JPH03222419A - Supersonic cleaning device - Google Patents
Supersonic cleaning deviceInfo
- Publication number
- JPH03222419A JPH03222419A JP1622090A JP1622090A JPH03222419A JP H03222419 A JPH03222419 A JP H03222419A JP 1622090 A JP1622090 A JP 1622090A JP 1622090 A JP1622090 A JP 1622090A JP H03222419 A JPH03222419 A JP H03222419A
- Authority
- JP
- Japan
- Prior art keywords
- inner tank
- receiving surface
- wave receiving
- vibrator
- ultrasonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 24
- 239000007788 liquid Substances 0.000 claims abstract description 26
- 238000002834 transmittance Methods 0.000 claims description 15
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 10
- 230000001902 propagating effect Effects 0.000 claims description 3
- 238000010276 construction Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000004809 Teflon Substances 0.000 description 5
- 229920006362 Teflon® Polymers 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000005297 pyrex Substances 0.000 description 4
- 235000019687 Lamb Nutrition 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 241000238413 Octopus Species 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- NBJBFKVCPBJQMR-APKOLTMOSA-N nff 1 Chemical compound C([C@H](NC(=O)[C@H](CCC(N)=O)NC(=O)[C@H](CCC(N)=O)NC(=O)[C@@H]1CCCN1C(=O)[C@H](CCCCN)NC(=O)[C@@H]1CCCN1C(=O)CC=1C2=CC=C(C=C2OC(=O)C=1)OC)C(=O)N[C@@H](CC=1C=CC=CC=1)C(=O)NCC(=O)N[C@@H](CC(C)C)C(=O)N[C@@H](CCCCNC=1C(=CC(=CC=1)[N+]([O-])=O)[N+]([O-])=O)C(=O)NCC(O)=O)C1=CC=CC=C1 NBJBFKVCPBJQMR-APKOLTMOSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Manufacturing Of Printed Wiring (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【発明の詳細な説明】
(発明の属する技術分野)
本発明は、超音波洗浄装置に関し、特に、半導体製造工
程で用いられる500kHz以上の超音波による2重槽
構造の超音波洗浄装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Technical field to which the invention pertains) The present invention relates to an ultrasonic cleaning device, and in particular to an ultrasonic cleaning device with a dual tank structure using ultrasonic waves of 500 kHz or more used in semiconductor manufacturing processes. be.
(従来技術とその問題点)
半導体製造工程における半導体ウェーハ、ガラスマスク
、液晶等の超精密洗浄を行うために用いられる超音波洗
浄装置は、0.1μm程度の微細な粒子(異物)を除去
する必要があるため、波長か短く、また、ギヤビテーシ
ョンによる損傷を生じさせないためI MH2付近の超
音波周波数か用いられている。(Prior art and its problems) Ultrasonic cleaning equipment used for ultra-precision cleaning of semiconductor wafers, glass masks, liquid crystals, etc. in the semiconductor manufacturing process removes fine particles (foreign objects) of about 0.1 μm. Because of the necessity, the wavelength is short and the ultrasonic frequency near IMH2 is used to avoid damage due to gearvitation.
さらに、洗浄槽内に金属イオンか存在するとイオン結合
によって被洗浄物に付着して悪影響を及ぼすため、石英
ガラスやパイレッスク等金属イオンや不純物が溶出しな
い材質によって作られたビー力等を内槽とする2重槽構
造の洗浄装置か用いられている。Furthermore, if metal ions are present in the cleaning tank, they will adhere to the items to be cleaned due to ionic bonds and have a negative effect, so be sure to use bead force, etc., made of materials that do not elute metal ions or impurities, such as quartz glass or Pyrescu, from the inner tank. A cleaning device with a double tank structure is used.
第1図は従来の2重槽構造の超音波洗浄装置の部分断面
図である。図において、lは外槽、2は内槽、3は超音
波振動子、4は水等の媒体液、5は洗浄液、6は被洗浄
物である。内槽2は、底面の4隅に取付けられたテフロ
ン製の足を外槽の底面上に取付けられたテフロン製のガ
イドにはめて固定されているか、図示は省略した。外槽
lは一般の洗浄装置と同様にステンレススチール等で作
られ底面の外側に超音波振動子3が取付けられ、外槽l
の中の媒体液4(例えば水)を超音波の伝達媒体として
振動子3によって発生させた超音波の縦波によって内槽
2の底面を振動させる。この内槽2の底面の振動により
矢印のように内槽2の洗浄液5が振動して被洗浄物6か
洗浄される。内槽2は取扱い時に破損しない程度の機械
的強度を有し厚さは3〜5mmである。FIG. 1 is a partial cross-sectional view of a conventional ultrasonic cleaning device with a double tank structure. In the figure, 1 is an outer tank, 2 is an inner tank, 3 is an ultrasonic vibrator, 4 is a liquid medium such as water, 5 is a cleaning liquid, and 6 is an object to be cleaned. The inner tank 2 is fixed by fitting Teflon feet attached to the four corners of the bottom surface into Teflon guides attached to the bottom surface of the outer tank (not shown). The outer tank l is made of stainless steel or the like like a general cleaning device, and an ultrasonic vibrator 3 is attached to the outside of the bottom.
