JPH0329873B2 - - Google Patents
Info
- Publication number
- JPH0329873B2 JPH0329873B2 JP10418188A JP10418188A JPH0329873B2 JP H0329873 B2 JPH0329873 B2 JP H0329873B2 JP 10418188 A JP10418188 A JP 10418188A JP 10418188 A JP10418188 A JP 10418188A JP H0329873 B2 JPH0329873 B2 JP H0329873B2
- Authority
- JP
- Japan
- Prior art keywords
- lead
- electrode
- anode
- chrome plating
- lead dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 claims description 52
- 238000007747 plating Methods 0.000 claims description 27
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 150000002500 ions Chemical class 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- -1 platinum group metals Chemical class 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 2
- 238000003466 welding Methods 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 10
- 239000010936 titanium Substances 0.000 description 9
- 229910052719 titanium Inorganic materials 0.000 description 9
- 239000013078 crystal Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229910001430 chromium ion Inorganic materials 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000010802 sludge Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910000004 White lead Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- RYZCLUQMCYZBJQ-UHFFFAOYSA-H lead(2+);dicarbonate;dihydroxide Chemical compound [OH-].[OH-].[Pb+2].[Pb+2].[Pb+2].[O-]C([O-])=O.[O-]C([O-])=O RYZCLUQMCYZBJQ-UHFFFAOYSA-H 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- MFEVGQHCNVXMER-UHFFFAOYSA-L 1,3,2$l^{2}-dioxaplumbetan-4-one Chemical compound [Pb+2].[O-]C([O-])=O MFEVGQHCNVXMER-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000003 Lead carbonate Inorganic materials 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- YJZATOSJMRIRIW-UHFFFAOYSA-N [Ir]=O Chemical class [Ir]=O YJZATOSJMRIRIW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- MOUPNEIJQCETIW-UHFFFAOYSA-N lead chromate Chemical compound [Pb+2].[O-][Cr]([O-])(=O)=O MOUPNEIJQCETIW-UHFFFAOYSA-N 0.000 description 1
- RLJMLMKIBZAXJO-UHFFFAOYSA-N lead nitrate Chemical compound [O-][N+](=O)O[Pb]O[N+]([O-])=O RLJMLMKIBZAXJO-UHFFFAOYSA-N 0.000 description 1
- PIJPYDMVFNTHIP-UHFFFAOYSA-L lead sulfate Chemical compound [PbH4+2].[O-]S([O-])(=O)=O PIJPYDMVFNTHIP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は陽極の保護方法に関し、特にクロムメ
ツキ用陽極としての二酸化鉛電極の保護方法に関
するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for protecting an anode, and particularly to a method for protecting a lead dioxide electrode as an anode for chrome plating.
（従来の技術）
従来、クロムメツキ用陽極としては、鉛および
鉛合金電極が主として用いられているが、これら
の電極は３〜６ケ月で消耗してしまうため短期間
で交換が必要となり、メツキ浴中に消耗した鉛が
スラツジとして沈積して被メツキ物に悪影響を及
ぼし、更に堆積したスラツジ処理にもかなりの費
用がかかつてしまう。(Prior art) Conventionally, lead and lead alloy electrodes have been mainly used as anodes for chrome plating, but these electrodes wear out in 3 to 6 months and must be replaced in a short period of time. The lead that has been consumed inside is deposited as sludge, which has an adverse effect on the object to be plated, and furthermore, the treatment of the deposited sludge incurs considerable costs.
これに対してスラツジの発生しない不溶性陽極
を用いることが検討されている。不溶性陽極とし
てはチタン等のバルブ金属基体上に白金族金属ま
たはそれらの酸化物を被覆した金属電極、またチ
タン等のバルブ金属基体上に白金族金属またはそ
れらの酸化物の中間層を介して二酸化鉛を被覆し
た二酸化鉛電極が知られている。 For this purpose, the use of insoluble anodes that do not generate sludge is being considered. Insoluble anodes include metal electrodes in which platinum group metals or their oxides are coated on a valve metal substrate such as titanium, or carbon dioxide formed on a valve metal substrate such as titanium through an intermediate layer of platinum group metals or their oxides. Lead-coated lead dioxide electrodes are known.
