JPH0320716Y2 - - Google Patents

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Publication number
JPH0320716Y2
JPH0320716Y2 JP10167085U JP10167085U JPH0320716Y2 JP H0320716 Y2 JPH0320716 Y2 JP H0320716Y2 JP 10167085 U JP10167085 U JP 10167085U JP 10167085 U JP10167085 U JP 10167085U JP H0320716 Y2 JPH0320716 Y2 JP H0320716Y2
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JP
Japan
Prior art keywords
liquid
fluidized bed
gas
fluidized
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10167085U
Other languages
Japanese (ja)
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JPS6212498U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP10167085U priority Critical patent/JPH0320716Y2/ja
Publication of JPS6212498U publication Critical patent/JPS6212498U/ja
Application granted granted Critical
Publication of JPH0320716Y2 publication Critical patent/JPH0320716Y2/ja
Expired legal-status Critical Current

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  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)

Description

【考案の詳細な説明】 (産業上の利用分野) 本考案は、分散板上の流動媒体を流動用気体の
流入により流動層とし、該流動層中に各種の被処
理液を噴霧供給して処理する流動層式液体処理炉
に関するものである。
[Detailed Description of the Invention] (Industrial Application Field) The present invention involves forming a fluidized medium on a dispersion plate into a fluidized bed by introducing a fluidizing gas, and spraying and supplying various liquids to be treated into the fluidized bed. The present invention relates to a fluidized bed type liquid processing furnace.

(従来の技術) 各種塩の溶液を、熱風の流入により流動化され
た流動媒体の流動層中に噴霧供給して、該流動層
中で前記溶液中の結晶水等を分離し同溶液中の塩
を粉体または粒状体にか焼して処理し回収する流
動層式液体処理炉について従来例を説明すると、
第3図に示すように炉本体1内に設けた分散板2
上に所望量の流動媒体(砂等)aを収容し、流動
化用の熱風bを、熱風入口3から分散板2下の風
箱内に連続供給し、分散板2を介し前記流動媒体
a中に上向きに流入させて流動層a,bとし、炉
本体1の下部から分散板2を貫通して配設されて
いる二重パイプ形状の気・液噴出ノズル4の上端
から溶液c(被処理液)とともにアトマイズ空気
dを噴出させ、前記流動層a,b中に前記溶液c
を気・液噴霧させて供給する構造になつている。
(Prior art) A solution of various salts is sprayed into a fluidized bed of a fluidized medium that is fluidized by the inflow of hot air, and in the fluidized bed, water of crystallization, etc. in the solution is separated. A conventional example of a fluidized bed liquid processing furnace that processes and recovers salt by calcining it into powder or granules is as follows:
As shown in FIG. 3, a dispersion plate 2 provided inside the furnace body 1
A desired amount of fluidizing medium (sand, etc.) a is stored in the top, and hot air b for fluidization is continuously supplied from the hot air inlet 3 into the wind box below the distribution plate 2, and the fluidizing medium a is The solution C (coated liquid) is flowed upward into the furnace body 1 to form fluidized beds a and b. The atomized air d is blown out together with the treatment liquid), and the solution c is injected into the fluidized beds a and b.
The structure is such that it supplies air and liquid as a spray.

(従来技術の問題点) 従来の前記流動層式液体処理炉においては、
気・液噴出ノズル4が分散板2側から流動層a,
bに向つて上向きに設けられ、気・液噴出ノズル
4の上向き噴出端部が流動層a,b中に配設され
ているため、熱風bを流入して流動媒体を流動化
して流動層a,bとし、該流動層a,b中に溶液
cをアトマイズ空気dとともに噴出させて噴霧供
給する運転時は、アトマイズ空気dの噴出による
空気抵抗によつて、流動媒体a等が気・液噴出ノ
ズル4内へ入るのを防止しているが、停電、運転
操作の誤り、あるいはコンプレツサの故障等の原
因によりアトマイズ空気dの供給が停止された
り、運転を停止した際などに、流動層a,b中の
流動媒体a等が気・液噴出ノズル4内に落ち込
み、同ノズルが閉塞される恐れがあり、作動の信
頼性に問題があるとともに、運転再開に支障を来
すなどの問題点がある。
(Problems with conventional technology) In the conventional fluidized bed liquid processing furnace,
The gas/liquid ejection nozzle 4 flows into the fluidized bed a, from the distribution plate 2 side.
Since the upward ejection end of the gas/liquid ejection nozzle 4 is disposed in the fluidized beds a and b, the hot air b flows in to fluidize the fluidized medium and form the fluidized bed a. , b, and when the solution c is ejected and sprayed together with the atomized air d into the fluidized beds a and b, the air resistance caused by the ejection of the atomized air d causes the fluidized medium a to eject gas and liquid. This prevents the atomized air from entering the nozzle 4, but if the supply of atomized air d is stopped or the operation is stopped due to a power outage, incorrect operation, or compressor failure, the fluidized bed a, There is a risk that the fluidized medium a, etc. in b may fall into the gas/liquid ejection nozzle 4, causing the nozzle to become clogged, which poses problems such as operational reliability and hindrance to resuming operation. be.

