JPH02275867A - Novel isocyanurate derivative - Google Patents
Novel isocyanurate derivativeInfo
- Publication number
- JPH02275867A JPH02275867A JP2005590A JP2005590A JPH02275867A JP H02275867 A JPH02275867 A JP H02275867A JP 2005590 A JP2005590 A JP 2005590A JP 2005590 A JP2005590 A JP 2005590A JP H02275867 A JPH02275867 A JP H02275867A
- Authority
- JP
- Japan
- Prior art keywords
- group
- weight
- parts
- product
- isocyanurate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical class OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 title abstract description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 48
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims abstract 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 10
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 9
- 150000001875 compounds Chemical class 0.000 abstract description 7
- 239000003960 organic solvent Substances 0.000 abstract description 7
- 239000003054 catalyst Substances 0.000 abstract description 4
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- 239000003607 modifier Substances 0.000 abstract description 3
- 239000000843 powder Substances 0.000 abstract description 3
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 abstract description 2
- -1 acryl Chemical group 0.000 abstract description 2
- 239000002270 dispersing agent Substances 0.000 abstract description 2
- 239000003822 epoxy resin Substances 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 229920000647 polyepoxide Polymers 0.000 abstract description 2
- 229920001225 polyester resin Polymers 0.000 abstract description 2
- 229920005989 resin Polymers 0.000 abstract description 2
- 239000011347 resin Substances 0.000 abstract description 2
- 125000001424 substituent group Chemical group 0.000 abstract description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 abstract description 2
- 229920001971 elastomer Polymers 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 description 28
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- 239000004593 Epoxy Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 238000000862 absorption spectrum Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 9
- 238000001514 detection method Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 229920002472 Starch Polymers 0.000 description 8
- 235000019698 starch Nutrition 0.000 description 8
- 239000008107 starch Substances 0.000 description 8
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 4
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000004448 titration Methods 0.000 description 3
- 239000005639 Lauric acid Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- YRIZYWQGELRKNT-UHFFFAOYSA-N 1,3,5-trichloro-1,3,5-triazinane-2,4,6-trione Chemical compound ClN1C(=O)N(Cl)C(=O)N(Cl)C1=O YRIZYWQGELRKNT-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- HENCHDCLZDQGIQ-UHFFFAOYSA-N 3-[3,5-bis(2-carboxyethyl)-2,4,6-trioxo-1,3,5-triazinan-1-yl]propanoic acid Chemical compound OC(=O)CCN1C(=O)N(CCC(O)=O)C(=O)N(CCC(O)=O)C1=O HENCHDCLZDQGIQ-UHFFFAOYSA-N 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229940090898 Desensitizer Drugs 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 102100039334 HAUS augmin-like complex subunit 1 Human genes 0.000 description 1
- 101100177185 Homo sapiens HAUS1 gene Proteins 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical class SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004440 column chromatography Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
Abstract
Description
【発明の詳細な説明】
従来、イソシアヌレート化合物としては、耐熱エナメル
等に用いられているトリス−(2−ヒドロキシエチル)
−イソシアヌレート(以下、THEICと記す)、粉体
塗料等に用いられているトリス−(2,3−エポキシプ
ロピル)−イソシアヌレート(以下、TEPrCと記す
)、トリス−(2−カルボキシエチル)−イソシアヌレ
ート(以下、TCEICと記す)、トリアリルイソシア
ヌレート、及び、トリクロロイソシアヌレート等が知ら
れている。[Detailed Description of the Invention] Conventionally, as an isocyanurate compound, tris-(2-hydroxyethyl), which is used for heat-resistant enamel, etc.
-Isocyanurate (hereinafter referred to as THEIC), tris-(2,3-epoxypropyl)-isocyanurate (hereinafter referred to as TEPrC) used in powder coatings, etc., tris-(2-carboxyethyl)- Isocyanurate (hereinafter referred to as TCEIC), triallylisocyanurate, trichloroisocyanurate, and the like are known.
イソシアヌレート化合物及びこれらを出発物質とする誘
導体の共通する特徴としては、良好な耐候性や透明性等
が挙げられ、かかる諸性質はトリアジン骨格に由来する
ものと考えられている。Common features of isocyanurate compounds and derivatives using these as starting materials include good weather resistance and transparency, and these properties are thought to be derived from the triazine skeleton.
このため、イソシアヌレート化合物及びそれらを出発物
質とする誘導体の開発は古くから行なわれて来た。For this reason, development of isocyanurate compounds and derivatives using them as starting materials has been carried out for a long time.
たとえば、THEICを出発物質とする誘導体としでは
モノカルボン酸とのエステル等の化合物があり、TCE
ICを出発物質とする誘導体としてはアルコール類との
エステル等の化合物が知られ、これらを耐熱性の可望剤
等に応用しようとする試みがあった。For example, derivatives using THEIC as a starting material include compounds such as esters with monocarboxylic acids;
As derivatives using IC as a starting material, compounds such as esters with alcohols are known, and attempts have been made to apply these to heat-resistant desensitizers and the like.
