JPH03254874A - Cleaning apparatus - Google Patents
Cleaning apparatusInfo
- Publication number
- JPH03254874A JPH03254874A JP5310990A JP5310990A JPH03254874A JP H03254874 A JPH03254874 A JP H03254874A JP 5310990 A JP5310990 A JP 5310990A JP 5310990 A JP5310990 A JP 5310990A JP H03254874 A JPH03254874 A JP H03254874A
- Authority
- JP
- Japan
- Prior art keywords
- water
- cleaning device
- glass plate
- washed
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 41
- 239000011521 glass Substances 0.000 claims abstract description 24
- 239000004973 liquid crystal related substance Substances 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 230000005284 excitation Effects 0.000 claims description 3
- 238000007599 discharging Methods 0.000 claims description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 239000005357 flat glass Substances 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 239000007921 spray Substances 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 10
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 abstract description 7
- 238000011109 contamination Methods 0.000 abstract description 7
- 238000005406 washing Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 6
- 230000007547 defect Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 241001517013 Calidris pugnax Species 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、液晶表示板製造時に行う洗浄工程に用いる洗
浄装置に関する。特に高精細液晶表示板製造における微
小汚れ除去に用いる洗浄装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning device used in a cleaning process performed during the manufacture of liquid crystal display panels. In particular, the present invention relates to a cleaning device used for removing minute dirt in the manufacture of high-definition liquid crystal display panels.
従来の装置は、「オートマチイック ウェットプロセッ
サ アンド クリーナ カタログ（ＡＵＴＯＭＡＴＩＣ
ＷＥＴ ＰＲＯＣＥＳ−８ＯＲ＆ＣＬＥＡＮＥＲＣＡ
ＴＡＬＯＧ）サンコー技研株式会社」に記載の様にブラ
シのスクラブ及び水のシャワーによって洗浄していた。The conventional equipment is
WET PROCES-8OR&CLEANERCA
It was cleaned by scrubbing with a brush and showering with water as described in TALOG) Sanko Giken Co., Ltd.
上記従来技術は第４図に示す様にブラシ１５によるスク
ラブ洗浄の為、被洗浄物との接触が避けられず、その接
触により傷が発生し、ガラス基板６上の微細、高精細な
形状を破壊するという問題があった。又、接触によりブ
ラシ１５が摩耗し、その摩耗粉がガラス基板６上に付着
し汚染するという問題があった。又、第３図に示す従来
技術では、シャワーノズル１３から吐出されるシャワー
水１４が、ガラス基板６上に、その液流時の粘性により
液の動きのない厚さ１μｍ程度の層（境界層）を形成す
る為、その層以下の微小粒子は除去出来ないという問題
があった。さらに第３，４図に示す従来技術とも、有機
物汚染の除去に対しては何の考慮もなされていなかった
。As shown in FIG. 4, in the above conventional technology, since scrub cleaning is performed using a brush 15, contact with the object to be cleaned is unavoidable, and this contact causes scratches and scratches on the fine, high-definition shapes on the glass substrate 6. There was a problem with destroying it. Further, there is a problem that the brush 15 is worn out due to the contact, and the abrasion powder adheres to the glass substrate 6 and contaminates it. Furthermore, in the prior art shown in FIG. 3, the shower water 14 discharged from the shower nozzle 13 is deposited on the glass substrate 6 in a layer (boundary layer) about 1 μm thick where the liquid does not move due to the viscosity of the liquid flowing. ), so there was a problem that fine particles below that layer could not be removed. Further, in both the conventional techniques shown in FIGS. 3 and 4, no consideration was given to the removal of organic contamination.
本発明の目的は、粒子径１μｍ以下の汚れ及び有機物汚
染を除去し、ガラス基板６表面に後の膜形成工程に適し
た清浄面を形成する事にある。The purpose of the present invention is to remove dirt and organic contamination with a particle size of 1 μm or less, and to form a clean surface suitable for the subsequent film forming process on the surface of the glass substrate 6.
本発明は上記目的を達成する為に、水膜により形成され
る厚さ１μｍ程度の境界層以下の粒子を除去するに適し
た１周波数ＩＭＨｚ程度の超音波で励振させた水でスプ
レー洗浄を行い、洗浄後に付着したその水を清浄な気流
で除き、さらに必要に応じて有機物汚染除去に有効な紫
外線オゾン洗浄を一貫ライン装置化したものである。In order to achieve the above object, the present invention performs spray cleaning with water excited by ultrasonic waves with a frequency of about 1 MHz, which is suitable for removing particles below the boundary layer with a thickness of about 1 μm formed by a water film. After cleaning, the attached water is removed with a clean air stream, and if necessary, ultraviolet ozone cleaning, which is effective for removing organic contamination, is integrated into an integrated line system.
