JPH03503503A - Method and device for treating exhaust gas by electron beam irradiation - Google Patents

Method and device for treating exhaust gas by electron beam irradiation

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JPH03503503A
JPH03503503A JP63508644A JP50864488A JPH03503503A JP H03503503 A JPH03503503 A JP H03503503A JP 63508644 A JP63508644 A JP 63508644A JP 50864488 A JP50864488 A JP 50864488A JP H03503503 A JPH03503503 A JP H03503503A
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exhaust gas
electron beam
beam irradiation
active species
treated
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JPH0616815B2 (en
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寛一 伊藤
前沢 章彦
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株式会社荏原製作所
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A50/00TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
    • Y02A50/20Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters

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Abstract

(57)【要約】本公報は電子出願前の出願データであるため要約のデータは記録されません。 (57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 電子線照射による排ガスの処理方法及び装置挾五分野 此の発明は、SO□やNO8等の有害(ガス)成分を含む排ガスに電子線を照射 して該有害(ガス)成分をミスト(硫酸及び/又は硝酸)やダスト(硫安及び/ 又は硝安)の形に変え、その結果得られたミストやダストを集塵装置等で捕捉す る排ガスの処理方法及び装置に関する。[Detailed description of the invention] Five fields of exhaust gas treatment methods and equipment by electron beam irradiation This invention irradiates exhaust gas containing harmful (gas) components such as SO□ and NO8 with an electron beam. and remove the harmful (gas) components from mist (sulfuric acid and/or nitric acid) or dust (ammonium sulfate and/or nitric acid). or ammonium nitrate) and capture the resulting mist and dust with a dust collector, etc. The present invention relates to a method and device for treating exhaust gas.

■量技歪 SO□やNOl等の有害(ガス)成分を排ガスから除く排ガス処理の一方法は、 排ガスに電子線を照射して排ガス中の酸素、水等からOラジカルやOHラジカル 等種々の活性種を形成し、該活性種が排ガス中の有害(ガス)成分に作用してミ ストを形成し、このミストをアンモニア等の存在下に更にダストに変え、次にこ のミストやダストを集塵装置等で捕捉する方法である。■Amount of skill distortion One method of exhaust gas treatment is to remove harmful (gas) components such as SO□ and NOl from exhaust gas. Exhaust gas is irradiated with electron beams to remove O radicals and OH radicals from oxygen, water, etc. in exhaust gas. These active species act on the harmful (gas) components in the exhaust gas to reduce emissions. This mist is further converted to dust in the presence of ammonia, etc., and then this mist is This method captures the mist and dust with a dust collector, etc.

図1は、此の排ガス処理法を実施するための排ガス処理装置の電子線照射部分の 概要構造を示す。図に示すように、排ガスダクト1に照射窓2を設け、照射窓2 を通して電子線加速機3から発射される電子線4を排ガスダクト1を通過する排 ガスに直接照射する。、電子線4を排ガスダクト1の内部に直接照射する構造で は、排ガス量が実用規模程度に多くなり排ガスダクト1のサイズがそれに従って 大きくなると、排ガスに漏れなく電子線4を吸収させるためには、排ガスダクト 1の外周に多数の電子線加速機3(図中例では2個)を用いたり、更に点線5で 示される電子線4の最大飛程を大きくする必要があった。しかしながら、多数の 電子線加速機:3を設置することは、排ガス処理装置の構造か複雑になり、費用 を高める欠点がある。更に、電子線4の最大飛程を大きくするには、電子線の加 速電圧を高くする必要があり、これが電子線加速機3の費用をかなり高めること になる。これに加え、電子線を高電圧で加速すると高エネルギーX−線が発生し 、このような高エネルギーX−線を遮弊するには厚い鉛又はコンクリート壁等を 設ける必要があり、このためにも排ガス処理装置の総費用が上昇する結果となる 。Figure 1 shows the electron beam irradiation part of the exhaust gas treatment equipment used to implement this exhaust gas treatment method. Shows the general structure. As shown in the figure, an irradiation window 2 is provided in the exhaust gas duct 1, and the irradiation window 2 The electron beam 4 emitted from the electron beam accelerator 3 is passed through the exhaust gas duct 1. Irradiates the gas directly. , with a structure in which the electron beam 4 is directly irradiated into the inside of the exhaust gas duct 1. In this case, the amount of exhaust gas increases to a practical scale, and the size of exhaust gas duct 1 changes accordingly. When the size increases, in order to absorb the electron beam 4 without leaking into the exhaust gas, the exhaust gas duct must be A large number of electron beam accelerators 3 (two in the example in the figure) are used around the outer circumference of 1, and the dotted line 5 It was necessary to increase the maximum range of the electron beam 4 shown. However, many Installing 3 electron beam accelerators will complicate the structure of the exhaust gas treatment equipment and increase costs. There are drawbacks to increasing the Furthermore, in order to increase the maximum range of the electron beam 4, It is necessary to increase the speed voltage, which significantly increases the cost of the electron beam accelerator 3. become. In addition, when electron beams are accelerated with high voltage, high-energy X-rays are generated. , to block such high-energy X-rays, thick lead or concrete walls, etc. This also results in an increase in the total cost of the exhaust gas treatment equipment. .

すなわち、先行技術には種々の問題かある。That is, the prior art has various problems.

下記表1は、加速電圧に依る電子線の最大飛程、電子線照射室のサイズ、排ガス の流速及び高エネルギーX−線を遮蔽する船壁の厚みの関係を示す。Table 1 below shows the maximum range of the electron beam, the size of the electron beam irradiation chamber, and the exhaust gas depending on the accelerating voltage. The relationship between the current velocity and the thickness of the ship wall that shields high-energy X-rays is shown.

