JPH03203701A - Antireflection coating - Google Patents
Antireflection coatingInfo
- Publication number
- JPH03203701A JPH03203701A JP1342436A JP34243689A JPH03203701A JP H03203701 A JPH03203701 A JP H03203701A JP 1342436 A JP1342436 A JP 1342436A JP 34243689 A JP34243689 A JP 34243689A JP H03203701 A JPH03203701 A JP H03203701A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- antireflection
- antireflection film
- zro2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 title abstract description 4
- 238000000576 coating method Methods 0.000 title abstract description 4
- 239000011521 glass Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 239000010408 film Substances 0.000 claims description 37
- 239000012788 optical film Substances 0.000 claims description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 abstract description 12
- 230000000694 effects Effects 0.000 abstract description 4
- 230000003287 optical effect Effects 0.000 abstract description 4
- 238000010030 laminating Methods 0.000 abstract 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical group O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 18
- 230000003595 spectral effect Effects 0.000 description 9
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000005304 optical glass Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005375 photometry Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0018—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for preventing ghost images
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は光学ガラスにコーティングされた反射防止膜に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an antireflection film coated on optical glass.
［従来の技術］
従来、光学ガラス表面の反射特性を改善するために、こ
の光学ガラス基板上に反射防止膜を設けることは良く知
られている。このような反射防止膜として、例えば米国
特許箱３．１８５．０２Ｏ号明ａ書には、基板のガラス
上に、第１層目を膜厚λ／４、第２１１１目をλ／２、
第３層目をλ／４（λは反射防止波長域の基準波長であ
る。）よりなる３１１１型反射防止膜が開示されている
。しかしながら前記米国特許用ＩＩＩに開示されている
反射防止膜をガラスレンズに施した場合、可視波長域全
域（３８０〜７Ｂ０ｎｍ）に対する反射防止効果が不十
分であり、眼鏡レンズとして使用づると、ゴースト現象
、フレア現象などの反射のちらつきを感じる問題点を有
している。上記問題を解決するために、例えば、特公昭
５７−２５８０１号公報には、７層型反射防止膜が、ま
た特公昭６４８８０１号公報には、４層以上の多層反射
防止膜が開示されている。[Prior Art] Conventionally, it is well known to provide an antireflection film on an optical glass substrate in order to improve the reflection characteristics of the surface of the optical glass. As such an anti-reflection film, for example, US Pat.
A type 3111 antireflection film is disclosed in which the third layer is made of λ/4 (λ is the reference wavelength of the antireflection wavelength range). However, when the antireflection coating disclosed in the above-mentioned U.S. Patent No. , there is a problem with the flickering of reflections such as flare phenomena. To solve the above problems, for example, Japanese Patent Publication No. 57-25801 discloses a seven-layer antireflection film, and Japanese Patent Publication No. 648801 discloses a multilayer antireflection film with four or more layers. .
［発明が解決しようとする課題］
しかしながら、特公昭５７−２５８０１号公報、特公昭
６４−８８０１号公報に開示されている反射防止膜は、
ＴｌＯ２に代表されるような、膜厚の厚さ方向に屈折率
が異なる性質を有する不均質膜が施こされている。前記
不均質膜の屈折率は真空度に大きく依存するため、所望
の反射特性を再現良く得ることが困難である問題を有し
ている。[Problems to be Solved by the Invention] However, the antireflection films disclosed in Japanese Patent Publication No. 57-25801 and Japanese Patent Publication No. 64-8801,
A non-uniform film, typified by TlO2, having a refractive index that differs in the thickness direction is applied. Since the refractive index of the heterogeneous film greatly depends on the degree of vacuum, there is a problem in that it is difficult to obtain desired reflection characteristics with good reproducibility.
従って本発明の目的は、可視光線域の波長範囲において
、反射防止効果に優れ、ガラスレンズに施した場合にで
もゴースト現象、フレア現象が起こりにくく、さらに所
望の反射特性を再現良く得ることができる反射防止膜を
提供づることにある。Therefore, the object of the present invention is to have an excellent antireflection effect in the wavelength range of visible light, to prevent ghosting and flare phenomena from occurring even when applied to a glass lens, and to be able to obtain desired reflection characteristics with good reproducibility. The purpose is to provide an anti-reflection film.