(考案の目的・問題点の解決手段) 本案は、前記のような問題点に対処する考案で
あつて、分散板上の流動媒体に流動用気体を流入
させて流動層とし該流動層中に被処理液を気・液
噴出ノズルによつて噴霧供給する流動層式液体処
理炉において、前記流動層の上方に前記気・液噴
出ノズルを設けるとともに、前記気・液噴出ノズ
ルの下向き噴出端部を前記流動層の静止時表面上
にかつ流動時表面下に配設した構成に特徴を有
し、流動層中に被処理液を供給する気・液噴出ノ
ズルを同流動層の上方に設け、同ノズルの下向き
噴出端部を流動層の静止時表面上にかつ流動表面
下に配設することにより、運転中は、被処理液が
流動層の流動時表面下に噴霧供給されて、被処理
液の供給、処理性能が確保され、噴霧用空気の供
給が停止されても前記被処理液の供給、処理に格
別の支障にならず、流動媒体等の前記ノズルへの
流入、閉塞が防止され、運転停止時は、前記ノズ
ルの下向き噴出端部が流動層の静止表面上とな
り、前記ノズルへの流動媒体等の流入が防止され
て、被処理液の供給、処理性能、作動信頼性が確
保されて前記のような問題点を解消した流動層式
液体処理炉を提供するにある。
(Purpose of the invention/Means for solving problems) This invention is an invention to deal with the above-mentioned problems, in which a fluidizing gas is introduced into a fluidizing medium on a dispersion plate to form a fluidized bed. In a fluidized bed type liquid processing furnace in which a liquid to be treated is sprayed and supplied by a gas/liquid jetting nozzle, the gas/liquid jetting nozzle is provided above the fluidized bed, and a downward jetting end of the gas/liquid jetting nozzle is provided. is arranged on the surface of the fluidized bed when it is at rest and below the surface when it is flowing, and a gas/liquid ejection nozzle that supplies the liquid to be treated into the fluidized bed is provided above the fluidized bed, By arranging the downward spouting end of the nozzle above the surface of the fluidized bed when it is at rest and below the surface of the fluidized bed, during operation, the liquid to be treated is sprayed and supplied below the surface of the fluidized bed when it is flowing. The supply and processing performance of the liquid is ensured, and even if the supply of air for spraying is stopped, there is no particular hindrance to the supply and processing of the liquid to be treated, and flow medium and the like are prevented from flowing into and clogging the nozzle. When the operation is stopped, the downward ejection end of the nozzle is on the stationary surface of the fluidized bed, which prevents the fluid medium from flowing into the nozzle, ensuring supply of the liquid to be treated, processing performance, and operational reliability. The object of the present invention is to provide a fluidized bed type liquid processing furnace which solves the above-mentioned problems.

(実施例) 第1図、第2図に本考案の一実施例を示してお
り、図中1は炉本体、2は炉本体1中に配設され
た分散板であつて、炉本体1中の分散板2上に
は、適宜の機構(図示省略)によつて流動媒体
(砂等)aが収容され、流動用気体(熱風等)b
が入口3から分散板2の下側の風箱内に連続的に
供給され、該流動用気体bが分散板2を介し流動
媒体a中に分散流入されて流動層a,bを形成す
る構成になつている。
(Embodiment) An embodiment of the present invention is shown in FIGS. 1 and 2, in which 1 is a furnace main body, 2 is a dispersion plate disposed in the furnace main body 1, and A fluidizing medium (sand, etc.) a is accommodated on the dispersion plate 2 inside by an appropriate mechanism (not shown), and a fluidizing gas (hot air, etc.) b
is continuously supplied from the inlet 3 into the wind box below the dispersion plate 2, and the fluidizing gas b is dispersed and flowed into the fluidizing medium a through the dispersing plate 2 to form fluidized beds a and b. It's getting old.

