JPH02232004A - Nail polishing device - Google Patents

Nail polishing device

Info

Publication number
JPH02232004A
JPH02232004A JP5207789A JP5207789A JPH02232004A JP H02232004 A JPH02232004 A JP H02232004A JP 5207789 A JP5207789 A JP 5207789A JP 5207789 A JP5207789 A JP 5207789A JP H02232004 A JPH02232004 A JP H02232004A
Authority
JP
Japan
Prior art keywords
zeolite
ions
polishing surface
resin
base plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5207789A
Other languages
Japanese (ja)
Inventor
Noriyuki Numata
沼田 典之
Hiroyuki Kuwahata
広幸 桑畑
Eiji Sakata
栄二 坂田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyushu Hitachi Maxell Ltd
Maxell Ltd
Original Assignee
Kyushu Hitachi Maxell Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyushu Hitachi Maxell Ltd, Hitachi Maxell Ltd filed Critical Kyushu Hitachi Maxell Ltd
Priority to JP5207789A priority Critical patent/JPH02232004A/en
Publication of JPH02232004A publication Critical patent/JPH02232004A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the always hygienic nail polishing device by allowing fine zeolite particles of, for example, synthetic zeolite, etc., which are formed by depositing metal ions, such as, for example, silver ions, copper ions and zinc ions, having an antibacterial property in pores, to exist in a polishing surface independently or after mixing the same with other fine ceramic particles. CONSTITUTION:The polishing surface 2 having prescribed ruggedness is formed on the left half of a base plate 1 consisting of a synthetic resin or metal and the other right half part is a crimping part 3. This polishing surface 2 is formed by applying a UV curing resin on the base plate 1 to form a coated film, sticking the zeolite having the antibacterial property on the thin adhesive agent film, and irradiating the coated film with UV rays by using a high-pressure mercury lamp to cure the above-mentioned resin, then immersing the base plate in an ethanol soln. to remove the uncured part of the resin. The synthetic zeolite formed by well holding the metal ions, such as silver ions, copper ions and zinc ions, having the antibacterial property in the crystal is used as the zeolite. This synthetic zeolite has the hardness higher than the hardness of the nails.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えば手動式あるいは電動式の爪みがき器に
係り、特にその研磨面の構成に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to, for example, a manual or electric nail polisher, and particularly relates to the configuration of its polishing surface.

〔従来技術〕[Prior art]

従来の例えば手動弐の爪みがき器は、所定の形状をした
金属板からなる基板上の一部にセラミックスからなる研
磨粒子を多数固着して、所定の粗さを有する研磨面を形
成していた。また電動式の爪みがき器の場合は、表面に
セラミックスからなる研磨粒子を多数固着して、所定の
粗さを有する研磨面を形成したポリッシャー(回転体)
あるいはスタイラー(往復子)を構成し、これを爪みが
き器本体の回転部あるいは往復部に装着していた.〔発
明が解決しようとする課題〕 ところで、爪の表面をみがいたときに爪の表面にある角
質層が削り取られてその一部が研ρ面の漱細な凹部に入
り込む。この角質層はボーラスで吸湿性を有しているこ
とから、空気中の水分を吸着し、そのため大腸菌.黄色
ぶどう状球菌.枯草菌ならびに緑膿凹などの種々雑多な
雑菌が付着して繁殖し、非衛生的である. 爪みがき器を使用した後に研磨面をブラシで清掃したり
、あるいはアルコールや紫外線などで殺菌処理すること
も考えられるが、実際にはこのような手入れを忘れたり
あるいは面倒であるから手入れを行わなかったりする場
合が多く、衛生状態が保持できないという欠点を存して
いる。
For example, in the conventional manual nail polisher, a large number of ceramic abrasive particles are fixed to a part of a substrate made of a metal plate in a predetermined shape to form a polishing surface with a predetermined roughness. . In addition, in the case of an electric nail polisher, a polisher (rotating body) has a large number of ceramic abrasive particles fixed to the surface to form a polished surface with a predetermined roughness.
Alternatively, a styler (reciprocating element) was constructed and attached to the rotating or reciprocating part of the nail polisher itself. [Problems to be Solved by the Invention] By the way, when the surface of the nail is polished, the stratum corneum on the surface of the nail is scraped off, and a portion of the stratum corneum gets into the narrow recesses of the polished surface. Since this stratum corneum is bolus and has hygroscopic properties, it adsorbs moisture from the air, which causes Escherichia coli. Staphylococcus aureus. Various miscellaneous bacteria such as Bacillus subtilis and Pseudomonas aeruginosa adhere and breed, making it unhygienic. After using a nail polisher, you can consider cleaning the polishing surface with a brush or sterilizing it with alcohol or ultraviolet light, but in reality, people often forget to do this or don't do it because it's a hassle. The disadvantage is that sanitary conditions cannot be maintained.

