JPH02106275A - Polishing tape - Google Patents
Polishing tapeInfo
- Publication number
- JPH02106275A JPH02106275A JP25992588A JP25992588A JPH02106275A JP H02106275 A JPH02106275 A JP H02106275A JP 25992588 A JP25992588 A JP 25992588A JP 25992588 A JP25992588 A JP 25992588A JP H02106275 A JPH02106275 A JP H02106275A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- powder
- layer
- abrasive
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 32
- 239000000463 material Substances 0.000 claims abstract 5
- 239000000843 powder Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 8
- 239000011230 binding agent Substances 0.000 claims description 7
- 239000000428 dust Substances 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 6
- 230000000452 restraining effect Effects 0.000 abstract 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 239000004020 conductor Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 239000003973 paint Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920005749 polyurethane resin Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- -1 isocyanate compounds Chemical class 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は研磨テープに関し、さらに詳しくは、帯電が
小さくて、クリーニング性に優れた研磨テープに関する
。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an abrasive tape, and more particularly to an abrasive tape with low electrostatic charge and excellent cleaning properties.
研磨テープは、通常、ポリエステルフィルム等の基体上
に、A1.203粉末、Cr、○、粉末、S i O2
粉末、SiC粉末等の研磨材を結合剤樹脂で結着してつ
くられ、たとえば、磁気記録再生装置における磁気ヘッ
ド等に摺接させて、磁気ヘッドに付着した塵埃や離脱し
た磁性粉末を取り除くなど、被研磨物に付着した付着異
物を取り除くときなどに広く使用されている。Polishing tapes are usually prepared by coating A1.203 powder, Cr, O, powder, SiO2 on a substrate such as a polyester film.
It is made by bonding abrasive materials such as powder, SiC powder, etc. with a binder resin, and is used, for example, to remove dust attached to the magnetic head or detached magnetic powder by sliding it in sliding contact with the magnetic head of a magnetic recording/reproducing device. It is widely used to remove foreign matter adhering to objects to be polished.
ところが、これら従来の研磨テープに使用するAfzO
3粉末、Cr、O,粉末、5iOz粉末、SiC粉末等
の研磨材は、いずれも電気抵抗が太き(、これらを使用
して得られる研磨テープは帯電が大きいため、塵埃が多
量に付着しやすく、これらの付着した塵埃によって磁気
ヘッド等の被研磨物に傷(スクラッチ)が発生しやすく
なる。However, AfzO used in these conventional polishing tapes
Abrasives such as 3 powder, Cr, O, powder, 5iOz powder, and SiC powder all have high electrical resistance (and the abrasive tapes obtained using these have a large charge, so a large amount of dust will adhere to them). These adhering dust particles tend to cause scratches on objects to be polished, such as magnetic heads.
〔課題を解決するための手段]
この発明はかかる現状に鑑み種々検討を行った結果なさ
れたもので、研磨層と基体との間に、電気抵抗が10I
0Ω/sq以下の導電体層を設けることによって、研磨
テープ全体の電気抵抗を低下させ、帯電を小さくして、
帯電による塵埃の付着を抑制し、磁気ヘッド等の被研磨
物上に傷を発生させることなく、磁気ヘッド等の被研磨
物から付着異物のみを良好に除去できるようにしたもの
である。[Means for Solving the Problems] This invention was made as a result of various studies in view of the current situation, and the present invention was made as a result of various studies in view of the current situation.
By providing a conductive layer of 0 Ω/sq or less, the electrical resistance of the entire polishing tape is lowered, and the electrostatic charge is reduced.
This suppresses the adhesion of dust due to electrification, and allows only adhering foreign matter to be removed from the object to be polished, such as the magnetic head, without causing scratches on the object to be polished, such as the magnetic head.