The bottom surface of the inner tank 2 is vibrated by longitudinal waves of ultrasonic waves generated by a vibrator 3 using a medium liquid 4 (for example, water) as a transmission medium for ultrasonic waves. This vibration of the bottom surface of the inner tank 2 causes the cleaning liquid 5 in the inner tank 2 to vibrate as shown by the arrow, thereby cleaning the object 6 to be cleaned. The inner tank 2 has a mechanical strength that is not damaged during handling and has a thickness of 3 to 5 mm.
このような従来の洗浄装置の大きな問題点は、外槽lの
媒体液4によって内槽2の底面に伝達される超音波エネ
ルギが内槽2の底部受波面によって反射し、内槽2の内
部へ伝達される振動エネルギは20〜30%となり振動
エネルギの伝達率言い換えれば透過率か極めて悪く、振
動子3の駆動電力に対する洗浄効率か著しく低いことで
ある。A major problem with such conventional cleaning devices is that the ultrasonic energy transmitted to the bottom surface of the inner tank 2 by the medium liquid 4 of the outer tank 1 is reflected by the bottom wave receiving surface of the inner tank 2, and the inside of the inner tank 2 is The vibration energy transmitted to the vibrator 3 is 20 to 30%, and the vibration energy transmission rate, in other words, the transmittance, is extremely poor, and the cleaning efficiency with respect to the driving power of the vibrator 3 is extremely low.
この問題点に対する対策として、内槽2の底面に超音波
振動子を直接取り付ける方法が試みられているか、内槽
2は前述のように石英ガラスやノくイレックス等で作ら
れているため、振動子を接着剤によって取付ける面の平
坦度と平面の精度とを上げるための製造加工技術に難点
があるばかりでなく、洗浄作業において内槽(ビー力)
を誤って破損させることも多(、振動子が取り付けられ
ていない場合は材料の再生利用が可能であるが、振動子
付きのものは接着剤の残渣があるために材質の純度か悪
く再生利用することができない。しかも、高価であるた
め経済的損失が大きいという欠点がある。As a countermeasure to this problem, attempts have been made to attach an ultrasonic transducer directly to the bottom of the inner tank 2, or because the inner tank 2 is made of quartz glass or Nokuirex as described above, Not only is there a difficulty in manufacturing and processing technology to improve the flatness and plane precision of the surface to which the child is attached with adhesive, but also the inner tank (beam force) is difficult to clean.
(If a vibrator is not attached, the material can be recycled, but if a vibrator is attached, the purity of the material may be poor due to adhesive residue.) Moreover, it has the disadvantage of being expensive and causing a large economic loss.
(発明の目的)
本発明の目的は、このような問題点を解決し、内槽に振
動子を取付けることなく、しかも、外槽からの超音波エ
ネルギの約90〜100%の振動エネルギが内槽の内部
に伝達され洗浄効率を大幅に改善した構造の超音波洗浄
装置を提供することにある。(Object of the Invention) The object of the present invention is to solve such problems, and to eliminate the need to attach a vibrator to the inner tank, and to reduce the vibration energy of approximately 90 to 100% of the ultrasonic energy from the outer tank to the internal tank. An object of the present invention is to provide an ultrasonic cleaning device having a structure in which ultrasonic waves are transmitted to the inside of a tank and the cleaning efficiency is greatly improved.
(発明の構成)
本発明の超音波洗浄装置は、500kHz以上の超音波
振動を発生する振動子か取付けられた外槽と、洗浄液と
被洗浄物とを収容するために、該外槽の内部に前記超音
波振動を伝達する媒体液を介在させるための空間を設け
て配置された内槽とを備えるとともに、前記媒体液中を
伝搬する前記超音波振動を前記内槽の受波面の法線に対
して傾斜角をもたせて該受波面に入射させることにより
、前記受波面を透過する前記超音波振動の振動エネルギ
の透過率を著しく改善するように構成したことを特徴と
するものである。(Structure of the Invention) The ultrasonic cleaning device of the present invention includes an outer tank equipped with a vibrator that generates ultrasonic vibrations of 500 kHz or more, and an inner tank for storing cleaning liquid and objects to be cleaned. and an inner tank disposed with a space for intervening a medium liquid for transmitting the ultrasonic vibration, and the ultrasonic vibration propagating in the medium liquid is transmitted along the normal line of the wave receiving surface of the inner tank. The present invention is characterized in that the transmittance of the vibration energy of the ultrasonic vibration transmitted through the wave receiving surface is significantly improved by making the ultrasonic vibration enter the wave receiving surface at an inclination angle relative to the wave receiving surface.