水をＩＭＨｚ程度の超音波で励振させると、その超音波
は水を媒体とした縦波により伝わり、被洗浄物表面に到
達する。この場合、水は超音波を伝える媒体として作用
するのみであり、液流としての作用を必要としない。そ
れゆえ液流により生ずる液の動きのない境界層は生成し
ない。被洗浄物表面に達した超音波は、その表面に付着
している異物に縦波の疎密波を作用させる。この波の作
用により１０５Ｇ程度の加速度が生ずる。この加速度で
揺される事により、異物と被洗浄物の間に液が浸入し、
異物と被洗浄物間の付着力が失われ、異物は表面から液
中へ移動する。本発明では、超音波励振させた水をスプ
レー状に吐出、洗浄する為、上記の液中へ移動した異物
は、スプレーの液流によって表面からさらに遠方へ運ば
れる。それゆえ、スプレー単独では除去出来ない境界層
下の異物が除去される。異物除去後は、被洗浄物表面の
水を除去する為に清浄空気の流れで付着水を除去する。When water is excited with ultrasonic waves of about IMHz, the ultrasonic waves are transmitted by longitudinal waves using water as a medium and reach the surface of the object to be cleaned. In this case, water only acts as a medium for transmitting ultrasonic waves and does not need to act as a liquid stream. Therefore, a boundary layer without liquid movement caused by liquid flow is not generated. The ultrasonic waves that reach the surface of the object to be cleaned act on foreign matter adhering to the surface with longitudinal compressional waves. The action of this wave produces an acceleration of about 105G. By being shaken by this acceleration, liquid will enter between the foreign object and the object to be cleaned.
The adhesion between the foreign matter and the object to be cleaned is lost, and the foreign matter moves from the surface into the liquid. In the present invention, since ultrasonically excited water is discharged in the form of a spray for cleaning, foreign matter that has moved into the liquid is carried further away from the surface by the liquid flow of the spray. Therefore, foreign matter under the boundary layer that cannot be removed by spraying alone is removed. After removing foreign matter, the water on the surface of the object to be cleaned is removed by a flow of clean air.
これにより被洗浄物表面には、異物及び水の存在しない
清浄面が形成される。しかし、上記洗浄方法では表面に
付着した有機物汚れ、特に皮膜状に付着した汚れは除去
出来ない。それゆえ、この有機質汚れを紫外線と酸素か
ら生ずるオゾンと、そのオゾンと紫外線により生ずる酸
素ラジカルにより酸化分解除去してしまう紫外線オゾン
洗浄を導入する事が有効となる。又、前記の超音波励振
水による洗浄を行う前に紫外線オゾン洗浄を行うと、異
物と被洗浄物表面の間に浸入し、両者を結びつける有機
物を除去する事となり、より洗浄効果が上る。又、被洗
浄物表面の水漏れ性を向上させる為、異物と被洗浄物間
への水の浸入が容易となり、被洗浄効果は向上する。As a result, a clean surface free from foreign matter and water is formed on the surface of the object to be cleaned. However, the above-mentioned cleaning method cannot remove organic dirt adhering to the surface, especially dirt adhering in the form of a film. Therefore, it is effective to introduce ultraviolet ozone cleaning, which removes this organic dirt by oxidation and decomposition using ozone generated from ultraviolet rays and oxygen, and oxygen radicals generated by the ozone and ultraviolet rays. Further, if ultraviolet ozone cleaning is performed before cleaning with the ultrasonic-excited water, the organic matter that enters between the foreign matter and the surface of the object to be cleaned and binds them together will be removed, thereby increasing the cleaning effect. Furthermore, since water leakage on the surface of the object to be cleaned is improved, water can easily enter between the foreign matter and the object to be cleaned, and the cleaning effect is improved.
以下、本発明の一実施例を第１図、第２図により説明す
る。An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.