さらに、二重パイプ管よりなる気・液噴出ノズ
ル10が炉本体1内の流動層a,bの上方に設け
られているとともに、気・液噴出ノズル10の下
向き噴出端部10aが、第1図に示すように流動
層a,bの静止時表面イ(換言すれば流動媒体a
の表面)上に位置するように、かつ第2図に示す
ように流動層a,bの流動時表面ロ下に位置する
ように配設されて、気・液噴出ノズル10の内側
パイプ内には被処理液cが入口10cから流入さ
れ、外側パイプ内には噴霧用空気(アトマイズ空
気)dが入口10dから流入され、前記被処理液
cと前記噴霧用空気dは、下向き噴出端部10a
から流動層a,bの流動時表面ロ下に噴出され、
流動層a,b中に噴霧供給されて処理される構成
になつている。
Further, a gas/liquid ejection nozzle 10 made of a double pipe is provided above the fluidized beds a, b in the furnace body 1, and the downward ejection end 10a of the gas/liquid ejection nozzle 10 is connected to the first As shown in the figure, when the fluidized beds a and b are at rest, the surface a (in other words, the fluidized medium a
The gas/liquid ejection nozzle 10 is disposed so as to be located above the surface of the fluidized bed and below the surface of the fluidized bed when the fluidized beds a and b are flowing, as shown in FIG. The liquid to be treated c flows in from the inlet 10c, the atomizing air (atomizing air) d flows into the outer pipe from the inlet 10d, and the liquid to be treated c and the atomizing air d flow through the downward jetting end 10a.
is ejected from below the surface of the fluidized beds a and b when flowing,
It is configured to be spray-supplied into fluidized beds a and b for treatment.

(作用) 本考案の実施例は、前記のような構成になつて
いるので、運転中は、流動用気体(熱風)bが分
散板2を介して流動層a,b中に上向きに連続的
に供給されるため、流動層a,bは第2図に示す
ように嵩高となりその流動時表面ロ下に気・液噴
出ノズル10の下向き噴出端部10aが位置さ
れ、被処理液cが下向き噴出端部10aから流動
層a,b中に下向きに気・液噴出されて、流動層
a,b中に噴霧供給され、液動層a,b中への被
処理液cの分散供給性能が確保されて、例えば、
放射性廃液等の塩溶液を流動層内の熱によつて処
理し、同溶液中の塩を粉体、粒体状にか焼処理し
て回収することができる。
(Function) Since the embodiment of the present invention has the above-mentioned configuration, during operation, the fluidizing gas (hot air) b is continuously flowed upward into the fluidized beds a and b via the dispersion plate 2. As a result, the fluidized beds a and b become bulky as shown in FIG. Gas and liquid are ejected downward from the ejection end 10a into the fluidized beds a and b, and the liquid to be treated is sprayed and supplied into the fluidized beds a and b. For example,
A salt solution such as radioactive waste liquid can be treated with heat in a fluidized bed, and the salt in the solution can be recovered by calcination into powder or granules.

また、前記運転時に、何らかの原因で噴出用気
体dの供給が減少、あるいは停止されても、被処
理液cの供給が確保され気・液噴出ノズル10内
への流動媒体a等の流入、閉塞が防止され、外パ
イプの下向き噴出端部に多少の流入が生じても噴
出用空気の再供給により簡単に排出されて、被処
理液、噴出用空気の再噴出に格別の支障になら
ず、液体処理を継続できる。
Moreover, even if the supply of the jetting gas d is reduced or stopped for some reason during the operation, the supply of the liquid to be treated c is ensured, and the flow medium a, etc. into the gas/liquid jetting nozzle 10 is prevented from being blocked. Even if a small amount of inflow occurs to the downward jetting end of the outer pipe, it can be easily discharged by resupplying the jetting air, and it will not cause any particular hindrance to the re-spraying of the liquid to be treated and the jetting air. Liquid processing can continue.

さらに、被処理液c、噴出用気体d、流動用気
体bの供給を停止した運転停止時は、第1図に示
すように流動層a,bの表面が下がり静止時表面
イになつて、気・液噴出ノズル10の下向き噴出
端部10aの下側になるため、流動媒体a等の下
向き噴出端部内への流入、閉塞がなくなり、運転
再開の支障にはならず、作動信頼性が得られる。
Furthermore, when the operation is stopped when the supply of the liquid to be treated c, the jetting gas d, and the fluidizing gas b is stopped, the surfaces of the fluidized beds a and b fall down to the stationary surface A, as shown in FIG. Since it is located below the downward ejection end 10a of the gas/liquid ejection nozzle 10, there is no inflow or blockage of the fluid medium a etc. into the downward ejection end, and there is no hindrance to restarting the operation, resulting in operational reliability. It will be done.