800      3、1       3.2     2.5xlO’      170500      1.6       1.7     6   xlO’     90300      0.8       0.9      2  xlO’     34200            0.46               0.5          0.7ス10’           P3 前記表1は、電子線の最大飛程及び排ガスが電子線を吸収するために必要な電子 線照射室のサイズの一例を示すものであり、それにより処理できる排ガス量及び X−線を遮蔽するための船壁の厚み、すなわち遮蔽構造が決定される。302や NOx 等有害ガス成分の処理には、適当な水準の電子線エネルギー(加速電圧 xi流)が必要である。し、かじながら、電流は、X−線を遮蔽する船壁厚みの 決定に重要な因子ではない。800 3, 1 3.2 2.5xlO' 170500 1.6 1.7 6 xlO' 90300 0.8 0.9 2 xlO’ 34200 0.46 0.5 0.7 s 10’        P3 Table 1 above shows the maximum range of the electron beam and the electrons required for the exhaust gas to absorb the electron beam. This shows an example of the size of the irradiation chamber, and the amount of exhaust gas that can be treated with it. The thickness of the ship wall for shielding X-rays, that is, the shielding structure is determined. 302 and To treat harmful gas components such as NOx, an appropriate level of electron beam energy (acceleration voltage) is required. xi style) is required. However, the current flows through the thickness of the ship's wall, which shields the X-rays. Not an important factor in the decision.

特開昭49−96975号、同55−97232号、米国特許第4.507.2 65号及び同第4.596.642号の明細書に開示されたものを含み、排ガス 全体に一様な電子線を照射することを目的とする技術は存在するが、前記の諸問 題を完全に解決するものはないことに留意する必要がある。JP 49-96975, JP 55-97232, U.S. Patent No. 4.507.2 No. 65 and No. 4.596.642, including those disclosed in the specifications of There are technologies that aim to irradiate the entire area with a uniform electron beam, but the above-mentioned problems arise. It is important to note that there is no complete solution to the problem.

更に、特開昭61−68126号には、雰囲気空気を電子線照射反応器に導入し て前置の空気に電子線を照射し、内部にオゾンや酸素原子を形成する技術が開示 されている。オゾンや酸素原子を含んだ前記の空気を排ガスに混合して排ガス中 のNOをN O2に酸化し、次に排ガスを湿式吸収塔に導入して脱硫及び脱硝す るのである。Furthermore, in JP-A-61-68126, atmospheric air is introduced into an electron beam irradiation reactor. technology to irradiate the air in front of it with an electron beam to form ozone and oxygen atoms inside has been disclosed. has been done. The above-mentioned air containing ozone and oxygen atoms is mixed with the exhaust gas. of NO is oxidized to N O2, and then the exhaust gas is introduced into a wet absorption tower for desulfurization and denitrification. It is.

該技術の脱硫及び脱硝では、湿式の吸収塔を用いるので、この湿式吸収塔で用い る吸収液は処理困難な窒素化合物や硫黄化合物を多量含有し、従って吸収液の処 理のため高額の排水処理装置を必要とする。このため、その設置及び維持に高い 費用を要する問題が生ずる。Desulfurization and denitrification using this technology use a wet absorption tower, so The absorbent liquid contains a large amount of nitrogen and sulfur compounds that are difficult to treat. requires expensive wastewater treatment equipment. Therefore, installation and maintenance are expensive. Expensive problems arise.

本発明は先行技術の前記諸問題の解決に導かれるものである。排ガスの主流から 一部を抜き取り、低電圧型加速機を用いてそれに電子線を照射し、照射された排 ガス中にOラジカルややOHラジカル等の活性種を形成してそれを活性化し、次 に活性化された排ガスを排ガスの主流中に一様に供給し、それにより排ガスから 302やNOlを効果的に除去するような電子線照射により排ガスを処理する方 法及び装置の提供が本発明の一目的である。The present invention is directed to solving the aforementioned problems of the prior art. From the mainstream of exhaust gas A part of the sample is extracted, and a low-voltage accelerator is used to irradiate it with an electron beam. Active species such as O radicals and OH radicals are formed in the gas and activated. The activated exhaust gas is uniformly supplied into the main stream of the exhaust gas, thereby removing the How to treat exhaust gas by electron beam irradiation that effectively removes 302 and NOl It is an object of the present invention to provide a method and apparatus.

胆示 前記目的達成のため、本発明は、処理目的の排ガスの一部に電子線を照射しで、 OラジカルやOHラジカル等の活性種を被照射排ガス内に形成すること1内部に 活性種が形成された排ガスを処理目的の排ガスに混合し、それにより処理対象排 ガス中の有害(ガス)成分を活性種の作用でミスト又はダストの形に変えること 、及び該ミストやダストを捕捉することからなる排ガス処理方法を提供する。courage In order to achieve the above object, the present invention irradiates a part of the exhaust gas to be treated with an electron beam, Forming active species such as O radicals and OH radicals in the irradiated exhaust gas 1. The exhaust gas in which active species have been formed is mixed with the exhaust gas to be treated, thereby Converting harmful (gas) components in gas into mist or dust by the action of active species , and an exhaust gas treatment method comprising capturing the mist and dust.

