JPH02254614A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPH02254614A
JPH02254614A JP7721389A JP7721389A JPH02254614A JP H02254614 A JPH02254614 A JP H02254614A JP 7721389 A JP7721389 A JP 7721389A JP 7721389 A JP7721389 A JP 7721389A JP H02254614 A JPH02254614 A JP H02254614A
Authority
JP
Japan
Prior art keywords
insulating film
film
size
coil
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7721389A
Other languages
Japanese (ja)
Other versions
JPH081689B2 (en
Inventor
Kiyotaka Shimabayashi
嶋林 清孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP7721389A priority Critical patent/JPH081689B2/en
Publication of JPH02254614A publication Critical patent/JPH02254614A/en
Publication of JPH081689B2 publication Critical patent/JPH081689B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To facilitate a patterning and to stabilize a yield by making an insulating film to cover a most upper coil among coils with plural layers into a duplex structure and executing the formation so that the size of the insulating film of the upper layer of the insulating film can be made larger than the size of the insulating film to cover a most lower layer coil and smaller than the size of the insulating film just under the most lower layer coil. CONSTITUTION:A third insulating film 9 and a fourth insulating film 10 are laminated, an upper magnetic film 11 and a protecting film 12 are successively laminated on them, and thereby, the formation is executed. The size of the fourth insulating film 10 is made smaller than the size of a first insulating film 5 and larger than the size of a second insulating film 7. Consequently, since the fourth insulating film 10 is formed on the third insulating film 9, the stage difference of the insulating films with three layers composed of the first insulating film 5, second insulating film 7 and third insulating film 9 can be solved, and a smooth surface is made. Thus, a ruggedness does not exist in the upper magnetic film 11, an electromagnetic conversion characteristic is made excellent, the patterning is made facilitated, and the yield is stabilized.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はm*11気ヘッドにIIIする。[Detailed description of the invention] (Industrial application field) The present invention applies to m*11 air heads.

〔従来の技術〕[Conventional technology]

従来の簿膜磁気ヘッドは、第2図に示すように、磁気へ
ラドスライダを構成する塞板1上に下部絶縁WA2、上
部磁性膜3、ギャップ膜4、第1絶縁WA5、スパイラ
ル型の第1コイル6、第2絶縁膜7、スパイラル型の第
2コイル8、第3絶縁膜13、上部磁性1I21、保I
!膜22を順次積層することにより形成されている。
As shown in FIG. 2, the conventional film magnetic head has a lower insulating WA2, an upper magnetic film 3, a gap film 4, a first insulating WA5, and a spiral-type first Coil 6, second insulating film 7, spiral type second coil 8, third insulating film 13, upper magnetic 1I21, holding I
! It is formed by sequentially stacking films 22.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来の薄膜磁気ヘッドは、第1絶縁膜5、第2
絶縁膜7、第3絶縁膜13と順次積層された構造となっ
ているので、これら3層の絶縁膜の側面はそれぞれの絶
縁膜の境界が段差を生じる。
The conventional thin film magnetic head described above has a first insulating film 5 and a second insulating film 5.
Since the structure is such that the insulating film 7 and the third insulating film 13 are sequentially laminated, a step is formed at the boundary between the respective insulating films on the sides of these three insulating films.

すなわち、これら3層の絶縁膜の上に上部磁性膜11が
形成されるので、上記段差はそのまま上部磁性膜11に
反映されるため、上部磁性膜11は凹凸の激しい形状と
なり、31111磁気ヘツドの?!磁a換特性を著しく
悪化させる結果となる。
That is, since the upper magnetic film 11 is formed on top of these three layers of insulating films, the above-mentioned step difference is directly reflected on the upper magnetic film 11, so the upper magnetic film 11 has a highly uneven shape, which makes the 31111 magnetic head ? ! This results in a significant deterioration of magnetic a exchange characteristics.

これを解決する手段として、例えば特開昭62−・42
311がある。しかしながら、本例では第2コイルの最
外周部が第3絶縁膜で十分に被覆できず、上部磁性膜と
第2コイルの最外周部とが電気的に短絡する危険性があ
る。また、電磁変換特性に重大な影響を与えるギャップ
深さ0の位置が第3絶縁膜で決定されるため、第3絶縁
膜のパタニング精度が非常に厳しく歩回りの悪いものと
なる。
As a means to solve this problem, for example, Japanese Patent Laid-Open No. 62-42
There is 311. However, in this example, the outermost portion of the second coil cannot be sufficiently covered with the third insulating film, and there is a risk that the upper magnetic film and the outermost portion of the second coil may be electrically short-circuited. Further, since the position of the gap depth 0, which has a significant influence on the electromagnetic conversion characteristics, is determined by the third insulating film, the patterning accuracy of the third insulating film is extremely severe and the yield is poor.