［課題を解決するための手段］
本発明は、上述の目的を達成するために鋭意研究した結
果、ほぼ、１．５から１．８の屈折率を有するガラス基
板上に設けられる７層構成の反射防止膜であって基材よ
り数えて順に第１層、第２層とした時に以下の条件を満
足し、さらに第６層がＺｒＯ２、Ｔａ２Ｏ５、Ｙ２Ｏ３
との混合物からなることを特徴とする反射防止膜を見い
出し本発明に至った。[Means for Solving the Problems] As a result of intensive research to achieve the above object, the present invention has a seven-layer structure provided on a glass substrate having a refractive index of approximately 1.5 to 1.8. The anti-reflection film satisfies the following conditions when the first layer and second layer are counted from the base material, and the sixth layer is ZrO2, Ta2O5, Y2O3.
The present inventors have discovered an antireflection film characterized by consisting of a mixture of .
第１１！！ １．３８ ≦ ０１ ≦１．３９０
．０７λ０≦ｎｌ ｄ１≦０．１４λ０第２層 １．
６２ ≦ ｎ２ ≦２．０５０．０２λ０≦ｎ２ ｄ２
≦０．０６λＯ第３１１ ｎｓ ≧１．９０
０．０６λ０≦ｎ３ ｄ３≦０．１０λ０第４層 １
．３８ ≦ ｎ４ ≦１．３９０．１０λ０≦ｎ４ ｄ
４≦０．１３λＯ第５１ ｎｓ ≧１．９０
０．０５λ０≦ｎ５ ｄ５≦０．１０λ０第６層 ２
．０５ ≦ ｎ６ ≦２．１５０．４８λ０≦ｎ６ ｄ
６≦０．５２λ０第７層 １．３８≦ ０７ ≦１
．３９０．２３λ０≦ｎ７ ｄ７≦０．２７λ０但し、
λ０は４５０〜５５０ｎｍの範囲において選択された設
計波長、ｎｌは屈折率、ｎｉｄは光学的膜厚、ｉは１〜
７の整数を示す。11th! ! 1.38≦01≦1.390
．． 07λ0≦nl d1≦0.14λ0 2nd layer 1.
62 ≦ n2 ≦2.050.02λ0≦n2 d2
≦0.06λO 311 ns ≧1.90 0.06λ0≦n3 d3≦0.10λ0 4th layer 1
．． 38≦n4≦1.390.10λ0≦n4 d
4≦0.13λO 51st ns ≧1.90 0.05λ0≦n5 d5≦0.10λ0 6th layer 2
．． 05≦n6≦2.150.48λ0≦n6 d
6≦0.52λ0 7th layer 1.38≦07≦1
．． 390.23λ0≦n7 d7≦0.27λ0However,
λ0 is the design wavelength selected in the range of 450 to 550 nm, nl is the refractive index, nid is the optical thickness, and i is 1 to 550 nm.
Indicates an integer of 7.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明の反射防止膜の第６１は、ＺｒＯ２、Ｔａ２Ｏ５
、Ｙ２Ｏ３との混合蒸着膜から構成されることを必須
条件としている。その理由は、Ｔａ２Ｏ５にＺｒＯ２と
Ｙ２Ｏ５とを混合することによって、膜厚の厚さ方向に
屈折率が異なる性質を有する不均質膜の不均質性を調整
することが可能であり、また吸収を示さず、屈折率が２
．０５〜２．１５と＾い屈折率を有するからである。尚
、ＺｒＯ２、Ｔａ２Ｏ５、Ｙ２Ｏ３とのモル組成比は、
ＺｒＯ２が１に対して、Ｔａ２ｏｓが０．８〜１．８、
Ｙ２Ｏ３が０．０５〜０．３が好ましく用いられる。The 61st antireflection film of the present invention is ZrO2, Ta2O5
, Y2O3 is an essential condition. The reason for this is that by mixing ZrO2 and Y2O5 with Ta2O5, it is possible to adjust the heterogeneity of a heterogeneous film that has a property that the refractive index differs in the thickness direction, and it also shows absorption. , the refractive index is 2
．． This is because it has a high refractive index of 0.05 to 2.15. The molar composition ratio of ZrO2, Ta2O5, and Y2O3 is as follows:
ZrO2 is 1, Ta2os is 0.8 to 1.8,
Y2O3 of 0.05 to 0.3 is preferably used.