又、高い反応性を有するエポキシ化合物であるTEPr
Cを出発物質とする例も多い。In addition, TEPr, an epoxy compound with high reactivity,
There are many examples in which C is used as a starting material.
TEPICは、エポキシ化合物のなかでも、特に硬化物
の耐熱性や耐候性が優れていることはよく知られている
が溶剤溶解性が乏しいといった問題もあり、それらの解
決のため特開昭56−61374、特公昭46−374
94等に記載されているように様々なカルボン酸、アミ
ン類、メルカプタン化合物等と、TEPIC分子内に3
個存在するエポキシ基のうちの一部を反応させて新規な
エポキシ化合物を製造しようとする誘導体研究が行なわ
れていた。Among epoxy compounds, TEPIC is well known to have particularly excellent heat resistance and weather resistance when cured, but it also has the problem of poor solvent solubility. 61374, Special public service 1974-374
94, etc., various carboxylic acids, amines, mercaptan compounds, etc., and 3 in the TEPIC molecule.
Research on derivatives has been conducted in an attempt to produce new epoxy compounds by reacting some of the existing epoxy groups.
さて、分子内に3個以上のヒドロキシル基を有する多価
アルコールの如き、イソシアヌレート化合物としては、
先にあげたTHEICがこの代表的化合物であるが、T
HEICは耐熱性や耐候性が優れているといった特徴を
有するものの、結晶性が強い、融点が高い、アルコール
、水等の高極性溶剤には溶解しやすいものの通常の有機
溶剤に溶解しに(いといった性質があり、用途が限定さ
れるという問題もあった。Now, as isocyanurate compounds such as polyhydric alcohols having three or more hydroxyl groups in the molecule,
THEIC listed above is a representative compound of this type, but T
Although HEIC has excellent heat resistance and weather resistance, it has strong crystallinity, a high melting point, and although it is easily soluble in highly polar solvents such as alcohol and water, it is difficult to dissolve in ordinary organic solvents. There was also the problem that its uses were limited due to these properties.
そこで、結晶性が低く通常の有機溶剤にも溶解しやすい
多価アルコールの如き、イソシアヌレート化合物が求め
られていた。Therefore, there has been a demand for isocyanurate compounds such as polyhydric alcohols that have low crystallinity and are easily soluble in common organic solvents.
本願発明者は鋭意検討の結果、下記式(1)(式中、X
+及びX2のうちどちらか一方はR,COO基で他方は
OH基であり、Yl及びY2のうちどちらか一方はR,
COO基で他方はOH基であり、更にZ、及びZ、tの
うちどちらか一方はR,COO基で他方はOH基である
イソシアヌレート誘導体であり、R,、R2、R1はO
H基若しくは000基で置換されていてもよい炭素数1
〜20のアルキル基)で表される新規なイソシアヌレー
ト誘導体を製造することによって前記課題を解決するこ
とを見出した。As a result of intensive study, the inventor of the present application found the following formula (1) (wherein,
One of + and X2 is R, COO group and the other is OH group, and one of Yl and Y2 is R,
It is an isocyanurate derivative in which one of Z, Z, and t is an R, COO group and the other is an OH group, and R,, R2, and R1 are O
1 carbon number which may be substituted with H group or 000 group
It has been found that the above problems can be solved by producing a novel isocyanurate derivative represented by (~20 alkyl groups).
本願発明のイソシアヌレート誘導体は、結晶性はTHE
I Cよりも低くなり、一般にアモルファスとなって
、溶剤溶解性が向上することが明らかになった。The isocyanurate derivative of the present invention has crystallinity of THE
It has become clear that the I C becomes lower than that of the I C and generally becomes amorphous, thereby improving solvent solubility.
この理由は必ずしも明らかではないが、これは分子内に
有する3つの脂肪酸エステル基がその結晶性を阻害する
ためであると推察される。Although the reason for this is not necessarily clear, it is presumed that the three fatty acid ester groups in the molecule inhibit its crystallinity.
本願発明の新規なイソシアヌレート誘導体の製造法とし
ては、TEPICと、カルボン酸との反応によって得る
ことができる。The novel isocyanurate derivative of the present invention can be produced by reacting TEPIC with a carboxylic acid.
TEPICとカルボン酸との反応によって、本願発明の
新規なイソシアヌレート誘導体を製造する場合、反応条
件は通常の有機溶剤を用いて加熱して行なっても良いし
、有機溶剤を使用せずに溶融させたTEPICにカルボ
ン酸を加えて行なっても良い。When producing the novel isocyanurate derivative of the present invention by reacting TEPIC with a carboxylic acid, the reaction conditions may be heating using a common organic solvent, or melting without using an organic solvent. Alternatively, carboxylic acid may be added to TEPIC.