以上のように従来の111m磁気ヘッドは、電磁変換特
性が悪く、磁性膜とコイルとの短絡のおそれがあり、か
つ製品の歩留りが低いという欠点がある。
As described above, the conventional 111m magnetic head has the disadvantages of poor electromagnetic conversion characteristics, the risk of short circuit between the magnetic film and the coil, and low product yield.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の薄膜磁気ヘッドは、複数層のコイルのうちの最
上層コイルを被覆する絶縁膜は二重構造とされ、また該
絶縁膜の上層の絶縁膜の大きさが最下層コイルを被覆し
ている絶縁膜の大きさより大きく、かつ該最下層コイル
の直下の絶縁膜の大きさより小さく形成されている。
In the thin film magnetic head of the present invention, the insulating film covering the uppermost layer of the plurality of coils has a double structure, and the size of the upper insulating film is larger than that of the lowermost coil. The coil is formed to be larger in size than the insulating film located therein, and smaller than the insulating film immediately below the lowermost layer coil.

(作用) 最上層コイルを被覆する絶縁膜が二重構造になっており
、その絶縁膜の上層の絶縁膜の大きさが最下層コイルを
被覆している絶縁膜の大きさより大きく、かつ最下層コ
イルの直下の絶縁膜の大きさより小さいので、コイルを
被覆している各絶縁膜による段差が影響せずに平滑な上
部磁性膜が得られて電磁変換特性が悪化せず、また上部
磁性膜と最上層コイルの最外周部との電気的短絡のおそ
れがなく、かつ、ギャップ深さOの位置が最下層コイル
直下の絶縁膜で決定されるのでバターニングが容易で歩
留りが悪化しない。
(Function) The insulating film covering the top layer coil has a double structure, and the size of the upper layer of the insulating film is larger than the size of the insulating film covering the bottom layer coil, and Since the size is smaller than the size of the insulating film directly under the coil, a smooth upper magnetic film is obtained without being affected by the difference in level caused by each insulating film covering the coil, and the electromagnetic conversion characteristics are not deteriorated. There is no fear of electrical short circuit with the outermost circumferential portion of the top layer coil, and since the position of the gap depth O is determined by the insulating film directly under the bottom layer coil, patterning is easy and yield does not deteriorate.

(実施例) 次に、本発明の実施例について図面を参照して説明する
(Example) Next, an example of the present invention will be described with reference to the drawings.

第1図は本発明の薄膜磁気ヘッドの一実施例の断面図で
ある。
FIG. 1 is a sectional view of an embodiment of the thin film magnetic head of the present invention.

この薄膜磁気ヘッドは第2図のWJWA磁気ヘッドの第
3絶縁!1113の代りに第3絶縁l1lI9と、第4
絶縁rI410が積層され、その上に上部磁性膜11、
保:!11112が順次積層されることにより形成され
ている。第4絶縁膜10の大きさは第1絶縁膜5の大き
さよりも小さく、第2絶縁117の大きさより大きくさ
れている。
This thin film magnetic head is the third insulator of the WJWA magnetic head shown in Figure 2! 1113 instead of the third insulator l1lI9 and the fourth insulator
An insulating rI 410 is laminated, on which an upper magnetic film 11,
Tamotsu:! 11112 are sequentially laminated. The size of the fourth insulating film 10 is smaller than the size of the first insulating film 5 and larger than the size of the second insulating film 117.

本実施例の薄膜磁気ヘッドでは第3絶縁11169の上
に第4絶縁膜10が形成されているため第1絶縁II5
.第2絶縁117.第3絶縁膜9よりなる3層の絶縁膜
の段差が解消され滑らかな面となっている。したがって
、上部磁性1111に凹凸は存在せず、電磁変換特性の
すぐれた薄plA磁気ヘッドが提供される。また、第2
コイル8が第3絶縁膜9と第4絶縁11110との2層
の絶縁膜で被覆されているため、第2コイル8の最外周
部14と上部磁気膜11が電気的に短絡することも全く
ない。さらに、第4絶縁1110の大きさを第1絶縁1
!5より小さく第2絶縁躾7より大きくしているので、
ギャップ深さOの位置は従来と同じく第1絶縁膜5で決
定されるので歩留りを悪化させることもない。
In the thin film magnetic head of this embodiment, since the fourth insulating film 10 is formed on the third insulating film 11169, the first insulating film II5
.. Second insulation 117. The step difference between the three layers of the third insulating film 9 is eliminated, resulting in a smooth surface. Therefore, there is no unevenness in the upper magnetic layer 1111, and a thin PLA magnetic head with excellent electromagnetic conversion characteristics is provided. Also, the second
Since the coil 8 is covered with two layers of insulating film, that is, the third insulating film 9 and the fourth insulating film 11110, there is no possibility of an electrical short circuit between the outermost peripheral part 14 of the second coil 8 and the upper magnetic film 11. do not have. Furthermore, the size of the fourth insulator 1110 is changed to the size of the first insulator 1110.
! Since the second insulation value is smaller than 5 and larger than 7,
Since the position of the gap depth O is determined by the first insulating film 5 as in the conventional case, the yield will not be deteriorated.