本発明は、電子線加速機から電子線を照射するための電子線照射室、処理対象排 ガスの一部を電子線照射室に導入し、そこで排ガスに電子線を照射してOラジカ ルやOr(ラジカル等の活性種を形成し、かつ、内部に活性種が形成された排ガ スを処理対象排ガスが流れている排ガス主ダクトに供給するための供給装置、供 給装百から供給される排ガスを排ガス主ダクト内に一様に分散させるための分散 装置、及び活性種の作用によりミス)・やダストの形に変化した主ダクト内の排 ガス中の有害(ガス)成分を捕捉するための捕捉装置で構成される排ガス処理装 置も提供する。The present invention relates to an electron beam irradiation chamber for irradiating electron beams from an electron beam accelerator, and A portion of the gas is introduced into an electron beam irradiation chamber, where the exhaust gas is irradiated with an electron beam to generate O radicals. Exhaust gas that forms active species such as radicals and Or (radicals), and has active species formed inside. Supply equipment and supplies for supplying gas to the exhaust gas main duct through which the exhaust gas to be treated flows. Dispersion for uniformly dispersing the exhaust gas supplied from the supply unit into the exhaust gas main duct Exhaust in the main duct that has changed into dust due to the action of equipment and active species. Exhaust gas treatment equipment consisting of a capture device to capture harmful (gas) components in gas We also provide a location.

区画@簡単ケ説明 図1は、従来の排ガス装ごの電子線照射部の概要構造を示す。Section @ simple explanation FIG. 1 shows a schematic structure of an electron beam irradiation section of a conventional exhaust gas system.

図2は、本発明の排ガス処理法を実施するための排ガス処理装置の概要構造を示 す。Figure 2 shows the general structure of an exhaust gas treatment device for carrying out the exhaust gas treatment method of the present invention. vinegar.

図3は、図2のX−X断面図である。FIG. 3 is a sectional view taken along line XX in FIG. 2.

図面の4は、本発明の排ガス処理方法を実施するだめの他の排ガス処理装置の概 要構造を示す。Figure 4 shows an outline of another exhaust gas treatment device for carrying out the exhaust gas treatment method of the present invention. Shows the essential structure.

図5は、図4のY−Y断面図である。FIG. 5 is a sectional view taken along YY line in FIG. 4.

尺盟(X鼻1な咋9ト方式 本発明を実施する方式を図面を引用j、なから以下で説明する。Shaku Mei (X Nose 1 Kui 9 To method) The manner in which the invention is carried out will be described below with reference to the drawings.

下式は、重子線で処理して被てる射ガス中に活性種を形成する排ガスの部分(割 合%)を示す。The formula below is the fraction of the exhaust gas that is treated with deuteron beams to form active species in the overburdened gas. percentage).

D・電子線照射室のサイズ(直径、m)。このサイズは、加速電圧により主に決 定される電子線の最大飛程よりも若干太き目に設定される。このサイズは更に排 ガスの密度及び温度によって変化する。このため、約500KV以下の加速電圧 に対しては約2.0m以下であることが好ましい。そうすると、電子線加速機や 周辺装置の設備費を著しく低下できるからである。。D. Size of electron beam irradiation chamber (diameter, m). This size is mainly determined by the accelerating voltage. The distance is set slightly wider than the maximum range of the electron beam. This size is even more exclusive. Varies depending on gas density and temperature. Therefore, the accelerating voltage is about 500KV or less. The distance is preferably about 2.0 m or less. Then, the electron beam accelerator This is because equipment costs for peripheral devices can be significantly reduced. .

■ 電子照射室内での排ガスの流速(m/秒)。この値は、一般に排ガスダクト に採用される約30m/秒以下であることが好ましい。この値が約30/秒より 大であると、圧力降下度が好ましくないまでに増大する。。■ Flow rate of exhaust gas in the electron irradiation chamber (m/sec). This value is generally It is preferable that the speed is about 30 m/sec or less. This value is about 30/sec If it is too large, the degree of pressure drop will increase undesirably. .

Q 処理対象排ガスの量(m3/時)。Q Amount of exhaust gas to be treated (m3/hour).

下記の表2は、加速電圧、電子線照射室のサイズ及び排ガスの流速間の関係を示 す。Table 2 below shows the relationship between accelerating voltage, electron beam irradiation chamber size, and exhaust gas flow rate. vinegar.

青ス 1000       最大  5.0       最大  30800        最大  3.7        最大  30500        最大  2−0       最大  30300       最大  1. 0       最大  30200       最大  0.6         最大  30図2は、本発明の排ガス処理法を実施するための排ガス処理 装置の概要構造を示し、図3は図2のX−X断面図である。Blue Su 1000 Maximum 5.0 Maximum 30800 Maximum 3.7 Maximum 30500 Maximum 2-0 Maximum 30300 Maximum 1. 0 Maximum 30200 Maximum 0.6 Maximum 30 Figure 2 shows exhaust gas treatment for carrying out the exhaust gas treatment method of the present invention. The general structure of the device is shown, and FIG. 3 is a sectional view taken along the line XX in FIG. 2.

電子線加速機6からの電子線7で照射するための電子線照射室8は、排ガス17 が流れる排ガス主ダクト12の近くに配置される。電子線加速機6の電子線照射 開口部から電子線照射室8の壁面に至る距離は、電子線7の最大飛程よりも若干 太き目に設定される。電子線照射室8の一端は排ガス主ダクト12に連通し、そ の他端は吸引圧送ブロワ9と管路10を介して、排ガス主ダクト12内にセット された分散装置113に連通している。分散装置13は、主ダクト12の中心部 から半径方向に伸びる複数のラジアル管14と同心的に配置された同心円管15 とからなり、ラジアル管14と同心円管15とは互いに連通ずると共に管路10 とも連通している。ラジアル管14と同心円管15には、夫々、排ガス17流の 下流側に面して多数の小孔16が開けられている。吸引圧送ブロワ9と管路10 は、組になって、電子線照射室8からの空気を分散装置13に供給する供給装置 を構成する。An electron beam irradiation chamber 8 for irradiating with an electron beam 7 from an electron beam accelerator 6 includes an exhaust gas 17 is located near the exhaust gas main duct 12 through which the exhaust gas flows. Electron beam irradiation from electron beam accelerator 6 The distance from the opening to the wall of the electron beam irradiation chamber 8 is slightly longer than the maximum range of the electron beam 7. Set to thick. One end of the electron beam irradiation chamber 8 communicates with the exhaust gas main duct 12; The other end is set in the exhaust gas main duct 12 via the suction pressure blower 9 and the pipe line 10. The dispersion device 113 is connected to the dispersion device 113. The dispersion device 13 is located in the center of the main duct 12. A concentric pipe 15 arranged concentrically with a plurality of radial pipes 14 extending in the radial direction from The radial pipe 14 and the concentric pipe 15 communicate with each other, and the pipe line 10 It also communicates with The radial pipe 14 and the concentric pipe 15 each have a flow of exhaust gas 17. A large number of small holes 16 are opened facing the downstream side. Suction pressure blower 9 and pipe line 10 are supply devices that form a set and supply air from the electron beam irradiation chamber 8 to the dispersion device 13. Configure.

