JPH01289919A - Manufacture of display device - Google Patents

Abstract

PURPOSE:To decrease working stages by forming picture electrodes, electrodes, and a short ring which connects source terminals, and gate terminals and the source terminals, and feeding electricity to the short ring and plating the gate electrodes, gate terminals, and source terminals. CONSTITUTION:The picture element electrodes 2, linear gate electrodes and their wiring 3, gate elements 8, and short ring 10 which short-circuits the source terminals 9, and gate terminals 8 and source terminals 9 outside them are formed. Then plating films 11 of metal such as Ni and Cr are deposited by electroplating on the gate electrodes and their wiring 3, gate terminals 8, source terminals 9, and short ring 10. At this time, the picture element electrodes 2 are not electrically conductive, so no plating film is deposited. Consequently, pattern working stages are less in frequency than those of a conventional method by one and cost reduction and high yield are realized.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application] The present invention relates to a method of manufacturing a matrix type display device such as a liquid crystal display device.

[Conventional technology]

This type of matrix type display device is usually constructed by a method in which a display material such as a liquid crystal is sandwiched between two opposing substrates, and a voltage is applied to the display material.

At this time, pixel electrodes arranged in a matrix are provided on at least one of the substrates, and in order to selectively operate these pixels, an active element having nonlinear characteristics such as TPT is provided for each pixel.

Conventionally, as this type of display device, for example, Japanese Patent Application Laid-Open No. 61-2
There is one disclosed in Japanese Patent No. 48564, and its structure is shown in FIGS. 4 to 6. FIG. 4 is a plan view showing the entire TFT array substrate formed by the conventional manufacturing method of a matrix type display device, FIG. 5 is a plan view of one pixel, and FIG. 6 is a line II-II line in FIG. 5. FIG. In each figure, 1 is a transparent insulating substrate, 2 is a pixel electrode on this substrate 1, 3 is a gate electrode and its wiring provided on the substrate 1, 4 is a gate insulating film on the gate electrode 3, and 5 is this insulating film. The semiconductor films 6 and 7 formed on the film 4 are a source electrode connected to the semiconductor film 5, its wiring, and a drain electrode. 8 is a gate terminal, and 9 is a source terminal.

In the display device configured as described above, a plurality of gate wirings 3 are arranged in parallel as a whole, and a plurality of source wirings @6 are arranged in parallel across the gate wiring #I3, and the gate and source wirings 3, The drain electrode 7, the gate insulating film 4, the semiconductor film 5, and the gate electrode 3 and the source electrode 6 provided at the intersection of the gate electrodes 6 constitute a TPT having nonlinear characteristics,
This active element and the pixel electrode 2 constitute a TFT array substrate. A counter electrode substrate (not shown) having a transparent electrode etc. on the surface is provided opposite to this TFT array substrate, and a display material such as liquid crystal is sandwiched between the TPT play substrate and the counter electrode substrate to form a matrix shape. Configure the display device.

[Problem to be solved by the invention]

However, when manufacturing a TFT array substrate, at least five pattern processing steps are required, and each time defects occur due to poor patterning or defects due to foreign matter adhering to the substrate after each step, which reduces product yield. In addition, high costs due to the large number of steps are unavoidable. Further, the gate terminal 8 and the source terminal 9 are respectively connected to a gate electrode and its wiring 3 and a source electrode and its wiring! At the same time as No. 6, since the terminals are made of materials such as AI and Cr, there is a problem in that highly reliable solder cannot be used when connecting the terminals to external circuits.

The present invention has been made to solve the above-mentioned conventional problems, and an object of the present invention is to provide a method for manufacturing a matrix type display device that can be manufactured by reducing at least one pattern processing step.

[Means to solve the problem]

A method for manufacturing a display device according to the present invention includes forming a short ring connecting a pixel electrode, a gate electrode, a source terminal, and a source=3− terminal to each other in a matrix display device, and energizing the short ring. Then, metal plating is applied to the gate electrode, gate terminal, and source terminal.

[For production]

In the present invention, since the gate electrode, its wiring, gate terminal, and source terminal are made of ITO and metal plated thereon, the patterning process can be repeated less than once compared to conventional manufacturing methods.

