JPH0362976A - Semiconductor light-receiving device - Google Patents
Semiconductor light-receiving deviceInfo
- Publication number
- JPH0362976A JPH0362976A JP1198501A JP19850189A JPH0362976A JP H0362976 A JPH0362976 A JP H0362976A JP 1198501 A JP1198501 A JP 1198501A JP 19850189 A JP19850189 A JP 19850189A JP H0362976 A JPH0362976 A JP H0362976A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- light
- receiving device
- semiconductor light
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 11
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims abstract 5
- 230000031700 light absorption Effects 0.000 claims description 13
- 230000000903 blocking effect Effects 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims 5
- 230000006866 deterioration Effects 0.000 abstract description 4
- 238000012216 screening Methods 0.000 abstract 1
- 239000000969 carrier Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
Landscapes
- Light Receiving Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は周波数特性の改善を図った半導体受光装置に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor light receiving device with improved frequency characteristics.
第2図は従来の半導体受光装置の断面図である。 FIG. 2 is a sectional view of a conventional semiconductor light receiving device.
図において(1)はn−1,P基板、(2)はn−−T
、lPバ7ファ層、(3)はn−−1,G、As光吸収
層、(4)はn−−1,P窓層でn−I、IP基板(1
)上に順次成長されている。(5)は選択的に形成され
たP゛−1,P窓層、(6)はP”−1fi P窓層(
5)と同時に選択形成されたP’ −1,、G、A、光
吸収層、(8)は開口部を有し、P” −I、、P窓層
(5)上に形成した窒化膜、(9)はP“=IlIP窓
層(5)上に部分的に形成されたP電極、αωはn−L
+P基板(1) に形成されたn電極である。In the figure, (1) is n-1, P substrate, (2) is n--T
, lP buffer layer, (3) is n--1, G, As light absorption layer, (4) is n--1, P window layer, n-I, IP substrate (1
) have been grown sequentially. (5) is a selectively formed P'-1, P window layer, (6) is a P''-1fi P window layer (
5) At the same time, the P'-1,,G,A light absorption layer was selectively formed, (8) had an opening, and the nitride film was formed on the P'-I,,P window layer (5). , (9) is P"=P electrode partially formed on IlIP window layer (5), αω is n-L
This is an n-electrode formed on the +P substrate (1).
次に動作について説明する。P電極(9)とn電極00
間に逆バイアスを印加した場合、P“−■。P窓層(5
)を−通過し入射した光はn−1、、Gm As光吸収
層(3)中に延びた空乏層中でほとんど吸収されキャリ
アを発生させる。このキャリアが逆バイアスにより広が
った空乏層内の電界によりドリフトすることで光電流が
発生する。Next, the operation will be explained. P electrode (9) and n electrode 00
When a reverse bias is applied between P“−■.P window layer (5
) is mostly absorbed in the depletion layer extending into the n-1, Gm As light absorption layer (3) and generates carriers. Photocurrent is generated when these carriers drift due to the electric field in the depletion layer expanded by reverse bias.
従来の半導体受光装置は以上のように構成されているの
で、逆バイアスによる空乏層外のn−■7G、A、光吸
収層に入射した光が吸収されキャリアを発生する。しか
し、キャリアの移動は拡散によるものなので空乏層内の
ドリフトによるものに比べ非常に遅く、応答特性の劣化
の原因となっていた。Since the conventional semiconductor light-receiving device is constructed as described above, the light incident on the n-7G,A light absorption layer outside the depletion layer due to the reverse bias is absorbed and carriers are generated. However, since the movement of carriers is due to diffusion, it is much slower than that due to drift within the depletion layer, and this has been a cause of deterioration in response characteristics.
この発明は以上のような問題点を解決するためになされ
たもので、空乏層外のn−−r、Ga At光吸収層に
光が入射しない様にし、応答特性の劣化を防止するもの
である。This invention was made to solve the above-mentioned problems, and it prevents light from entering the n--r, Ga At light absorption layer outside the depletion layer, and prevents the response characteristics from deteriorating. be.
この発明による半導体受光素子は、n” −I。 The semiconductor light receiving element according to the present invention has an n''-I.
P窓層上にn−−T、Gs At光遮断層を形成する。An n--T, Gs At light blocking layer is formed on the P window layer.
この発明による半導体受光装置は、n−−1゜P窓層上
にn−I MGm Ag光遮断層を形成することにより
、空乏層外のn−−1,、Ga At光吸収層への光の
入射を防止することができ、拡散のみで移動するキャリ
アを減少させることができ応答特性の劣化を防止するこ
とができる。The semiconductor photodetector according to the present invention prevents light from entering the n-1, Ga At light absorption layer outside the depletion layer by forming an n-I MGm Ag light blocking layer on the n-1°P window layer. The number of carriers that move only by diffusion can be reduced, and the deterioration of response characteristics can be prevented.