排ガス処理装置は前記のように配置されているため、排ガス主ダクトから電子線 照射室8内に吸引される排ガス18は、電子線加速機6からの電子線7で照射さ れ、排ガス中の酸素や水はOラジカルやOHラジカル等の活性種を形成する。Since the exhaust gas treatment equipment is arranged as described above, electron beams are transmitted from the exhaust gas main duct. The exhaust gas 18 sucked into the irradiation chamber 8 is irradiated with the electron beam 7 from the electron beam accelerator 6. Therefore, oxygen and water in the exhaust gas form active species such as O radicals and OH radicals.

内部に活性種が形成された排ガスは、吸引圧送ブロワ9により管路10を介して 分散装置13に供給され、分散装置13の中で排ガスは主ダクト12内の排ガス 17に一様に分散されて、それと混合する。その結果、OラジカルやOHラジカ ル等の活性種は排ガス17中のSowやNOlの有害(ガス)成分に作用してミ スト(硫酸、硝酸等)の形に変わる。管路10の一部(図示せず)から適当量の アンモニアを注入すれば、該ミストと該アンモニアガスが互いに反応してダスト (硫安、硝安等)を形成する。このミストやダストを静電沈降器、ノくグフイル ター、活性炭分離器等(全て従来のものである)等の集塵機(図示せず)で捕捉 することにより、排ガス17からS O2やNOo等の有害(ガス)成分を除去 することが可能である。The exhaust gas in which active species have been formed is passed through a pipe line 10 by a suction pressure blower 9. The exhaust gas is supplied to the dispersion device 13, and in the dispersion device 13, the exhaust gas is collected from the exhaust gas in the main duct 12. 17 and mixed therewith. As a result, O radicals and OH radicals Activated species such as alcohol act on harmful (gas) components such as Sow and NOl in exhaust gas 17, It changes to the form of salt (sulfuric acid, nitric acid, etc.). An appropriate amount of When ammonia is injected, the mist and the ammonia gas react with each other to form dust. Forms (ammonium sulfate, ammonium nitrate, etc.). This mist and dust is removed using an electrostatic precipitator. Collected by dust collectors (not shown) such as filters, activated carbon separators, etc. (all conventional) By doing this, harmful (gas) components such as S O2 and NOo are removed from the exhaust gas 17. It is possible to do so.

図4は本発明の排ガス処理法を実施するための他の排ガス処理装置の概要構造を 示し、図5は図4のY−Y断面図である。Figure 4 shows a schematic structure of another exhaust gas treatment device for carrying out the exhaust gas treatment method of the present invention. 5 is a sectional view taken along YY line in FIG. 4.

電子線照射室21は、排ガス主ダクト23の近くに配置される。電子線照射室2 1の一端は管路22を介して排ガス主ダクト23に連通し、その他端+1吸引圧 送ブロワ24、管路25および環状通路26を介して分散装置27に連通して( 洩る。電子線照射室21は電子線加速機19を備えている。電子線加速機19の 電子線照射開口部から電子線照射室21の壁面に至る距離は、電子線20の最大 飛程より若干太き目になるよう設定されている。The electron beam irradiation chamber 21 is arranged near the exhaust gas main duct 23. Electron beam irradiation room 2 One end of 1 communicates with the exhaust gas main duct 23 via a pipe line 22, and the other end has a suction pressure of +1 It communicates with a dispersion device 27 via a feed blower 24, a pipe line 25 and an annular passage 26 ( Leak. The electron beam irradiation chamber 21 is equipped with an electron beam accelerator 19. Electron beam accelerator 19 The distance from the electron beam irradiation opening to the wall surface of the electron beam irradiation chamber 21 is the maximum distance of the electron beam 20. It is set to be slightly wider than the range.

分散装置27は、環状通路26に連通ずる複数のフィン28と、フィン281こ 面するよう配置され且つ矢印30の方向に回転する羽根29とで構成される。各 フィン28は、矢印の方向から見て裏側に多数の小孔31が開けられており、羽 根29の回転によって生じる排ガス32の渦は、電子線照射され且つ電子線照射 室21から配送される排ガスを排ガス32に一様に分散して混合する。図面で( よ、参照数33は羽根29を回転するモータを示し、数字34はモータ33を排 ガス主ダクト23内に支持する支持部材を示す。The dispersion device 27 includes a plurality of fins 28 communicating with the annular passage 26 and fins 281. The blades 29 are arranged to face each other and rotate in the direction of the arrow 30. each The fin 28 has a large number of small holes 31 on the back side when viewed from the direction of the arrow, and the wings The vortex of the exhaust gas 32 generated by the rotation of the root 29 is irradiated with an electron beam and The exhaust gas delivered from the chamber 21 is uniformly dispersed and mixed with the exhaust gas 32. In the drawing ( The reference number 33 indicates the motor that rotates the blade 29, and the number 34 excludes the motor 33. A support member supported within the gas main duct 23 is shown.

前記の例では羽根29はモータ33により回転するのであるが、勿論、羽根29 を回転させる駆動部たとえばモータを排ガス主ダクト23の外部1こ設け、駆動 部からの回転力を適当な回転力伝達手段、例えば歯車、チェーン又はベルトを用 いて伝達するような配置であってもよい。In the above example, the blades 29 are rotated by the motor 33, but of course the blades 29 A drive unit, for example, a motor, is provided outside the exhaust gas main duct 23 to rotate the The rotational force from the The arrangement may also be such that the information is transmitted by

前記の排ガス処理装置の配置では、排ガス主ダクト23から管路22を介して吸 引される排ガスの一部は、電子線加速機19からの電子線20で照射され、前記 例(図2に示した例)と全(同様に、排ガス中の酸素や水がOラジカルやOHラ ジカル等の活性種を形成する。内部に活性種が形成された排ガスは、分散装置2 7を介して排ガス主ダクト23内の排ガス32中に分散され、それと混合する。In the arrangement of the exhaust gas treatment device described above, the exhaust gas is sucked from the main duct 23 through the pipe line 22. A part of the drawn exhaust gas is irradiated with an electron beam 20 from an electron beam accelerator 19, and the example (the example shown in Figure 2) and total (similarly, oxygen and water in the exhaust gas are O radicals and OH radicals). Forms active species such as radicals. The exhaust gas in which active species have been formed is transferred to the dispersion device 2. 7 into the exhaust gas 32 in the exhaust gas main duct 23 and mix therewith.

その結果、活性種は排ガス32中の有害(ガス)成分に作用してミストやダスト を形成する。従って、静電沈降器、バグフィルタ、活性炭分離器等の集塵器を用 いてこのミストやダスト捕捉することができる。As a result, the activated species act on the harmful (gas) components in the exhaust gas 32 and create mist and dust. form. Therefore, use dust collectors such as electrostatic precipitators, bag filters, and activated carbon separators. It can capture this mist and dust.

図2乃至5に示す排ガス処理装置の構造は本発明の一実施態様であって、本発明 は必ずしもそれらに限定されるものでないことに留意されたい。要するに、電子 線加速機からの電子ビームで照射するための電子線照射室を排ガス主ダクトの近 くに設置し、処理対象排ガスの一部を電子線照射室に導入し、そこで排ガスに電 子線を照射してOラジカルやOHラジカル等の活性種を形成し:内部に活性種が 形成された排ガスを供給手段により排ガス主ダクト内に供給し;分散装置を用い て排ガス主ダクト内に導入された排ガスを主ダクトを介して流れている排ガス中 に分散して混合し、それにより排ガス中の(有害)成分を活性種の作用でミスト やダストの形に変え、かつ、静電沈降器、バグフィルタ、活性炭分離器等従来の 集塵装置の捕捉装置を用いてダストやミストを捕捉するように排ガス処理装置が 配置されているならば、排ガス処理装置の各部はどのような特定の配置や構造を 有するものであってもよい。The structure of the exhaust gas treatment device shown in FIGS. 2 to 5 is an embodiment of the present invention. Note that these are not necessarily limited to these. In short, electronic The electron beam irradiation room for irradiation with the electron beam from the line accelerator was installed near the main exhaust gas duct. A part of the exhaust gas to be treated is introduced into the electron beam irradiation chamber, where an electric current is applied to the exhaust gas. Irradiation with a sub-beam to form active species such as O radicals and OH radicals: Active species inside The formed exhaust gas is fed into the exhaust gas main duct by a supply means; using a dispersion device. The exhaust gas introduced into the exhaust gas main duct is transferred to the exhaust gas flowing through the main duct. The (harmful) components in the exhaust gas are dispersed and mixed into a mist by the action of active species. and dust, and can be used in conventional methods such as electrostatic precipitators, bag filters, and activated carbon separators. Exhaust gas treatment equipment uses the trapping device of the dust collector to capture dust and mist. If so, what is the specific arrangement and structure of each part of the exhaust gas treatment equipment? It may be something that you have.

前述のように、本発明によれば、排ガスの一部を抜き取って電子線を照射し、1 ll−ガス中にそれを活性化する活性種を形成【7、次に活性化された排ガスを 処理目的のガスに混合し、それにより排ガス中の有害(ガス)成分をミストやダ ストの形に変えるのである。従って、先行技術のよ・うに排カス全体を直接照射 する必要はなく、排ガス量か実用規模程度に多くなり排ガスダクトのサイズがそ れに対応して大きくなっても、多数の電子加速機を配!したり加速電圧を高めた りする必要はない。従って、電子線加速機や周辺装置の設備費を著しく下げるこ とか可能となるのである。例えば、電子線を排カスに直接適用する従来の配置で は、排ガス中に活性種を一様に形成する目的で排ガスダクトサイズ等に関して満 足な電子線エネルギーを得るには、電子線加速機の加速電圧を高水準すなわち8 00KV乃至1.0OOK Vに設定する必要があった。これに対して本発明の 場合には、約500に■以下の加速電圧の電子線加速機で十分であり、電子線加 速機や周辺装置の設備費を著しく下げることができる。As described above, according to the present invention, a part of the exhaust gas is extracted and irradiated with an electron beam, and 1 Formation of active species in the gas that activates it [7, Next, the activated exhaust gas is It is mixed with the gas for processing purposes, thereby removing harmful (gas) components from the exhaust gas into mist or dust. It turns into a strike. Therefore, unlike the prior art, the entire waste residue is directly irradiated. There is no need to do so, and the amount of exhaust gas increases to a practical scale and the size of the exhaust gas duct increases. Even if it becomes larger in response to this, it will be equipped with a large number of electron accelerators! or increased the acceleration voltage. There is no need to do this. Therefore, equipment costs for the electron beam accelerator and peripheral equipment can be significantly reduced. It becomes possible. For example, in a traditional arrangement where an electron beam is applied directly to the waste In order to uniformly form active species in the exhaust gas, the exhaust gas duct size etc. In order to obtain sufficient electron beam energy, the acceleration voltage of the electron beam accelerator should be set to a high level, that is, 8 It was necessary to set it to 00KV to 1.0OOK V. In contrast, the present invention In some cases, an electron beam accelerator with an accelerating voltage of approximately 500 or less is sufficient; Equipment costs for speed machines and peripheral equipment can be significantly reduced.