〔Example〕

An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure is a plan view of the entire TFT array substrate of a matrix display device manufactured by the manufacturing method of the present invention, FIG. 2 is an enlarged plan view of one pixel, and FIG. 3 is a sectional view taken along the line I-N in FIG. Reference numeral 11 denotes a metal plating film that coats the surface of the gate electrode and its wiring 3, and all other symbols are the same as in the conventional example, so the same symbols will be given and explanations will be omitted.

Next, a method for manufacturing the above-described TFT array substrate will be explained.

First, ITO (Incl.
Transparent conductive film such as ium Tin Oxide) is
It is deposited using the fish deposition method, etc. Next, using a method such as photo-etching, a short ring 1 is formed to electrically short-circuit the pixel electrode 15, the linear gate electrode, its wiring 3, gate terminal 8, source terminal 9, and gate terminal 8 and source terminal 9 on the outside thereof.
form 0. Next, a plating film 11 of a metal such as Ni or Cr is deposited on the gate electrode, its wiring 3, gate terminal 8, source terminal 9, and short ring 10 by electroplating. At this time, since the pixel electrode 2 is not electrically conductive, no plating film is deposited.

Next, S:N or S:C2, etc., which will become the gate insulating film 4, and hydrogenated amorphous silicon (a
-8i:H) etc. are successively deposited by CVD method or the like.

Next, the semiconductor film 5 is sequentially formed into an island shape, and the gate insulating film 4 is patterned so that at least the pixel electrode 2 and the drain electrode 7 are connected, and further, the source terminal 9 and the source wiring 6 are connected. Next, metals such as Aj and Cr are deposited to form a source electrode, its wiring 6, and a drain electrode i7.

This completes the TFT array substrate.

A display material such as a liquid crystal is sandwiched between the thus formed TFT array substrate and a counter electrode substrate having transparent conductive electrodes, color filters, etc., thereby manufacturing a matrix type display device.

〔Effect of the invention〕

As explained above, according to the present invention, a pixel electrode, a gate electrode and its wiring, a gate terminal, a source terminal, and a short ring that electrically connects the gate terminal and the source terminal are formed, and a current is applied to the short ring to connect the gate electrode to the gate electrode. Since the gate electrode and its wiring, the data terminal and the source terminal are plated with metal, the gate electrode, its wiring, the gate terminal and the source terminal are made of ITO and the metal plated on it, which is easier than the conventional method. Since the pattern processing process is repeated once, lower costs and higher yields can be expected. Further, the gate electrode and its wiring were conventionally formed by sputtering or the like, which required expensive equipment, but in this invention, plating is used, so expensive equipment is unnecessary and the cost is reduced. Furthermore, if you choose Ni as the metal to be plated, you can use soldering to connect the terminals to external circuits.
It is expected that it will be cheaper and more reliable.

[Brief explanation of the drawing]

FIG. 1 is a plan view showing the entire TFT array substrate manufactured by a method for manufacturing a 7-trix display device according to an embodiment of the present invention, FIG. 2 is an enlarged plan view of one pixel, and FIG. 3 is a sectional view taken along the line ■-■ in Fig. 2, and Fig. 4 is a TF manufactured by the conventional method for manufacturing a matrix type display device.
FIG. 5 is an enlarged plan view of one pixel of the T-array substrate, and FIG. 6 is a sectional view taken along the line 1--2 of FIG. 1 is a transparent insulating substrate, 2 is a pixel electrode, 3 is a gate electrode and its wiring, 4 is a gate insulating film, 5 is a semiconductor film, 6 is a source electrode and its wiring, 7 is a drain electrode, 8 is a gate terminal,
9 is a source terminal, 10 is a short ring, and 11 is a metal plating film. In the drawings, the same reference numerals indicate the same or equivalent parts.

Claims (1)

[Claims] A plurality of gate electrodes and their wiring arranged in parallel on a transparent insulating substrate, a plurality of source electrodes and their wiring that intersect with the electrode wiring, and an active element with nonlinear characteristics and a display electrode provided at the intersection of both electrode wirings. Thin film transistor (
TFT) array substrate, a counter electrode substrate facing the array substrate and having a transparent conductive film on its surface, and a display material such as a liquid crystal sandwiched between the counter electrode substrate and the array substrate. In the pixel electrode,
Form a short ring that electrically connects the gate electrode, its wiring, the gate terminal, the source terminal, and all gate terminals and source terminals, and then energizes the short ring to connect the gate electrode, its wiring, the gate terminal, and the source. A method for manufacturing a display device, characterized in that the terminal is formed by plating metal.