JPH01298719A - Aligner - Google Patents

Aligner

Info

Publication number
JPH01298719A
JPH01298719A JP88128350A JP12835088A JPH01298719A JP H01298719 A JPH01298719 A JP H01298719A JP 88128350 A JP88128350 A JP 88128350A JP 12835088 A JP12835088 A JP 12835088A JP H01298719 A JPH01298719 A JP H01298719A
Authority
JP
Japan
Prior art keywords
blocks
slit
signals
disposed
array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP88128350A
Inventor
Mutsuo Hirai
Original Assignee
Hitachi Hokkai Semiconductor Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Hokkai Semiconductor Ltd, Hitachi Ltd filed Critical Hitachi Hokkai Semiconductor Ltd
Priority to JP88128350A priority Critical patent/JPH01298719A/en
Publication of JPH01298719A publication Critical patent/JPH01298719A/en
Application status is Pending legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control, in all parts of the microlithographic apparatus, e.g. pulse length control, light interruption
    • G03F7/70558Dose control, i.e. achievement of a desired dose
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • G03F7/70066Size and form of the illuminated area in the mask plane, e.g. REMA

Abstract

PURPOSE: To extremely easily set optimum exposure conditions by longitudinally dividing a slit light into a plurality of blocks, producing the illuminances of the respective blocks as electric amounts of the respective blocks, and controlling slit opening width varying means disposed at positions corresponding to the blocks in response to the electricity amounts.
CONSTITUTION: Many sensors 36, optoelectric transducers, are disposed with regularity in a sensor array 21. The sensors 36 are disposed in an array state on a whole surface in which lights passed through slits 19 are radiated. The array 21 is divided in rows into n pieces of blocks, and signals corresponding to illuminances S1WSn are transmitted from the blocks to a slit controller 35. The controller 35 receives the signals S1WSn, processes the signals, transmits them to drive control signals Q1WQn to an actuator 32 so that the illuminance distribution of slit lights 37 becomes uniform, and partly alters an elastic unit 31a in the opening widths D of the slits 19. Thus, a region in which the light passes a slit 30 can be corrected.
COPYRIGHT: (C)1989,JPO&Japio
JP88128350A 1988-05-27 1988-05-27 Aligner Pending JPH01298719A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP88128350A JPH01298719A (en) 1988-05-27 1988-05-27 Aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP88128350A JPH01298719A (en) 1988-05-27 1988-05-27 Aligner

Publications (1)

Publication Number Publication Date
JPH01298719A true JPH01298719A (en) 1989-12-01

Family

ID=14982640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP88128350A Pending JPH01298719A (en) 1988-05-27 1988-05-27 Aligner

Country Status (1)

Country Link
JP (1) JPH01298719A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6509954B1 (en) 1993-06-30 2003-01-21 Nikon Corporation Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method
US6608665B1 (en) 1993-06-11 2003-08-19 Nikon Corporation Scanning exposure apparatus having adjustable illumination area and methods related thereto
JP2008172256A (en) * 1997-03-31 2008-07-24 Asml Holding Nv Adjustable slit device and method of varying line width
JP2010056456A (en) * 2008-08-29 2010-03-11 Nikon Corp Blind unit, variable slit device, and exposure device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62193125A (en) * 1986-02-19 1987-08-25 Canon Inc Exposure-uneveness correcting apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62193125A (en) * 1986-02-19 1987-08-25 Canon Inc Exposure-uneveness correcting apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6608665B1 (en) 1993-06-11 2003-08-19 Nikon Corporation Scanning exposure apparatus having adjustable illumination area and methods related thereto
US6509954B1 (en) 1993-06-30 2003-01-21 Nikon Corporation Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method
US6795169B2 (en) 1993-06-30 2004-09-21 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US7023527B2 (en) 1993-06-30 2006-04-04 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US7088425B2 (en) 1993-06-30 2006-08-08 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP2008172256A (en) * 1997-03-31 2008-07-24 Asml Holding Nv Adjustable slit device and method of varying line width
JP2010056456A (en) * 2008-08-29 2010-03-11 Nikon Corp Blind unit, variable slit device, and exposure device

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