その理由は、前記モル組成比であれば、前記屈折率の範
囲と不均質性を調整することが容易で、また得られる蒸
着膜に吸収が生じさせないためである。１モルのＺｒＯ
２に対してＴａ２Ｏ５が０゜８モル未満の場合や１．８
モルを超える場合には、得られる蒸着膜に吸収が生じ易
く、Ｙ２Ｏ３が０゜３モルを超えると、蒸着速度が早く
なり、得られる蒸着膜に吸収が生じ易くなるとともに、
蒸着原料の飛散が生じ易くその制御が難しくなる。The reason is that the above molar composition ratio makes it easy to adjust the range and non-uniformity of the refractive index, and also prevents absorption from occurring in the resulting deposited film. 1 mole ZrO
When Ta2O5 is less than 0°8 mol or 1.8
If Y2O3 exceeds 0.3 mol, absorption tends to occur in the obtained vapor deposited film, and when Y2O3 exceeds 0.3 mol, the vapor deposition rate becomes faster and absorption tends to occur in the obtained vapor deposited film.
The vapor deposition raw material tends to scatter, making it difficult to control.
本発明の反射防止膜の各層の膜材料は、各層の屈折率と
光学的膜厚の範囲をみたすものであれば特に限定はない
が、第１層、第４層及び第７Ｈは、低屈折率の物質、た
とえば、屈折率１．３８〜１゜３９のＭＯＦ２、第２層
は、Ａｌ２Ｏ３またはＺｒＯ２、第３層、第５層は、Ｚ
ｒＯ２またはＺｒＯ２、Ｔａ２Ｏ５、Ｙ２Ｏ３との混合
物によッテ構成することが好ましい。その理由は、吸収
を示さず、所望の屈折率と強い膜強度を得ることができ
るからである。The film material of each layer of the antireflection film of the present invention is not particularly limited as long as it satisfies the range of refractive index and optical film thickness of each layer, but the first layer, fourth layer, and 7th layer have low refractive index. For example, the second layer is Al2O3 or ZrO2, and the third and fifth layers are ZrO2.
It is preferable to use rO2 or a mixture with ZrO2, Ta2O5, and Y2O3. The reason is that it exhibits no absorption and can provide a desired refractive index and strong film strength.
尚、本発明におけるガラス基材の屈折率は、１゜５から
１．８の範囲のものを用いる。その理由は、ガラス基材
の屈折率が１．５から１．８の範囲であれば、本発明の
反射防止膜の各層の蒸着物質、蒸着物質の積層順を変え
ることなく前記ガラス基材に適用することが可能だから
である。Incidentally, the refractive index of the glass substrate used in the present invention is in the range of 1.5 to 1.8. The reason is that if the refractive index of the glass substrate is in the range of 1.5 to 1.8, the vapor deposition material of each layer of the antireflection film of the present invention and the lamination order of the vapor deposition material can be applied to the glass substrate without changing the layering order. This is because it can be applied.
本発明では、反射防止膜の膜構成を７層構成とし、各層
の屈折率、光学的膜厚の範囲を前記の如く限定すること
により表面反射率が極めて低い反射防止膜を得ることが
可能になる。In the present invention, the antireflection film has a seven-layer structure, and by limiting the refractive index and optical thickness range of each layer as described above, it is possible to obtain an antireflection film with extremely low surface reflectance. Become.
本発明において前記第１〜７層は、真空蒸着、スパッタ
リングによって設けることができる。より、好ましくは
真空蒸着である。イオンビームアシストなどの方法も適
宜応用してもよい。In the present invention, the first to seventh layers can be provided by vacuum deposition or sputtering. Vacuum deposition is more preferred. Methods such as ion beam assist may also be applied as appropriate.
［実施例］
以下、実施例により本発明を更に詳細に説明するが、本
発明は、これら実施例に限定されるものでない。[Examples] Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples.
第１図は、本発明にかかる反射防止膜を示す断面図であ
る。第１図において、反射防止膜Ｃは基板Ａ側から空気
Ｂ側へ順に、第１層１、第２８２、第３層３、第４層４
、第５層５、第６層６、第７層７構成からなる。FIG. 1 is a sectional view showing an antireflection film according to the present invention. In FIG. 1, the antireflection film C is arranged in order from the substrate A side to the air B side: first layer 1, layer 282, third layer 3, and fourth layer 4.
, a fifth layer 5, a sixth layer 6, and a seventh layer 7.
