JPH0344643A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPH0344643A
JPH0344643A JP18091489A JP18091489A JPH0344643A JP H0344643 A JPH0344643 A JP H0344643A JP 18091489 A JP18091489 A JP 18091489A JP 18091489 A JP18091489 A JP 18091489A JP H0344643 A JPH0344643 A JP H0344643A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
compsn
compd
formula
expressed
etc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18091489A
Other versions
JP2626070B2 (en )
Inventor
Ryotaro Hanawa
Takeshi Hioki
Yasunori Kamiya
Shinji Konishi
Takanori Yamamoto
Original Assignee
Sumitomo Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Abstract

PURPOSE: To stably form patterns of a high resolution which are free from halation and notching even when the compsn. is used for a high-reflectivity substrate by adding a specific light absorbent to the compsn.
CONSTITUTION: A novolak resin and a quinone diazide photosensitive agent are incorporated into this compsn. and further, the compd. expressed by formula I is incorporated as the light absorbent therein. In the formula, R denotes H, 1 to 5C alkyl, 1 to 5C alkyl, hydroxy, etc. The compd. which exhibits the absorption max. for the light of a desired region among the above-mentioned compds. is usable and the more specific example thereof includes the compd. expressed by formula II, etc.
COPYRIGHT: (C)1991,JPO&Japio
JP18091489A 1989-07-12 1989-07-12 Photoresist composition Expired - Lifetime JP2626070B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18091489A JP2626070B2 (en) 1989-07-12 1989-07-12 Photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18091489A JP2626070B2 (en) 1989-07-12 1989-07-12 Photoresist composition

Publications (2)

Publication Number Publication Date
JPH0344643A true true JPH0344643A (en) 1991-02-26
JP2626070B2 JP2626070B2 (en) 1997-07-02

Family

ID=16091495

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18091489A Expired - Lifetime JP2626070B2 (en) 1989-07-12 1989-07-12 Photoresist composition

Country Status (1)

Country Link
JP (1) JP2626070B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003515590A (en) * 1999-12-03 2003-05-07 エモリー ユニバーシティ Curcumin analog for the treatment of cancer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003515590A (en) * 1999-12-03 2003-05-07 エモリー ユニバーシティ Curcumin analog for the treatment of cancer
US6664272B2 (en) * 1999-12-03 2003-12-16 Emory University Curcumin analogs with anti-tumor and anti-angiogenic properties
US7371766B2 (en) 1999-12-03 2008-05-13 Emory University Curcumin analogs with anti-tumor and anti-angiogenic properties
US7842705B2 (en) 1999-12-03 2010-11-30 Emory University Curcumin analogs with anti-tumor and anti-angiogenic properties

Also Published As

Publication number Publication date Type
JP2626070B2 (en) 1997-07-02 grant

Similar Documents

Publication Publication Date Title
JPH0296755A (en) Photosensitive composition
JPH04122938A (en) Positive type photoresist composition
JPS61143748A (en) Photosensitive composition
JPH02161436A (en) Photoresist composition and its usage
JPS5956403A (en) Photomerizable composition
JPH0413149A (en) Photosensitive composition
JPS5575405A (en) Photopolymerizable composition
JPH03200254A (en) Positive type resist composition
JPS61118744A (en) Positive photoresist composition
JPH03187960A (en) Water-reducing agent for cement
JPH03200251A (en) Positive type resist composition
JPS53135621A (en) Photosensitive composition
JPH01265205A (en) Polarizing plate
JPH02309358A (en) Positive type photosensitive resin composition
JPH03200253A (en) Positive type resist composition
JPH0411260A (en) Positive type photoresist composition
JPS5340779A (en) Optically active tolpertisone, their preparation and pharmaceuticals containting the same
JPH0348249A (en) Positive type resist composition
JPS61185741A (en) Positive type photoresist composition
JPH03107162A (en) Resist composition
JPS53140344A (en) Resin composition for printed-wiring board
JPH041650A (en) Positive type resist composition
JPH0451243A (en) Resist composition
JPH04279540A (en) Decarboxylation method
JPH02217855A (en) Negative type electron beam resist composition