被洗浄物であるガラス板６はローラフにより本体１内部
へ搬送される。本体１内には水を励振させて吐出するス
プレーノズル９が配置され、そのスプレーノズル９には
、超音波振動子１０が備えられている。スプレーノズル
９には、給水管４が接続されており、水の流れ５の方向
に水がスプレーノズル９に流れ込んでいる。スプレーノ
ズル９内で水は超音波励振され、吐出水１１となってガ
ラス板６を前記記載の作用で洗浄する。ガラス板６は上
記の作用を受けながらローラフによりさらに搬送され、
ブローノズル８の間を通過する。ここでブローノズル８
には給気管２が接続さ九ており、流れの方向３に沿って
空気が送られる。ガラス板６はブローノズル８の間を通
過する時、この空気の流れによって表面付着水が除去さ
れる。それにより水の付着していない清浄面が形成され
る。A glass plate 6, which is an object to be cleaned, is conveyed into the main body 1 by a roller ruff. A spray nozzle 9 for exciting and discharging water is disposed within the main body 1, and the spray nozzle 9 is equipped with an ultrasonic vibrator 10. A water supply pipe 4 is connected to the spray nozzle 9, and water flows into the spray nozzle 9 in the direction of the water flow 5. Water is ultrasonically excited in the spray nozzle 9, becomes discharged water 11, and cleans the glass plate 6 by the action described above. The glass plate 6 is further conveyed by the roller ruff while being subjected to the above action,
It passes between the blow nozzles 8. Here, blow nozzle 8
An air supply pipe 2 is connected to the air supply pipe 2, through which air is delivered along the flow direction 3. When the glass plate 6 passes between the blow nozzles 8, water adhering to the surface is removed by this air flow. As a result, a clean surface free from adhesion of water is formed.
ガラス板６はさらにローラ７によって搬送され、第１図
において以後の工程、例えば膜塗布工程に送られる。又
、第２図においてはガラス板６は口−ラフにより搬送さ
れ、紫外線灯１２の下を通過する。この時、紫外線の光
及び酸素オゾンによって洗浄される。洗浄後、ガラス６
は、ローラ７により本体外へ運ばれ上記同様後の工程に
送られる。The glass plate 6 is further conveyed by rollers 7 and sent to a subsequent step in FIG. 1, for example a film coating step. Also, in FIG. 2, the glass plate 6 is conveyed by a lug and passes under an ultraviolet lamp 12. At this time, it is cleaned by ultraviolet light and oxygen and ozone. After cleaning, glass 6
is carried out of the main body by rollers 7 and sent to the subsequent process as described above.
次に、洗浄効果事例を示す、ガラス板６はサイズ２００
Ｘ１５０であり、液晶表示板の透明電極パターンが形成
されたものであり、後工程でそのパターン表面上に保護
膜を塗布形成する。膜形成時に異物が付着した場合、そ
の部分に膜が形成されない為、ピンホールが形成される
。又、有機物汚染が存在した場合、その部分の漏れ性が
異る為、クレータ状の膜となり、いずれも製品上重大な
欠陥となる。それゆえ清浄面形成が重要な技術となる。Next, an example of the cleaning effect will be shown. The glass plate 6 is of size 200.
X150, on which a transparent electrode pattern of a liquid crystal display panel is formed, and a protective film is coated on the surface of the pattern in a subsequent process. If foreign matter adheres during film formation, the film will not be formed in that area, resulting in pinholes. Furthermore, if organic contamination is present, the leakage properties of the affected parts will be different, resulting in a crater-shaped film, which will result in a serious defect in the product. Therefore, clean surface formation is an important technology.
本事例はその塗布膜形成前洗浄事例である。This example is an example of cleaning before coating film formation.
前工程を終えたガラス板６上には、０．５μｍ以上の異
物が３５〜４０個付着している。このガラス板を第１図
に示す洗浄装置を用い、以下の条件で洗浄を行った場合
、その付着数は２固程度に低減する（除去率９５％）。35 to 40 foreign particles of 0.5 μm or more are attached to the glass plate 6 after the pre-process. When this glass plate is cleaned using the cleaning apparatus shown in FIG. 1 under the following conditions, the number of adhered glass plates is reduced to about 2 pieces (removal rate of 95%).
搬送速度３５履／秒。Conveyance speed: 35 shoes/sec.