以下図面により本発明の詳細な説明する。The present invention will be explained in detail below with reference to the drawings.
第2図は本発明の詳細な説明するための部分構造断面図
である。図において、lは外槽、3は超音波振動子、7
は内槽の受波面の一部分であり液体8を媒体として振動
子3からの振動エネルギv1を受ける部分片である。破
線で示した7°は従来の装置における内槽の面の位置を
示している。内槽の受波面7または7゛を透過して内槽
の内側の洗浄液に相当する液体内に伝達される振動エネ
ルギをV2とすると、振動エネルギの透過率はV2/V
IX100(%)で表すことができる。本発明は、内槽
の受波面を従来の7″の位置に比べてθの角度をもたせ
て7の姿勢になるようにしたものである。このθは、受
波面に直角(法線方向)に振動エネルギが与えられると
きを基準(θ=0)として表してあり、これは外槽の面
と相対する内装の面との傾斜角に相当する。FIG. 2 is a partial structural sectional view for explaining the present invention in detail. In the figure, l is an outer tank, 3 is an ultrasonic transducer, and 7
is a part of the wave receiving surface of the inner tank, which receives the vibration energy v1 from the vibrator 3 using the liquid 8 as a medium. 7° indicated by a broken line indicates the position of the surface of the inner tank in the conventional device. If the vibration energy transmitted through the wave receiving surface 7 or 7 of the inner tank and transmitted to the liquid corresponding to the cleaning liquid inside the inner tank is V2, the vibration energy transmittance is V2/V.
It can be expressed as IX100 (%). In the present invention, the wave-receiving surface of the inner tank is set at an angle of θ compared to the conventional 7" position, so that it has a posture of 7. This θ is perpendicular to the wave-receiving surface (normal direction). It is expressed as a reference (θ=0) when vibration energy is applied to , and this corresponds to the inclination angle between the surface of the outer tank and the surface of the interior facing the surface.
第3図は、本発明の原理を裏付ける特性図であり、入射
角(傾斜角)θに対する内槽の部分片7の透過率の実測
値を示す。図において、縦軸の透過率は、内槽の部分片
7が存在しないときのV2(=V、)の値を例えば水中
マイクロホン等で測定した音圧レベルを100%として
いる。内槽の部分片7は厚さが3mのパイレックス(硼
硅酸ガラス)であり、振動周波数はI MHzである。FIG. 3 is a characteristic diagram that supports the principle of the present invention, and shows actually measured values of the transmittance of the partial piece 7 of the inner tank with respect to the incident angle (angle of inclination) θ. In the figure, the transmittance on the vertical axis is defined as 100% of the sound pressure level, which is the value of V2 (=V,) measured with an underwater microphone or the like when the partial piece 7 of the inner tank is not present. The inner tank section 7 is made of Pyrex (borosilicate glass) with a thickness of 3 m and a vibration frequency of I MHz.
図から明らかなように、従来のθ=0のときの透過率は
約26%であるのに対してθ#28°のときの透過率は
はほ100%となっている。As is clear from the figure, while the conventional transmittance when θ=0 is about 26%, the transmittance when θ#28° is almost 100%.
内槽の材質として、例えば、厚さt=1〜2Mのステン
レス、t−2〜5 mmのパイレックス、t3〜5mm
の石英ガラス等を用いた場合も、内槽の受波面への超音
波の入射角が直角(θ=0)のときの透過率は、表1に
示すように10〜30%であるか、これらの材質の場合
も第2図に示すように入射角θを変化させたとき、透過
率が著しく改善され、それぞれほぼ100%の透過率を
示す角度のあることか実験により確かめられた。The material of the inner tank may be, for example, stainless steel with a thickness of t=1 to 2M, Pyrex with a thickness of t-2 to 5 mm, or t of 3 to 5 mm.
Even when using quartz glass etc., the transmittance when the incident angle of the ultrasonic wave to the wave receiving surface of the inner tank is at right angle (θ = 0) is 10 to 30% as shown in Table 1, or In the case of these materials as well, when the incident angle θ was changed as shown in FIG. 2, the transmittance was significantly improved, and it was experimentally confirmed that there were angles at which the transmittance was approximately 100%.
表 !
第4図は、これらの材質と板厚をパラメータとして透過
率か最大(95〜100%)となる入射角θを実験によ
って求めた説明図である。この図に示したように、本発
明は半導体ウェハ等を洗浄対象としているために内槽の
材質をパイレックスまたは石英ガラスとして説明を述べ
ているが、他の一般の洗浄対象物の場合には他の材質を
用いても同様の効果が得られることは明らかである。table ! FIG. 4 is an explanatory diagram in which the incident angle θ at which the transmittance becomes maximum (95 to 100%) was determined by experiment using these materials and plate thicknesses as parameters. As shown in this figure, since the present invention is intended to clean semiconductor wafers, etc., the material of the inner tank is described as Pyrex or quartz glass, but in the case of other general objects to be cleaned, other materials may be used. It is clear that the same effect can be obtained even if the material is used.