又、4級アンモニウム塩や、3級アミン、有機リン系化
合物といったエポキシ/カルボン酸の付加反応を促進す
る触媒を加えて行なっても良い。Further, a catalyst that promotes the addition reaction of epoxy/carboxylic acid such as a quaternary ammonium salt, a tertiary amine, or an organic phosphorus compound may be added.
更に、反応温度は特に限定しないが有機溶剤を用いて触
媒を加えて行なう場合には60−150°C位が望まし
く、有機溶剤を使用せずに溶融させたTEPICを用い
る場合には100〜200 ’C位が望ましい。Further, the reaction temperature is not particularly limited, but it is preferably about 60-150°C when the reaction is carried out using an organic solvent with the addition of a catalyst, and about 100-200°C when using TEPIC melted without using an organic solvent. 'C rank is desirable.
一般に、エポキシ基とカルボン酸の反応生成物は、式(
II)及び式(II[)の如く、OH基とエステル基の
位置の異なる2種類の異性体を生成することが知られて
いる。Generally, the reaction product of an epoxy group and a carboxylic acid has the formula (
It is known that two types of isomers having different positions of the OH group and the ester group are produced as shown in formula (II) and formula (II[).
0 〔■〕
0 〔■〕
このため、本願発明の誘導体はTEPICの3つのエポ
キシ基へのカルボン酸の付加体であるがら、1種類のカ
ルボン酸を用いても計8種類の異性体を生ずる。0 [■] 0 [■] Therefore, although the derivative of the present invention is an adduct of carboxylic acid to the three epoxy groups of TEPIC, a total of 8 types of isomers are generated even when one type of carboxylic acid is used. .
これらは高速液体クロマトグラフィー装置、カラムクロ
マトグラフィー装置、等によって分離可能ではあるが、
回収率の低いといったの問題がある。Although these can be separated using high performance liquid chromatography equipment, column chromatography equipment, etc.
There are problems with low recovery rates.
しかしながら、TEPICとカルボン酸の付加体の異性
体群は殆ど同等の性質を有するため、特に分離しなくと
も実質的には異性体混合物でも問題はない。However, since the isomers of the adduct of TEPIC and carboxylic acid have almost the same properties, there is no problem even if the isomers are a mixture even if they are not particularly separated.
請求項記載の新規なイソシアヌレート誘導体の用途とし
ては、ポリエステル、ウレタン樹脂等、ヒドロキシル基
と他の置換基との反応を利用することにより製造される
樹脂の改質、エポキシ樹脂の硬化剤、金属表面処理剤、
無機粉体の分散剤、アクリルゴムの改質剤、等があげら
れる。Applications of the novel isocyanurate derivatives described in the claims include modification of resins produced by utilizing the reaction between hydroxyl groups and other substituents such as polyester and urethane resins, curing agents for epoxy resins, and metals. surface treatment agent,
Examples include dispersants for inorganic powders and modifiers for acrylic rubber.
以下、実施例を示し、さらに詳細に説明する。Hereinafter, examples will be shown and explained in more detail.
4、実施例
〈実施例1〉
撹拌機、温度計、冷却管のついた四つロフラスコに、T
EPIC−3(口座化学工業製商品名、トリス−(2,
3−エポキシプロビル)−イソシアヌレート<TEPI
C>の高純度品)297重量部およびエチレンジクロラ
イド(以下、EDCと記す)214重量部を加え、10
0°Cにて溶解させる。4. Example <Example 1> In a four-loaf flask equipped with a stirrer, thermometer, and cooling tube, a T
EPIC-3 (trade name manufactured by Kagaku Kagaku Kogyo, Tris-(2,
3-Epoxyprobyl)-isocyanurate <TEPI
Add 297 parts by weight of high purity product of C> and 214 parts by weight of ethylene dichloride (hereinafter referred to as EDC), and
Dissolve at 0°C.
ここに、酢酸220重量部及び、反応触媒としてテトラ
メチルアンモニウムクロライド(以下、TMACと記す
)2.3重量部を加えて、EDCのリフラックス温度に
て、12時間反応させる。To this, 220 parts by weight of acetic acid and 2.3 parts by weight of tetramethylammonium chloride (hereinafter referred to as TMAC) as a reaction catalyst are added, and the mixture is reacted for 12 hours at the reflux temperature of EDC.
その後、エバポレータにてEDC及び未反応の酢酸を留
去し、水飴状の生成物を得た。Thereafter, EDC and unreacted acetic acid were distilled off using an evaporator to obtain a starch syrup-like product.
以上の方法により、X、及びXz、のうち一方はCH,
COO基であり他方はOH基であり、Y。By the above method, one of X and Xz is CH,
One is a COO group, the other is an OH group, and Y.