この発明において、研磨層と基体との間に設ける導電体
層は、電気抵抗が10I0Ω/sq以下となるようにす
ることが好ましく、このような電気抵抗が1QIOΩ/
sq以下の導電体層が形成されると、研磨テープ全体の
電気抵抗が充分に低下され、帯電が充分に小さくなって
、帯電による塵埃の付着が充分に抑制される。従って、
このような導電体層を、研磨層と基体との間に設けた研
磨テープを使用すれば、磁気ヘッド等の被研磨物上に傷
を発生させることなく、磁気ヘッド等の被研磨物から付
着異物のみを良好に除去することができる。In this invention, the conductor layer provided between the polishing layer and the base preferably has an electrical resistance of 10I0Ω/sq or less, and such electrical resistance is 1QIOΩ/sq or less.
When a conductive layer having a size of sq or less is formed, the electrical resistance of the entire polishing tape is sufficiently reduced, and the charging becomes sufficiently small, so that the adhesion of dust due to charging is sufficiently suppressed. Therefore,
By using a polishing tape in which such a conductive layer is provided between the polishing layer and the substrate, it is possible to remove the adhesion from the magnetic head or other object to be polished without causing scratches on the object to be polished, such as the magnetic head. Only foreign matter can be removed well.
このような導電体層は、導電性粉末を、結合剤樹脂、有
機溶剤等とともに混合分散して導電体層用塗料を調製し
、この導電体層用塗料を基体上に塗布、乾燥して形成さ
れ、導電性粉末としては、カーボンブラック、もしくは
銅粉末などの導電性の良好な金属粉末などが好適なもの
として使用される。導電性粉末の含有量は、導電体層中
の全固形成分に対して5〜80重量%の範囲内にするの
が好ましく、導電性粉末が少なすぎると導電体層の電気
抵抗を充分に小さくすることができず、多くしすぎると
導電体層の基体に対する接着性が低下する。Such a conductive layer is formed by mixing and dispersing conductive powder with a binder resin, an organic solvent, etc. to prepare a conductive layer paint, applying this conductive layer paint onto a substrate, and drying it. As the conductive powder, carbon black or metal powder with good conductivity such as copper powder is preferably used. The content of the conductive powder is preferably within the range of 5 to 80% by weight based on the total solid components in the conductor layer, and if the amount of conductive powder is too small, the electrical resistance of the conductor layer may be sufficiently reduced. If the amount is too large, the adhesion of the conductive layer to the substrate will decrease.
また、導電体層に使用される結合剤樹脂としては、塩化
ビニル−酢酸ビニル系共重合体、ポリビニルブチラール
樹脂、繊維素系樹脂、ポリウレタン系樹脂、ポリエステ
ル系樹脂、エポキシ系樹脂、ポリエーテル系樹脂、イソ
シアネート化合物、放射線硬化型樹脂など従来から汎用
されている結合剤樹脂がいずれも好適に使用され、有機
溶剤としては、アセトン、メチルイソブチルケトン、メ
チルエチルケトン、シクロヘキサノン、トルエン、酢酸
エチル、テトラヒドロフラン、ジメチルホルムアミドな
ど従来一般に使用される有機溶剤がいずれも単独で、或
いは二種以上混合して使用される。In addition, binder resins used for the conductor layer include vinyl chloride-vinyl acetate copolymer, polyvinyl butyral resin, cellulose resin, polyurethane resin, polyester resin, epoxy resin, and polyether resin. , isocyanate compounds, radiation-curable resins, and other conventional binder resins are preferably used. Examples of organic solvents include acetone, methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, toluene, ethyl acetate, tetrahydrofuran, and dimethyl formamide. Organic solvents commonly used in the past may be used alone or in combination of two or more.
この他、導電体層は、導電性に優れたアルミニウム等の
金属、もしくは酸化パラジウム等の金属酸化物を、基体
上に蒸着するなどの方法でも形成される。In addition, the conductive layer can be formed by depositing a highly conductive metal such as aluminum or a metal oxide such as palladium oxide onto the substrate.
