JPH02132563A - Picture reading method - Google Patents

Picture reading method

Info

Publication number
JPH02132563A
JPH02132563A JP1073436A JP7343689A JPH02132563A JP H02132563 A JPH02132563 A JP H02132563A JP 1073436 A JP1073436 A JP 1073436A JP 7343689 A JP7343689 A JP 7343689A JP H02132563 A JPH02132563 A JP H02132563A
Authority
JP
Japan
Prior art keywords
reflection
incident
optical axis
subject
received
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1073436A
Other languages
Japanese (ja)
Inventor
Atsushi Takamine
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP7906288 priority Critical
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP1073436A priority patent/JPH02132563A/en
Publication of JPH02132563A publication Critical patent/JPH02132563A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management and control, including software
    • G03F7/70541Tagging, i.e. hardware or software tagging of features or components

Abstract

PURPOSE: To improve the contrast and to attain the measurement of pictures with high accuracy by setting a picture detecting mechanism at a position out of the optical axis of the right reflection beam of the measured light and detecting the reflection beam shifted from the right reflection beam received from a subject.
CONSTITUTION: A CCD camera 9 is selectively set at a position where the right reflection beam of an incident beam is not made incident, i.e., a position which is slightly shifted from the optical axis of the right reflection beam. At the same time, the photodetecting surface of the camera 9 is slightly shifted from the optical axis (b) of the right reflection beam. A light shielding plate 10 is set between a measuring light source 8 and a semiconductor wafer 6. Thus the peripheral beams of the source 8 are never made incident on the wafer 6. In such a way, the reflection beams except the right reflection beam produced at the position of a mark are received and measured. Thus it is possible to obtain an image having a good contrast and to secure the high image resolution even though a high reflection factor is secured on the surface of the subject.
COPYRIGHT: (C)1990,JPO&Japio
JP1073436A 1988-03-31 1989-03-24 Picture reading method Pending JPH02132563A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7906288 1988-03-31
JP1073436A JPH02132563A (en) 1988-03-31 1989-03-24 Picture reading method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1073436A JPH02132563A (en) 1988-03-31 1989-03-24 Picture reading method

Publications (1)

Publication Number Publication Date
JPH02132563A true JPH02132563A (en) 1990-05-22

Family

ID=26414577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1073436A Pending JPH02132563A (en) 1988-03-31 1989-03-24 Picture reading method

Country Status (1)

Country Link
JP (1) JPH02132563A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05142120A (en) * 1991-11-22 1993-06-08 Asutemu Eng:Kk Mark on surface of thin plate steel plate specimen and marking device and method and device for identifying mark

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49111665A (en) * 1973-02-22 1974-10-24
JPS51140477A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Method of fabricating semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49111665A (en) * 1973-02-22 1974-10-24
JPS51140477A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Method of fabricating semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05142120A (en) * 1991-11-22 1993-06-08 Asutemu Eng:Kk Mark on surface of thin plate steel plate specimen and marking device and method and device for identifying mark

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