及びY2のうち一方は、CH,COO基であり他方はO
H基であって、かつ、Zl及びZ2のうち一方はCHI
COO基であり他方はOH基である目的物を得た。and Y2, one is CH, COO group and the other is O
H group, and one of Zl and Z2 is CHI
A target product was obtained in which one group was COO and the other was OH group.
過塩素酸滴定法によりエポキシ価を測定した結果、残留
エポキシ量は滴定法の検出限界以下であった。As a result of measuring the epoxy value by perchloric acid titration, the amount of residual epoxy was below the detection limit of titration.
島津製作所製GPCカラムH3G−15及びH3C;−
30を用いて、カラム温度40”C,溶離液テトラヒド
ロフラン、流量1.8m I 7分の条件にて、GPC
法により生成物の2%テトラヒドロフラン溶液の組成分
析を行なった結果、リテンションタイム 27.8分に
単一ピークが認められた。Shimadzu GPC columns H3G-15 and H3C;-
30, column temperature 40"C, eluent tetrahydrofuran, flow rate 1.8 m I 7 minutes, GPC
As a result of the compositional analysis of a 2% tetrahydrofuran solution of the product using the method, a single peak was observed at a retention time of 27.8 minutes.
無水酢酸処理後の逆滴定法によりOH基含有量を測定し
た結果、6.2当量/kgであり、はぼ理論値通りの結
果であった。The OH group content was measured by back titration after treatment with acetic anhydride and was found to be 6.2 equivalents/kg, which was almost in line with the theoretical value.
赤外吸収スペクトル測定の結果を表−1に示した。The results of infrared absorption spectrum measurement are shown in Table-1.
1733cm−’付近に生成したエステル化したカルボ
キシル基、3430〜3450 c m −’付近に生
成したOH基の吸収が認められた。Absorption of an esterified carboxyl group generated around 1733 cm-' and an OH group generated around 3430 to 3450 cm-' was observed.
〈実施例2〉
実施例1と同様の方法で、今度は溶剤および触媒を用い
ず、TEPIC−3297重量部を140”Cにて溶融
した後、130°Cに温度を下げて攪拌しておき、ここ
に酢酸180重量部を30分〜1時間か・けて加え、そ
の後2時間反応させる。<Example 2> In the same manner as in Example 1, this time without using a solvent or catalyst, parts by weight of TEPIC-3297 were melted at 140"C, and then the temperature was lowered to 130°C and stirred. , 180 parts by weight of acetic acid is added thereto over 30 minutes to 1 hour, and then reacted for 2 hours.
次いで温度を140℃に昇温しで、1時間反応させる。Next, the temperature was raised to 140°C and the reaction was carried out for 1 hour.
反応終了後、冷却し水飴状の生成物を得た。After the reaction was completed, the mixture was cooled to obtain a starch syrup-like product.
以上の方法により、X、およびX2のうち一方はCH,
COO基であり他方はOH基であり、Y+及びY2のう
ち一方はCH,COO基であり他方はOH基であって、
かつ、Zl及びZ2のうち一方はCH,COO基であり
他方はOH基である目的物を得た。By the above method, one of X and X2 is CH,
one is a COO group and the other is an OH group; one of Y+ and Y2 is a CH, COO group and the other is an OH group,
In addition, a target product was obtained in which one of Zl and Z2 was a CH, COO group and the other was an OH group.
エポキシ価を測定した結果、検出限界以下であった。As a result of measuring the epoxy value, it was below the detection limit.
GPC法により生成物のテトラ、ヒドロフラン溶液の組
成分析を行なった結果、リテンションタイム 27.8
分に単一ピークが認められた。As a result of the compositional analysis of the tetrahydrofuran solution of the product using the GPC method, the retention time was 27.8.
A single peak was observed at 10 min.
OH基含有量を測定した結果、6.3当量/kgであり
、はぼ理論値通りの結果であった。As a result of measuring the OH group content, it was 6.3 equivalent/kg, which was almost in line with the theoretical value.
赤外吸収スペクトル測定の結果を表−1に示した。The results of infrared absorption spectrum measurement are shown in Table-1.
1733cm−’付近に生成したエステル化したカルボ
キシル基、3430〜3450 c m −’付近に生
成したOH5の吸収が認められた。Absorption of esterified carboxyl group generated around 1733 cm-' and OH5 generated around 3430-3450 cm-' was observed.
〈実施例3〉
実施例2と同様の方法で、TEPIC−3297重量部
を140℃にて溶融した後、130°Cに温度を下げて
攪拌しておき、ここに、ラウリン酸600重量部を加え
て、温度130’Cにて2時間反応させ、その後、TM
AC3重量部を加えて、2時間反応させ、ワックス状の
生成物を得た。<Example 3> In the same manner as in Example 2, parts by weight of TEPIC-3297 were melted at 140°C, the temperature was lowered to 130°C and stirred, and 600 parts by weight of lauric acid was added thereto. In addition, the reaction was carried out at a temperature of 130'C for 2 hours, and then TM
3 parts by weight of AC was added and reacted for 2 hours to obtain a waxy product.
