JPH01199314A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH01199314A JPH01199314A JP18336188A JP18336188A JPH01199314A JP H01199314 A JPH01199314 A JP H01199314A JP 18336188 A JP18336188 A JP 18336188A JP 18336188 A JP18336188 A JP 18336188A JP H01199314 A JPH01199314 A JP H01199314A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- magnetic
- substrate
- intermediate layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000011651 chromium Substances 0.000 claims abstract description 9
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 9
- 239000010941 cobalt Substances 0.000 claims abstract description 9
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052802 copper Inorganic materials 0.000 claims abstract description 9
- 239000010949 copper Substances 0.000 claims abstract description 9
- 239000010936 titanium Substances 0.000 claims abstract description 9
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 9
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 8
- 239000010955 niobium Substances 0.000 claims abstract description 8
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 7
- 239000013078 crystal Substances 0.000 abstract description 10
- 238000004544 sputter deposition Methods 0.000 abstract description 9
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 21
- 239000002184 metal Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、磁気記録等に用いられる磁気ディスクなどの
磁気記録媒体に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic recording medium such as a magnetic disk used for magnetic recording and the like.
近年、磁気記録媒体はますます高密度記録となる傾向に
あシ、保磁力とS/N比を高くする必要がある。In recent years, there has been a trend toward higher density recording in magnetic recording media, and it is necessary to increase coercive force and S/N ratio.
基板上に非磁性金属下地層(例えばCr ) をスパ
ッタ法によシ成膜し、引き続き磁性金属層(例えばCo
−Ni、Co−Ni−Cr系)を同様の方法で成膜した
多層膜からなる磁気記録媒体は、一般によく知られてい
る。このような層構成からなる磁気記録媒体の保磁力を
高くするには、非磁性金属下地層を厚くするか、あるい
は磁性金属層を薄くすれば長い。しかし、非磁性金属下
地層を厚くすると結晶粒が粗大化し、その上にエピタキ
シャル成長する磁性金属層の結晶粒も粗大化してS/N
比が低下する。又、磁性金属層を薄くすると残留磁束密
度(Sr )が低下し、出力が不足する問題がある。A non-magnetic metal underlayer (e.g. Cr) is formed on the substrate by sputtering, followed by a magnetic metal layer (e.g. Co).
-Ni, Co-Ni-Cr) magnetic recording media made of multilayer films formed by similar methods are generally well known. In order to increase the coercive force of a magnetic recording medium having such a layered structure, the length can be increased by increasing the thickness of the non-magnetic metal underlayer or by decreasing the thickness of the magnetic metal layer. However, when the non-magnetic metal underlayer is made thicker, the crystal grains become coarser, and the crystal grains of the magnetic metal layer epitaxially grown on it also become coarser, resulting in S/N
ratio decreases. Furthermore, if the magnetic metal layer is made thinner, the residual magnetic flux density (Sr) decreases, resulting in a problem of insufficient output.
本発明者らは鋭意検討した結果、基板上に炭素、アルミ
ニウム、チタン、コバルト、銅及びニオブよりなる群か
ら選ばれた成分を含む下引き層を設けることによって、
非磁性金属層の結晶粒が微細化し、連続してスパッタさ
れる磁性金属層の結晶粒も微細化して、高密度記録に適
した磁気記録媒体が得られることを見出し、本発明に到
達した。As a result of extensive studies, the present inventors found that by providing an undercoat layer containing a component selected from the group consisting of carbon, aluminum, titanium, cobalt, copper, and niobium on the substrate,
The inventors have discovered that by making the crystal grains of the non-magnetic metal layer finer, and by making the crystal grains of the continuously sputtered magnetic metal layer finer, a magnetic recording medium suitable for high-density recording can be obtained, and the present invention has been achieved.
すなわち、本発明の要旨は、基板上に炭素、アルミニウ
ム、チタン、コバルト、銅及びニオブよりなる群から選
ばれた成分を含む下引き層を設け、該下引き層の上にC
rを含む中間層を設け、該中間層の上に磁性層を設けて
なる磁気記録媒体に存する。That is, the gist of the present invention is to provide an undercoat layer containing a component selected from the group consisting of carbon, aluminum, titanium, cobalt, copper, and niobium on a substrate, and to deposit C on the undercoat layer.