以上のような現象についてさらに詳しく述べる。The above phenomena will be described in more detail.
従来の2重槽構造の一般の超音波洗浄装置は、超音波振
動子の周波数が20〜40kHzであり、媒体液(例え
ば水)の中を伝達する縦波(疎密波)の速度Cは145
6m/seeであり周波数fを26kHzとするとその
縦波の波長λは次式で示され約56mmである。In a conventional general ultrasonic cleaning device with a double tank structure, the frequency of the ultrasonic vibrator is 20 to 40 kHz, and the velocity C of the longitudinal wave (compressional wave) transmitted in the medium liquid (for example, water) is 145 kHz.
6 m/see and the frequency f is 26 kHz, the wavelength λ of the longitudinal wave is expressed by the following equation and is approximately 56 mm.
λ= C/ f = 1456(m/5ec)/26(
kl(z) =56(mm)一方、洗浄機の内槽の底板
の肉厚はステンレススチールの場合は約1〜2IIIf
fl程度、石英ガラスやパイレックスの場合は3〜5I
nff1程度であり、波長λ= 56mmに対して無視
できる位小さい。そのため外槽からの振動エネルギの歪
みの大きい疎の部分と密の部分によって内槽の底面にた
て波(P波)とよこ波(S波)の振動か誘起されて振動
エネルギの殆どが内槽内の洗浄液に伝達される。λ=C/f=1456(m/5ec)/26(
kl (z) = 56 (mm) On the other hand, the wall thickness of the bottom plate of the inner tank of the washing machine is approximately 1 to 2IIIf if it is made of stainless steel.
fl degree, 3-5I for quartz glass or pyrex
nff1, which is so small that it can be ignored with respect to the wavelength λ=56 mm. Therefore, vertical waves (P waves) and transverse waves (S waves) are induced on the bottom of the inner tank by the sparse parts and dense parts where the vibration energy from the outer tank is distorted, and most of the vibration energy is transferred to the inner tank. is transmitted to the cleaning fluid inside.
ところが、洗浄対象が半導体ウェハ等の場合ミクロン級
の微細な汚れを落とす必要から、周波数を高くして約5
00kHz〜l MHzにする必要がある。However, when cleaning objects such as semiconductor wafers, it is necessary to remove micron-level dirt, so the frequency is increased to approximately 5.
It is necessary to set the frequency between 00kHz and 1MHz.
従って、媒体液中の縦波の波長は約1.4〜2.8 m
mとなり、内槽の底板の肉厚と同程度となるため、底板
の境界面の影響を大きく受けるようになり、底板にたて
波やよこ波の振動が誘起されない。そのため、従来のI
M)Izの超音波振動を利用した洗浄装置では、実験
で求められたように振動エネルギの70〜8096か反
射して透過率が著しく低下し約20〜30%の振動エネ
ルギしか内槽内に伝達されない。Therefore, the wavelength of longitudinal waves in the medium liquid is approximately 1.4 to 2.8 m.
m, which is about the same thickness as the bottom plate of the inner tank, so it is greatly influenced by the boundary surface of the bottom plate, and no vertical or horizontal wave vibrations are induced in the bottom plate. Therefore, the conventional I
M) In a cleaning device that uses Iz ultrasonic vibration, as determined in experiments, 70 to 8096 of the vibration energy is reflected, resulting in a significant decrease in transmittance and only about 20 to 30% of the vibration energy enters the inner tank. Not communicated.
第5図は本発明の推定原理の説明図であり、第2図の部
分断面図である。外槽lと内槽の部分片7が角度θの傾
斜で相対している。媒体液は省略した。矢印は外槽1の
駆動面から媒体液中を伝達する縦波の方向を示す。内槽
の部分片7を傾けることにより、A1点から伝達される
縦波は距離aにある部分片7のA2点に入射角θで到達
し、B1点からの縦波は距離すにあるB1点に到達する
。FIG. 5 is an explanatory diagram of the estimation principle of the present invention, and is a partial sectional view of FIG. 2. The outer tank 1 and the inner tank partial piece 7 face each other at an angle θ. The medium was omitted. The arrow indicates the direction of the longitudinal wave transmitted from the driving surface of the outer tank 1 through the medium liquid. By tilting the partial piece 7 of the inner tank, the longitudinal wave transmitted from point A1 reaches point A2 of the partial piece 7 at distance a at an incident angle θ, and the longitudinal wave from point B1 reaches point A2 at distance a. Reach the point.