以上の方法により、xl及びXlのうち一方はC,、H
,、COO基であり他方はOH基であり、Y。By the above method, one of xl and Xl is C,,H
, , COO group and the other is OH group, Y.
及びY!のうち一方はCIIH!3000基であり他方
はOH5であって、かつ、Zl及びZ2のうち一方はC
+tHzzCOO基であり他方はOH基である目的物を
得た。and Y! One of them is CIIH! 3000 groups, the other is OH5, and one of Zl and Z2 is C
A target product having +tHzCOO group and the other OH group was obtained.
エポキシ価は検出限界以下であった。The epoxy value was below the detection limit.
GPC法により、生成物の2%テトラヒドロフラン溶液
の組成分析を行なった結果、リテンションタイム 25
.6分に単一ピークが認められた。As a result of analyzing the composition of a 2% tetrahydrofuran solution of the product using the GPC method, the retention time was 25.
.. A single peak was observed at 6 minutes.
01−1基含有量を測定した結果、3.3当!/kgで
あり、はぼ理論値通りの結果であった。As a result of measuring the 01-1 group content, it was 3.3! /kg, which was in line with the theoretical value.
赤外吸収スペクトル測定の結果を表−1に示した。The results of infrared absorption spectrum measurement are shown in Table-1.
1738cm−’付近に生成したエステル化したカルボ
キシル基、3430〜3450 c m −’付近に生
成したOH基の吸収が認められた。Absorption of an esterified carboxyl group generated around 1738 cm-' and an OH group generated around 3430-3450 cm-' was observed.
〈実施例4〉
実施例2と同様の方法で、TEPIC−3297重量部
を140″Cにて溶融した後、ステアリン酸852重量
部を加えて、温度140℃にて2時間反応させ、その後
TMAC3重量部を加えて2時間反応させ、ワックス状
の生成物を得た。<Example 4> In the same manner as in Example 2, parts by weight of TEPIC-3297 were melted at 140"C, 852 parts by weight of stearic acid was added, and the mixture was reacted at a temperature of 140°C for 2 hours, and then TMAC3 Parts by weight were added and reacted for 2 hours to obtain a waxy product.
以上の方法により、X、及びX、のうち一方はCIt
H3s COO基であり他方はOH基であり、Yl及び
Y2のうち一方はC,、H,COO基であり他方はOH
基であって、かつ、Zl及びZ2のうち一方はCI?H
ユ、000基であり他方はOH基である目的物を得た。By the above method, one of X and X is CIt
H3s is a COO group and the other is an OH group, and one of Yl and Y2 is a C,,H,COO group and the other is an OH group.
group, and one of Zl and Z2 is CI? H
A target product was obtained in which one of the two groups was Y, 000 and the other was an OH group.
エポキシ価は検出限界以下であった。The epoxy value was below the detection limit.
GPC法により、生成物の2%テトラヒドロフラン溶液
の組成分析を行なった結果、リテンションタイム 24
.8分に単一ピークが認められた。As a result of analyzing the composition of a 2% tetrahydrofuran solution of the product using the GPC method, the retention time was 24.
.. A single peak was observed at 8 minutes.
OH基含有量を測定した結果、2.5当量/kgであり
、はぼ理論値通りの結果であった。The OH group content was measured to be 2.5 equivalents/kg, which was in line with the theoretical value.
赤外吸収スペクトル測定の結果を表−1に示した。The results of infrared absorption spectrum measurement are shown in Table-1.
1739cm−’(ず近に生成したエステル化したカル
ボキシル基、3430〜3450 c m −’付近に
生成したOH基の吸収が認められた。Absorption of an esterified carboxyl group generated near 1739 cm-' and an OH group generated near 3430 to 3450 cm-' was observed.
〈実施例5〉
実施例2と同様の方法で、TEP I C−3297重
量部を140°Cにて溶融した後、110℃に温度を下
げて攪拌しておき、カプロン酸348重量部を加えて、
3時間反応させ、その後TMAC3重量部を加えて、温
度130°Cにて2時間反応させ、水飴状の生成物を得
た。<Example 5> In the same manner as in Example 2, parts by weight of TEP I C-3297 were melted at 140°C, the temperature was lowered to 110°C and stirred, and 348 parts by weight of caproic acid was added. hand,
The mixture was reacted for 3 hours, and then 3 parts by weight of TMAC was added, and the reaction was continued for 2 hours at a temperature of 130°C to obtain a starch syrup-like product.
以上の方法により、X、及びX2のうち一方はCs H
+ r COO基であり他方はOH基であり、Yl及び
Ytのうち一方はCs Hl+ COO基であり他方は
OH基であって、かつ、ZlおよびZ2のうち一方はC
,H,、COO基であり他方はOH基である目的物を得
た。By the above method, one of X and X2 is Cs H
+r is a COO group and the other is an OH group, one of Yl and Yt is a Cs Hl+ COO group and the other is an OH group, and one of Zl and Z2 is a C
, H,, a target product was obtained in which one group was COO and the other was OH group.