A magnetic recording medium includes an intermediate layer containing r and a magnetic layer provided on the intermediate layer.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明で使用する基板は、NiPメツキを施したアルミ
ニウム合金基板である。NiPメツキ皮膜は公知の無電
解メツキ法により、アルミニウム合金基板上に20μm
”−,2s pmの膜厚に成膜する。その後、基板表面
を機械研摩により、Ra (中心線平均粗さ)で20
A〜、?OAに仕上げる。The substrate used in the present invention is an aluminum alloy substrate plated with NiP. The NiP plating film was deposited on an aluminum alloy substrate with a thickness of 20 μm using a known electroless plating method.
A film is formed to a film thickness of 1.5"-2s pm.Then, the substrate surface is mechanically polished to an Ra (center line average roughness) of 20.
A~,? Finish to OA.
本発明では、基板上に炭素、アルミニウム、チタン、コ
バルト、銅及びニメブよりなる群から選ばれた成分を含
む下引き層を設ける。具体的には、基板上に炭素、アル
ミニウム、チタン、コバルト、銅及びニオブよりなる群
から選ばれた成分を含む膜を30θA−!0OOA、好
ましく1は!00A S−3000ACD展厚に成膜す
る。In the present invention, an undercoat layer containing a component selected from the group consisting of carbon, aluminum, titanium, cobalt, copper, and nimeb is provided on the substrate. Specifically, a film containing a component selected from the group consisting of carbon, aluminum, titanium, cobalt, copper, and niobium is deposited on a substrate at 30θA-! 0OOA, preferably 1! 00A S-3000ACD film is formed to an expanded thickness.
その成膜は、通常行われているスパッタ法により行われ
る。例えば、直流式スパッタ装置又は交流式スパッタ装
置を使用して行い、基板を装着した装置内を予め/ X
1O−5torr以下に排気し、スパッタリング用ガ
スとしてアルゴンを分圧j X 10−3〜II X
10−” torr装入し、基板を室温から200℃ま
での範囲で加熱する。The film is formed by a commonly used sputtering method. For example, it is performed using a DC sputtering device or an AC sputtering device, and the inside of the device on which the substrate is mounted is pre-coated with /
Evacuate to 1O-5 torr or less, and use argon as a sputtering gas at a partial pressure of j x 10-3 to II
10-'' torr and heat the substrate in a range from room temperature to 200°C.
炭素、アルミニウム、チタン、コバルト、銅およびニオ
ブ等の各ターゲットは高純度であるほうが望ましいが、
他の金属をO−Sθ原子チ含んでもよい。この下引き層
は、中間層、磁性金属層の結晶粒を微細化させる為に重
要であり、その成膜面は緻密であることが望ましい。It is desirable that targets such as carbon, aluminum, titanium, cobalt, copper, and niobium have high purity;
Other metals may also be included in the O-Sθ atoms. This undercoating layer is important for making the crystal grains of the intermediate layer and the magnetic metal layer fine, and it is desirable that the surface on which it is formed is dense.
次に、該下引き層の上にクロムを含む中間層を上記スパ
ッタ法と同一条件において!;001k。Next, an intermediate layer containing chromium is formed on the undercoat layer under the same conditions as the above sputtering method! ;001k.
〜1oooohの膜厚で成膜するが、高密度記録に使用
するためには、1000A−jθθoAの膜厚が望まし
い。ターゲットはクロムを主成分としたものであり、他
の金属な0−10原子チ含んでいてもよい。Although the film is formed to a thickness of ~1ooooh, a film thickness of 1000A-jθθoA is desirable for use in high-density recording. The target is mainly composed of chromium and may also contain 0-10 atoms of other metals.