(発明の効果) 以上説明したように本発明は、最上層コイルを被覆する
絶縁膜の構造を二層構造とし、また、この絶縁膜の上層
の絶縁膜の大きさを最下層コイルを被覆する絶縁膜の大
きさよりも大きく、かつ最下層コイル直下の絶RIIよ
り小さくすることにより、コイルを被覆している各絶縁
膜による段差が上部磁性膜に影響を与えないのですぐれ
た電磁変換特性が得られ、また、上部磁性膜と最上層コ
イルの最外周部との電気的短絡のおそれがなく、かつ、
ギャップ深さ0の位置が最下層コイル直下の絶B13で
決定されるのでパターニングが容易で歩留りが安定する
という効果がある。
(Effects of the Invention) As explained above, the present invention has a two-layer structure for the insulating film that covers the uppermost coil, and the size of the upper insulating film that covers the lowermost coil. By making the size of the insulating film larger than the size of the insulating film and smaller than the absolute RII directly under the lowest coil, the difference in level caused by each insulating film covering the coil will not affect the upper magnetic film, resulting in excellent electromagnetic conversion characteristics. and there is no risk of electrical short circuit between the upper magnetic film and the outermost periphery of the uppermost layer coil, and
Since the position of the gap depth 0 is determined by the gap B13 directly below the lowest layer coil, patterning is easy and the yield is stable.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の薄膜磁気ヘッドの一実施例の断面図、
第2図は薄vAIt&気ヘッドの従来例の断面図である
。 1・・・基板、2・・・下部絶縁膜、3・・・下部磁性
膜、4・・・ギャップ膜、5・・・第1絶縁膜、6・・
・第1コイル、7・・・第2絶縁膜、8・・・第2コイ
ル、9・・・第3絶縁膜、10・・・第4絶縁膜、11
・・・上部磁性膜、12・・・保護膜、14・・・最外
周部。
FIG. 1 is a sectional view of an embodiment of the thin film magnetic head of the present invention.
FIG. 2 is a sectional view of a conventional example of a thin vAIt&air head. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Lower insulating film, 3... Lower magnetic film, 4... Gap film, 5... First insulating film, 6...
・First coil, 7... Second insulating film, 8... Second coil, 9... Third insulating film, 10... Fourth insulating film, 11
. . . Upper magnetic film, 12 . . . Protective film, 14 . . . Outermost peripheral portion.

Claims (1)

【特許請求の範囲】 1、基板上に下部磁性膜、ギャップ膜、複数層のコイル
、絶縁膜、上部磁性膜等が順次積層されて形成される薄
膜磁気ヘッドにおいて、 前記コイルのうちの最上層コイルを被覆する絶縁膜は二
重構造とされ、また該絶縁膜の上層の絶縁膜の大きさが
最下層コイルを被覆している絶縁膜の大きさより大きく
、かつ該最下層コイルの直下の絶縁膜の大きさより小さ
く形成されていることを特徴とする薄膜磁気ヘッド。
[Claims] 1. In a thin film magnetic head formed by sequentially laminating a lower magnetic film, a gap film, a plurality of coil layers, an insulating film, an upper magnetic film, etc. on a substrate, the uppermost layer of the coil The insulating film covering the coil has a double structure, and the size of the insulating film on the upper layer of the insulating film is larger than the size of the insulating film covering the lowest layer coil, and the insulating film directly below the lowest layer coil is A thin film magnetic head characterized by being formed smaller than the size of the film.
JP7721389A 1989-03-28 1989-03-28 Thin film magnetic head Expired - Lifetime JPH081689B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7721389A JPH081689B2 (en) 1989-03-28 1989-03-28 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7721389A JPH081689B2 (en) 1989-03-28 1989-03-28 Thin film magnetic head

Publications (2)

Publication Number Publication Date
JPH02254614A true JPH02254614A (en) 1990-10-15
JPH081689B2 JPH081689B2 (en) 1996-01-10

Family

ID=13627556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7721389A Expired - Lifetime JPH081689B2 (en) 1989-03-28 1989-03-28 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPH081689B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03156714A (en) * 1989-08-23 1991-07-04 Hitachi Ltd Thin-film magnetic head and production thereof
US6400527B1 (en) 1998-11-13 2002-06-04 Alps Electric Co., Ltd. Thin film magnetic head having upper core layer with narrow track width

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03156714A (en) * 1989-08-23 1991-07-04 Hitachi Ltd Thin-film magnetic head and production thereof
US6400527B1 (en) 1998-11-13 2002-06-04 Alps Electric Co., Ltd. Thin film magnetic head having upper core layer with narrow track width

Also Published As

Publication number Publication date
JPH081689B2 (en) 1996-01-10

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