次に、本発明実施例１〜４の具体的構成を表１に、実施
例５〜８の具体的構成を表２に、実施例９〜１２の具体
的構成を表３に示し、実施例１〜３の分光反射率曲線を
第２図に、実施例５〜７の分光反射率曲線を第３図に、
実施例９〜１１の分光反射率曲線を第４図に、また、実
施例４，８゜１２の分光反射率曲線を第５図に示す。但
し、表１〜表３において各層の光学的膜厚は設計波長λ
０を５００ｎｍとして計算した場合の値である。Next, the specific structures of Examples 1 to 4 of the present invention are shown in Table 1, the specific structures of Examples 5 to 8 are shown in Table 2, the specific structures of Examples 9 to 12 are shown in Table 3, and The spectral reflectance curves of Examples 1 to 3 are shown in Figure 2, and the spectral reflectance curves of Examples 5 to 7 are shown in Figure 3.
The spectral reflectance curves of Examples 9 to 11 are shown in FIG. 4, and the spectral reflectance curves of Examples 4 and 8°12 are shown in FIG. However, in Tables 1 to 3, the optical thickness of each layer is based on the design wavelength λ.
This value is calculated assuming that 0 is 500 nm.
尚、蒸着法は真空蒸着法を用い、基板温度３００℃、真
空度３ｘ １０’Ｔｏ ｒ ｒの条件で行なった。屈折
率１．６のガラスレンズとしてＬ ＨＩ −■（ホーヤ
（株）！ＦＪ）、屈折率１．７のガラスレンズとしてＬ
ＨＩ（ホーヤ（株）製）、屈折率１゜８のガラスレンズ
としてＴＨＩ−Ｉ［（ホーヤ（株）製）を用い、ＺｒＯ
２、Ｔａ２Ｏ５ 、Ｙ２Ｏ３ ｆ７）モル組成比はＺｒ
Ｏ２が１に対して、Ｔａ２Ｏｓが１．２、Ｙ２Ｏ３が０
．３で行なツタ。第２図〜第５図から明らかなようにい
ずれの実施例においても、片面の検感反射率は、約０．
１５％以下と極めて優れた反射防止性を有していた。Incidentally, the evaporation method was performed using a vacuum evaporation method under conditions of a substrate temperature of 300° C. and a degree of vacuum of 3×10′ Torr. L HI-■ (Hoya Co., Ltd.!FJ) as a glass lens with a refractive index of 1.6, L as a glass lens with a refractive index of 1.7
HI (manufactured by Hoya Co., Ltd.), THI-I (manufactured by Hoya Co., Ltd.) as a glass lens with a refractive index of 1°8, ZrO
2, Ta2O5, Y2O3 f7) Molar composition ratio is Zr
O2 is 1, Ta2Os is 1.2, Y2O3 is 0
．． Ivy at 3. As is clear from FIGS. 2 to 5, in each of the examples, the sensed reflectance on one side is about 0.
It had extremely excellent antireflection properties of 15% or less.
また、第６図は、単色測光法（λＯ＝５５０ｎｍ）にて
制御を行ない、第６層０．５０λＯを５回繰り返して形
成したときの第６層の蒸着時間（膜厚変化）に対する反
射率変化を示す図である。第６図に示すように、いづれ
の場合にも蒸着開始点ａと０．５０λＯの最小極値点す
の反射率値がほぼ同一であり、第６層のＺｒＯ２、Ｔａ
２Ｏｓ 、Ｙ２Ｏ３からなる膜は均質なものであった。In addition, Figure 6 shows the reflectance as a function of the deposition time (film thickness change) of the sixth layer when the sixth layer of 0.50λO was repeatedly formed five times using monochromatic photometry (λO = 550 nm). It is a figure showing a change. As shown in FIG. 6, in all cases, the reflectance values at the deposition start point a and the minimum extreme value point of 0.50λO are almost the same, and the ZrO2, Ta
The film made of 2Os and Y2O3 was homogeneous.
さらに、実施例１〜１２に示す反射防止膜を施したガラ
スレンズをそれぞれ繰り返し製作したところ、すべての
ガラスレンズにおいて片面検感反射率が約０．１５％以
下と反射特性を再現良く得ることができた。Furthermore, when glass lenses coated with anti-reflection films shown in Examples 1 to 12 were repeatedly produced, it was possible to obtain good reproducibility of reflection characteristics with single-sided test reflectance of approximately 0.15% or less for all glass lenses. did it.
