JPH0411802B2 - - Google Patents
Info
- Publication number
- JPH0411802B2 JPH0411802B2 JP58051504A JP5150483A JPH0411802B2 JP H0411802 B2 JPH0411802 B2 JP H0411802B2 JP 58051504 A JP58051504 A JP 58051504A JP 5150483 A JP5150483 A JP 5150483A JP H0411802 B2 JPH0411802 B2 JP H0411802B2
- Authority
- JP
- Japan
- Prior art keywords
- signal
- data
- pattern
- detection
- pulse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 claims description 58
- 238000005070 sampling Methods 0.000 claims description 31
- 230000002441 reversible effect Effects 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 15
- 230000010365 information processing Effects 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 11
- 238000000605 extraction Methods 0.000 claims description 9
- 238000005286 illumination Methods 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 4
- 230000004044 response Effects 0.000 claims description 3
- 238000003860 storage Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 17
- 235000012431 wafers Nutrition 0.000 description 13
- 238000003708 edge detection Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000008707 rearrangement Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Image Processing (AREA)
- Image Analysis (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58051504A JPS59177668A (ja) | 1983-03-29 | 1983-03-29 | パタ−ン情報処理装置 |
US06/851,293 US4639604A (en) | 1983-03-29 | 1986-04-04 | Method and apparatus for detecting an edge position of a pattern and eliminating overlapping pattern signals |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58051504A JPS59177668A (ja) | 1983-03-29 | 1983-03-29 | パタ−ン情報処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59177668A JPS59177668A (ja) | 1984-10-08 |
JPH0411802B2 true JPH0411802B2 (enrdf_load_stackoverflow) | 1992-03-02 |
Family
ID=12888818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58051504A Granted JPS59177668A (ja) | 1983-03-29 | 1983-03-29 | パタ−ン情報処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59177668A (enrdf_load_stackoverflow) |
-
1983
- 1983-03-29 JP JP58051504A patent/JPS59177668A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59177668A (ja) | 1984-10-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4794648A (en) | Mask aligner with a wafer position detecting device | |
US5018210A (en) | Pattern comparator with substage illumination and polygonal data representation | |
US4886958A (en) | Autofocus system for scanning laser inspector or writer | |
US4912487A (en) | Laser scanner using focusing acousto-optic device | |
JPS5999304A (ja) | 顕微鏡系のレーザ光による比較測長装置 | |
JPS6236635B2 (enrdf_load_stackoverflow) | ||
US4639604A (en) | Method and apparatus for detecting an edge position of a pattern and eliminating overlapping pattern signals | |
US4634876A (en) | Object position detecting apparatus using accumulation type sensor | |
JPH04290902A (ja) | 三次元変位計測装置 | |
US4969200A (en) | Target autoalignment for pattern inspector or writer | |
JPH0735964B2 (ja) | 間隔測定装置 | |
JPS5832147A (ja) | レチクル検査方法 | |
JPH0258766B2 (enrdf_load_stackoverflow) | ||
JPH0411802B2 (enrdf_load_stackoverflow) | ||
JPH0411803B2 (enrdf_load_stackoverflow) | ||
JP2626611B2 (ja) | 物体形状測定方法 | |
JP2539107B2 (ja) | レチクルパタ―ン検査装置 | |
US4991977A (en) | Smoothing filter for stage position pulses | |
JP2539108B2 (ja) | パタ−ン検査方法 | |
EP0094041B1 (en) | Reduction projection aligner system | |
JPS60166952A (ja) | 位置検出装置 | |
JPS63103949A (ja) | 異物検査装置 | |
JPH09106945A (ja) | 粒子線のアライメント方法及びそれを用いた照射方法並びに装置 | |
JPS60134421A (ja) | パタ−ン位置検出装置 | |
JPH01164031A (ja) | アライメント装置 |