また、このようにして形成される導電体層上に形成され
る研磨層は、研磨材粉末を、結合剤樹脂、有機溶剤等と
ともに混合分散して研磨塗料を調製し、この研磨塗料を
基体上に塗布、乾燥して形成される。In addition, the polishing layer formed on the conductive layer thus formed is prepared by mixing and dispersing abrasive powder with a binder resin, an organic solvent, etc. to prepare a polishing paint, and applying this polishing paint to the substrate. It is formed by applying and drying.
研磨材粉末としては、適度な硬度を有し、被研磨物に付
着した塵埃などの付着異物を良好に取り除くことができ
るものが好ましく使用され、たとえば、A1zCh粉末
、Cr!0ユ粉末、SiO2粉末、SiC粉末などが、
単独または2種以上混合して使用される。使用量は、充
分なりリーニング効果を発揮させるため、研磨層中の全
固形成分に対して20〜90重景%の範囲内で使用する
のが好ましく、50〜80重量%の範囲内で使用するの
がより好ましい。As the abrasive powder, it is preferable to use one that has appropriate hardness and can effectively remove foreign matter such as dust attached to the object to be polished. For example, A1zCh powder, Cr! 0U powder, SiO2 powder, SiC powder, etc.
They may be used alone or in a mixture of two or more. The amount used is preferably within the range of 20 to 90% by weight, and is preferably used within the range of 50 to 80% by weight based on the total solid components in the polishing layer, in order to exhibit a sufficient leaning effect. is more preferable.
また、このような研磨層に使用される結合剤樹脂および
有機溶剤としては、前記の導電体層で使用したものと同
じものがいずれも好適なものとして使用される。Further, as the binder resin and organic solvent used in such a polishing layer, the same ones as those used in the above-mentioned conductor layer are preferably used.
なお、研磨層中には、通常使用されている各種添加剤、
たとえば、潤滑剤、分散剤、充填剤などを適宜に添加使
用してもよい。The polishing layer contains various commonly used additives,
For example, a lubricant, a dispersant, a filler, etc. may be added as appropriate.
〔実施例] 次に、この発明の実施例について説明する。〔Example] Next, embodiments of the invention will be described.
実施例1
ケッチエンブラックEC(アク 30重量部ゾ社製、
カーボンブラック)
バイロン200(東洋紡社製、 70〃ポリエステル
樹脂)
メチルエチルケトン 400〃この組成物を
ボールミル中で40時間混合分散して導電体層用塗料を
調製し、この導電体層用塗料を厚さ50μmのポリエス
テルフィルム上に乾燥厚が2μmとなるように塗布、乾
燥して導電体層を形成した。この導電体層の電気抵抗は
10’Ω/sqであった。Example 1 Ketchen Black EC (Aku 30 parts by weight, manufactured by Zo Co., Ltd.,
(Carbon black) Byron 200 (manufactured by Toyobo Co., Ltd., 70〃Polyester resin) Methyl ethyl ketone 400〃This composition was mixed and dispersed in a ball mill for 40 hours to prepare a paint for a conductor layer, and this paint for a conductor layer was mixed to a thickness of 50 μm. A conductive layer was formed by coating the polyester film to a dry thickness of 2 μm and drying. The electrical resistance of this conductor layer was 10'Ω/sq.
次いで、このポリエステルフィルム上の導電体層上に、
下記組成の研磨塗料を塗布、乾燥して、厚さ10μmの
研磨層を形成した。しかる後、所定の巾に裁断して研磨
テープをつくった。Next, on the conductor layer on this polyester film,
A polishing coating having the composition shown below was applied and dried to form a polishing layer with a thickness of 10 μm. After that, it was cut to a predetermined width to make abrasive tape.