（以下余白）
［発明の効果１
以上詳述したように、本発明の反射防止膜は、ガラスレ
ンズ上に設けたときに、可視光線域の波長範囲において
表面反射率が極めて低く、優れた反射防止効果を有して
いることから、ゴースト現象、フレア現象が解消され眼
鏡レンズとして特に好適に用いることができる。また第
６層に不均質の問題を解消できる物質を用いていること
から、反射特性を再現良く得ることができる。さらに、
本発明の反射防止膜は、屈折率１．５〜１．８のガラス
レンズにおいて蒸着物質、蒸着物質の積層順を変えずに
ほぼ同一の反射特性を得ることが可能になった。(Blank below) [Effect of the Invention 1 As detailed above, the antireflection film of the present invention has extremely low surface reflectance in the wavelength range of visible light when provided on a glass lens, and provides excellent reflection. Since it has a preventive effect, ghost phenomena and flare phenomena are eliminated, and it can be particularly suitably used as a spectacle lens. Furthermore, since a material that can solve the problem of non-uniformity is used in the sixth layer, reflection characteristics can be obtained with good reproducibility. moreover,
The anti-reflection film of the present invention makes it possible to obtain substantially the same reflection characteristics in a glass lens having a refractive index of 1.5 to 1.8 without changing the layering order of the vapor-deposited substances and the vapor-deposited substances.
第１図は本発明にかかる反射防止膜の構成を示す断面図
、第２図は本実施例１〜３の分光反射率曲線図、第３図
は、本実施例５〜７の分光反射率曲線図、第４図は、実
施例９〜１１の分光反射率曲線図、第５図は、本実施例
４，８．１２の分光反射率曲線図、第６図は、第６層を
単色測光法にて制御した第６層の反射率変化図である。
Ａニガラス基材、Ｂ：空気
Ｃ：反射防止膜
１：第１層、２：第２層
３：第３層、４：第４層
５：第５層、６：第６層
７：第７層FIG. 1 is a sectional view showing the structure of the antireflection film according to the present invention, FIG. 2 is a spectral reflectance curve diagram of Examples 1 to 3, and FIG. 3 is a spectral reflectance curve of Examples 5 to 7. Figure 4 is a spectral reflectance curve diagram of Examples 9 to 11, Figure 5 is a spectral reflectance curve diagram of Examples 4, 8.12, and Figure 6 is a monochromatic spectral reflectance curve diagram of the sixth layer. FIG. 6 is a graph showing changes in reflectance of the sixth layer controlled by photometry. A Niglass base material, B: Air C: Antireflection film 1: 1st layer, 2: 2nd layer 3: 3rd layer, 4: 4th layer 5: 5th layer, 6: 6th layer 7: 7th layer layer
Claims (4)
基板上に設けられる７層構成の反射防止膜であつて基材
より数えて順に第１層、第２層とした時に以下の条件を
満足し、さらに第６層がＺｒＯ＿２、Ｔａ＿２Ｏ＿５、
Ｙ＿２Ｏ＿３との混合物からなることを特徴とする反射
防止膜； 第１層１．３８≦ｎ＿１≦１．３９ ０．０７λ＿０≦ｎ＿１ｄ＿１≦０．１４λ＿０第２層
１．６２≦ｎ＿２≦２．０５ ０．０２λ＿０≦ｎ＿２ｄ＿２≦０．０７λ＿０第３層
ｎ＿３≧１．９０ ０．０６λ＿０≦ｎ＿３ｄ＿３≦０．１０λ＿０第４層
１．３８≦ｎ＿４≦１．３９ ０．１０λ＿０≦ｎ＿４ｄ＿４≦０．１３λ＿０第５層
ｎ＿５≧１．９０ ０．０５λ＿０≦ｎ＿５ｄ＿５≦０．１０λ＿０第６層
２．０５≦ｎ＿６≦２．１５ ０．４８λ＿０≦ｎ＿６ｄ＿６≦０．５２λ＿０第７層
１．３８≦ｎ＿７≦１．３９ ０．２３λ＿０≦ｎ＿７ｄ＿７≦０．２７λ＿０但し、
λ＿０は４５０〜５５０ｎｍの範囲において選択された
設計波長、ｎｉは屈折率、ｎｉｄｉは光学的膜厚、ｉは
１〜７の整数を示す。(1) It is an antireflection film with a seven-layer structure provided on a glass substrate having a refractive index of approximately 1.5 to 1.8, and when the first layer and the second layer are counted from the base material in order, the following is shown. The sixth layer is ZrO_2, Ta_2O_5,
Anti-reflection film characterized by being made of a mixture with Y_2O_3; First layer 1.38≦n_1≦1.39 0.07λ_0≦n_1d_1≦0.14λ_0 Second layer 1.62≦n_2≦2.05 0. 02λ_0≦n_2d_2≦0.07λ_0 3rd layer n_3≧1.90 0.06λ_0≦n_3d_3≦0.10λ_0 4th layer 1.38≦n_4≦1.39 0.10λ_0≦n_4d_4≦0.13λ_0 5th layer n_5≧ 1.90 0.05λ_0≦n_5d_5≦0.10λ_0 6th layer 2.05≦n_6≦2.15 0.48λ_0≦n_6d_6≦0.52λ_0 7th layer 1.38≦n_7≦1.39 0.23λ_0≦n_7d_7 ≦0.27λ_0 However,
λ_0 is a design wavelength selected in the range of 450 to 550 nm, ni is a refractive index, nidi is an optical film thickness, and i is an integer from 1 to 7.