角度θを加減することにより、図のように(b−a)が
縦波の1波長λ、となり、部分片7上に誘起する板波の
振動の波長λ2がA、とB!との距離に一致したとき部
分片7にLamb波と呼ばれる板波の振動が誘起され振
動エネルギは効率良く内槽の内部へ伝達されることにな
る。即ち、sinθ=λ1/λ、と表すことができる。By adjusting the angle θ, as shown in the figure, (ba) becomes one wavelength λ of the longitudinal wave, and the wavelength λ2 of the vibration of the plate wave induced on the partial piece 7 becomes A, B! When the distance matches the distance, plate wave vibrations called Lamb waves are induced in the partial piece 7, and the vibration energy is efficiently transmitted to the inside of the inner tank. That is, it can be expressed as sin θ=λ1/λ.
このように傾斜角(入射角)θを設定すれば内槽の受波
面を能率良く振動させることができる。By setting the inclination angle (angle of incidence) θ in this manner, the wave receiving surface of the inner tank can be efficiently vibrated.
このLamb波は、板の境界面の存在によって長手方向
に導かれる被導波(guided wave)の一種で
あり、Lamb波(板の波) 、 PocharIlm
er−Chree波(棒の波) 、 Love波(表面
層の波)などと呼ばれる板の断面に応じた特別な波であ
る。板を伝搬するこのような被導波は総称して板波と呼
ばれている。This Lamb wave is a type of guided wave that is guided in the longitudinal direction by the existence of the plate boundary surface, and is called Lamb wave (plate wave), PocharIlm.
These are special waves depending on the cross section of the board, called er-Chree waves (rod waves), Love waves (surface layer waves), etc. Such guided waves propagating through a plate are collectively called plate waves.
−例として、媒体液を水(温度20°C)とすると、周
波数= I Mllz 、水中の音速= 1456m/
seeから媒体液内の縦波の波長λ、は次式となる。- As an example, if the medium liquid is water (temperature 20°C), frequency = I Mllz, sound speed in water = 1456 m/
From see, the wavelength λ of the longitudinal wave in the medium liquid is given by the following equation.
一方、内槽の板として厚さ3mmの硼硅酸ガラスを使用
した場合、板波の音速は3100m/seeとなるので
、板波の振動の波長λ2は次式となる。On the other hand, when borosilicate glass with a thickness of 3 mm is used as the plate of the inner tank, the sound velocity of the plate wave is 3100 m/see, so the wavelength λ2 of the vibration of the plate wave is given by the following equation.
従って、前記のsinθ=λI/λ2からθを求めると
、
θ==sin−’ (λ1/λ−) =sin−’(1
,456/3.1)=sni−’0.47=28゜
となり、第3図の実測値と一致する。Therefore, when calculating θ from the above sinθ=λI/λ2, θ==sin-' (λ1/λ-) = sin-'(1
, 456/3.1) = sni-'0.47 = 28°, which agrees with the measured value in FIG.
次に、本発明の実施例について説明する。Next, examples of the present invention will be described.
第6図〜第1θ図は本発明の実施例の概略を示す構造図
である。こられの図において、内槽の外槽への取付構造
は前述の従来の周知の構造と同しであるので省略した。FIGS. 6 to 1θ are structural diagrams schematically showing embodiments of the present invention. In these figures, the structure for attaching the inner tank to the outer tank is omitted because it is the same as the conventional well-known structure described above.
また、超音波振動子3は実際には複数の振動子か配設さ
れるが、これも従来の周知の構造と同じであるので詳細
は省略した。また、振動子3の発振源及び振動子3への
配線は省略した。また、4は媒体液を示し、5は洗浄液
を示す。Furthermore, the ultrasonic transducer 3 is actually provided with a plurality of transducers, but since this structure is the same as the conventional well-known structure, the details are omitted. Further, the oscillation source of the vibrator 3 and the wiring to the vibrator 3 are omitted. Further, 4 indicates a medium liquid, and 5 indicates a cleaning liquid.
第6図は本発明の第1の実施例を示す縦断面図であり、
外槽1は従来の形状で、内槽10及び11の受波面に傾
斜を設けた実施例である。第6図(b)の受波面は2面
になっているか、4面あるいは円錐状でもよい。FIG. 6 is a longitudinal sectional view showing the first embodiment of the present invention,
The outer tank 1 has a conventional shape, and the wave receiving surfaces of the inner tanks 10 and 11 are sloped. The receiving surface in FIG. 6(b) may have two surfaces, four surfaces, or a conical shape.
第7図は本発明の第2の実施例を示す縦断面図であり、
内槽2は従来形状で、外槽12及び13の振動子3の取
付面に傾斜を設けた実施例である。FIG. 7 is a longitudinal sectional view showing a second embodiment of the present invention,
This is an embodiment in which the inner tank 2 has a conventional shape, and the mounting surfaces of the vibrator 3 of the outer tanks 12 and 13 are sloped.
第8図は本発明の第3の実施例を示す平面図であり、内
槽2は従来の形状で、外槽14の側面を傾斜させて振動
子3を取付けた構造を示している。FIG. 8 is a plan view showing a third embodiment of the present invention, in which the inner tank 2 has a conventional shape and the outer tank 14 has an inclined side surface and a vibrator 3 is attached thereto.