(考案の効果) 前述のように本考案は、分散板2上の流動媒体
aに流動用気体bを流入させて流動層a,bとし
該流動層中に被処理液cを気・液噴出ノズルによ
つて噴霧供給する流動層式液体処理炉において、
前記流動層a,bの上方に前記気・液噴出ノズル
10を設けるとともに、気・液噴出ノズル10の
下向き噴出端部10aを流動層a,bの静止時表
面イ上にかつ流動時表面ロ下に配設した構成にな
つているため、運転中は、被処理液が流動層の流
動時表面下に噴出され噴霧供給されて、被処理液
の供給、処理性能が確保され、噴出用空気の供給
が停止されても被処理液の供給、処理に格別の支
障とならず、流動媒体等の前記ノズルへの流入、
閉塞が防止され、運転停止時は、前記ノズルの下
向き噴出端部が流動層の静止表面上になつて、前
記ノズルへの流動媒体等の流入、閉塞が防止され
て、前記ノズルへの流動媒体等の流入、閉塞が効
果的に防止され、被処理液の供給、処理性能、そ
の作動信頼性が向上されている。
(Effects of the invention) As described above, the present invention allows the fluidizing gas b to flow into the fluidizing medium a on the dispersion plate 2 to form fluidized beds a and b, and the liquid to be treated c is jetted into the fluidized bed. In a fluidized bed liquid processing furnace that is sprayed and supplied by a nozzle,
The gas/liquid ejection nozzle 10 is provided above the fluidized beds a, b, and the downward ejecting end 10a of the gas/liquid ejecting nozzle 10 is placed above the surface A of the fluidized bed A, b when it is at rest and above the surface R when flowing. During operation, the liquid to be treated is ejected and sprayed below the surface of the fluidized bed, ensuring supply of the liquid to be treated and processing performance. Even if the supply of the liquid to be treated is stopped, there will be no particular hindrance to the supply and treatment of the liquid to be treated, and the flow of the fluid medium etc. to the nozzle,
Blockage is prevented, and when the operation is stopped, the downward ejection end of the nozzle is on the stationary surface of the fluidized bed, preventing the flow of the fluid medium etc. into the nozzle and blocking, and the flow medium into the nozzle is prevented. This effectively prevents inflow and blockage of liquids to be treated, improves processing performance, and improves operational reliability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例を示す縦断機構図、
第2図は第1図の運転状態を示す縦断機構図、第
3図は従来例を示す縦断機構図である。 1:炉本体、2:分散板、10:気・液噴出ノ
ズル、10a:下向き噴出端部、a:流動媒体、
b:流動用気体、c:被処理液。
FIG. 1 is a longitudinal mechanical diagram showing an embodiment of the present invention;
FIG. 2 is a longitudinal mechanical diagram showing the operating state of FIG. 1, and FIG. 3 is a longitudinal mechanical diagram showing a conventional example. 1: Furnace body, 2: Dispersion plate, 10: Gas/liquid ejection nozzle, 10a: Downward ejection end, a: Fluid medium,
b: fluidizing gas, c: liquid to be treated.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 分散板上の流動媒体に流動用気体を流入させて
流動層とし該流動層中に被処理液を気・液噴出ノ
ズルによつて噴霧供給する流動層式液体処理炉に
おいて、前記流動層の上方に前記気・液噴出ノズ
ルを設けるとともに、前記気・液噴出ノズルの下
向き噴出端部を前記流動層の静止時表面上にかつ
流動時表面下に配設したことを特徴とする流動層
式液体処理炉。
In a fluidized bed type liquid processing furnace, a fluidizing gas is flowed into a fluidized medium on a dispersion plate to form a fluidized bed, and a liquid to be treated is sprayed into the fluidized bed by a gas/liquid jet nozzle, above the fluidized bed. The fluidized bed type liquid is provided with the gas/liquid jetting nozzle, and the downward jetting end of the gas/liquid jetting nozzle is disposed on the surface of the fluidized bed when it is at rest and below the surface when it is flowing. Processing furnace.
JP10167085U 1985-07-05 1985-07-05 Expired JPH0320716Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10167085U JPH0320716Y2 (en) 1985-07-05 1985-07-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10167085U JPH0320716Y2 (en) 1985-07-05 1985-07-05

Publications (2)

Publication Number Publication Date
JPS6212498U JPS6212498U (en) 1987-01-26
JPH0320716Y2 true JPH0320716Y2 (en) 1991-05-02

Family

ID=30972609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10167085U Expired JPH0320716Y2 (en) 1985-07-05 1985-07-05

Country Status (1)

Country Link
JP (1) JPH0320716Y2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2547023B2 (en) * 1987-06-27 1996-10-23 株式会社 大川原製作所 Liquid material powderizer
US11236269B2 (en) 2018-03-29 2022-02-01 Denka Company Limited Alpha-Sialon fluorescent body and light-emitting device

Also Published As

Publication number Publication date
JPS6212498U (en) 1987-01-26

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