とを特徴とする請求項１記載の反射防止膜。(2) The antireflection film according to claim 1, wherein the first layer, the fourth layer, and the seventh layer are made of MgF_2.
ることを特徴とする請求項１または請求項２記載の反射
防止膜。(3) The antireflection film according to claim 1 or 2, wherein the second layer is made of Al_2O_3 or ZrO_2.
Ｔａ＿２Ｏ＿５、Ｙ＿２Ｏ＿３との混合物からなること
を特徴とする請求項１または請求項２または請求項３記
載の反射防止膜。(4) The third layer and the fifth layer are ZrO_2 or ZrO_2,
The antireflection film according to claim 1, 2, or 3, characterized in that it is made of a mixture of Ta_2O_5 and Y_2O_3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1342436A JP2815951B2 (en) | 1989-12-29 | 1989-12-29 | Anti-reflective coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1342436A JP2815951B2 (en) | 1989-12-29 | 1989-12-29 | Anti-reflective coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03203701A true JPH03203701A (en) | 1991-09-05 |
| JP2815951B2 JP2815951B2 (en) | 1998-10-27 |
Family
ID=18353725
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1342436A Expired - Lifetime JP2815951B2 (en) | 1989-12-29 | 1989-12-29 | Anti-reflective coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2815951B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6606196B2 (en) * | 2000-08-29 | 2003-08-12 | Hoya Corporation | Optical element having antireflection film |
| US11456094B2 (en) | 2020-03-03 | 2022-09-27 | Koa Corporation | Surface-mounted resistor |
-
1989
- 1989-12-29 JP JP1342436A patent/JP2815951B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6606196B2 (en) * | 2000-08-29 | 2003-08-12 | Hoya Corporation | Optical element having antireflection film |
| US11456094B2 (en) | 2020-03-03 | 2022-09-27 | Koa Corporation | Surface-mounted resistor |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2815951B2 (en) | 1998-10-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3359114B2 (en) | Thin film type ND filter and method of manufacturing the same | |
| US4387960A (en) | Multi-layer anti-reflection coating | |
| US4784467A (en) | Multi-layered anti-reflection coating | |
| US3829197A (en) | Antireflective multilayer coating on a highly refractive substrate | |
| JP3624082B2 (en) | Antireflection film and method for manufacturing the same | |
| JPH11264903A (en) | Antireflection film and its production | |
| JPS5860701A (en) | Reflection preventing film | |
| JPH03109503A (en) | Antireflection film of optical parts made of plastic and formation thereof | |
| JP4171362B2 (en) | Transparent substrate with antireflection film | |
| JP2002107506A (en) | Antireflection coating and optical component using the same | |
| JPH052101A (en) | Optical component | |
| JP2566634B2 (en) | Multi-layer antireflection film | |
| JPH03203701A (en) | Antireflection coating | |
| JP2001100002A (en) | Antireflection film and optical member using same | |
| JP2003098312A (en) | Antireflection film and optical device | |
| JP2815949B2 (en) | Anti-reflective coating | |
| JPS60130704A (en) | Antireflection film for plastic substrate | |
| JP2000357654A (en) | Antireflection film, optical element, aligner and electronic component | |
| JP2002267801A (en) | Antireflection film and optical member which uses the same | |
| JP2835535B2 (en) | Anti-reflection coating for optical components | |
| JP3044359B2 (en) | Optical system with multilayer anti-reflection coating | |
| JP2001051121A (en) | Polarizing filter | |
| JP2001013304A (en) | Optical parts | |
| JP2002372602A (en) | Antireflection coating and optical element using the same | |
| JP3107898B2 (en) | Optical components |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080814 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080814 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090814 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090814 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100814 Year of fee payment: 12 |
|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100814 Year of fee payment: 12 |