次に該中間層の上に磁性金属層を上記スパッタ法と同一
条件において2oθAA−コθoolの膜厚で成膜する
。磁性金属層はコバルトを主成分としたものであり、ニ
ッケル、クロム、白金等の他の金属を含んでいてもよい
。ターゲットとしては、例えば、CogO原子チーNi
コ0原子チ、Co7ダ原子%−Nilt原子%−Crg
原子チ、CoA2.!;原子%−Ni30原子% −C
r7.3原子チのものが一般的に使用される。Next, a magnetic metal layer is formed on the intermediate layer to a thickness of 2oθAA-koθoool under the same conditions as the above sputtering method. The magnetic metal layer has cobalt as its main component, and may also contain other metals such as nickel, chromium, and platinum. As a target, for example, CogO atom Qi Ni
Co0 atom, Co7 da atom%-Nilt atom%-Crg
Atom Q, CoA2. ! ; atomic%-Ni30 atomic%-C
Those with r7.3 atoms are generally used.
このようにして製造された磁気記録媒体は、下引き属の
ない媒体て比べ、磁性金属層の結晶粒を微細化すること
ができる。In the magnetic recording medium manufactured in this way, the crystal grains of the magnetic metal layer can be made finer than in a medium without an undercoat.
以下、本発明を実施例により説明するが、本発明はその
要旨を越えない限り実施例により限定されるものでは、
ない。The present invention will be explained below with reference to Examples, but the present invention shall not be limited by the Examples unless it goes beyond the gist of the invention.
do not have.
実施例1
直流式マグネトロンスパッタ装置によりNiPメツキを
施したアルミニウム合金板上べ、下引き層、中間層、磁
性金属層をアルゴン界囲気下次の条件°で連続スパッタ
した。Example 1 A NiP-plated aluminum alloy plate top plate, undercoat layer, intermediate layer, and magnetic metal layer were continuously sputtered under the following conditions under an argon atmosphere using a direct current type magnetron sputtering device.
初期排気 l〜コX10″torr
アルゴン分圧 / X / 0−2toor基板加
熱 なしく室温)
下引き層用ターゲット Co(純度??。9多以上)
中間層用ターゲラ)Cr(純度99.9%以上)磁性金
属層用ターゲラ) Coqa原子%−Ni/f原子
チーCrざ原子係
下引き層膜厚 約1000に
中間層膜厚 約、yoool
磁性金属層膜厚 約 600)。Initial exhaust 1~CoX10''torr Argon partial pressure /
Target layer for intermediate layer) Cr (purity 99.9% or higher) Target layer for magnetic metal layer) Coqa atomic % - Ni/f atomic Qi Cr Zn sublayer film thickness: approx. 1000 Intermediate layer film thickness: approx., yoool Magnetic metal Layer thickness approximately 600).
結果を第1表に示した。The results are shown in Table 1.
実施例コ
下引き層用ターゲットとして銅(純度背、?チ以上)を
使用したこと以外は実施例1と同様に行なった。結果を
第1表に示した。S/N比は3J、OdBであり、後述
の比較例に比べ八、1−dB向上した。Example 1 The same procedure as Example 1 was carried out except that copper (purity: 100% or higher) was used as the target for the undercoat layer. The results are shown in Table 1. The S/N ratio was 3 J, OdB, which was improved by 8.1-dB compared to the comparative example described below.
実施例3
下引き層用ターゲットとしてニオブ(純度99.9%以
上)を使用したこと以外は実施例1と同様に行なった。Example 3 The same procedure as Example 1 was carried out except that niobium (purity of 99.9% or more) was used as the target for the undercoat layer.
結果を第1表に示した。The results are shown in Table 1.
S/N比は3 y、2 dBであり、後述の比較例に比
べ2.7 dB向上した。The S/N ratio was 3 y, 2 dB, which was improved by 2.7 dB compared to the comparative example described below.
実施例グ
下引き層用ターゲットとしてチタン(純度99.94以
上)を使用したこと以外は実施例1と同様に行なった。Example 1 The same procedure as Example 1 was conducted except that titanium (purity 99.94 or higher) was used as the target for the undercoat layer.
結果を第1表に示した。The results are shown in Table 1.