エポキシ価は検出限界以下であった。The epoxy value was below the detection limit.
GPC法により、生成物の2%テトラヒドロフラン溶液
の組成分析を行なった結果、リテンションタイム 26
.8分に単一ピークが認められた。As a result of analyzing the composition of a 2% tetrahydrofuran solution of the product using the GPC method, the retention time was 26.
.. A single peak was observed at 8 minutes.
OH基含有量を測定した結果、4.5当量/kgであり
、はぼ理論値通りの結果であった。The OH group content was measured to be 4.5 equivalents/kg, which was in line with the theoretical value.
赤外吸収スペクトル測定の結果を表−1に示した。The results of infrared absorption spectrum measurement are shown in Table-1.
1739cm”付近に生成したエステル化したカルボキ
シル基、3430〜3450 c m −’付近に生成
したOH基の吸収が認められた。Absorption of an esterified carboxyl group generated around 1739 cm'' and an OH group generated around 3430 to 3450 cm-' was observed.
〈実施例6〉
実施例2と同様の方法で、TEP I C−3297重
量部を140°Cにて溶融した後、110°Cに温度を
下げて攪拌しておき、プロピオン酸222重量部を加え
て3時間反応させ、その後TMAC3重量部を加えて温
度130℃にて2時間反応させ、水飴状の生成物を得た
。<Example 6> In the same manner as in Example 2, parts by weight of TEP I C-3297 were melted at 140°C, the temperature was lowered to 110°C and stirred, and 222 parts by weight of propionic acid was melted. After that, 3 parts by weight of TMAC was added and the reaction was continued for 2 hours at a temperature of 130° C. to obtain a starch syrup-like product.
以上の方法により、XI及びXオのうち一方はC,l(
、COO基であり他方はOH基であり、Y。By the above method, one of XI and XO is converted to C, l(
, one is a COO group, the other is an OH group, and Y.
及びY2のうち一方はCz Hs C00基であり他方
はOH基であって、かつ、Zl及びZオのうち一方はC
,H,COO基であり他方はOH基である目的物を得た
。and Y2, one is a Cz Hs C00 group and the other is an OH group, and one of Zl and ZO is C
, H, COO groups and the other one was an OH group.
エポキシ価は検出限界以下であった。The epoxy value was below the detection limit.
OH基含有量を測定した結果、5.7当量/kgであり
、はぼ理論値通りの結果であった。The OH group content was measured to be 5.7 equivalents/kg, which was in line with the theoretical value.
赤外吸収スペクトル測定の結果を表−1に示した。The results of infrared absorption spectrum measurement are shown in Table-1.
1735cm−1付近に生成したエステル化したカルボ
キシル基、3430〜3450cm−’付近に生成した
OH基の吸収が認められた。Absorption of an esterified carboxyl group generated around 1735 cm-1 and an OH group generated around 3430 to 3450 cm-' was observed.
〈実施例7〉
実施例2と同様の方法で、TEP I C−3297重
量部を140°Cにて溶融した後、110°Cに温度を
下げて攪拌しておき、カプリル酸432重量部を加えて
3時間反応させ、その後TMAC3ii量部を加えて温
度130°Cにて2時間反応させ、水飴状の生成物を得
た。<Example 7> In the same manner as in Example 2, parts by weight of TEP I C-3297 were melted at 140°C, the temperature was lowered to 110°C and stirred, and 432 parts by weight of caprylic acid was melted. The mixture was added and reacted for 3 hours, and then 3 parts of TMAC was added and reacted for 2 hours at a temperature of 130°C to obtain a starch syrup-like product.
以上の方法により、xl及びX2のうち一方はC1H1
sC00基であり他方はOH基であり、Y。By the above method, one of xl and X2 is C1H1
sC00 group, the other is OH group, and Y.
及びY2のうち一方はC,H,、COO基であり他方は
OH基であって、かつ、Zl及びZtのうち一方はC?
Hr s C00基であり他方はOH基である目的物
を得た。and Y2, one is a C, H,, COO group, the other is an OH group, and one of Zl and Zt is C?
A target product was obtained in which one of the Hr s C00 groups and the other one was an OH group.
エポキシ価は検出限界以下であった。The epoxy value was below the detection limit.
OH基含有量を測定した結果、4.0当量/kgであり
、はぼ理論値通りの結果であった。As a result of measuring the OH group content, it was 4.0 equivalent/kg, which was almost in line with the theoretical value.
赤外吸収スペクトル測定の結果を表=1に示した。The results of infrared absorption spectrum measurement are shown in Table 1.