第9図は本発明の第4の実施例を示す平面図であり、内
槽!5の側面を2面に傾斜させて受波面とした構成を示
している。図では傾斜側面か2面の場合を示しているか
、3面又は4面とすることもできる。FIG. 9 is a plan view showing a fourth embodiment of the present invention, and shows an inner tank! A configuration is shown in which the side surfaces of the antenna 5 are inclined into two planes to serve as wave receiving surfaces. The figure shows a case with two inclined sides, but it may also have three or four sides.
第10図は本発明の第5の実施例を示す平面図であり、
外槽1及び内槽2とも従来の形状であるが、内槽2をほ
ぼ中心の垂直軸を中心にθだけ回転させた位置に固定し
た構造を示している。この実施例の特徴は、内槽2の回
転角θを加減調節できるように半固定構造にすることが
できることと、第1〜第4の実施例のように外槽】及び
内槽2の形状を特殊な形状にする必要がな〈従来の形状
を用いることかできることである。図において、振動子
3は外槽1の1つの側面のみに取付けられているか、2
面、3面あるいは4面に取付けることもできる。FIG. 10 is a plan view showing a fifth embodiment of the present invention,
Both the outer tank 1 and the inner tank 2 have a conventional shape, but the structure shows that the inner tank 2 is fixed at a position rotated by θ around a substantially central vertical axis. The feature of this embodiment is that it can have a semi-fixed structure so that the rotation angle θ of the inner tank 2 can be adjusted, and the shape of the outer tank and the inner tank 2 as in the first to fourth embodiments. There is no need to make it into a special shape; it is possible to use a conventional shape. In the figure, the vibrator 3 is attached to only one side of the outer tank 1, or two
It can also be mounted on three or four sides.
第1図は第6図(a)に示した本発明の第1の実施例に
おける内槽の支持構造の一例を示す部分構造断面図であ
る。図において、20,21は内槽11の底面の4隅に
設けられたテフロン製の支持構の断面を示す。23は外
槽1の底に設けられ、支持構20゜21をはめこむため
のテフロン製のガイド(受具)である。22はテフロン
製のナツトの断面を示し、支持構21の下端部に設けら
れた雄ねじと螺合している。ナツト22を回転させるこ
とにより支持構21によって支えられている内槽11の
支持の高さを加減することかでき、従って、入射角θを
調節して透過率をより高くなるようにすることができる
。FIG. 1 is a partial structural sectional view showing an example of the support structure for the inner tank in the first embodiment of the present invention shown in FIG. 6(a). In the figure, reference numerals 20 and 21 indicate cross sections of Teflon support structures provided at the four corners of the bottom surface of the inner tank 11. Reference numeral 23 denotes a guide (receiver) made of Teflon, which is provided at the bottom of the outer tank 1 and into which the support structures 20 and 21 are fitted. Reference numeral 22 shows a cross section of a Teflon nut, which is screwed into a male thread provided at the lower end of the support structure 21. By rotating the nut 22, the height of support for the inner tank 11 supported by the support structure 21 can be adjusted, and therefore, the incident angle θ can be adjusted to increase the transmittance. can.
透過率の調節は、振動子3の駆動周波数を加減すること
によっても行うことかできるか、振動子3の振動効率の
制約もあるため、図のように内槽11の支持構造によっ
て入射角θを調節することも有効である。The transmittance can be adjusted by adjusting the driving frequency of the vibrator 3. Since there are also restrictions on the vibration efficiency of the vibrator 3, the incident angle θ can be adjusted by adjusting the support structure of the inner tank 11 as shown in the figure. It is also effective to adjust the
(発明の効果)
以上詳細に説明したように、本発明を実施することによ
り、外槽に取付けられた超音波振動子の駆動エネルギか
効率よく内槽の内部に挿入された被洗浄物に伝達される
ため、従来と比べて格段の洗浄能力が発揮されるばかり
でなく、消費電力を少なくすることができ、経済的にも
極めて大きい効果がある。(Effects of the Invention) As explained in detail above, by implementing the present invention, the driving energy of the ultrasonic transducer attached to the outer tank is efficiently transmitted to the object to be cleaned inserted into the inner tank. Therefore, it not only exhibits a much higher cleaning ability than the conventional method, but also reduces power consumption, which has an extremely large economical effect.
さらに、従来は高い周波数(数M)lz)を使用して、
より微細、かっ、精密な超音波洗浄を行おうとすると、
内槽による超音波の減衰か大きくなり、実現か困難であ
った。本発明によれば、減衰を大幅に低減することがで
きるのでより高い周波数での超音波洗浄か可能となり、
洗浄の質を飛躍的に高めることができる。Furthermore, conventionally, using a high frequency (several M) lz),
When trying to perform more fine and precise ultrasonic cleaning,
The attenuation of the ultrasonic waves by the inner tank would be large, making it difficult to implement. According to the present invention, since attenuation can be significantly reduced, ultrasonic cleaning at a higher frequency is possible.
