JPH03208549A - Polishing method for structure observation test piece and polishing gage - Google Patents

Abstract

PURPOSE:To know a polishing quantity correctly and easily even while under polishing, by measuring the area or side length of a polishing gage exposed on the face to be polished of the material to be polished and polishing while measuring the polishing quantity of a structure observation test piece. CONSTITUTION:The area or side length of a polishing gage 2 exposed on the face to be polished of the material 4 to be polished is measured by using the material 4 to be polished which is made by imbedding the polishing gage 2 and a structure observation test piece 1 into a resin hardening body 3. Thus, polishing is performed while measuring the polishing quantity of the structure observation test piece.

Description

[Detailed description of the invention]

[Industrial Field of Application] The present invention relates to a polishing method and a polishing gage for observation test pieces, and more specifically, the present invention relates to structure observation test pieces such as sintered bodies of metallic uranium and uranium oxide used in the nuclear fuel field. A polishing method for a specimen for microstructural observation that can accurately and easily polish a predetermined amount of polishing material, and a method for polishing specimens for microstructural observation, for example, when the position of the surface required for microstructural observation is determined, or when the polishing distance from the edge of the specimen is determined. This invention relates to a polishing gauge that allows you to accurately and easily determine the polishing distance, etc. [Prior Art and Invention Problem 1i] For example, in the field of nuclear fuel, mechanical properties of nuclear fuel materials,
In order to understand various properties such as physical and chemical properties, it is important to observe the microscopic structure of nuclear fuel materials such as sintered bodies of uranium metal and uranium oxide. In addition, in other fields, there are cases where it is necessary to observe the metal structure, welded parts, bonded parts, etc. In order to facilitate the handling of a test piece cut out from a sample, a method for microscopic microstructural observation is to prepare an embedded test piece by embedding the test piece in a resin. The embedded test piece is polished to a mirror-like state, then corroded using chemicals to reveal the structure of the test piece, and this structure is observed using, for example, an optical microscope or an electron microscope. There is. For example, as shown in FIGS. 4(a) and 4(b), the center part C of the root spacing of the welded part C of the test piece B embedded in the cured resin body A is In the specified case, in the conventional method, the cured resin body A in which the test piece B is embedded is
The polishing distance L must be determined from the height of the stop and the height during polishing. However, according to this method, the surface to be polished of the cured resin body A and the surface opposite thereto are not parallel to each other, or the central axis of the test piece B embedded in the cured resin body A and the surface to be polished of the cured resin body A are not parallel to each other. Since it is sometimes difficult to polish the surface perpendicularly, it is extremely difficult to know the polishing distance accurately. It's difficult. The present invention has been made based on the above circumstances. An object of the present invention is to provide a method for polishing a 111K texture specimen, which can accurately and easily polish a predetermined amount of the texture observation specimen. Another object of the present invention is to provide a polishing gauge that allows accurate and easy determination of polishing distance, etc. [Means for solving the problem] In order to achieve the above-mentioned object, the present invention was developed by Nagisa, who has made extensive studies and developed a coating in which a specific polishing gauge is embedded in a hardened resin body together with a texture-viewing test piece. According to a specific method using an abrasive material, it is possible to accurately and easily abrade a predetermined amount of a 1111M observation specimen, such as a sintered body of metallic uranium or uranium oxide used in the nuclear fuel field, and this specific method. For example, when the position of a surface necessary for microstructural observation is determined by the polishing gauge, or when the polishing distance from the end of the specimen is determined, the polishing distance etc. can be accurately and easily determined. The present invention was achieved by discovering the following. The structure of the invention of claim 1 uses a material to be polished in which a polishing gauge and a texture Ii test piece are embedded in a cured resin body,
Structure observation V characterized in that polishing is performed while measuring the amount of polishing of the structure observation test piece by measuring the area or length of the side of the polishing gauge exposed on the surface to be polished of the material to be polished. ! This is a method for polishing a test piece, and the invention according to claim 2 is a polishing gauge that can be used by being embedded in a cured resin body together with a tissue observation test piece. Below, the method for polishing a specimen for microstructural analysis of the present invention and the polishing gauge will be described in detail. In the method of the present invention, for example, as shown in FIG. 1, a material to be polished 4 is used, which is formed by embedding an mma test piece 1 and a polishing gauge 2 in a cured resin body 3. The cured resin that forms the material to be polished is made by curing a thermally curing type resin or a reaction curing type resin, such as epoxy resin, diallyl phthalate resin, phenol resin, unsaturated polyester resin, and polyimite. There are no particular restrictions on the material as long as it is a hardening resin. One of the important points in the method of the present invention is to embed the polishing gauge together with the microstructure observation specimen in the cured resin. The polishing gauge to be used measures, for example, the area or length of the side of the surface appearing on the polished surface of the material to be polished or the observation surface of the structure observation test piece, according to the method of the present invention. By the way. The member is capable of detecting the amount of polishing of the microstructure observation specimen and can be polished together with the cured resin body and the microstructure observation specimen. Therefore, the shape of the polishing gauge may be any shape, such as a column, a cone, or a plate, as long as it can perform the above-mentioned function. There are no particular restrictions. Further, the dimensions of the polishing gauge may be appropriately selected depending on the dimensions of the Group I and observation test piece to be polished by the method of the present invention. The shape material of the polishing gate having such an action or function is appropriately selected from among metals, plastics, ceramics, etc., depending on the material and properties of the microstructure observation test piece and the hardening resin. I can do something. However, in selecting the material for forming the polishing gate,
■It does not react with the above-mentioned hardening resin used for the shape of the cured resin, and ■When the cured resin is made of a thermosetting resin, warm press is usually used to form the material to be polished. (1) It must be softer than the above-mentioned microstructure observation specimen, and (2) It must be softer than the above-mentioned microstructure observation specimen. In order to reduce wear, it is desirable to pay attention to the following points: non-ferrous or non-metallic materials are preferable to ferrous materials. An example of the polishing gate is shown in FIGS. 2(A) to 2(2). For example, FIGS. 2A and 2B show examples of polishing gauges 2 that can be suitably used when the polishing distance is determined to be a. This polishing gauge is embedded in the cured resin body so that the end face of the polishing side of the material to be polished matches the end face of the microstructure observation test piece and the end face of the polishing gauge, and the material to be polished is polished. As shown in Figure 2 (A) and Figure 2 (B), as the area of the polishing gauge appearing on the surface to be polished changes, the polishing distance a can be adjusted accurately and easily. Is it possible to know? Furthermore, Figures 2 (c) and 2 (2) show examples of polishing gauges that can be suitably used to continuously and steplessly determine the polishing distance. By polishing the material to be polished in which the polishing gauge is embedded in the cured resin together with the microstructure observation test piece, the length of the side of the polishing gauge appearing on the surface to be polished becomes stepless. Since it changes continuously, it is possible to accurately and easily know the amount of polishing of the material to be polished, that is, the Kuminowa Kanryo test piece, from this amount of change.In the method of the present invention, It is preferable to embed a plurality of the polishing gauges in the cured resin body. That is, in the method of the present invention, if a plurality of polishing gauges are used that are polished at the same time, each polishing gauge can be polished during the polishing process. By measuring the area or length of the side of the polishing gauge that appears on the polished surface of the material to be polished using the polishing gauge, the perpendicularity between the central axis of the microstructure observation test piece and the polished surface can be determined. This is because the perpendicularity can be easily and accurately determined, making it possible to correct the perpendicularity during the polishing process. There are no particular restrictions on the polishing method of the present invention, and the polishing method of the present invention can be suitably applied to metal pieces such as sintered bodies of uranium metal and uranium oxide, and various ceramics. There are no particular restrictions on the abrasive that can be used for polishing the material to be polished, and for example, it can be selected from among various conventionally used grindstones depending on the properties of the microstructure examination specimen. In any case, in the polishing process, the structure observation test is performed by measuring the area or side length of the polishing gauge appearing on the polished surface of the polished material. It is possible to accurately, easily, and continuously recognize the amount of polishing of a piece.For example, an optical measurement method can be suitably used.Specifically, a phototransistor Examples include a method of measuring the intensity of the amount of reflected light from a measuring surface using It is also possible to use a method.The above-mentioned braided rope observation test piece that has been subjected to polishing treatment (rough polishing, precision polishing, etc.) according to the method of the present invention is then subjected to, for example, a chemical treatment to reveal the structure. Depending on the condition, it can be subjected to observation using an optical microscope, an electron microscope, etc.

