JPH0336907B2 - - Google Patents
Info
- Publication number
- JPH0336907B2 JPH0336907B2 JP57130299A JP13029982A JPH0336907B2 JP H0336907 B2 JPH0336907 B2 JP H0336907B2 JP 57130299 A JP57130299 A JP 57130299A JP 13029982 A JP13029982 A JP 13029982A JP H0336907 B2 JPH0336907 B2 JP H0336907B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- flat annular
- annular magnet
- etching
- cathode electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005530 etching Methods 0.000 claims description 37
- 150000002500 ions Chemical class 0.000 claims description 29
- 230000005291 magnetic effect Effects 0.000 claims description 27
- 239000000696 magnetic material Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 238000001020 plasma etching Methods 0.000 claims description 6
- 230000007935 neutral effect Effects 0.000 claims description 3
- 230000007547 defect Effects 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 230000005294 ferromagnetic effect Effects 0.000 description 4
- 238000000992 sputter etching Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000006424 Flood reaction Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13029982A JPS5923878A (ja) | 1982-07-28 | 1982-07-28 | プラズマエツチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13029982A JPS5923878A (ja) | 1982-07-28 | 1982-07-28 | プラズマエツチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5923878A JPS5923878A (ja) | 1984-02-07 |
| JPH0336907B2 true JPH0336907B2 (fr) | 1991-06-03 |
Family
ID=15030991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13029982A Granted JPS5923878A (ja) | 1982-07-28 | 1982-07-28 | プラズマエツチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5923878A (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6386879A (ja) * | 1986-09-30 | 1988-04-18 | Toshiba Corp | ドライエツチング装置及びその製造方法 |
| FR2604990B1 (fr) * | 1986-10-01 | 1991-04-05 | Omnium Traitement Valorisa | Procede de purification, par voie biologique, d'eaux residuaires sur lit de materiau granulaire |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5554570A (en) * | 1978-10-16 | 1980-04-21 | Anelva Corp | Sputtering apparatus for magnetic thin film formation |
| JPS5558371A (en) * | 1978-10-25 | 1980-05-01 | Hitachi Ltd | Sputtering apparatus |
-
1982
- 1982-07-28 JP JP13029982A patent/JPS5923878A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5554570A (en) * | 1978-10-16 | 1980-04-21 | Anelva Corp | Sputtering apparatus for magnetic thin film formation |
| JPS5558371A (en) * | 1978-10-25 | 1980-05-01 | Hitachi Ltd | Sputtering apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5923878A (ja) | 1984-02-07 |
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