この発明の一実施例を図において説明する。第1図は半
導体受光装置の断面図である。図において(11〜f6
1181〜aωは第2図の従来例に示したものと同等で
あるので説明を省略する。(7]はn−−IPPH14
)上のみに形成され、n−−1r、 CM A光吸収層
(3)と同一組成のn−−1,、G、A、光である。An embodiment of this invention will be explained with reference to the drawings. FIG. 1 is a sectional view of a semiconductor light receiving device. In the figure (11-f6
Since 1181 to aω are the same as those shown in the conventional example of FIG. 2, their explanation will be omitted. (7) is n--IPPH14
), and has the same composition as the n--1r, CM A light absorption layer (3).
次に動作について説明する。P電極(9)とn電極fI
I間に逆バイアスを印加した場合、P’−1,、P窓層
(5)を通過し入射した光はn−−1,GっA3光吸収
N(3)で吸収されキャリアを発生させる。このキャリ
アが逆バイアスにより広がった空乏層内を分離ドリフト
することにより光電流が発生する。Next, the operation will be explained. P electrode (9) and n electrode fI
When a reverse bias is applied between I, the light passing through the P'-1, P window layer (5) is absorbed by the n--1, G A3 light absorption N (3) and generates carriers. . When these carriers separate and drift within the depletion layer expanded by reverse bias, a photocurrent is generated.
以上のように、この発明によればn−−1,P窓層上に
n−−19G、A、光遮断層を形成することにより、n
−−1,Gs As光吸収層中にのびた空乏層以外への
光の入射を防止することができ、拡散により移動するス
ピードの遅いキャリアの発生が防止でき応答特性の劣化
を防止できる。As described above, according to the present invention, by forming the n--19G, A, light blocking layer on the n--1,P window layer, the n--1,
--1, Gs As It is possible to prevent light from entering other than the depletion layer extending in the light absorption layer, it is possible to prevent the generation of slow moving carriers due to diffusion, and it is possible to prevent deterioration of response characteristics.
第1図はこの発明の一実施例による半導体受光装置の断
面図、第2図は従来の半導体受光装置の断面図である。
図において(1)はn−1,P基板、(2)はn−−1
fiPバッファ層、(3)はn−−r、、G。
A、光吸収層、(4)はn−−1,IP窓層、(5)は
P”−1,P窓層、(6)はP” −1nG、A、光吸
収層、(7)はn” −I、lGm Ag光遮断層、(
8)は窒化膜、(9)はP電極、α0)はn電極である
。
なお図中同一符号は同−又は相当部分を示す。FIG. 1 is a sectional view of a semiconductor light receiving device according to an embodiment of the present invention, and FIG. 2 is a sectional view of a conventional semiconductor light receiving device. In the figure, (1) is n-1, P substrate, (2) is n--1
fiP buffer layer,(3) is n--r,,G. A, light absorption layer, (4) is n--1, IP window layer, (5) is P"-1, P window layer, (6) is P"-1nG, A, light absorption layer, (7) is n”-I, lGm Ag light blocking layer, (
8) is a nitride film, (9) is a P electrode, and α0) is an n electrode. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
るInPバッファ層、InGaAs光吸収層、InP窓
層を順次形成した後、InPバッファ層とInGaAs
光吸収層の一部を第二の導電体に選択的に反転した領域
を有する構造による半導体受光装置において、第一の導
電体のInP窓層上に該窓層と同一の導電体を有するI
nGaAs光遮断層を形成したことを特徴とする半導体
受光装置。After sequentially forming an InP buffer layer having the same conductor, an InGaAs light absorption layer, and an InP window layer on the InP substrate having the first conductor, the InP buffer layer and the InGaAs
In a semiconductor light-receiving device having a structure in which a part of the light absorption layer is selectively inverted to a second conductor, an I in which the same conductor as the window layer is provided on the InP window layer of the first conductor;
A semiconductor light receiving device characterized by forming an nGaAs light blocking layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1198501A JPH0362976A (en) | 1989-07-31 | 1989-07-31 | Semiconductor light-receiving device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1198501A JPH0362976A (en) | 1989-07-31 | 1989-07-31 | Semiconductor light-receiving device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0362976A true JPH0362976A (en) | 1991-03-19 |
Family
ID=16392184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1198501A Pending JPH0362976A (en) | 1989-07-31 | 1989-07-31 | Semiconductor light-receiving device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0362976A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8108430B2 (en) * | 2004-04-30 | 2012-01-31 | Microsoft Corporation | Carousel control for metadata navigation and assignment |
-
1989
- 1989-07-31 JP JP1198501A patent/JPH0362976A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8108430B2 (en) * | 2004-04-30 | 2012-01-31 | Microsoft Corporation | Carousel control for metadata navigation and assignment |
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