JPH0234381B2 - - Google Patents

Info

Publication number
JPH0234381B2
JPH0234381B2 JP57085382A JP8538282A JPH0234381B2 JP H0234381 B2 JPH0234381 B2 JP H0234381B2 JP 57085382 A JP57085382 A JP 57085382A JP 8538282 A JP8538282 A JP 8538282A JP H0234381 B2 JPH0234381 B2 JP H0234381B2
Authority
JP
Japan
Prior art keywords
processing
processing liquid
plate
photosensitive material
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57085382A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58202444A (ja
Inventor
Takeshi Nakamura
Goro Tezuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP8538282A priority Critical patent/JPS58202444A/ja
Publication of JPS58202444A publication Critical patent/JPS58202444A/ja
Publication of JPH0234381B2 publication Critical patent/JPH0234381B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8538282A 1982-05-20 1982-05-20 感光材料処理装置 Granted JPS58202444A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8538282A JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8538282A JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Publications (2)

Publication Number Publication Date
JPS58202444A JPS58202444A (ja) 1983-11-25
JPH0234381B2 true JPH0234381B2 (enEXAMPLES) 1990-08-02

Family

ID=13857183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8538282A Granted JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Country Status (1)

Country Link
JP (1) JPS58202444A (enEXAMPLES)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6141249U (ja) * 1984-08-18 1986-03-15 コニカ株式会社 感光材料処理装置
US6270267B1 (en) 1997-12-22 2001-08-07 Asahi Kasei Kabushiki Kaisha Method of developing photosensitive resin plate and developing device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5366301U (enEXAMPLES) * 1976-11-05 1978-06-03
JPS54113265A (en) * 1978-02-23 1979-09-04 Mitsubishi Electric Corp Resistor developing equipement

Also Published As

Publication number Publication date
JPS58202444A (ja) 1983-11-25

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