JPH0238727U - - Google Patents

Info

Publication number

JPH0238727U

JPH0238727U JP11693188U JP11693188U JPH0238727U JP H0238727 U JPH0238727 U JP H0238727U JP 11693188 U JP11693188 U JP 11693188U JP 11693188 U JP11693188 U JP 11693188U JP H0238727 U JPH0238727 U JP H0238727U

Authority

JP

Japan

Prior art keywords

coating

nozzle

coating liquid

rotary

wafer

Prior art date

1988-09-05

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 239000011248 coating agent Substances 0.000 claims description 8
• 238000000576 coating method Methods 0.000 claims description 8
• 239000007788 liquid Substances 0.000 claims description 8
• 239000002904 solvent Substances 0.000 claims description 4
• 238000001035 drying Methods 0.000 claims 1
• 239000004065 semiconductor Substances 0.000 claims 1
• 239000007921 spray Substances 0.000 claims 1
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
• 239000000377 silicon dioxide Substances 0.000 description 4
• 239000011877 solvent mixture Substances 0.000 description 1