JPH0159076B2 - - Google Patents
Info
- Publication number
- JPH0159076B2 JPH0159076B2 JP56063962A JP6396281A JPH0159076B2 JP H0159076 B2 JPH0159076 B2 JP H0159076B2 JP 56063962 A JP56063962 A JP 56063962A JP 6396281 A JP6396281 A JP 6396281A JP H0159076 B2 JPH0159076 B2 JP H0159076B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- processing
- laser beam
- cutting
- focused
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Description
【発明の詳細な説明】
この発明はレーザビームによつて切断加工を好
適に行う切断装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cutting device that suitably performs cutting using a laser beam.
レーザビームは集光されて各種材料の切断に適
用されているが、この際問題となるのは切断面に
付着した溶融物である。特に、半導体の結晶材料
では溶融物が付着したままであると、切断後の製
造工程に支障をきたし、また、製品の性能にも影
響する。このような切断面に溶融物を付着させず
に切断する対策としては、加工走査速度を調整し
たり、あるいは不活性ガスなどを切断面に高速に
噴出して溶融物を吹き飛ばすことなどが行われて
いたが、結果としては不十分であつたり、切断部
が拡大するなどの不都合を生じていた。 Laser beams are focused and applied to cut various materials, but the problem in this case is molten matter adhering to the cutting surface. In particular, if a molten substance remains attached to a semiconductor crystal material, it will interfere with the manufacturing process after cutting, and will also affect the performance of the product. Measures to cut without molten material adhering to the cut surface include adjusting the processing scanning speed, or blowing away the molten material by jetting inert gas at high speed onto the cut surface. However, the results were not sufficient or the cut area became enlarged, resulting in inconveniences.
第1図、第2図は上記欠点を解決するために発
明者が行つたもので、1はパルスレーザ発振器、
2はこの発振器より放出されたパルスレーザ光3
の光路を変える反射鏡、4は上記反射鏡2で光路
変更されたパルスレーザ光3を被加工物5に集束
照射するための集光レンズである。6は移動テー
ブルで被加工物5を載置し駆動源7により矢印A
方向に移動するようになつている。また、8は反
射鏡2用の振動駆動源8で反射鏡2に矢印Bで示
す反復動作をさせるようにしている。 Figures 1 and 2 show what the inventor has done to solve the above drawbacks; 1 is a pulsed laser oscillator;
2 is a pulsed laser beam 3 emitted from this oscillator
A reflecting mirror 4 is a condenser lens for condensing and irradiating the pulsed laser beam 3 whose optical path has been changed by the reflecting mirror 2 onto the workpiece 5 . Reference numeral 6 denotes a moving table on which the workpiece 5 is placed and moved by the drive source 7 as shown by arrow A.
It is designed to move in the direction. Further, reference numeral 8 denotes a vibration drive source 8 for the reflecting mirror 2, which causes the reflecting mirror 2 to perform the repetitive motion shown by arrow B.
上記構成による切断作用について次に説明す
る。 The cutting action of the above configuration will be explained next.
移動テーブル6を載置された被加工物5に対
し、集光レンズ4を透過したパルスレーザビーム
3が照射される。このとき、反射鏡2の振動をパ
ルスレーザビームが集光レンズ4から外れないよ
うな動作にしておくこと、および、その振動を被
加工物5の移動速度に比して格段に高速度にして
おけば加工走査線9上において、パルスレーザビ
ーム3は加工走査全長の一部分xを範囲として振
動する多重ビーム3aになり、多重の反復照射を
繰り返す。 A workpiece 5 on which a moving table 6 is placed is irradiated with a pulsed laser beam 3 that has passed through a condenser lens 4 . At this time, the vibration of the reflecting mirror 2 must be set so that the pulsed laser beam does not come off the condensing lens 4, and the vibration must be set at a much higher speed than the moving speed of the workpiece 5. Then, on the processing scanning line 9, the pulsed laser beam 3 becomes a multiple beam 3a that oscillates over a portion x of the entire processing scanning length, and multiple repeated irradiations are repeated.