1739cm−’付近に生成したエステル化したカルボ
キシル基、3430〜3450 c m −’付近に生
成したOH基の吸収が認められた。Absorption of an esterified carboxyl group generated around 1739 cm-' and an OH group generated around 3430-3450 cm-' was observed.
〈実施例8〉
実施例2と同様の方法で、mEPIc−375重量部を
140°Cにて溶融した後、160°Cに昇温し、ここ
にラウリン酸5重量部を加えて温度160°Cにて3時
間反応させる。<Example 8> In the same manner as in Example 2, parts by weight of mEPIc-375 were melted at 140°C, the temperature was raised to 160°C, 5 parts by weight of lauric acid was added thereto, and the temperature was raised to 160°C. React at C for 3 hours.
次いで、酢酸エチル200重量部を加えて室温にて攪拌
しながら洗浄した後、未反応のTEP I Cをろ別す
る。Next, 200 parts by weight of ethyl acetate was added and washed at room temperature with stirring, and unreacted TEP I C was filtered off.
得られたろ液より、溶剤を減圧留去しワックス状の生成
物19.63重量部を得た。From the obtained filtrate, the solvent was distilled off under reduced pressure to obtain 19.63 parts by weight of a waxy product.
次に、かかるワックス状の生成物 10重量部と酢酸4
重量部を温度110″Cにて2時間、更に温度140℃
にて1時間反応させる。Next, 10 parts by weight of such waxy product and 4 parts by weight of acetic acid
The weight part was heated to 110″C for 2 hours, and then further heated to 140°C.
Allow to react for 1 hour.
得られた水飴状生成物を、酢酸エチル 50重量部に溶
解し、分液ろうとを用いて、十分水洗して未反応の酢酸
及びワックス状の生成物に残留していたTEPICと酢
酸との反応生成物を除去した。The obtained starch syrup-like product was dissolved in 50 parts by weight of ethyl acetate, and washed thoroughly with water using a separating funnel to react the unreacted acetic acid and TEPIC remaining in the wax-like product with acetic acid. Product was removed.
その後、溶剤を減圧留去し、水飴状の生成物を得た。Thereafter, the solvent was distilled off under reduced pressure to obtain a starch syrup-like product.
以上の゛方法により、Xl及びX2のうち一方はCr
r Ht 2 COO基であり他方はOH基であり、Y
。By the above method, one of Xl and X2 is made of Cr.
r Ht 2 is a COO group, the other is an OH group, and Y
.
及びY:のうち一方はCH,COO基であり他方はOH
基であって、かつ、Zl及びZ!のうち一方はCH,C
OO基であり他方はOH基である目的物を得た。and Y: one is CH, COO group and the other is OH
a group, and Zl and Z! One of them is CH, C
A target product was obtained in which one was an OO group and the other was an OH group.
エポキシ価は検出限界以下であった。The epoxy value was below the detection limit.
OH基含有量を測定した結果、4.1当量/ k gで
あり、はぼ理論値通りの結果であった。As a result of measuring the OH group content, it was 4.1 equivalent/kg, which was almost in line with the theoretical value.
赤外吸収スペクトル測定の結果を表−1に示した。The results of infrared absorption spectrum measurement are shown in Table-1.
1738cm−’付近に生成したエステル化したカルボ
キシル基、3430〜3450 c m −’付近に生
成したOH基の吸収が認められた。Absorption of an esterified carboxyl group generated around 1738 cm-' and an OH group generated around 3430-3450 cm-' was observed.
〈実施例9〉
実施例2と同様の方法で、TEPIC−3297重量部
を140℃にて溶融した後、130″Cに温度を下げて
攪拌しておき、乳酸270重量部を加えて、温度130
°Cにて2時間反応させ、そ、の後TMAC1,5重量
部を加えて1時間反応させ、水飴状の生成物を得た。<Example 9> In the same manner as in Example 2, parts by weight of TEPIC-3297 were melted at 140°C, the temperature was lowered to 130″C and stirred, 270 parts by weight of lactic acid was added, and the temperature was lowered. 130
The mixture was allowed to react at °C for 2 hours, and then 1.5 parts by weight of TMAC was added and allowed to react for 1 hour to obtain a starch syrup-like product.
以上の方法により、XI及びX2のうち一方はCI?
Hss COO基であり他方はOH基であり、Yl及び
Yつのうち一方はCH,COO基であり他方はOH5で
あって、かつ、Zl及びz2のうち一方はCH,COO
基であり他方はOH基である目的物を得た。By the above method, one of XI and X2 is CI?
Hss is a COO group and the other is an OH group, one of Yl and Y is a CH, COO group and the other is OH5, and one of Zl and z2 is CH, COO
The target product was obtained in which one group was one group and the other was an OH group.
エポキシ価は検出限界以下であった。The epoxy value was below the detection limit.
OH基含有量を測定した結果、10.7当量/kgであ
り、はぼ理論値通りの結果であった。As a result of measuring the OH group content, it was 10.7 equivalent/kg, which was almost in line with the theoretical value.