The quality of cleaning can be dramatically improved.
第1図は従来の装置の部分断面図、第2図は本発明の詳
細な説明する部分断面図、第3図は本発明の原理を示す
実測特性図、第4図は種々の材質の場合の本発明の原理
を示す実測説明図、第5図は本発明の詳細な説明する部
分断面図、第6図〜第7図は本発明の実施例を示す構造
部分断面図、第8図〜第1O図は本発明の実施例を示す
平面図、第11図は本発明の支持構造の一例を示す部分
断面図である。
1、12L 13.14・・・外槽、2.10.11.
15・・・内槽、3・・・超音波振動子、4・・・媒体
液、5・・・洗浄液、6・・・被洗浄物、7・・・内槽
の部分片、8・・・液体、20、21・・・支持構、2
2・・・ナツト、23・・・ガイド。
第3図
θ(贋)
幣2図
殆4図
緩厚(mm)
第5図
7
(75)
(DJ
蛸9図
5
蛸10図
第
図
(Q)
(b)
幣
図
4
菌11図
δ
3
手続補正書印発)
平成3年1月16日Fig. 1 is a partial cross-sectional view of a conventional device, Fig. 2 is a partial cross-sectional view explaining the present invention in detail, Fig. 3 is an actual measurement characteristic diagram showing the principle of the present invention, and Fig. 4 is a case of various materials. Fig. 5 is a partial sectional view explaining the present invention in detail, Figs. 6 to 7 are structural partial sectional views showing embodiments of the invention, and Figs. FIG. 1O is a plan view showing an embodiment of the present invention, and FIG. 11 is a partial sectional view showing an example of the support structure of the present invention. 1, 12L 13.14...Outer tank, 2.10.11.
15...Inner tank, 3...Ultrasonic vibrator, 4...Medium liquid, 5...Cleaning liquid, 6...Object to be cleaned, 7...Partial piece of inner tank, 8...・Liquid, 20, 21...Support structure, 2
2...Natsuto, 23...Guide. Fig. 3 θ (fake) Fig. 2 Fig. 4 Slight thickness (mm) Fig. 5 7 (75) (DJ Fig. 9 fig. 5 Fig. 10 octopus Fig. 10 (Q) (b) Fig. 4 Fig. 11 Fig. δ 3 Procedural amendments stamped) January 16, 1991
Claims (1)
けられた外槽と、 洗浄液と被洗浄物とを収容するために、該外槽の内部に
前記超音波振動を伝達する媒体液を介在させるための空
間を設けて配置された内槽とを備えるとともに、前記媒
体液中を伝搬する前記超音波振動を前記内槽の受波面の
法線に対して傾斜角をもたせて該受波面に入射させるこ
とにより、前記受波面を透過する前記超音波振動の振動
エネルギの透過率を著しく改善するように構成した超音
波洗浄装置。[Scope of Claims] An outer tank equipped with a vibrator that generates ultrasonic vibrations of 500 kHz or more, and a container that transmits the ultrasonic vibrations to the inside of the outer tank to accommodate cleaning liquid and objects to be cleaned. an inner tank disposed with a space for intervening a medium liquid, and the ultrasonic vibration propagating in the medium liquid has an inclination angle with respect to a normal to a wave receiving surface of the inner tank. An ultrasonic cleaning device configured to significantly improve the transmittance of vibration energy of the ultrasonic vibrations transmitted through the wave receiving surface by making the ultrasonic vibrations incident on the wave receiving surface.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016220A JPH079900B2 (en) | 1990-01-29 | 1990-01-29 | Ultrasonic cleaning equipment |
KR1019910001071A KR0150466B1 (en) | 1990-01-29 | 1991-01-23 | Ultrasonic cleaning apparatus and supporting apparatus for objects |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016220A JPH079900B2 (en) | 1990-01-29 | 1990-01-29 | Ultrasonic cleaning equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03222419A true JPH03222419A (en) | 1991-10-01 |
JPH079900B2 JPH079900B2 (en) | 1995-02-01 |
Family
ID=11910449
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016220A Expired - Lifetime JPH079900B2 (en) | 1990-01-29 | 1990-01-29 | Ultrasonic cleaning equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH079900B2 (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05102119A (en) * | 1991-10-09 | 1993-04-23 | Mitsubishi Electric Corp | Apparatus and method for cleaning |
JPH05291227A (en) * | 1992-01-14 | 1993-11-05 | Kokusai Denki Erutetsuku:Kk | Piezoelectrically driven ultrasonic cleaning apparatus |
JPH0645334U (en) * | 1992-11-26 | 1994-06-14 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