ところで、パルスレーザビーム3が高速繰り返
し発振動作をしていても、被加工物5は低速移動
ではあるが絶えず移動しているため、加工走査線
9上の同一箇所にパルスレーザビーム3が静止す
ることはない。したがつて切断部で発生する熱が
分散されるので、温度上昇は十分低く抑えられ
る。また、パルスレーザビーム3の各パルス毎に
除去された除去物は入射ビームの方向に飛散する
が、各パルスの照射位置は上記のように時々刻々
変位しているのであるから、切断前方から後方に
かけてその前方側を高くして傾斜する切断面10
を形成しつつ切断する加工が行われる。したがつ
て、加工の進行につれて加工部内部に残留した溶
融物は上記切断前方から既に加工が終つた後方に
移動されることにより漸次減少し、このため溶融
物は効果的に切断面から除去される。しかしなが
ら、多重ビームは被加工物5の加工面に対して直
角となるので、被加工物の表面と裏面とではスポ
ツト径に差が生じる。したがつて、表面に最小ス
ポツトを照射するように集束した場合には、裏面
にいく程広がつた切断幅となり、傾斜した切断面
となつてしまう問題があつた。また、逆に裏面側
に最小スポツトを照射するように集束した場合に
は切断しにくくなるほか、表面側が幅広く、裏面
側にいく程狭幅の、すなわち上記とは逆の傾斜し
た切断面となつてしまう問題があつた。 By the way, even if the pulsed laser beam 3 is performing a high-speed repetitive oscillation operation, the workpiece 5 is constantly moving, albeit at a low speed, so the pulsed laser beam 3 stops at the same location on the processing scanning line 9. Never. Therefore, the heat generated at the cutting part is dispersed, so that the temperature rise can be suppressed to a sufficiently low level. In addition, the material removed by each pulse of the pulsed laser beam 3 scatters in the direction of the incident beam, but since the irradiation position of each pulse changes from time to time as described above, from the front of the cutting to the rear. The cut surface 10 is sloped with its front side elevated.
A process of cutting while forming is performed. Therefore, as the machining progresses, the molten matter remaining inside the machining section is gradually reduced by being moved from the front of the cutting to the rear where the machining has already been completed, and therefore the molten matter is effectively removed from the cut surface. Ru. However, since the multiple beams are perpendicular to the processing surface of the workpiece 5, there is a difference in spot diameter between the front and back surfaces of the workpiece. Therefore, when the laser beam is focused so as to irradiate the smallest spot on the front surface, the cutting width becomes wider toward the back surface, resulting in a slanted cut surface. On the other hand, if the beam is focused to the smallest spot on the back side, it will be difficult to cut, and the cut surface will be wider on the front side and narrower towards the back side, which is the opposite of the above. I had a problem.
この発明は上記の事情に鑑みてなされたもの
で、切断幅が狭く、かつ傾斜のきわめて小さい切
断面を得ることのできるレーザ切断装置を提供す
ることを目的とする。 The present invention has been made in view of the above-mentioned circumstances, and an object of the present invention is to provide a laser cutting device capable of obtaining a cut surface having a narrow cutting width and an extremely small slope.
以下、実施例と示す図面に基いてこの発明を説
明する。なお、第1図と共通する部分には同一符
号を付して説明する。 The present invention will be described below based on examples and drawings. Note that parts common to those in FIG. 1 will be described with the same reference numerals.
第3図において、移動テーブル6を傾け、被加
工物5に対し、パルスレーザビーム3の振動中心
の照射が上記実施例のように直角にせず、斜めに
当るようにし、矢印C方向に走査して切断加工を
行うようにしたものである。この実施例では加工
物5に対する集光レンズ4の位置はもとより、加
工物5の厚みによりその傾斜度合を調節すること
で、ビーム3aの集束径の最も小さい部分で加工
前方側における深奥部および加工後方側における
加工表面部をそれぞれ照射することになり、上記
深奥部および加工表面部を結ぶ傾斜した切断面1
0を形成しながら加工が行われる。したがつて、
この実施例では加工物の厚みに関係なくその表面
から裏面までを最小径の集束ビームで加工できる
ので、切断幅が細くかつ真直な切断面に切断でき
るという効果が得られる。 In FIG. 3, the moving table 6 is tilted so that the irradiation of the vibration center of the pulsed laser beam 3 hits the workpiece 5 obliquely, instead of at right angles as in the above embodiment, and the workpiece is scanned in the direction of arrow C. The cutting process is performed using the same method. In this embodiment, by adjusting not only the position of the condensing lens 4 with respect to the workpiece 5 but also the degree of inclination according to the thickness of the workpiece 5, the beam 3a can be used at a deep part on the front side of the workpiece and at a point where the focused diameter of the beam 3a is the smallest. The machined surface part on the rear side is irradiated, and the inclined cutting surface 1 connects the deep part and the machined surface part.