クロムメツキ用陽極として金属電極を使用した
場合、初期は十分にメツキ可能であるが、徐々に
メツキ不良となる。その原因はめつき浴中のクロ
ムイオンが陰極（被めつき物）上で６価から３価
に還元されるためである。金属電極はクロムイオ
ンの３価から６価への酸化能が弱く、クロムメツ
キ浴中の３価のクロムイオンの量が増えるため、
メツキ浴の再生が必要となり、安定したメツキ操
業が出来なくなる。 When a metal electrode is used as an anode for chrome plating, sufficient plating is possible at the beginning, but plating becomes poor gradually. The reason for this is that chromium ions in the plating bath are reduced from hexavalent to trivalent on the cathode (the object to be plated). Metal electrodes have a weak ability to oxidize chromium ions from trivalent to hexavalent, and the amount of trivalent chromium ions in the chrome plating bath increases.
The plating bath will need to be regenerated, making stable plating operations impossible.
これに対して、二酸化鉛電極は前記酸化能も十
分あり、不溶性であるが、二酸化鉛層は機械的強
度が弱く、また電解操業中に発生する内部応力に
より剥離、脱落を起こすなど問題があつた。 On the other hand, lead dioxide electrodes have sufficient oxidation ability and are insoluble, but the lead dioxide layer has weak mechanical strength and has problems such as peeling and falling off due to internal stress generated during electrolytic operation. Ta.
（発明が解決しようとする問題点）
これらを解決するために特公昭60−58312のよ
うに、チタン板の上にチタンのエキスパンドメタ
ルをスポツト熔接して基体を形成し、この基体上
に白金族金属またはそれらの酸化物からなる中間
層を介して二酸化鉛層を被覆した電極が開発され
た。最近のクロムメツキ浴はメツキ効率を上げる
ため、フツ化物あるいはケイフツ化物を添加して
おり、特に電極の消耗が激しくなつているが、二
酸化鉛はこれらについて比較的耐食性があり、ク
ロムメツキ用陽極としては最適である。しかし、
この電極は機械的強度等は大幅に改善されたもの
の、二酸化鉛上のピンホールを通して電解液が侵
入し基体のチタン金属を腐食してしまうため、被
覆が残つているにもかかわらず電解不能と成つて
しまう問題が残されていた。(Problems to be solved by the invention) In order to solve these problems, as in Japanese Patent Publication No. 60-58312, a titanium expanded metal is spot welded onto a titanium plate to form a base, and a platinum group Electrodes have been developed in which a lead dioxide layer is coated with an intermediate layer of metals or their oxides. Recent chrome plating baths add fluorides or silicate to increase plating efficiency, which causes severe wear and tear on the electrodes, but lead dioxide is relatively resistant to corrosion and is ideal as an anode for chrome plating. It is. but,
Although the mechanical strength of this electrode has been greatly improved, the electrolyte enters through the pinholes on the lead dioxide and corrodes the titanium metal base, making it impossible to conduct electrolysis even though the coating remains. There were still problems to be solved.
（問題点を解決するための手段）
本発明者らは、二酸化鉛電極をクロムメツキ用
陽極として使用するために、電極表面の保護とい
観点から鋭意検討した。その結果、クロムメツキ
浴中に微量の鉛イオンを添加することで、二酸化
鉛電極を陽極として用いるクロムメツキ操作にお
いて、陽極上に二酸化鉛の塊状結晶が発生してピ
ンホールを埋めて電解液の侵入を阻止し、チタン
基体の腐食を抑制することが可能なことを見い出
した。(Means for Solving the Problems) In order to use a lead dioxide electrode as an anode for chrome plating, the present inventors have conducted intensive studies from the viewpoint of protecting the electrode surface. As a result, by adding a small amount of lead ions to the chrome plating bath, in the chrome plating operation using a lead dioxide electrode as an anode, lead dioxide lump crystals are generated on the anode, filling pinholes and preventing electrolyte from entering. It has been found that it is possible to inhibit the corrosion of titanium substrates.
鉛イオンを添加する方法としては、炭酸鉛、硫
酸鉛等の鉛塩として添加されるのが好ましいが、
硝酸塩、塩化物はその陰イオンがメツキ物の色調
に影響を与えるために好ましくない。 As for the method of adding lead ions, it is preferable to add them as lead salts such as lead carbonate and lead sulfate.
Nitrate and chloride are not preferred because their anions affect the color tone of the plated material.
添加量は鉛イオンとして1ppm以上あれば二酸
化鉛の塊状結晶が析出しはじめ、濃度が高い方が
より効果的であるが、50ppm程で浴中の鉛イオン
が飽和するため過剰に添加してもクロム酸鉛の沈
澱物を形成するのみである。従つて、約１〜約
50ppmの範囲で添加されるのが好ましい。 If the amount of lead ions added is 1 ppm or more, bulk crystals of lead dioxide will begin to precipitate, and the higher the concentration, the more effective the solution will be. However, at about 50 ppm, the lead ions in the bath will be saturated, so adding too much is not enough. It only forms lead chromate precipitates. Therefore, about 1 to about
It is preferably added in a range of 50 ppm.
