JPH0372298A - Manufacture of multilayer film reflecting mirror - Google Patents

Manufacture of multilayer film reflecting mirror

Info

Publication number
JPH0372298A
JPH0372298A JP1207939A JP20793989A JPH0372298A JP H0372298 A JPH0372298 A JP H0372298A JP 1207939 A JP1207939 A JP 1207939A JP 20793989 A JP20793989 A JP 20793989A JP H0372298 A JPH0372298 A JP H0372298A
Authority
JP
Japan
Prior art keywords
place
axis
film thickness
different
multilayer film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1207939A
Inventor
Katsuhiko Murakami
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP1207939A priority Critical patent/JPH0372298A/en
Publication of JPH0372298A publication Critical patent/JPH0372298A/en
Application status is Pending legal-status Critical

Links

Abstract

PURPOSE: To make it possible to secure a high reflectance on the whole reflecting surface of a reflector by a method wherein a multilayer film formed on a curved surface is subjected to heat treatment for a heating time being different for each place and thereby a film thickness cycle is varied so that the condition of Bragg diffraction be met in each place.
CONSTITUTION: A base 1 of which a reflecting surface is a spheroid is formed. The base 1 is disposed so that a sputtering target 4 and the rotational axis 6 of the spheroid are parallel to each other and is swung around an axis 7 being parallel to the axis 6, and substances 2 and 3 being different in a difference from a refractive index in vacuum are deposited in layers alternately so that a film thickness distribution in the direction intersecting the axis 6 perpendicularly be uniform. Subsequently, irreversible heat treatment is conducted for a heting time being different for each place, since a variation in a film thickness cycle is dependent on a temperature and the heating time, and thereby a control is made so that the condition of Bragg diffraction be met in each place of a curved surface.
COPYRIGHT: (C)1991,JPO&Japio
JP1207939A 1989-08-14 1989-08-14 Manufacture of multilayer film reflecting mirror Pending JPH0372298A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1207939A JPH0372298A (en) 1989-08-14 1989-08-14 Manufacture of multilayer film reflecting mirror

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1207939A JPH0372298A (en) 1989-08-14 1989-08-14 Manufacture of multilayer film reflecting mirror

Publications (1)

Publication Number Publication Date
JPH0372298A true JPH0372298A (en) 1991-03-27

Family

ID=16548041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1207939A Pending JPH0372298A (en) 1989-08-14 1989-08-14 Manufacture of multilayer film reflecting mirror

Country Status (1)

Country Link
JP (1) JPH0372298A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002310947A (en) * 2001-04-11 2002-10-23 Rigaku Corp Method and apparatus for measurement of small-angle scattering
JP2007011403A (en) * 1999-11-29 2007-01-18 X-Ray Optical Systems Inc Doubly curved optical device with graded atomic plane
WO2008133254A1 (en) * 2007-04-23 2008-11-06 Nikon Corporation Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007011403A (en) * 1999-11-29 2007-01-18 X-Ray Optical Systems Inc Doubly curved optical device with graded atomic plane
JP2002310947A (en) * 2001-04-11 2002-10-23 Rigaku Corp Method and apparatus for measurement of small-angle scattering
JP4514982B2 (en) * 2001-04-11 2010-07-28 株式会社リガク Small angle scattering measurement system
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8194322B2 (en) 2007-04-23 2012-06-05 Nikon Corporation Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
WO2008133254A1 (en) * 2007-04-23 2008-11-06 Nikon Corporation Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
JP2008270808A (en) * 2007-04-23 2008-11-06 Nikon Corp Multilayer film reflecting mirror, exposure apparatus, manufacturing method of device, and manufacturing method of multilayer film reflecting mirror
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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