赤外吸収スペクトル測定の結果を表−1に示した。The results of infrared absorption spectrum measurement are shown in Table-1.
1743cm−’付近に生成したエステル化したカルボ
キシル基、3430〜3450cm−1付近に生成した
OH基の吸収が認められた。Absorption of an esterified carboxyl group generated around 1743 cm-' and an OH group generated around 3430 to 3450 cm-1 was observed.
表−1赤外吸収スペクトルTable-1 Infrared absorption spectrum
Claims (1)
COO基で他方はOH基であり、Y_1及びY_2のど
ちらか一方はR_2COO基で他方はOH基であり、更
にZ_1及びZ_2のうちどちらか一方はR_3COO
基で他方はOH基であるイソシアヌレート誘導体であり
、R_1、R_2、R_3はOH基若しくはCOOH基
で置換されていてもよい炭素数1〜20のアルキル基) で表される新規なイソシアヌレート誘導体。[Claims] The following general formula▲ includes mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, one of X_1 and X_2 is R_1
One of Y_1 and Y_2 is an R_2COO group and the other is an OH group, and one of Z_1 and Z_2 is an R_3COO group.
and the other is an OH group, and R_1, R_2, and R_3 are alkyl groups having 1 to 20 carbon atoms which may be substituted with an OH group or a COOH group. .
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1-21373 | 1989-01-31 | ||
JP2137389 | 1989-01-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02275867A true JPH02275867A (en) | 1990-11-09 |
JP2876678B2 JP2876678B2 (en) | 1999-03-31 |
Family
ID=12053290
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005590A Expired - Fee Related JP2876678B2 (en) | 1989-01-31 | 1990-01-30 | Method for producing isocyanurate derivative |
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---|---|
JP (1) | JP2876678B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000128871A (en) * | 1998-08-20 | 2000-05-09 | Nissan Chem Ind Ltd | Production of isocyanurate derivative |
WO2006009118A1 (en) * | 2004-07-21 | 2006-01-26 | Nissan Chemical Industries, Ltd. | Heat-resistant water-soluble flux composition for soldering |
WO2006035641A1 (en) * | 2004-09-29 | 2006-04-06 | Nissan Chemical Industries, Ltd. | Modified epoxy resin composition |
JP2009107979A (en) * | 2007-10-31 | 2009-05-21 | Japan Epoxy Resin Kk | Method for producing carboxylic acid-modified triglycidyl isocyanurate, epoxy resin composition, and cured product of epoxy resin |
CN101935307A (en) * | 2009-05-20 | 2011-01-05 | 罗门哈斯电子材料有限公司 | The coating composition that uses with outer resist coating |
TWI563006B (en) * | 2015-12-31 | 2016-12-21 | Ind Tech Res Inst | Curable resin and curing composition comprising the same |
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JP5298411B2 (en) * | 2006-08-14 | 2013-09-25 | 三菱化学株式会社 | Epoxy resin composition and use thereof |
-
1990
- 1990-01-30 JP JP2005590A patent/JP2876678B2/en not_active Expired - Fee Related
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000128871A (en) * | 1998-08-20 | 2000-05-09 | Nissan Chem Ind Ltd | Production of isocyanurate derivative |
JP4502086B2 (en) * | 1998-08-20 | 2010-07-14 | 日産化学工業株式会社 | Process for producing isocyanurate derivatives |
WO2006009118A1 (en) * | 2004-07-21 | 2006-01-26 | Nissan Chemical Industries, Ltd. | Heat-resistant water-soluble flux composition for soldering |
US8900376B2 (en) | 2004-07-21 | 2014-12-02 | Nissan Chemical Industries, Ltd. | Heat-resistant water-soluble flux composition for soldering |
WO2006035641A1 (en) * | 2004-09-29 | 2006-04-06 | Nissan Chemical Industries, Ltd. | Modified epoxy resin composition |
US9598528B2 (en) | 2004-09-29 | 2017-03-21 | Nissan Chemical Industries, Ltd. | Modified epoxy resin composition |
JP2009107979A (en) * | 2007-10-31 | 2009-05-21 | Japan Epoxy Resin Kk | Method for producing carboxylic acid-modified triglycidyl isocyanurate, epoxy resin composition, and cured product of epoxy resin |
CN101935307A (en) * | 2009-05-20 | 2011-01-05 | 罗门哈斯电子材料有限公司 | The coating composition that uses with outer resist coating |
TWI563006B (en) * | 2015-12-31 | 2016-12-21 | Ind Tech Res Inst | Curable resin and curing composition comprising the same |
CN106928429A (en) * | 2015-12-31 | 2017-07-07 | 财团法人工业技术研究院 | Curable resin and cured composition containing the same |
CN106928429B (en) * | 2015-12-31 | 2019-09-27 | 财团法人工业技术研究院 | Curable resin and cured composition containing the same |
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