二酸化鉛電極を用いて本発明の様に鉛イオンを
添加したメツキ浴からクロムメツキを行なうと、
速やかに陽極表面に微細な二酸化鉛の塊状結晶が
析出する。塊状結晶はその粒子径が数十μｍであ
り、陽極表面に層状にほぼ均一に分布する。元来
の二酸化鉛層に比較して該塊状結晶層はかなり脆
弱であるが、通電に際して支障を来たすことはな
い。又、この塊状結晶層は電解停止時の逆電流な
どにより元の電極の二酸化鉛層が還元されるのを
塊状結晶層自身が還元されることにより防止する
効果もあり、電極寿命を延長することもできる。 When chrome plating is performed from a plating bath containing lead ions as in the present invention using a lead dioxide electrode,
Fine bulk crystals of lead dioxide quickly precipitate on the anode surface. The bulk crystals have a particle size of several tens of micrometers and are distributed almost uniformly in a layered manner on the surface of the anode. Although the bulk crystal layer is considerably weaker than the original lead dioxide layer, it does not pose a problem when electricity is applied. In addition, this lumpy crystal layer has the effect of preventing the original lead dioxide layer of the electrode from being reduced due to reverse current when electrolysis is stopped, by reducing the lumpy crystal layer itself, thereby extending the life of the electrode. You can also do it.
鉛イオンの補給は、他の金属イオンの添加と同
様に行なうが、頻繁である必要はなく、一月に一
回程度で十分である。 Replenishment of lead ions is carried out in the same manner as the addition of other metal ions, but it does not need to be done frequently, and once a month is sufficient.
以下、実施例によつて本発明を説明する。 The present invention will be explained below with reference to Examples.
実施例 １
長さ200mm、幅15mm、厚さ１mmのチタン板に縦
50mm、横32mmのチタン製エキスパンド板（目開き
の対角線の長さが2.0mmおよび1.0mm、板厚0.12mm、
ストランド幅0.18mm）を密着、重ねてスポツト熔
接し電極基体とした。この基体を常法により脱
脂、エツチングし、塩化白金と塩化イリジウムの
イソプロピルアルコール溶液を塗布し、乾燥後、
500℃で焼成して白金とイリジウムの酸化物の中
間層を形成させた。その後この電極を陽極として
硝酸鉛と硝酸銅の溶液から二酸化鉛層を電着し、
約0.5mm厚の二酸化鉛被覆を有する二酸化鉛電極
を作製した。Example 1 A titanium plate with a length of 200 mm, a width of 15 mm, and a thickness of 1 mm.
50mm x 32mm wide titanium expanded plate (diagonal length of opening 2.0mm and 1.0mm, plate thickness 0.12mm,
The strands (width 0.18 mm) were closely adhered, overlapped, and spot welded to form the electrode base. This substrate was degreased and etched by a conventional method, and an isopropyl alcohol solution of platinum chloride and iridium chloride was applied, and after drying,
It was fired at 500°C to form an intermediate layer of platinum and iridium oxides. This electrode was then used as an anode to electrodeposit a lead dioxide layer from a solution of lead nitrate and copper nitrate.
A lead dioxide electrode with a lead dioxide coating approximately 0.5 mm thick was fabricated.
この二酸化鉛電極（活性面；50×16mm）を陽極
として、電流密度50A／ｄm2の条件でクロムメツ
キを行なつた。メツキ浴の組成は次の通りであつ
た。 Using this lead dioxide electrode (active surface: 50 x 16 mm) as an anode, chrome plating was carried out at a current density of 50 A/dm 2 . The composition of the plating bath was as follows.
無水クロム酸 250ｇ／
ケイフツ化ナトリウム 10ｇ／
硫酸 １ｇ／
塩基性炭酸鉛 0.05ｇ／
４ケ月使用後も十分にメツキ可能で、チタン基
体の腐食も殆ど見られなかつた。Chromic anhydride 250g/sodium silicate 10g/sulfuric acid 1g/basic lead carbonate 0.05g/Even after 4 months of use, plating was possible, and almost no corrosion of the titanium base was observed.
比較例 １
実施例１で作製した二酸化鉛電極を陽極として
クロムメツキを行なつた。メツキ浴の組成は塩基
性炭酸鉛を加えていない以外は全く同じであつ
た。電流密度50A／ｄm2で電解したところ、61日
で電圧上昇を生じ、、メツキが出来なくなつた。
このとき電極を電解槽より引き上げたところ、チ
タン基体の一部が腐食され、二酸化鉛層の剥離が
見られた。Comparative Example 1 Chrome plating was performed using the lead dioxide electrode prepared in Example 1 as an anode. The composition of the plating bath was exactly the same except that no basic lead carbonate was added. When electrolyzed at a current density of 50 A/dm 2 , a voltage increase occurred in 61 days and plating was no longer possible.