本発明の目的は、このような従来技術の欠点を解消し、
常に衛生的な爪みがき器を提供するにある。
The purpose of the present invention is to eliminate such drawbacks of the prior art,
We always provide a hygienic nail polisher.

〔課題を解決するための手段〕[Means to solve the problem]

前述の目的を達成するため、本発明は、例えば銀イオン
.銅イオン,亜鉛イオンなどの抗菌性のある金属イオン
をイオン交換などにより細孔中に担持した例えば合成ゼ
オライトなどのゼオライト微粒子を、単独あるいは他の
セラミックス微粒子と混合して研磨面に存在せしめたこ
とを特徴とするものである. [作用〕 前述のように研磨面に抗菌剤を存在せしめることにより
、角質層の詰まりにより大気中の水分を吸着し、さらに
雑菌などが付着しても、前記抗菌剤の作用により雑菌の
繁殖を抑制するかあるいは殺菌することができる.その
ために、爪みがき器の研磨面を常に衛生な状態に保持す
ることができる。
In order to achieve the above-mentioned object, the present invention utilizes, for example, silver ions. Zeolite fine particles such as synthetic zeolite, in which antibacterial metal ions such as copper ions and zinc ions are supported in the pores by ion exchange, are present on the polished surface either alone or in combination with other ceramic fine particles. It is characterized by [Function] As mentioned above, by having an antibacterial agent present on the polished surface, moisture in the atmosphere is adsorbed due to clogging of the stratum corneum, and even if bacteria etc. adhere, the action of the antibacterial agent prevents the growth of bacteria. It can be suppressed or sterilized. Therefore, the polishing surface of the nail polisher can always be maintained in a sanitary condition.

〔実施例〕〔Example〕

次に本発明の実施例を図面とともに説明する.第1図は
、第1実施例を説明するための爪みがき器の平面図であ
る.同図に示すようにほぼ菱形をした合成樹脂や金属か
らなる基板1の左半分には所定の凹凸を有する研磨面2
が形成され、他の右半分は扶持部3となっている. この研摩面2は、紫外線硬化性樹脂(大日精化社製 製
品名 セイ力ビームEX−58520)を粘度800〜
2000cpsに調整し、これを前記基板1上に塗布し
て厚さ0.1mmの塗膜を形成する.この接着剤薄膜の
上に抗菌性を有する粒径が0.1μm〜40μm程度の
ゼオライトを付着させ、次に高圧水銀灯を用い160W
/cm”の出力で波長365nmの紫外線を5秒間照射
して、前記紫外線硬化性樹脂を硬化せしめる.しかる後
エタノール溶液中に浸漬して、樹脂の未硬化部分を除去
する。
Next, embodiments of the present invention will be explained with reference to the drawings. FIG. 1 is a plan view of a nail polisher for explaining the first embodiment. As shown in the figure, a polishing surface 2 having a predetermined unevenness is formed on the left half of a substantially diamond-shaped substrate 1 made of synthetic resin or metal.
is formed, and the other right half is the supporting part 3. This polishing surface 2 is made of ultraviolet curable resin (manufactured by Dainichiseika Chemical Co., Ltd., product name Seirybeam EX-58520) with a viscosity of 800 to
This was adjusted to 2000 cps and applied onto the substrate 1 to form a coating film with a thickness of 0.1 mm. Zeolite, which has antibacterial properties and has a particle size of about 0.1 μm to 40 μm, is adhered to this adhesive thin film, and then a high pressure mercury lamp is used to
The ultraviolet curable resin is cured by irradiating it with ultraviolet rays with a wavelength of 365 nm for 5 seconds at an output of 1.0 cm". Thereafter, it is immersed in an ethanol solution to remove the uncured portion of the resin.