実施例S
下引き層用ターゲットとして、アルミニウム(純度99
.94以上)を使用したこと以外は実施例/と同様に行
なった。結果を第1表に示した。S/N比は、311.
t dBであり、後述の比較例に比べ3.!;dB向上
した。Example S Aluminum (purity 99
.. 94 or higher) was used in the same manner as in Example/. The results are shown in Table 1. The S/N ratio is 311.
t dB, which is 3. ! ; improved by dB.
実施例6
下引き層用ターゲットとして炭素(純度9?、9?9%
)を使用したこと以外は実施例/と同様に行なった。結
果を第1表に示した。S/N比は1.33.!;dBで
あり、後述の比較例に比ベコ、OdB向上した。Example 6 Carbon (purity 9?, 9?9%) as target for undercoat layer
) was used in the same manner as in Example/. The results are shown in Table 1. The S/N ratio is 1.33. ! ;dB, which is an OdB improvement compared to the comparative example described below.
比較例/
下引き層を成膜しなかった以外は実施例/と同様に行っ
た。結果を第1表に示す。S/N 比は3八よdBであ
りた。Comparative Example The same procedure as in Example was carried out except that the undercoat layer was not formed. The results are shown in Table 1. The S/N ratio was 38 dB.
第 / 表
第1表に示したよう罠、下引き層を有した場合の磁性金
属層の結晶粒は、下引ぎ層がない場合に比べ微細化して
いる。Table 1 As shown in Table 1, the crystal grains of the magnetic metal layer with the trap and underlayer are finer than those without the underlayer.
本発明によると、磁性金属層の結晶粒を微細化すること
かできるため、高純度記録に適した磁気記録媒体を提供
することができる。According to the present invention, since the crystal grains of the magnetic metal layer can be made finer, it is possible to provide a magnetic recording medium suitable for high-purity recording.
Claims (1)
、銅及びニオブよりなる群から選ばれた成分を含む下引
き層を設け、該下引き層の上にクロムを含む中間層を設
け、該中間層の上に磁性層を設けてなる磁気記録媒体。(1) An undercoat layer containing a component selected from the group consisting of carbon, aluminum, titanium, cobalt, copper, and niobium is provided on a substrate, an intermediate layer containing chromium is provided on the undercoat layer, and an intermediate layer containing chromium is provided on the undercoat layer. A magnetic recording medium that has a magnetic layer on top of the magnetic layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63183361A JP2797326B2 (en) | 1987-10-05 | 1988-07-22 | Magnetic recording media |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62-250915 | 1987-10-05 | ||
JP25091587 | 1987-10-05 | ||
JP63183361A JP2797326B2 (en) | 1987-10-05 | 1988-07-22 | Magnetic recording media |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01199314A true JPH01199314A (en) | 1989-08-10 |
JP2797326B2 JP2797326B2 (en) | 1998-09-17 |
Family
ID=26501834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63183361A Expired - Fee Related JP2797326B2 (en) | 1987-10-05 | 1988-07-22 | Magnetic recording media |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2797326B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6804822B2 (en) * | 2001-04-27 | 2004-10-12 | Sharp Kabushiki Kaisha | Magnetic recording medium and magnetic recording apparatus using same |
CN102443405A (en) * | 2010-10-09 | 2012-05-09 | 中国科学院理化技术研究所 | Peak regulating method and device for oil and gas condensing recovery |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63187416A (en) * | 1987-01-29 | 1988-08-03 | Hitachi Ltd | Magnetic recording medium |
-
1988
- 1988-07-22 JP JP63183361A patent/JP2797326B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63187416A (en) * | 1987-01-29 | 1988-08-03 | Hitachi Ltd | Magnetic recording medium |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6804822B2 (en) * | 2001-04-27 | 2004-10-12 | Sharp Kabushiki Kaisha | Magnetic recording medium and magnetic recording apparatus using same |
CN102443405A (en) * | 2010-10-09 | 2012-05-09 | 中国科学院理化技术研究所 | Peak regulating method and device for oil and gas condensing recovery |
Also Published As
Publication number | Publication date |
---|---|
JP2797326B2 (en) | 1998-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |