JPH0357469B2 - - Google Patents

Info

Publication number
JPH0357469B2
JPH0357469B2 JP60229308A JP22930885A JPH0357469B2 JP H0357469 B2 JPH0357469 B2 JP H0357469B2 JP 60229308 A JP60229308 A JP 60229308A JP 22930885 A JP22930885 A JP 22930885A JP H0357469 B2 JPH0357469 B2 JP H0357469B2
Authority
JP
Japan
Prior art keywords
pdlα
sensitivity
resist
rays
chlorinated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60229308A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6287955A (ja
Inventor
Yoshiki Suzuki
Nobuyuki Yoshioka
Noriaki Ishio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60229308A priority Critical patent/JPS6287955A/ja
Publication of JPS6287955A publication Critical patent/JPS6287955A/ja
Publication of JPH0357469B2 publication Critical patent/JPH0357469B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60229308A 1985-10-14 1985-10-14 パタ−ン形成法 Granted JPS6287955A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60229308A JPS6287955A (ja) 1985-10-14 1985-10-14 パタ−ン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60229308A JPS6287955A (ja) 1985-10-14 1985-10-14 パタ−ン形成法

Publications (2)

Publication Number Publication Date
JPS6287955A JPS6287955A (ja) 1987-04-22
JPH0357469B2 true JPH0357469B2 (https=) 1991-09-02

Family

ID=16890105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60229308A Granted JPS6287955A (ja) 1985-10-14 1985-10-14 パタ−ン形成法

Country Status (1)

Country Link
JP (1) JPS6287955A (https=)

Also Published As

Publication number Publication date
JPS6287955A (ja) 1987-04-22

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