前述のゼオライトとしては、合成ゼオライトが賞用され
る。この合成ゼオライトは、三次元的に発達した骨格構
造を存し、爪の硬度よりも高い200〜400程度のビ
ッカース硬度をもっている.また化学組成は、一般には
Alt03を基準にしてxMa/no H AlzOx
・ySift ・211tOで表され、Mはイオン交換
可能な金属イオンを表し、nはその原子価である.そし
てケイ素の一部を配位数4の正四面体形アルミニウムで
置換しているため、正電尚が不足し、その不足を補うた
め、恨イオン.銅イオン.亜鉛イオンなどの抗菌性のあ
る金属イオンを結晶内に良好に保持することができる.
また合成ゼオライトは10オングストローム以下の細孔
を三次元的に有し、150m”/gの比1表面積をもち
、特にゼオライトA,ゼオライトXならびにゼオライト
Yが好適である。
As the zeolite mentioned above, synthetic zeolite is preferably used. This synthetic zeolite has a three-dimensionally developed skeletal structure and has a Vickers hardness of about 200 to 400, which is higher than the hardness of nails. In addition, the chemical composition is generally xMa/no H AlzOx based on Alt03.
・ySift ・211tO, M represents an exchangeable metal ion, and n is its valence. Since some of the silicon is replaced with regular tetrahedral aluminum with a coordination number of 4, there is a shortage of positive ions, and to compensate for this deficiency, shodensho is added. Copper ion. Antibacterial metal ions such as zinc ions can be well retained within the crystal.
The synthetic zeolite has three-dimensional pores of 10 angstroms or less and a specific surface area of 150 m''/g, and zeolite A, zeolite X and zeolite Y are particularly suitable.

第2図は、本発明の第2実施例を説明するための爪みが
き器の斜視図である.この爪みがき器は、中間に例えば
発泡ウレタン樹脂などのほぼ菱形をした弾性基板4を用
い、その上下両面にそれぞれ例えばウレタンシートなど
の樹脂シー}5a,5bが貼着されている.この上側樹
脂シーt−5aの左側尖端の三角形部分には粒径l30
0の研磨面6aが、上側樹脂シー}5aの右側尖端の三
角形部分には粒径”6 0 0の研磨面6bが、さらに
下側樹脂シー}5bの左側尖端の三角形部分には粒径”
1000の研磨面6Cが、下側樹脂シ一ト5bの右側尖
端の三角形部分には粒径”2 0 0 0の研磨面6d
が、それぞれ形成されている.このように粒度の異なる
研磨面6a〜6dは、合成ゼオライト微粒子(抗菌性の
ある金属イオンをイオン交換により付着)の粒径をふる
い分けし、紫外線硬化性樹脂などの光重合性樹脂をバイ
ンダーとして用いて形成することができる。
FIG. 2 is a perspective view of a nail polisher for explaining a second embodiment of the present invention. This nail polisher uses an approximately diamond-shaped elastic substrate 4 made of foamed urethane resin in the middle, and resin sheets 5a and 5b such as urethane sheets are attached to the upper and lower surfaces of the substrate, respectively. The triangular portion at the left tip of this upper resin sheet t-5a has a grain size of l30.
A polishing surface 6a with a grain size of "600" is present on the triangular portion of the right tip of the upper resin sheet 5a, and a polishing surface 6b with a grain size of "600" is on the triangular portion of the left tip of the lower resin sheet 5b.
A polishing surface 6C with a grain size of 1,000 and a polishing surface 6d with a grain size of 2,000 is on the triangular portion of the right tip of the lower resin sheet 5b.
are formed respectively. The polished surfaces 6a to 6d having different particle sizes are prepared by screening the particle sizes of synthetic zeolite fine particles (to which antibacterial metal ions are attached by ion exchange) and using a photopolymerizable resin such as an ultraviolet curable resin as a binder. It can be formed by

この実施例の場合、樹脂シ一ト5の表面にバインダーを
用いて研磨粒子《ゼオライト粒子》を固着して研磨面を
形成したが、例えばウレタン樹脂に合成ゼオライト微粒
子を重量比で40〜80%混入し、シート状に成形して
研磨面を形成することもできる。なお、ゼオライト粒子
とともに例えば二酸化ケイ素や酸化アルミニウムなどの
砥粒を冫昆入することもできる。
In the case of this example, the abrasive particles (zeolite particles) were fixed to the surface of the resin sheet 5 using a binder to form the abrasive surface. It is also possible to form a polishing surface by mixing it and forming it into a sheet. Incidentally, abrasive grains such as silicon dioxide or aluminum oxide can also be added together with the zeolite particles.

第3図ならびに第4図は、本発明の第3実施例を説明す
るための図である。この実施例の場合、爪みがき器本体
7の先端部に、研磨ビース8が着脱可能にセットされる
。この研磨ビース8の研磨面9には、所定の粒度を有し
抗菌性のある金属イオンをイオン交換により担持したゼ
オライト微粒子単独あるいは他の研磨粒との混合物が固
着されている。
FIG. 3 and FIG. 4 are diagrams for explaining a third embodiment of the present invention. In this embodiment, a polishing bead 8 is removably set at the tip of the nail polisher body 7. On the polishing surface 9 of the polishing bead 8, zeolite fine particles having a predetermined particle size and carrying antibacterial metal ions by ion exchange are fixed, either alone or in a mixture with other polishing particles.