更に、本発明に従って電子線照射により排ガスを処理する方法および装置は、活 性種(OラジカルやOHラジカル等)の作用により排ガスの有害成分をミストや ダストに変え、そのミストやダストを従来の捕捉装置を用いて捕捉するものであ る。従って、本発明は前述の湿式吸収塔を用いるケースとは異なり、湿式吸収塔 を用いた場合にはそれに用いる吸収液から出る排水の処理が必要となるが、本発 明では設備費及び維持費を下げることができる。Furthermore, the method and apparatus for treating exhaust gas by electron beam irradiation according to the present invention Harmful components of exhaust gas are removed by the action of chemical species (O radicals, OH radicals, etc.) The mist and dust are captured using conventional capture devices. Ru. Therefore, unlike the case where a wet absorption tower is used as described above, the present invention uses a wet absorption tower. When using the absorption liquid, it is necessary to treat the wastewater generated from the absorption liquid used in the process. In light, equipment costs and maintenance costs can be lowered.

更に本発明は、排ガスの一部を抜き取って電子線照射するので、外部から取り入 れた空気を電子線照射する場合と比べて、電子線照射した排ガスを主ダクトを介 して流れる排ガスに混合した際に排ガスの容積は増加しない。すなわち、本発明 は大容量のブロワを必要としない。しかしながら、総ガス容積の増加や脱硫・脱 硝の僅かな効率低下が大した問題でなく、空気を取り入れて電子線照射すること が好ましい場合には、排ガスの一部の代わりに空気を取り入れてもよい。Furthermore, since the present invention extracts a part of the exhaust gas and irradiates it with electron beams, it is not necessary to introduce it from the outside. Compared to the case where the air is irradiated with an electron beam, the exhaust gas irradiated with an electron beam is passed through the main duct. When mixed with flowing exhaust gas, the volume of the exhaust gas does not increase. That is, the present invention does not require a large capacity blower. However, the increase in total gas volume and desulfurization/desulfurization The slight decrease in efficiency of the glass is not a big problem, and it is possible to take in air and irradiate the electron beam. If this is preferred, air may be introduced instead of part of the exhaust gas.

実施例により以下で本発明を更に詳しく説明するが、本発明はこの実施例で限定 されるものではない。The present invention will be explained in more detail below by way of examples, but the present invention is not limited to these examples. It is not something that will be done.

実施例 S 02 (200ppm)とN O、(180ppm)を含む排ガス(2,0 00Nm’ /時)を70℃に冷却し、次に排ガスの一部を照射室に導入し、そ こでそれに電子線を照射して活性種を形成した。これらの活性種を含む排ガスを 主排ガスダクトに戻し、混合された排ガスを前記主ダクトに通して静電沈降器に 導入し、そこで生成ダストを分離して被処理ガスを大気中に放出した。実験操作 は約150時間実施した。Example Exhaust gas (2,0 ppm) containing S02 (200 ppm) and NO, (180 ppm) 00Nm'/hour) to 70℃, then part of the exhaust gas is introduced into the irradiation chamber, and then Then, it was irradiated with an electron beam to form active species. Exhaust gas containing these active species The mixed exhaust gas is returned to the main exhaust gas duct and passed through the main duct to the electrostatic precipitator. where the generated dust was separated and the gas to be treated was released into the atmosphere. Experimental manipulation The test was carried out for about 150 hours.

操作条件、電子線で処理する排ガスの部分(割合)及び脱硫と脱硝の百分率を表 3に示す。Displays operating conditions, portion (proportion) of flue gas treated with electron beam and percentage of desulfurization and denitrification. Shown in 3.

表1゜ 100     20.000    1.000     10g         1.5     4.453      Jo、600     800      108       1.5     3.215      3. 000     500     108       1.5     1. 74.2      840     300     108        1.5     0.91.3      260     200      108       1.5     0.50、37         90         80        1570、37         90         75         850.37         90         .75         320.37         9 0        70         13V週ffl性 本発明に従って電子線照射により排ガスを処理する方法及び装置では、排ガス中 のSO2やNOl等の有害(ガス)成分をミスト(硫酸及び、/又は硝酸)やダ スト(硫安及び/又は硫安)の形に変えた後、生成したミストやダストを集塵器 等で捕捉する。従って、本発明の方法及び装置は、化石燃料たとえば重油や石炭 を燃料として使う熱電気発電プラントのボイラー燃焼排ガスや製鉄工場の焼結排 ガスを処理する方法及び装置として好適である。Table 1゜ 100 20.000 1.000 10g 1.5 4.453 Jo, 600 800 108 1.5 3.215 3. 000 500 108 1.5 1. 74.2 840 300 108 1.5 0.91.3 260 200 108 1.5 0.50, 37 90 80 1570, 37 90 75 850.37 90       . 75 320.37 9 0 70 13V week ffl sex In the method and apparatus for treating exhaust gas by electron beam irradiation according to the present invention, Harmful (gas) components such as SO2 and NOl are removed using mist (sulfuric acid and/or nitric acid) or dust. After changing the form of mist (ammonium sulfate and/or ammonium sulfate), the generated mist and dust are transferred to a dust collector. etc. to capture it. Therefore, the method and apparatus of the present invention can be applied to fossil fuels such as heavy oil and coal. Boiler combustion exhaust gas from thermoelectric power generation plants that use fuel as fuel and sintering exhaust gas from steel plants It is suitable as a method and apparatus for treating gas.