Processing is performed while forming 0. Therefore,
In this embodiment, regardless of the thickness of the workpiece, it is possible to process the workpiece from the front surface to the back surface with a focused beam of the minimum diameter, so that it is possible to cut the workpiece into a thin and straight cut surface.
なお、上記実施例では反射鏡2はいずれもガル
バノメータ式を採用したがこれに限ることなく、
多面鏡を回転し小範囲の距離を高速に反復走査す
る方式に替えてもよい。また、加工部の走査形状
は直線だけでなく円弧やその他任意の形状であつ
ても振動ビーム側を対応させれば不都合はない。
また走査は相対的なものであるので、被加工物側
を移動せずに、レーザビーム側を走査するように
してもよい。 Incidentally, in the above embodiments, the reflecting mirror 2 is of a galvanometer type, but is not limited to this.
It is also possible to use a method in which a polygon mirror is rotated to repeatedly scan a small range of distance at high speed. Further, even if the scanning shape of the processing part is not only a straight line but also a circular arc or any other arbitrary shape, there is no problem as long as the vibration beam side is matched.
Furthermore, since scanning is relative, the laser beam side may be scanned without moving the workpiece side.
以上詳述したように、パルスレーザビームを加
工走査上で小範囲に反復動作を繰り返すととも
に、その小範囲の振幅中に振幅の一端が被加工物
の表面に集束し、上記振幅の他端が被加工物の裏
面に集束するようにして加工を行うようにしたの
で、徐々に切り屑される如く斜めの切断面を形成
する。この斜めの切断面は第3図のように被加工
物5を斜めにした場合ではほぼ水平面となり、最
小スポツトが被加工物の厚みの全域にわたること
になり、上記のような効果を得るほか、溶融物を
効率よく外部に排除するばかりでなく、ばりのな
い高精度な切断面にすることができた。 As detailed above, when the pulsed laser beam is repeatedly operated in a small range on the processing scan, one end of the amplitude is focused on the surface of the workpiece during the amplitude of the small range, and the other end of the amplitude is focused on the surface of the workpiece. Since the machining is performed so that the chips are concentrated on the back surface of the workpiece, an oblique cut surface is formed so that the chips are gradually removed. When the workpiece 5 is made oblique as shown in FIG. 3, this oblique cut surface becomes a nearly horizontal plane, and the minimum spot extends over the entire thickness of the workpiece, which provides the above-mentioned effects. Not only was the molten material efficiently expelled to the outside, but the cutting surface was also burr-free and highly accurate.
第1図はこの発明の従来技術を説明するための
構成図、第2図は第1図における加工部を示す平
面図、第3図はこの発明の一実施例を説明するた
めの図である。
1……パルスレーザ発振器、2……反射鏡、3
a……多重ビーム、4……集光レンズ、5……被
加工物、6……移動テーブル、8……振動駆動
源、10……切断面。
FIG. 1 is a block diagram for explaining the prior art of this invention, FIG. 2 is a plan view showing a processing part in FIG. 1, and FIG. 3 is a diagram for explaining one embodiment of this invention. . 1...Pulse laser oscillator, 2...Reflector, 3
a... Multiple beam, 4... Condensing lens, 5... Workpiece, 6... Moving table, 8... Vibration drive source, 10... Cutting surface.
