JPH02236406A - Method for inspecting mask pattern - Google Patents

Method for inspecting mask pattern

Info

Publication number
JPH02236406A
JPH02236406A JP5815289A JP5815289A JPH02236406A JP H02236406 A JPH02236406 A JP H02236406A JP 5815289 A JP5815289 A JP 5815289A JP 5815289 A JP5815289 A JP 5815289A JP H02236406 A JPH02236406 A JP H02236406A
Authority
JP
Japan
Prior art keywords
mask pattern
references
areas
pattern
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5815289A
Other languages
Japanese (ja)
Other versions
JPH0820231B2 (en
Inventor
Katsuji Tawara
Satoru Akutagawa
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1058152A priority Critical patent/JPH0820231B2/en
Publication of JPH02236406A publication Critical patent/JPH02236406A/en
Priority claimed from US07/989,459 external-priority patent/US5287290A/en
Publication of JPH0820231B2 publication Critical patent/JPH0820231B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE: To shorten time required for inspecting a mask pattern and to improve the processing efficiency of an inspection device by setting a defect detection reference corresponding to the design pattern references of respective mask pattern areas every inspection objective area.
CONSTITUTION: The mask pattern 11 has two or more mask pattern areas A1 - An and the design pattern references R1 - Rn of the respective mask pattern areas A1 - An are different. Then, the respective mask pattern areas A1 - An are decided as the inspection objective areas B1 - Bn and the defect detection references ε1 - εn corresponding to the design pattern references R1 - Rn of the respective mask pattern areas A1 - An are set every inspection objective area B1 - Bn. Based on the defect detection references ε1 - εn, the defect of the mask pattern 11 is detected every inspection objective area B1 - Bn.
COPYRIGHT: (C)1990,JPO&Japio
JP1058152A 1989-03-10 1989-03-10 Mask pattern inspection method Expired - Fee Related JPH0820231B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1058152A JPH0820231B2 (en) 1989-03-10 1989-03-10 Mask pattern inspection method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1058152A JPH0820231B2 (en) 1989-03-10 1989-03-10 Mask pattern inspection method
US07/989,459 US5287290A (en) 1989-03-10 1992-12-10 Method and apparatus for checking a mask pattern

Publications (2)

Publication Number Publication Date
JPH02236406A true JPH02236406A (en) 1990-09-19
JPH0820231B2 JPH0820231B2 (en) 1996-03-04

Family

ID=13076018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1058152A Expired - Fee Related JPH0820231B2 (en) 1989-03-10 1989-03-10 Mask pattern inspection method

Country Status (1)

Country Link
JP (1) JPH0820231B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002532760A (en) * 1998-12-17 2002-10-02 ケーエルエー−テンカー コーポレイション Mechanisms for manufacturing and inspecting reticles
JP2007536560A (en) * 2003-07-03 2007-12-13 ケーエルエー−テンカー テクノロジィース コーポレイション Wafer and reticle inspection methods and systems using designer intent data

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61176807A (en) * 1985-02-01 1986-08-08 Hitachi Ltd Inspection of pattern
JPS61273088A (en) * 1985-05-29 1986-12-03 Hitachi Ltd Inspection method for surface pattern

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61176807A (en) * 1985-02-01 1986-08-08 Hitachi Ltd Inspection of pattern
JPS61273088A (en) * 1985-05-29 1986-12-03 Hitachi Ltd Inspection method for surface pattern

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002532760A (en) * 1998-12-17 2002-10-02 ケーエルエー−テンカー コーポレイション Mechanisms for manufacturing and inspecting reticles
JP2010044414A (en) * 1998-12-17 2010-02-25 Kla-Tencor Corp Circuit design, inspection method, and processing method
JP2007536560A (en) * 2003-07-03 2007-12-13 ケーエルエー−テンカー テクノロジィース コーポレイション Wafer and reticle inspection methods and systems using designer intent data
JP4758343B2 (en) * 2003-07-03 2011-08-24 ケーエルエー−テンカー コーポレイション Wafer and reticle inspection methods and systems using designer intent data

Also Published As

Publication number Publication date
JPH0820231B2 (en) 1996-03-04

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Legal Events

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