JPH02125332U - - Google Patents

Info

Publication number

JPH02125332U

JPH02125332U JP3351189U JP3351189U JPH02125332U JP H02125332 U JPH02125332 U JP H02125332U JP 3351189 U JP3351189 U JP 3351189U JP 3351189 U JP3351189 U JP 3351189U JP H02125332 U JPH02125332 U JP H02125332U

Authority

JP

Japan

Prior art keywords

semiconductor manufacturing

manufacturing device

overflow tank

inlet

shower nozzle

Prior art date

1989-03-23

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 238000005530 etching Methods 0.000 claims description 2
• 238000004519 manufacturing process Methods 0.000 claims 2
• 239000004065 semiconductor Substances 0.000 claims 2
• 238000004140 cleaning Methods 0.000 claims 1
• 238000001914 filtration Methods 0.000 claims 1
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
• 239000007788 liquid Substances 0.000 description 1
• 238000004080 punching Methods 0.000 description 1
• 229910052814 silicon oxide Inorganic materials 0.000 description 1