研磨塗料
WA−400(不二見研磨材工 75重量部業社製、
アルミナ粉末)
N−2301(日本ポリウレタ 25ン工業社製、ポ
リウレタン樹
脂)
メチルエチルケトン 300〃比較例1
実施例1において、導電体層の形成を省いた以外は、実
施例1と同様にして研磨テープをつくった。Abrasive paint WA-400 (manufactured by Fujimi Abrasive Materials Co., Ltd. 75 Heavy Industries Co., Ltd.,
Alumina powder) N-2301 (manufactured by Nippon Polyurethane Industry Co., Ltd., polyurethane resin) Methyl ethyl ketone 300 Comparative Example 1 A polishing tape was prepared in the same manner as in Example 1, except that the formation of the conductive layer was omitted. I made it.
各実施例および比較例で得られた研磨テープについて、
研磨層表面の帯電圧を測定し、この帯電圧が初期帯電圧
の50%に減少するまでの半減期を測定した。また、各
研磨テープを、磁性塗膜離脱物あるいは塵埃等の付着に
より目づまりしたギャップ長が0.25μmのセンダス
)[気ヘッドを搭載した8 mm V T Rにかけ、
クリーニング効果と、研磨テープによる磁気ヘッドの傷
つき状態を調べた。クリーニング効果は20秒走行させ
て出力回復度を調べ、目づまり前の出力と比較して出力
の低下が0.3dB以内の場合を(0)として評価した
。また、磁気ヘッドの傷つき状態は磁気ヘッド表面のス
クラッチ傷の有無を観察した。Regarding the polishing tapes obtained in each example and comparative example,
The charging voltage on the surface of the polishing layer was measured, and the half-life until this charging voltage decreased to 50% of the initial charging voltage was measured. In addition, each polishing tape was applied to an 8 mm VTR equipped with a Sendus head with a gap length of 0.25 μm that was clogged due to magnetic coating detachment or adhesion of dust, etc.
The cleaning effect and the damage to the magnetic head caused by the polishing tape were investigated. The cleaning effect was evaluated by checking the degree of output recovery after running for 20 seconds, and rated as (0) if the output decreased within 0.3 dB compared to the output before clogging. In addition, the state of damage to the magnetic head was determined by observing the presence or absence of scratches on the surface of the magnetic head.
下記第1表はその結果である。Table 1 below shows the results.
第1表
〔発明の効果〕
上記第1表から明らかなように、この発明で得られた研
磨テープ(実施例1)は、比較例1で得られた研磨テー
プに比し、帯電圧が小さくて、半減期も短く、磁気ヘッ
ドが傷付きにくくて、クリーング効果があり、このこと
からこの発明で得られた研磨テープは、帯電防止効果に
優れ、被研磨物を傷つけたりすることなく、被研磨物に
付着した付着異物のみを良好に除去することができるこ
とがわかる。Table 1 [Effects of the Invention] As is clear from Table 1 above, the abrasive tape obtained by the present invention (Example 1) has a lower electrostatic voltage than the abrasive tape obtained in Comparative Example 1. Therefore, the polishing tape obtained by this invention has an excellent antistatic effect and can be used without damaging the object to be polished. It can be seen that only the foreign matter adhering to the polished object can be successfully removed.
特許出願人 日立マクセル株式会社Patent applicant: Hitachi Maxell, Ltd.
