膜
の上に被膜が形成されていることを特徴とする請求項1
記載の被膜付アルミニウム等外装品。2. A claim characterized in that a second intermediate film is formed on the intermediate film to prevent the influence of heat on the intermediate film during formation of the film, and a film is formed on the second intermediate film. 1
Exterior products such as coated aluminum as described.
被膜付アルミニウム等外装品。3. The coated aluminum exterior product according to claim 1, wherein a protective film is formed on the coat.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11814990A JPH0413860A (en) | 1990-05-08 | 1990-05-08 | External member of aluminum, etc., with coating film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11814990A JPH0413860A (en) | 1990-05-08 | 1990-05-08 | External member of aluminum, etc., with coating film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0413860A true JPH0413860A (en) | 1992-01-17 |
Family
ID=14729300
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11814990A Pending JPH0413860A (en) | 1990-05-08 | 1990-05-08 | External member of aluminum, etc., with coating film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0413860A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10102245A (en) * | 1996-07-31 | 1998-04-21 | Dr Ing H C F Porsche Ag | Gloss coating method for member, preferably, for member for vehicle, particularly, for wheel and member coated thereby |
US6225975B1 (en) | 1997-03-18 | 2001-05-01 | Alps Electric Co., Ltd. | Control device for game machine |
US6707193B2 (en) | 2000-09-11 | 2004-03-16 | Mabuchi Motor Co., Ltd. | Miniature motor with vibrator secured to an irregular portion of the motor shaft |
US7261956B2 (en) | 2004-03-16 | 2007-08-28 | Seiko Epson Corporation | Decorative article and timepiece |
US7736734B2 (en) * | 2005-12-30 | 2010-06-15 | Sandvik Intellectual Property Ab | Cutting tool insert |
US20130029174A1 (en) * | 2011-07-29 | 2013-01-31 | Hon Hai Precision Industry Co. Ltd. | Coated article and method for making the same |
CN111842085A (en) * | 2020-06-24 | 2020-10-30 | 肇庆宏旺金属实业有限公司 | Preparation method of brown fingerprint-resistant stainless steel |
CN111842076A (en) * | 2020-06-24 | 2020-10-30 | 肇庆宏旺金属实业有限公司 | Preparation method of champagne anti-fingerprint stainless steel |
CN111850487A (en) * | 2020-06-24 | 2020-10-30 | 肇庆宏旺金属实业有限公司 | Preparation method of rose gold fingerprint-resistant stainless steel |
CN111876730A (en) * | 2020-06-24 | 2020-11-03 | 肇庆宏旺金属实业有限公司 | Preparation method of titanium-gold fingerprint-resistant stainless steel |
CN113737144A (en) * | 2021-08-27 | 2021-12-03 | 西安交通大学 | Al for high-frequency electrotome2O3/CrN composite insulating coating and preparation method thereof |
-
1990
- 1990-05-08 JP JP11814990A patent/JPH0413860A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10102245A (en) * | 1996-07-31 | 1998-04-21 | Dr Ing H C F Porsche Ag | Gloss coating method for member, preferably, for member for vehicle, particularly, for wheel and member coated thereby |
JP4584366B2 (en) * | 1996-07-31 | 2010-11-17 | ドクトル イング ハー ツェー エフ ポルシェ アクチエンゲゼルシャフト | Glossy coating method for components, preferably vehicle components, in particular wheels, and components coated thereby |
US6225975B1 (en) | 1997-03-18 | 2001-05-01 | Alps Electric Co., Ltd. | Control device for game machine |
US6707193B2 (en) | 2000-09-11 | 2004-03-16 | Mabuchi Motor Co., Ltd. | Miniature motor with vibrator secured to an irregular portion of the motor shaft |
US7261956B2 (en) | 2004-03-16 | 2007-08-28 | Seiko Epson Corporation | Decorative article and timepiece |
US7736734B2 (en) * | 2005-12-30 | 2010-06-15 | Sandvik Intellectual Property Ab | Cutting tool insert |
US20130029174A1 (en) * | 2011-07-29 | 2013-01-31 | Hon Hai Precision Industry Co. Ltd. | Coated article and method for making the same |
US8795840B2 (en) * | 2011-07-29 | 2014-08-05 | Hong Fu Jin Precision Industry (Shenzhen) Co., Ltd. | Coated article and method for making the same |
CN111842085A (en) * | 2020-06-24 | 2020-10-30 | 肇庆宏旺金属实业有限公司 | Preparation method of brown fingerprint-resistant stainless steel |
CN111842076A (en) * | 2020-06-24 | 2020-10-30 | 肇庆宏旺金属实业有限公司 | Preparation method of champagne anti-fingerprint stainless steel |
CN111850487A (en) * | 2020-06-24 | 2020-10-30 | 肇庆宏旺金属实业有限公司 | Preparation method of rose gold fingerprint-resistant stainless steel |
CN111876730A (en) * | 2020-06-24 | 2020-11-03 | 肇庆宏旺金属实业有限公司 | Preparation method of titanium-gold fingerprint-resistant stainless steel |
CN113737144A (en) * | 2021-08-27 | 2021-12-03 | 西安交通大学 | Al for high-frequency electrotome2O3/CrN composite insulating coating and preparation method thereof |
CN113737144B (en) * | 2021-08-27 | 2022-05-20 | 西安交通大学 | Al for high-frequency electrotome2O3/CrN composite insulating coating and preparation method thereof |
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