At this time, when the electrode was lifted from the electrolytic bath, a portion of the titanium base was corroded and peeling of the lead dioxide layer was observed.
（発明の効果）
本発明の保護方法によつて、クロムメツキ用二
酸化鉛電極表面に析出する塊状二酸化鉛層がピン
ホールを埋め、更に電解停止時の逆電流による二
酸化鉛層の還元が塊状二酸化鉛層自身が還元され
ることにより、電極の使用寿命を延長することが
可能となつた。(Effect of the invention) By the protection method of the present invention, the lumpy lead dioxide layer deposited on the surface of the lead dioxide electrode for chrome plating fills the pinhole, and furthermore, the reduction of the lead dioxide layer by the reverse current when electrolysis is stopped is caused by the lumpy lead dioxide layer. By reducing the layer itself, it became possible to extend the service life of the electrode.
Claims (1)
ドメタルをスポツト熔接して電極基体を形成し、
該基体上に白金族金属およびそれらの酸化物から
なる中間層を介して二酸化鉛を電着被覆した電極
を陽極として行なうクロムメツキ操作において、
クロムメツキ浴中に１〜50ppmの鉛イオンが存在
するよう鉛塩を添加することを特徴とするクロム
メツキ用陽極の保護方法。1. Spot welding expanded metal of the same valve metal onto a valve metal plate to form an electrode base,
In a chrome plating operation in which an electrode in which lead dioxide is electrodeposited on the substrate via an intermediate layer made of platinum group metals and their oxides is used as an anode,
A method for protecting an anode for chrome plating, characterized by adding lead salt so that 1 to 50 ppm of lead ions are present in the chrome plating bath.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10418188A JPH01275793A (en) | 1988-04-28 | 1988-04-28 | Method for protecting anode for chromium plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10418188A JPH01275793A (en) | 1988-04-28 | 1988-04-28 | Method for protecting anode for chromium plating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01275793A JPH01275793A (en) | 1989-11-06 |
| JPH0329873B2 true JPH0329873B2 (en) | 1991-04-25 |
Family
ID=14373832
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10418188A Granted JPH01275793A (en) | 1988-04-28 | 1988-04-28 | Method for protecting anode for chromium plating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01275793A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4558457B2 (en) * | 2003-11-20 | 2010-10-06 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | Manufacturing method of scintillator array for radiation detector |
-
1988
- 1988-04-28 JP JP10418188A patent/JPH01275793A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4558457B2 (en) * | 2003-11-20 | 2010-10-06 | ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー | Manufacturing method of scintillator array for radiation detector |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01275793A (en) | 1989-11-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4459189A (en) | Electrode coated with lead or a lead alloy and method of use | |
| US20190376200A1 (en) | Method for electrodepositing zinc and zinc alloy coatings from an alkaline coating bath with reduced depletion of organic bath additives | |
| GB2047744A (en) | Electrolytic alloy plating | |
| JPH0329873B2 (en) | ||
| JP3654204B2 (en) | Oxygen generating anode | |
| JP3513657B2 (en) | Insoluble anode | |
| JPH0559999B2 (en) | ||
| JPS5837192A (en) | Post-treatment for non-plated surface of steel plate electroplated with zinc on one side | |
| JPH01100291A (en) | Chromium plating method | |
| JPS6017096A (en) | Production of electrode | |
| JPS5928598A (en) | Insoluble anode made of pb alloy for electroplating | |
| JPH0125398B2 (en) | ||
| JPH02194190A (en) | Chromium plating method | |
| JP3537255B2 (en) | Electrode for electrolysis | |
| JPH0477078B2 (en) | ||
| JPS6293389A (en) | Electrode | |
| JP2908540B2 (en) | Chrome plating method | |
| JPH02294497A (en) | Chromium plating method | |
| JPS63243300A (en) | Insoluble anode for electroplating | |
| JPH0343354B2 (en) | ||
| JPH0434640B2 (en) | ||
| JPH036239B2 (en) | ||
| JPS6058312B2 (en) | Lead dioxide coated electrode for electrolysis | |
| JPH03260098A (en) | Electrolysis using electrode covered with lead dioxide | |
| JPS58133395A (en) | After-treatment of uncoated surface of single-surface zinc-electroplated steel sheet |