補正書の翻訳文提出書 (特許法第184条の8) 平成 3年 4月30日 特許庁長官   植 松   敏  殿          赳11、特許出願 の表示 pcT/JP88101101 、発明の名称 電子線照射による排ガスの処理方法及び装置3、特許出願人 住 所  日本国 144 東京都大田区羽田旭町11番1号名 称  株式会 社 存庫製作所 4、代理人 住 所  東京都千代田区大手町二丁目2番1号新大手町ビル 206区 5、補正書の提出日 (1) 補正書の翻訳文       1通補  正  書 1、(補正) 主ダクト内を流れる排ガスを電子線照射により処理する方法であ って、 処理すべき排ガスの総容積基準で、前記排ガスの約1.3乃至約15容積%を前 記主ダクトから電子照射室内に分離するステップ、但し前記の分離ステップで分 離される排ガスの割合は、前記主ダクト内の排ガスの百分率として(式中、Dは 電子線照射室の直径、すなわち約200kV乃至約500kV以下の加速電圧に 対しては約2.0m以下であり、■は電子線照射室内の排ガスの流速であって約 30m/秒以下であり、Q (m”/時)は前記の主ダクト内を流れる処理すべ き排ガスの量である。)にて定義される:前記の分離ステップで分離された排ガ スの部分を前記照射室内で照射し、分離され照射された排ガス中に活性種を形成 するステップ:内部に前記活性種が形成された分離され照射された排ガスを主ダ クト内を流れる処理すべき前記排ガスに主ダクト内で混合し、それにより主ダク ト内を流れる前記排ガス中の有害ガス成分を前記活性種の作用によりミスト又は ダストの形に変えるステップ、及び 集塵器を用いて前記のミスト又はダストを捕捉するステップからなる電子線照射 により主ダクト内を流れる排ガスを処理する方法。Submission of translation of written amendment (Article 184-8 of the Patent Law) April 30, 1991 Toshi Ueki, Commissioner of the Japan Patent Office, 11, Patent application Display of pcT/JP88101101 , name of invention Method and device for treating exhaust gas by electron beam irradiation 3, patent applicant Address: Japan 144 11-1 Haneda Asahi-cho, Ota-ku, Tokyo Name: Co., Ltd. Company Zonko Seisakusho 4. Agent Address: Shin-Otemachi Building, 206-ku, 2-2-1 Otemachi, Chiyoda-ku, Tokyo 5. Date of submission of written amendment (1) Translation of the written amendment 1 supplementary copy of the original copy 1. (Correction) This is a method of treating the exhaust gas flowing in the main duct with electron beam irradiation. So, Based on the total volume of the exhaust gas to be treated, about 1.3 to about 15% by volume of the exhaust gas is A step of separating the recorder duct into the electron irradiation chamber. The proportion of exhaust gas separated is expressed as a percentage of the exhaust gas in the main duct (where D is Accelerating voltage below the diameter of the electron beam irradiation chamber, that is, approximately 200 kV to approximately 500 kV. 2.0 m or less, and ■ is the flow velocity of exhaust gas in the electron beam irradiation chamber, which is approximately 2.0 m or less. 30m/sec or less, and Q (m”/hour) is the processing flow rate in the main duct. This is the amount of exhaust gas. ): Defined by: Exhaust gas separated in the above separation step The part of the gas is irradiated in the irradiation chamber to form active species in the separated and irradiated exhaust gas. step: The separated and irradiated exhaust gas with the active species formed therein is The exhaust gas to be treated flowing through the main duct is mixed with the exhaust gas to be treated, thereby The harmful gas components in the exhaust gas flowing through the exhaust gas are converted into mist or by the action of the active species. converting into dust form, and Electron beam irradiation comprising the step of capturing the mist or dust using a dust collector. A method of treating exhaust gas flowing in the main duct.

2、(補正) 主ダクト内を流れる排ガスを電子線照射により処理するための装 置であって、 電子線照射室の内部を照射するため一以上の電子線加速機を含む電子線照射室1  処理すべき排ガスの総容積基準で前記排ガスの約1.3乃至約15容積%を前 記主ダクトから分離し、分離された排ガスの部分を前記の電子線照射室に供給し 、そこで排ガスの前記の分離された部分に電子線を照射して活性種を形成し、か つ、内部に前記の活性種が形成された分離され照射された排ガスを前記の処理す べき排ガスか流れている前記排ガス主ダクトに戻すための分離手段、但し主ダク トから分離される排ガスの割合は、主ダクト内を流れる排ガスの百分率とじて( 式中、Dは電子線照射室の直径、すなわち約200kV乃至約500kVの加速 電圧に対しては約2.0m以下であり、■は電子線照射室内の排ガスの流速であ って約30m/秒以下であり、Q (m!/時)は前記の主ダクト内を流れる処 理すべき排ガスの量である。)にて定義される:前記の分離手段から供給され、 内部に活性種が形成された分離され照射された排ガスを主ダクト内に一様に分散 させ、それにより前記主ダクト内を流れる前記誹ガス中の有害ガス成分を、前記 活性種の作用によりミスト又はダストの形に変えるための分散手段、及び 前記活性種の作用により主ダクト内の排ガス中の有害ガス成分が変化したミスト 又はダストを捕捉するための集塵手段で構成される電子線照射により主ダクト内 を流れる排ガスを処理するための装置。2. (Correction) Equipment for treating exhaust gas flowing in the main duct with electron beam irradiation The location is An electron beam irradiation chamber 1 including one or more electron beam accelerators for irradiating the interior of the electron beam irradiation chamber. Approximately 1.3 to 15% by volume of the exhaust gas to be treated, based on the total volume of the exhaust gas to be treated. The exhaust gas is separated from the recording duct and the separated exhaust gas is supplied to the electron beam irradiation chamber. Then, the separated part of the exhaust gas is irradiated with an electron beam to form active species, and the The separated and irradiated exhaust gas in which the active species have been formed is treated as described above. Separation means for returning the flowing exhaust gas to the main duct, provided that the main duct The proportion of flue gas separated from the main duct is calculated as the percentage of flue gas flowing in the main duct ( In the formula, D is the diameter of the electron beam irradiation chamber, that is, the acceleration of about 200 kV to about 500 kV. The voltage is approximately 2.0 m or less, and ■ is the flow velocity of exhaust gas in the electron beam irradiation chamber. is about 30 m/sec or less, and Q (m!/hour) is the flow rate in the main duct mentioned above. This is the amount of exhaust gas that should be controlled. ): supplied from said separating means, The separated and irradiated exhaust gas with active species formed inside is uniformly distributed within the main duct. As a result, harmful gas components in the harmful gas flowing in the main duct are removed from the dispersion means for converting into a mist or dust form by the action of active species; Mist in which harmful gas components in the exhaust gas in the main duct have changed due to the action of the active species. Or inside the main duct by electron beam irradiation consisting of a dust collection means to capture dust. A device for treating exhaust gas flowing through.