この実施例はスタイラー(往復子)を用いた往復タイプ
の電動式爪みがき器を示しているが、ポリッシャー(回
転子)を用いた回転タイプの電動式爪みがき器にも適用
できる。
Although this embodiment shows a reciprocating type electric nail polisher using a styler (reciprocating element), it can also be applied to a rotating type electric nail polisher using a polisher (rotor).

〔発明の効果〕〔Effect of the invention〕

本発明は前述のような構成になっており、角質層の付着
などによって吸湿しやすい状態になる研磨面を常に衛生
な状態に保持することができる。
The present invention has the above-described configuration, and can always keep the polished surface, which tends to absorb moisture due to the adhesion of the stratum corneum, in a sanitary state.

また実施例で示したように、無溶剤系の光重合性樹脂を
バインダーとして使用すれば、残存有機溶剤によるマニ
キャなどの化粧品への悪影舌の心配がない。
Furthermore, as shown in the examples, if a solvent-free photopolymerizable resin is used as a binder, there is no fear that residual organic solvents will have an adverse effect on cosmetics such as manicure.

【図面の簡単な説明】[Brief explanation of the drawing]

図面はすべて本発明の実施例を説明するためのもので、
第1図は第1実施例に係る手動式爪みがき器の平面図、
第2図は第2実施例に係る手動式爪みがき器の斜視図、
第3図は第3実施例に係る電動式爪みがき器の一部分解
斜視図、第4図はその電動式爪みがき器に用いる研磨ピ
ースの底面図である. 2,6a.6b,6c.6d,L=研磨面、8・・・研
磨ビース. 第1N 第33 vIl2図
All drawings are for illustrating embodiments of the present invention.
FIG. 1 is a plan view of a manual nail polisher according to the first embodiment;
FIG. 2 is a perspective view of a manual nail polisher according to a second embodiment;
FIG. 3 is a partially exploded perspective view of an electric nail polisher according to the third embodiment, and FIG. 4 is a bottom view of a polishing piece used in the electric nail polisher. 2,6a. 6b, 6c. 6d, L=polished surface, 8...polishing bead. 1N 33 vIl2 figure

Claims (4)

【特許請求の範囲】[Claims] (1)抗菌性のある金属イオンを細孔中に担持したゼオ
ライト微粒子を研磨面に存在せしめたことを特徴とする
爪みがき器。
(1) A nail polisher characterized in that fine zeolite particles carrying antibacterial metal ions in their pores are present on the polishing surface.
(2)請求項(1)記載において、前記ゼオライトが合
成ゼオライトであることを特徴とする爪みがき器。
(2) The nail polishing device according to claim (1), wherein the zeolite is a synthetic zeolite.
(3)請求項(1)または請求項(2)記載において、
前記研磨面にゼオライト微粒子と研磨粒子とが混在して
いることを特徴とする爪みがき器。
(3) In claim (1) or claim (2),
A nail polisher characterized in that the polishing surface contains a mixture of zeolite fine particles and polishing particles.
(4)請求項(1)または請求項(2)記載において、
前記ゼオライト微粒子が光重合性樹脂によつて研磨面に
固着されていることを特徴とする爪みがき器。
(4) In claim (1) or claim (2),
A nail polisher characterized in that the zeolite fine particles are fixed to a polishing surface by a photopolymerizable resin.
JP5207789A 1989-03-06 1989-03-06 Nail polishing device Pending JPH02232004A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5207789A JPH02232004A (en) 1989-03-06 1989-03-06 Nail polishing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5207789A JPH02232004A (en) 1989-03-06 1989-03-06 Nail polishing device

Publications (1)

Publication Number Publication Date
JPH02232004A true JPH02232004A (en) 1990-09-14

Family

ID=12904756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5207789A Pending JPH02232004A (en) 1989-03-06 1989-03-06 Nail polishing device

Country Status (1)

Country Link
JP (1) JPH02232004A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019187553A (en) * 2018-04-19 2019-10-31 株式会社遠藤製作所 Nail file

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4831719U (en) * 1971-08-06 1973-04-17
JPS555883B2 (en) * 1973-11-09 1980-02-12
JPS6452469A (en) * 1987-08-21 1989-02-28 Ijiri Seiji Method for sterilizing, asceptic and antifungal treatment of material or processed product composed of synthetic resin, rubber, synthetic fiber, metal or ceramics

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4831719U (en) * 1971-08-06 1973-04-17
JPS555883B2 (en) * 1973-11-09 1980-02-12
JPS6452469A (en) * 1987-08-21 1989-02-28 Ijiri Seiji Method for sterilizing, asceptic and antifungal treatment of material or processed product composed of synthetic resin, rubber, synthetic fiber, metal or ceramics

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019187553A (en) * 2018-04-19 2019-10-31 株式会社遠藤製作所 Nail file

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