JPH0367337U - - Google Patents
Info
- Publication number
- JPH0367337U JPH0367337U JP12845289U JP12845289U JPH0367337U JP H0367337 U JPH0367337 U JP H0367337U JP 12845289 U JP12845289 U JP 12845289U JP 12845289 U JP12845289 U JP 12845289U JP H0367337 U JPH0367337 U JP H0367337U
- Authority
- JP
- Japan
- Prior art keywords
- illuminance
- ultraviolet
- varying
- ultraviolet lamp
- ozone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12845289U JPH0367337U (ko) | 1989-11-04 | 1989-11-04 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12845289U JPH0367337U (ko) | 1989-11-04 | 1989-11-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0367337U true JPH0367337U (ko) | 1991-07-01 |
Family
ID=31676159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12845289U Pending JPH0367337U (ko) | 1989-11-04 | 1989-11-04 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0367337U (ko) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019091762A (ja) * | 2017-11-13 | 2019-06-13 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、及び記憶媒体 |
-
1989
- 1989-11-04 JP JP12845289U patent/JPH0367337U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019091762A (ja) * | 2017-11-13 | 2019-06-13 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、及び記憶媒体 |
| US11469115B2 (en) | 2017-11-13 | 2022-10-11 | Tokyo Electron Limited | Substrate processing apparatus, substrate processing method and recording medium |
| TWI810216B (zh) * | 2017-11-13 | 2023-08-01 | 日商東京威力科創股份有限公司 | 基板處理裝置、基板處理方法及記錄媒體 |
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