JPH0655246U (en) * | 1991-11-22 | 1994-07-26 | 株式会社国際電気エルテック | Immersion type transducer for ultrasonic cleaning equipment |
JPH07328571A (en) * | 1994-06-14 | 1995-12-19 | Kokusai Denki L Tec:Kk | Ultrasonic washing apparatus |
JPH0924349A (en) * | 1995-07-07 | 1997-01-28 | Kokusai Denki L Tec:Kk | Ultrasonic washing device |
JPH0947733A (en) * | 1995-08-03 | 1997-02-18 | Kokusai Denki L Tec:Kk | Ultrasonic washer |
JPH10335294A (en) * | 1997-06-05 | 1998-12-18 | Toshiba Corp | Device and method for cleaning substrate and semiconductor device manufactured by the cleaning method |
JP2008043842A (en) * | 2006-08-11 | 2008-02-28 | Kaijo Corp | Ultrasonic cleaning device |
WO2009004964A1 (en) * | 2007-06-29 | 2009-01-08 | Kaijo Corporation | Ultrasonic rinsing device, and ultrasonic rinsing method |
CN105164792A (en) * | 2013-05-14 | 2015-12-16 | 信越半导体株式会社 | Ultrasonic cleaning apparatus and cleaning method |
WO2020026771A1 (en) * | 2018-08-02 | 2020-02-06 | 株式会社カネカ | Cassette and cleaning bath set |
WO2020026770A1 (en) * | 2018-08-02 | 2020-02-06 | 株式会社カネカ | Cleaning bath |
JPWO2022130565A1 (en) * | 2020-12-17 | 2022-06-23 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0290525A (en) * | 1988-09-28 | 1990-03-30 | Toshiba Corp | Ultrasonic cleaning device |
-
1990
- 1990-01-29 JP JP2016220A patent/JPH079900B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0290525A (en) * | 1988-09-28 | 1990-03-30 | Toshiba Corp | Ultrasonic cleaning device |
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05102119A (en) * | 1991-10-09 | 1993-04-23 | Mitsubishi Electric Corp | Apparatus and method for cleaning |
JPH0655246U (en) * | 1991-11-22 | 1994-07-26 | 株式会社国際電気エルテック | Immersion type transducer for ultrasonic cleaning equipment |
JPH05291227A (en) * | 1992-01-14 | 1993-11-05 | Kokusai Denki Erutetsuku:Kk | Piezoelectrically driven ultrasonic cleaning apparatus |
JPH0645334U (en) * | 1992-11-26 | 1994-06-14 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
JPH07328571A (en) * | 1994-06-14 | 1995-12-19 | Kokusai Denki L Tec:Kk | Ultrasonic washing apparatus |
JPH0924349A (en) * | 1995-07-07 | 1997-01-28 | Kokusai Denki L Tec:Kk | Ultrasonic washing device |
JPH0947733A (en) * | 1995-08-03 | 1997-02-18 | Kokusai Denki L Tec:Kk | Ultrasonic washer |
JPH10335294A (en) * | 1997-06-05 | 1998-12-18 | Toshiba Corp | Device and method for cleaning substrate and semiconductor device manufactured by the cleaning method |
JP2008043842A (en) * | 2006-08-11 | 2008-02-28 | Kaijo Corp | Ultrasonic cleaning device |
JP2009011879A (en) * | 2007-06-29 | 2009-01-22 | Kaijo Corp | Ultrasonic cleaning apparatus and ultrasonic cleaning method |
WO2009004964A1 (en) * | 2007-06-29 | 2009-01-08 | Kaijo Corporation | Ultrasonic rinsing device, and ultrasonic rinsing method |
JP4533406B2 (en) * | 2007-06-29 | 2010-09-01 | 株式会社カイジョー | Ultrasonic cleaning apparatus and ultrasonic cleaning method |
CN105164792A (en) * | 2013-05-14 | 2015-12-16 | 信越半导体株式会社 | Ultrasonic cleaning apparatus and cleaning method |
KR20160008535A (en) | 2013-05-14 | 2016-01-22 | 신에쯔 한도타이 가부시키가이샤 | Ultrasonic cleaning apparatus and cleaning method |
WO2020026771A1 (en) * | 2018-08-02 | 2020-02-06 | 株式会社カネカ | Cassette and cleaning bath set |
WO2020026770A1 (en) * | 2018-08-02 | 2020-02-06 | 株式会社カネカ | Cleaning bath |
JPWO2020026770A1 (en) * | 2018-08-02 | 2021-08-02 | 株式会社カネカ | Wash tub |
JPWO2020026771A1 (en) * | 2018-08-02 | 2021-08-05 | 株式会社カネカ | Cassette and washing tub set |
JPWO2022130565A1 (en) * | 2020-12-17 | 2022-06-23 | ||
WO2022130565A1 (en) * | 2020-12-17 | 2022-06-23 | 日本製鉄株式会社 | Ultrasonic treatment method and ultrasonic treatment device |
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