3、  (取り消し) 4、  (取り消し) 5、  (取り消し) 国際調査報告 国際調査報告 JP uo111]13. (Cancellation) 4. (Cancellation) 5. (Cancellation) international search report international search report JP uo111] 1

Claims (2)

【特許請求の範囲】[Claims] 1.電子線照射により排ガスを処理する方法であって処理対象排ガスの一部分を 電子線照射して被照射排ガス中に活性種を形成すること、但し排ガスの前記の部 分(割合%)は式(π/4d2xVx3600/Q)×100(式中、Dは電子 線照射室の直径、すなわち500kV以下の加速電圧に対しては約2.0m以下 であり、Vは電子線照射室内の排ガスの流速であって約30m/秒以下であり、 Q(m3/時)は処理すべき排ガスの量である。)にて定義される; 内部に活性種が形成された排ガスを処理すべき前記排ガスに混合し、それにより 前記の処理すべき排ガス中の有害(ガス)成分を前記活性種の作用によりミスト 又はダストの形に変えること;及び 前記のミスト又はダストを集塵器を用いて捕捉することからなる排ガスの処理方 法。1. A method of treating exhaust gas by electron beam irradiation, in which a portion of the exhaust gas to be treated is forming active species in the irradiated exhaust gas by electron beam irradiation; The minute (ratio %) is calculated using the formula (π/4d2xVx3600/Q) x 100 (where D is the electron The diameter of the radiation chamber, that is, approximately 2.0 m or less for acceleration voltages of 500 kV or less. , V is the flow velocity of exhaust gas in the electron beam irradiation chamber, which is about 30 m/sec or less, Q (m3/hour) is the amount of exhaust gas to be treated. ) defined in; The exhaust gas in which active species have been formed is mixed with the exhaust gas to be treated, thereby Harmful (gas) components in the exhaust gas to be treated are misted by the action of the active species. or converting into the form of dust; and A method of treating exhaust gas comprising capturing the above-mentioned mist or dust using a dust collector. Law. 2.電子線照射により排ガスを処理するための装置であって、電子線加速機から の電子線を照射するための電子線照射室;処理すべき排ガスの一部分を電子線照 射室内に導入し、そこで排ガスに電子線を照射して活性種を形成し、かつ、内部 に活性種が形成された排ガスを処理すべき排ガスが流れている排ガス主ダクトに 供給するための装置、但し排ガスの前記の部分(割合%)は 式(π/4d2xVx3600/Q)×100(式中、Dは電子線照射室の直径 、すなわち500kV以下の加速電圧に対しては約2.0m以下であり、Vは電 子線照射室内の排ガスの流速であって約30m/秒以下であり、Q(m3/時) は処理すべき排ガスの量である。)にて定義される;前記の供給装置から供給さ れる排ガスを主ダクト内に一様に分散させるための分散装置:及び 主ダクト内の排ガス中の有害(ガス)成分が、前記の活性種の作用により変化し たミスト又はダストを捕捉するための集塵機で構成される電子線照射により排ガ スを処理するための装置。2. A device for treating exhaust gas by electron beam irradiation, from an electron beam accelerator. Electron beam irradiation chamber for irradiating a portion of the exhaust gas to be treated with electron beam; The exhaust gas is introduced into the injection chamber, where the exhaust gas is irradiated with an electron beam to form active species, and the inside In the exhaust gas main duct where the exhaust gas to be treated is flowing, the exhaust gas in which active species have been formed. equipment for supplying, provided that the said portion (%) of the exhaust gas is Formula (π/4d2xVx3600/Q) x 100 (where D is the diameter of the electron beam irradiation chamber , that is, for an accelerating voltage of 500 kV or less, it is approximately 2.0 m or less, and V is the electric current. The flow velocity of exhaust gas in the child beam irradiation chamber is approximately 30 m/sec or less, and Q (m3/hour) is the amount of exhaust gas to be treated. ); supplied from the above-mentioned supply device. A dispersion device for uniformly dispersing the exhaust gas into the main duct: and The harmful (gas) components in the exhaust gas in the main duct change due to the action of the active species described above. Exhaust gas by electron beam irradiation consists of a dust collector to capture mist or dust. equipment for processing
JP63508644A 1988-10-28 1988-10-28 Method and apparatus for treating exhaust gas by electron beam irradiation Expired - Lifetime JPH0616815B2 (en)

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