スプレーノズル９の数３個。ノズル１個あたりの吐出水
量８Ｑ／ｍｉｎ、水温２５℃吐出巾６０■Ｘ２ｍ、励振
超音波周波数Ｉ ＭＨｚ、超音波振動子１ｏの出力１０
０Ｗ、ノズル９とガラス６との距離５■、ブローノズル
８の空気圧２．５ｋｇｆ／ａＪブローノズルの吐出空気
量５００ Ｑ ／ ｍ ｉ ｎ 、−方、同等条件で超
音波励振を行わない場合、その洗浄方法は第３図に相当
するが、この条件で洗浄した場合、ガラス板６の異物付
着数は３０個程度にしか減少しない（除去率２５％）。Number of spray nozzles 9: 3. Water discharge amount per nozzle: 8 Q/min, water temperature: 25°C, discharge width: 60 x 2 m, excitation ultrasonic frequency: I MHz, output of ultrasonic vibrator: 10
0W, the distance between the nozzle 9 and the glass 6 is 5■, the air pressure of the blow nozzle 8 is 2.5 kgf/aJ, the amount of air discharged from the blow nozzle is 500 Q/min, -, and when no ultrasonic excitation is performed under the same conditions, The cleaning method corresponds to that shown in FIG. 3, but when cleaning is performed under these conditions, the number of foreign substances attached to the glass plate 6 is reduced to only about 30 (removal rate of 25%).
これより本発明の洗浄効果は明らかである。From this, the cleaning effect of the present invention is clear.
第１図に示す洗浄では有機物汚染は除去されない、その
表面の清浄度を、表面と純水の漏れ性のパラメータであ
る接触角で測定した結果、５０＠であった。この事は、
この表面が有機物によって汚染されている事を示してい
る。一方、第２図に示す洗浄を行った場合、その清浄度
は、接触角にて５′であった。ここで第２図における紫
外線洗浄の条件は、紫外線灯数４本、出力１００Ｗ／１
本、照射距離５鵬であった。これより第２図に示す洗浄
機における洗浄効果は明らかである。The cleaning shown in FIG. 1 does not remove organic contamination.The cleanliness of the surface was measured by the contact angle, which is a parameter of leakage between the surface and pure water, and found to be 50@. This thing is
This indicates that the surface is contaminated with organic matter. On the other hand, when the cleaning shown in FIG. 2 was performed, the cleanliness was 5' in terms of contact angle. Here, the conditions for ultraviolet cleaning in Figure 2 are: 4 ultraviolet lamps, output 100W/1
The irradiation distance was 5 points. From this, the cleaning effect of the cleaning machine shown in FIG. 2 is clear.
塗膜形成工程前に本洗浄装置を導入する事によって前記
の欠陥発生による不良発生率は約１／１０に低減した。By introducing this cleaning device before the coating film forming process, the incidence of defects due to the occurrence of defects was reduced to about 1/10.
本発明は、以上説明した様に構成され、以下に示す効果
を奏する。The present invention is configured as described above, and provides the following effects.
（１）水の境界層（厚さ１μｍ）以下に存在する異物を
除去する。(1) Remove foreign substances existing below the boundary layer (thickness 1 μm) of water.
（２）表面漏れ性に悪影響を与える有機物汚染を除去す
る。(2) Remove organic contamination that adversely affects surface leakage.
（３）上記（１）、（２）の作用により後工程、特に塗
膜工程に好ましい表面を形成し、ピンホール等の欠陥発
生を防止出来る。(3) Due to the effects of (1) and (2) above, a surface suitable for subsequent processes, particularly coating processes, can be formed, and defects such as pinholes can be prevented from occurring.
第１図、第２図は本発明の一実施例の洗浄装置の断面図
、第３図、第４図は従来技術の洗浄装置の断面図である
。
１・・・洗浄装置本体、２・・・給気管、３・・・気体
の流れ、４・・・給水管、５・・・水の流れ、６・・・
ガラス基板、７・・・ローラ、８・・・ブローノズル、
９・・・スプレーノズル、１０・・・超音波振動子、１
１・・・吐出水、１２・・・紫外線灯、１３・・・シャ
ワーノズル、１４・・・シャワー水、１５・・・ブラシ
。
第
１
図
水管、訃・・水の流れ、６・・・ガラス基板、７・・・
ローラ、８・・・ブローノズル１９・・・スプレーノズ
ル、１０・・・超ｆ波ｍ動子。
１１・・吐出水、１２・・・紫外線灯、１３ シャワ
ーノズル。
１４・・・シャワー水、１５・・・ブラ／。
第２図1 and 2 are sectional views of a cleaning device according to an embodiment of the present invention, and FIGS. 3 and 4 are sectional views of a conventional cleaning device. DESCRIPTION OF SYMBOLS 1... Cleaning device main body, 2... Air supply pipe, 3... Gas flow, 4... Water supply pipe, 5... Water flow, 6...
Glass substrate, 7... roller, 8... blow nozzle,
9... Spray nozzle, 10... Ultrasonic vibrator, 1
1... Discharge water, 12... Ultraviolet lamp, 13... Shower nozzle, 14... Shower water, 15... Brush. Figure 1 Water pipe, water flow, 6... glass substrate, 7...