Claims (1)
トに集束された集束レーザビームを加工部に相対
的に走査して行うレーザ切断装置において、上記
レーザビームに対し上記加工走査の全長の一部を
振幅範囲とした振動ビームにする手段と、上記被
加工物の加工面に対し上記振動ビームが斜めに入
射するように上記被加工物を傾斜して保持するテ
ーブルとを備えたことを特徴とするレーザ切断装
置。1 In a laser cutting device that scans a focused laser beam focused on a minute spot relative to a processing part according to the processing scanning shape of a workpiece, a part of the total length of the processing scan is applied to the laser beam. The method is characterized by comprising means for generating a vibrating beam with an amplitude range, and a table that holds the workpiece at an angle so that the vibration beam is obliquely incident on the processing surface of the workpiece. Laser cutting equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56063962A JPS57181787A (en) | 1981-04-30 | 1981-04-30 | Laser working method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56063962A JPS57181787A (en) | 1981-04-30 | 1981-04-30 | Laser working method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57181787A JPS57181787A (en) | 1982-11-09 |
| JPH0159076B2 true JPH0159076B2 (en) | 1989-12-14 |
Family
ID=13244433
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56063962A Granted JPS57181787A (en) | 1981-04-30 | 1981-04-30 | Laser working method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57181787A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6676878B2 (en) | 2001-01-31 | 2004-01-13 | Electro Scientific Industries, Inc. | Laser segmented cutting |
| US7157038B2 (en) | 2000-09-20 | 2007-01-02 | Electro Scientific Industries, Inc. | Ultraviolet laser ablative patterning of microstructures in semiconductors |
| KR20100107253A (en) | 2009-03-25 | 2010-10-05 | 삼성모바일디스플레이주식회사 | Substrate cutting appartus and method for cutting substrate using the same |
| KR101041137B1 (en) | 2009-03-25 | 2011-06-13 | 삼성모바일디스플레이주식회사 | Substrate cutting device and substrate cutting method using same |
| DE102011108405A1 (en) * | 2011-07-23 | 2013-01-24 | Volkswagen Aktiengesellschaft | Introducing cutting kerf extending between starting point and end point, into workpiece by laser ablation cutting, comprises e.g. repeatedly passing cutting kerf with energy beam, in cutting direction between starting point and end point |
| DE102013204222B4 (en) * | 2013-03-12 | 2017-09-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | METHOD AND SYSTEM FOR PROCESSING AN OBJECT WITH A LASER BEAM |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS511836U (en) * | 1974-06-19 | 1976-01-08 |
-
1981
- 1981-04-30 JP JP56063962A patent/JPS57181787A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57181787A (en) | 1982-11-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6638011B2 (en) | Laser processing machine and laser processing method | |
| JP2016516584A (en) | Linking beam angle and workpiece movement for taper control | |
| JP2019025539A (en) | Laser processing device | |
| TW202212036A (en) | Laser processing system and method thereof | |
| WO2015008482A1 (en) | Laser processing device, laser processing method, and laser oscillation device | |
| JPS6239539B2 (en) | ||
| JP3257157B2 (en) | CO2 laser drilling device and method | |
| JPH0159076B2 (en) | ||
| JPH02137687A (en) | Laser light condensing device | |
| EP0428610B1 (en) | Cutting using high energy radiation | |
| JPS6054151B2 (en) | Laser cutting method | |
| JPH06170563A (en) | Working method using pulse laser light | |
| JPS6317035B2 (en) | ||
| KR102635396B1 (en) | Laser beam irradiation device for FULL cutting of semiconductor and operation method THEREOF | |
| JP6643442B1 (en) | Laser processing machine and laser processing method | |
| JP2581574B2 (en) | Laser processing method and apparatus | |
| JPH10202387A (en) | Welding method and welding apparatus using the same | |
| JP2003033893A (en) | Laser processing method and processing apparatus | |
| JPS62168688A (en) | Laser beam machining device | |
| JPH01104493A (en) | Laser processing machine | |
| KR100356379B1 (en) | Laser machinning method and the apparatus adopting the same | |
| JP7460193B2 (en) | Laser beam irradiation device and its operating method for complete semiconductor cutting | |
| KR102724285B1 (en) | Laser processing device using objective lens and method of operation thereof | |
| JP2872792B2 (en) | Laser marking device | |
| JP7291527B2 (en) | Laser processing machine and laser processing method |