JPH03161962A - Semiconductor device - Google Patents

Abstract

PURPOSE:To facilitate wiring change by a method wherein, in a semiconductor device having a large scale function cell, at least one wiring is arranged so as to longitudinally or transversely traverse the cell, which wiring has not yet been used, is in contact with the outer periphery of the layout pattern of the function cell, and is not connected with the input or the output in the cell. CONSTITUTION:A longitudinal direction field line 102 and a transversal direction field line 103 for signal transmission are previously formed in a large scale cell 101. When a wiring is drawn between a function block 105 and a function block 107, a wiring 104 led out from the block 105 is coupled to the transversal direction field line 103, and connected with an arbitrary wiring at the central part where the wiring 102 and the wiring 103 intersect, thereby changing a path. In this manner, the signal transmission wiring 104 led out from the block 105 is connected with an arbitrary block out of blocks 106, 107, 108. Thereby the wiring path is minimized, and wiring change is facilitated.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a semiconductor device that has unused wiring (hereinafter referred to as a feed line) in the cells of large-scale cells, and is constituted by these large-scale cells. Regarding.

[Prior Art] In a semiconductor device constructed by combining large-scale cells, in the conventional large-scale cell, in the large-scale cell,
The wiring area for passing external signal wiring unrelated to the cell is not taken into consideration, and the cell area is designed to be as small as possible. For this reason,
It has been difficult to route wiring within a large-scale cell so that external signal lines unrelated to the cell pass through it.

[Problem to be Solved by the Invention 1] In a semiconductor device that has one function as a cell and is configured by combining functional cell blocks, wiring or wiring for data transmission between each functional cell block 202, 203, 204 is Plug-in P for control signal transmission
R20t was wired around the outside of the cell. For this reason, as the scale of each cell increases, the wiring length must become longer because the wiring must be done in a manner that avoids large-scale cells. Furthermore, since the wiring between each cell is routed, the wiring area inevitably increases, which becomes an obstacle to reducing the chip area of the semiconductor device.

On the other hand, if an attempt is made to make the wiring area as small as possible, there will be restrictions on the arrangement of cells in each functional block, and the degree of freedom in arrangement of each functional block will be lost.

Therefore, the present invention was developed to solve the above-mentioned problems, and by improving wiring efficiency, it is possible to reduce the chip area. In addition, the present invention provides a semiconductor device that allows greater flexibility in the arrangement of functional blocks.

[Means for solving the problem l] In a semiconductor device having a large-scale functional cell, at least one unused wiring that is in contact with the outer edge of the layout pattern of the functional cell and is not connected to an input or an output within the functional cell is removed. The book has a feature that the unused wiring runs vertically or crosses the functional cell.

[Example 1 Examples of the present invention will be described below. The semiconductor device of the present invention has the structure shown in FIG.

The present invention exhibits its effects by being configured on one semiconductor device. The following description concerns the feed lines between each cell block on one chip.

Vertical wide lines 10 for signal transmission within the large-scale cell 101
2 and the lateral feed II I O 3 are roughly formed. When wiring for signal transmission is drawn between certain functional blocks 105 and 107, the wiring 104 led from 105 is used as a horizontal feed line 1. 0 3 combined,
Switching is performed by connecting to an arbitrary wire at the central portion where the vertical wire 102 and the horizontal wire 103 intersect. This switching is performed by connecting feed lines on the pattern. This allows function block 105
The signal transmission wiring 104 derived from the function block 10
6, 107, and 108.

This feed line is formed of a wiring layer made of aluminum or the like. Therefore, the cell wiring area is divided into four blocks by the feed lines. Wiring between these four blocks is performed using different wiring layers. In the case of multi-layer aluminum wiring, the first layer of aluminum is used for wiring between divided wiring areas, and the second layer of aluminum is used for wiring of feed lines. Further, polysilicon can also be used as wiring between divided wiring regions.

[Effects of the Invention] A semiconductor device having a large-scale cell manufactured according to the above-described configuration of the present invention can pass a feed line within the large-scale cell, so that it is possible to pass the feed line in the large-scale cell, so that it is possible to pass the feed line in the large-scale cell. There is no need to wire to avoid this. As a result, the wiring takes the shortest route, so the wiring area can be smaller than when wiring is performed to avoid cell blocks.

Additionally, when it becomes necessary to change the wiring after placing cells in each functional block, by using the feed lines within the cell block, the wiring can be changed without reviewing the entire surrounding circuitry and wiring. It becomes possible.

Since each feed line can be connected to any feed line in the center of the large-scale cell, the degree of freedom in wiring is increased.

Nowadays, semiconductor devices are frequently constructed using large-scale cells, and each functional cell is packed with functions at a high density, making each cell larger. There is. Therefore, it is effective to reduce the wiring area of a semiconductor device by providing a large number of feed lines within a large-scale cell.

Due to the above effects, it is possible to design an efficient semiconductor device, and to provide an inexpensive semiconductor device in a short period of time.

[Brief explanation of the drawing]

FIG. 1 is a block diagram of a layout pattern of a semiconductor device according to the present invention. FIG. 2 is a block diagram of a layout pattern of a conventional semiconductor device. 101 ・ 1 0 2 ・ 1 0 3 ・ 104 ・ 1 05 ・ 106 ・ 107 ・ 108 ・ 2 0 1 ・ 2 0 2 ・ 2 0 3 ・ 2 04 ・ ...Large-scale cell, vertical feed line, horizontal feed Lines/Signal transmission wiring/Functional block cells/Functional block cells/Functional block cells/Functional block cells Data wiring between functional blocks/Functional blocks/Functional blocks...More than functional blocks

Claims (1)

[Claims] In a semiconductor device having a large-scale functional cell, there is at least one unused wiring that is in contact with the outer edge of the layout pattern of the functional cell and is not connected to an input or an output within the functional cell, and the unused wiring traverses or crosses the functional cell.