Roller, 8...Blow nozzle 19...Spray nozzle, 10...Ultra f-wave m-motor. 11. Discharge water, 12. Ultraviolet lamp, 13. Shower nozzle. 14...Shower water, 15...Bra/. Figure 2
Claims (1)
を気体の流れで除去する事を特徴とする洗浄装置。 ２、酸素を含む雰囲気中で紫外線を照射する機能を設け
た請求項１記載の洗浄装置。 ３、励振振動が超音波であることを特徴とする請求項１
または２記載の洗浄装置。 ４、超音波の周波数が２８ｋＨｚ以上１０ＭＨｚ以下の
請求項３記載の洗浄装置。 ５、周波数が４０ｋＨｚ以上１０ＭＨｚ以下の請求項３
記載の洗浄装置。 ６、周波数が１±０．１ＭＨｚである請求項３記載の洗
浄装置。 ７、気体が窒素を含む請求項１から６のいずれかに記載
の洗浄装置。 ８、気体が空気である請求項７記載の洗浄装置。 ９、板状物がガラスである請求項１から８のいずれかに
記載の洗浄装置。 １０、板状ガラスが液晶表示板の部品である請求項９記
載の洗浄装置。 １１、液晶表示板の部品である板状ガラスに膜形成を行
う前に用いる請求項１０記載の洗浄装置。[Scope of Claims] 1. A cleaning device characterized by discharging excited water onto an object to be cleaned and then removing the water with a gas flow. 2. The cleaning device according to claim 1, further comprising a function of irradiating ultraviolet rays in an atmosphere containing oxygen. 3. Claim 1, characterized in that the excitation vibration is an ultrasonic wave.
Or the cleaning device described in 2. 4. The cleaning device according to claim 3, wherein the frequency of the ultrasonic waves is 28 kHz or more and 10 MHz or less. 5. Claim 3 where the frequency is 40 kHz or more and 10 MHz or less
The cleaning device described. 6. The cleaning device according to claim 3, wherein the frequency is 1±0.1 MHz. 7. The cleaning device according to any one of claims 1 to 6, wherein the gas contains nitrogen. 8. The cleaning device according to claim 7, wherein the gas is air. 9. The cleaning device according to any one of claims 1 to 8, wherein the plate-like object is glass. 10. The cleaning device according to claim 9, wherein the plate glass is a component of a liquid crystal display panel. 11. The cleaning device according to claim 10, which is used before forming a film on a plate glass that is a component of a liquid crystal display panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5310990A JPH03254874A (en) | 1990-03-05 | 1990-03-05 | Cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5310990A JPH03254874A (en) | 1990-03-05 | 1990-03-05 | Cleaning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03254874A true JPH03254874A (en) | 1991-11-13 |
Family
ID=12933629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5310990A Pending JPH03254874A (en) | 1990-03-05 | 1990-03-05 | Cleaning apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03254874A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07155709A (en) * | 1993-11-30 | 1995-06-20 | Shimada Phys & Chem Ind Co Ltd | Precision washing method and device therefor |
| US6893688B2 (en) | 2000-09-06 | 2005-05-17 | Seiko Epson Corporation | Method and apparatus for fabricating electro-optical device and method and apparatus for fabricating liquid crystal panel |
| WO2005062694A3 (en) * | 2003-12-31 | 2005-08-18 | F & M Mateados De Cristal S L | Automatic machine for matting, silk screening and producing reliefs on vitreous sheets |
| CN101992194A (en) * | 2009-08-17 | 2011-03-30 | 鸿富锦精密工业（深圳）有限公司 | Automatic washing device |
-
1990
- 1990-03-05 JP JP5310990A patent/JPH03254874A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07155709A (en) * | 1993-11-30 | 1995-06-20 | Shimada Phys & Chem Ind Co Ltd | Precision washing method and device therefor |
| US6893688B2 (en) | 2000-09-06 | 2005-05-17 | Seiko Epson Corporation | Method and apparatus for fabricating electro-optical device and method and apparatus for fabricating liquid crystal panel |
| WO2005062694A3 (en) * | 2003-12-31 | 2005-08-18 | F & M Mateados De Cristal S L | Automatic machine for matting, silk screening and producing reliefs on vitreous sheets |
| CN101992194A (en) * | 2009-08-17 | 2011-03-30 | 鸿富锦精密工业（深圳）有限公司 | Automatic washing device |
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