JPH0410224B2 - - Google Patents
Info
- Publication number
- JPH0410224B2 JPH0410224B2 JP3565286A JP3565286A JPH0410224B2 JP H0410224 B2 JPH0410224 B2 JP H0410224B2 JP 3565286 A JP3565286 A JP 3565286A JP 3565286 A JP3565286 A JP 3565286A JP H0410224 B2 JPH0410224 B2 JP H0410224B2
- Authority
- JP
- Japan
- Prior art keywords
- main surface
- semiconductor
- integrated circuit
- substrate
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000005855 radiation Effects 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000001443 photoexcitation Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000010953 base metal Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- -1 boron ions Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
Landscapes
- Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3565286A JPS62193271A (ja) | 1986-02-20 | 1986-02-20 | 半導体集積回路装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3565286A JPS62193271A (ja) | 1986-02-20 | 1986-02-20 | 半導体集積回路装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62193271A JPS62193271A (ja) | 1987-08-25 |
| JPH0410224B2 true JPH0410224B2 (enrdf_load_stackoverflow) | 1992-02-24 |
Family
ID=12447804
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3565286A Granted JPS62193271A (ja) | 1986-02-20 | 1986-02-20 | 半導体集積回路装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62193271A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6484673A (en) * | 1987-09-28 | 1989-03-29 | Kanagawa Prefecture | Manufacture of semiconductor optical detection element |
-
1986
- 1986-02-20 JP JP3565286A patent/JPS62193271A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62193271A (ja) | 1987-08-25 |
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