[Example] Stainless steel with TIGm welding (SIIS 304
), and as shown in Figure 3 (a) and (b), the center or II of the root interval sentence of the melting part IrJ
Place the microstructure observation test piece L, which is set on the surface of I, along with two polishing gauges made of fluorocarbon resin, in a die so that their end surfaces are aligned. After filling the trench with phenol resin powder, warm pressing is performed to embed the tissue inspection specimen L and two polishing gauges 2 in the cured resin body 3, as shown in FIG. 4(A). A material to be polished 4 was prepared, which was complicated and had a certain polishing distance. Note that the fact that the polishing distance L has been reached in this material to be polished 4 means that the length of the side of each polishing gauge 2 on the exposed surface is L. You can come to know by becoming. While polishing the material 4 to be polished using a diamond disk, the length of each side of the two polishing gauges 2 that appeared on the surface to be polished was measured.
As shown in (b), polishing was stopped when the length reached Lo at the same time. Since the length of each side of the two polishing gauges 2 became L0 at the same time, the perpendicularity between the surface to be polished and the central axis of the texture lI east specimen l was maintained, and therefore, this polishing It was confirmed that the surface of the assembly observation test piece l that appeared on the polished surface of the material to be polished by the treatment was the predetermined observation surface. [Effects of the Invention] According to the present invention, ( ) Since the texture observation test piece and the polishing gauge are polished at the same time using a material to be polished in which the texture observation test piece and the texture observation test piece are embedded in a hardened resin, the polishing material that appears on the polished surface of the polishing material is polished at the same time. By measuring the area or length of the sides of the mesh, it is possible to accurately and easily know the amount of polishing even during polishing, and it is possible to reliably reveal the predetermined observation surface in the microstructure observation specimen. The present invention provides an industrially useful method for polishing a specimen for microstructural observation, which has the advantage of reducing the number of microstructures; Therefore, it is possible to provide an industrially suitable abrasive gauge for skin.

[Brief explanation of drawings]

FIG. 1 is an explanatory cross-sectional view showing an example of a material to be polished in the method of the present invention, FIGS. ) is a plan view showing another example of the material to be polished in the method of the present invention, FIG. 4(b) is a vertical sectional view thereof, and FIG. Figures 1 and 2 (b) are vertical cross-sectional views. 1...Tissue observation test piece, 2...Polishing gauge, 3.
...Resin cured body, 4... Material to be polished (A) Figure 1 Figure 2 (D) (C) (2)

Claims (2)

[Claims] (1) Using a material to be polished in which a polishing gauge and a microstructure observation test piece are embedded in a cured resin body, the area or length of the side of the polishing gauge exposed on the polished surface of the material to be polished. A method for polishing a microstructure observation test piece, comprising: polishing the microstructure observation test piece while measuring the polishing amount of the microstructure observation test piece. (2) A polishing gauge characterized in that it can be used by being embedded in a cured resin body together with a tissue observation test piece.