JPH0353439A - Electron optical lens barrel - Google Patents

Electron optical lens barrel

Info

Publication number
JPH0353439A
JPH0353439A JP18816689A JP18816689A JPH0353439A JP H0353439 A JPH0353439 A JP H0353439A JP 18816689 A JP18816689 A JP 18816689A JP 18816689 A JP18816689 A JP 18816689A JP H0353439 A JPH0353439 A JP H0353439A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
astigmatism
electron beam
electron
time
way
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18816689A
Other versions
JP2946537B2 (en )
Inventor
Kenji Morita
Mamoru Nakasuji
Hiroyasu Shimizu
Shohei Suzuki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To automatically adjust astigmatism or a focus at high speed by adjusting voltage applied to each of a plurality of electrodes in the way of forming an electrostatic field having almost two time-rotation symmetry in the midway of an electron beam with 45°C angle.
CONSTITUTION: An electron optical lens barrel has systems where an electron beam emitted from an electron gun is focused on a sample by a magnetic field- type focusing lens 6 and the position of the electron beam on the sample is altered by an electrostatic deflection apparatus having a plurality of electrodes 1a, 1b, 2a, 2b, 3a, 3b, 4a, 4b put along with the route of the electron beams. An astigmatism adjusting apparatus having voltage adjusting means 8-11 to adjust the voltage applied to each of the plurality of the electrode 1a-4b in the way of forming an electrostatic filed being almost two time-rotation symmetrical in the route of the electron beam with 45°C angle is installed. Astigmatism adjustment is thus carried out electrostatically and waiting time after alteration of the voltage to be applied to an electrode can be shortened. In this way, astigmatism collection is carried automatically within a short time.
COPYRIGHT: (C)1991,JPO&Japio
JP18816689A 1989-07-20 1989-07-20 Electronic optical lens barrel Expired - Lifetime JP2946537B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18816689A JP2946537B2 (en) 1989-07-20 1989-07-20 Electronic optical lens barrel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18816689A JP2946537B2 (en) 1989-07-20 1989-07-20 Electronic optical lens barrel

Publications (2)

Publication Number Publication Date
JPH0353439A true true JPH0353439A (en) 1991-03-07
JP2946537B2 JP2946537B2 (en) 1999-09-06

Family

ID=16218909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18816689A Expired - Lifetime JP2946537B2 (en) 1989-07-20 1989-07-20 Electronic optical lens barrel

Country Status (1)

Country Link
JP (1) JP2946537B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
US7135676B2 (en) 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
JP2007095576A (en) * 2005-09-29 2007-04-12 Horon:Kk Charged particle beam device and its focus control method
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
JP2007227700A (en) * 2005-11-17 2007-09-06 Nuflare Technology Inc Method and apparatus for charged particle beam drawing
JP2013077778A (en) * 2011-09-30 2013-04-25 Nuflare Technology Inc Charged particle beam lithography apparatus and charged particle beam lithography method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002299207A (en) 2001-03-29 2002-10-11 Toshiba Corp Charged particle beam lithography device

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8053726B2 (en) 2000-06-27 2011-11-08 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7135676B2 (en) 2000-06-27 2006-11-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8803103B2 (en) 2000-06-27 2014-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US8368031B2 (en) 2000-06-27 2013-02-05 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7297949B2 (en) 2000-06-27 2007-11-20 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7411191B2 (en) 2000-06-27 2008-08-12 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US9368314B2 (en) 2000-06-27 2016-06-14 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7601972B2 (en) 2000-06-27 2009-10-13 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
US7417236B2 (en) 2000-07-27 2008-08-26 Ebara Corporation Sheet beam-type testing apparatus
US7829871B2 (en) 2000-07-27 2010-11-09 Ebara Corporation Sheet beam-type testing apparatus
US7109484B2 (en) 2000-07-27 2006-09-19 Ebara Corporation Sheet beam-type inspection apparatus
JP2007095576A (en) * 2005-09-29 2007-04-12 Horon:Kk Charged particle beam device and its focus control method
JP2007227700A (en) * 2005-11-17 2007-09-06 Nuflare Technology Inc Method and apparatus for charged particle beam drawing
JP2013077778A (en) * 2011-09-30 2013-04-25 Nuflare Technology Inc Charged particle beam lithography apparatus and charged particle beam lithography method

Also Published As

Publication number Publication date Type
JP2946537B2 (en) 1999-09-06 grant

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