Claims (1)
設けた研磨テープにおいて、研磨層と基体との間に電気
抵抗が10^1^0Ω/sq以下の導電体層を設けたこ
とを特徴とする研磨テープ 2、研磨層中に含まれる研磨材粉末が、Al_2、O_
3粉末、Cr_2O_3粉末、SiO_2粉末、SiC
粉末から選ばれる少なくとも1種以上の研磨材粉末であ
る請求項1記載の研磨テープ[Scope of Claims] 1. An abrasive tape in which an abrasive layer containing an abrasive powder and a binder component is provided on a substrate, and the electrical resistance between the abrasive layer and the substrate is 10^1^0 Ω/sq or less. The polishing tape 2 is characterized in that it is provided with a conductive layer, and the polishing material powder contained in the polishing layer is Al_2, O_
3 powder, Cr_2O_3 powder, SiO_2 powder, SiC
The abrasive tape according to claim 1, which is at least one abrasive powder selected from powders.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25992588A JPH02106275A (en) | 1988-10-15 | 1988-10-15 | Polishing tape |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25992588A JPH02106275A (en) | 1988-10-15 | 1988-10-15 | Polishing tape |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02106275A true JPH02106275A (en) | 1990-04-18 |
Family
ID=17340834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25992588A Pending JPH02106275A (en) | 1988-10-15 | 1988-10-15 | Polishing tape |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02106275A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5633068A (en) * | 1994-10-14 | 1997-05-27 | Fuji Photo Film Co., Ltd. | Abrasive tape having an interlayer for magnetic head cleaning and polishing |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61152373A (en) * | 1984-12-25 | 1986-07-11 | Mitsui Toatsu Chem Inc | Synthetic resinous abrasive |
JPS6294270A (en) * | 1985-10-18 | 1987-04-30 | Fuji Photo Film Co Ltd | Abrasive tape |
JPS62130181A (en) * | 1985-12-02 | 1987-06-12 | Nippon Micro Kooteingu Kk | Manufacture of electrification preventing polishing sheet |
JPS63169270A (en) * | 1986-12-27 | 1988-07-13 | Dainippon Printing Co Ltd | Abrasive tape |
-
1988
- 1988-10-15 JP JP25992588A patent/JPH02106275A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61152373A (en) * | 1984-12-25 | 1986-07-11 | Mitsui Toatsu Chem Inc | Synthetic resinous abrasive |
JPS6294270A (en) * | 1985-10-18 | 1987-04-30 | Fuji Photo Film Co Ltd | Abrasive tape |
JPS62130181A (en) * | 1985-12-02 | 1987-06-12 | Nippon Micro Kooteingu Kk | Manufacture of electrification preventing polishing sheet |
JPS63169270A (en) * | 1986-12-27 | 1988-07-13 | Dainippon Printing Co Ltd | Abrasive tape |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5633068A (en) * | 1994-10-14 | 1997-05-27 | Fuji Photo Film Co., Ltd. | Abrasive tape having an interlayer for magnetic head cleaning and polishing |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1161313A (en) | Magnetic recording medium | |
US4547425A (en) | Magnetic recording media | |
EP0154827B1 (en) | Magnetic recording medium comprising an undercoating made of a mixture of thermosetting polyurethane and polyester resins | |
JPH02106275A (en) | Polishing tape | |
US4515856A (en) | Magnetic recording media comprising titanium monoxide and carbon black powders in a magnetic recording layer | |
US4388369A (en) | Magnetic recording medium | |
JP3211007B2 (en) | Manufacturing method of polishing tape | |
JPH0424193B2 (en) | ||
JPS61104426A (en) | Magnetic recording medium | |
JPS63185579A (en) | Polishing tape | |
JP2987383B2 (en) | Polishing sheet | |
JP2820696B2 (en) | Manufacturing method of magnetic recording medium | |
JPH0869618A (en) | Magnetic recording medium and its manufacturing process | |
JP2813176B2 (en) | Magnetic recording media | |
JP3017254B2 (en) | Magnetic recording media | |
JPS6355727A (en) | Magnetic recording medium | |
JP3049451B2 (en) | Polishing tape | |
JPS604698Y2 (en) | polishing sheet | |
JPH03154782A (en) | Abrasive tape and manufacture thereof | |
JPH0830930A (en) | Polishing tape | |
JPS62176771A (en) | Polishing tape | |
JPS62184623A (en) | Magnetic recording medium | |
JPH0546972A (en) | Magnetic recording medium | |
JPS6260725B2 (en) | ||
JPS6035323A (en) | Magnetic recording medium |