JPH01155520A - Production of perpendicular magnetic recording medium - Google Patents
Production of perpendicular magnetic recording mediumInfo
- Publication number
- JPH01155520A JPH01155520A JP31428587A JP31428587A JPH01155520A JP H01155520 A JPH01155520 A JP H01155520A JP 31428587 A JP31428587 A JP 31428587A JP 31428587 A JP31428587 A JP 31428587A JP H01155520 A JPH01155520 A JP H01155520A
- Authority
- JP
- Japan
- Prior art keywords
- film
- permalloy
- heat treatment
- recording medium
- perpendicular magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 50
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 229910000889 permalloy Inorganic materials 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 229920001721 polyimide Polymers 0.000 claims abstract description 24
- 238000010438 heat treatment Methods 0.000 claims abstract description 23
- 229910000599 Cr alloy Inorganic materials 0.000 claims abstract description 12
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims abstract description 4
- 238000004544 sputter deposition Methods 0.000 claims description 13
- 238000004804 winding Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 1
- 239000000696 magnetic material Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 230000003313 weakening effect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000005415 magnetization Effects 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高密度Ｃｎ気記録用の垂直磁気記録媒体の製
造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method of manufacturing a perpendicular magnetic recording medium for high-density Cn gas recording.
（従来の技術）
最近、高密度の磁気記録を可能とする記録方式として垂
直磁気記録方式が注目されている。かかる記録方式に用
いる垂直磁気記録媒体としては、軟磁性膜と垂直磁化膜
とからなる２層膜媒体が提案されている（例えば特公昭
５Ｂ−９１号公報）。(Prior Art) Recently, perpendicular magnetic recording has attracted attention as a recording method that enables high-density magnetic recording. As a perpendicular magnetic recording medium used in such a recording system, a two-layer film medium consisting of a soft magnetic film and a perpendicular magnetization film has been proposed (for example, Japanese Patent Publication No. 5B-91).
この垂直磁気記録媒体は、基本的には第１図に示すよう
な構成になっている。同図に示したところにおいて、番
号１はポリエチレンテレフタレー） （ＰＥＴ）ポリイ
ミドなどのプラスチックフィルムや非磁性剛体からなる
基板、そして２はパーマロイやアモルファスなどからな
る軟磁性膜、３はＣｏ−Ｃｒ合金などからなる垂直磁化
膜であり、該基板１上に軟磁性膜２、ついで垂直磁化膜
３を被成することによって垂直磁気記録媒体を製造して
いる。This perpendicular magnetic recording medium basically has a configuration as shown in FIG. In the figure, number 1 is a substrate made of a plastic film such as polyethylene terephthalate (PET) polyimide or a nonmagnetic rigid body, number 2 is a soft magnetic film made of permalloy or amorphous, and number 3 is a Co-Cr alloy. A perpendicular magnetic recording medium is manufactured by forming a soft magnetic film 2 and then a perpendicular magnetic film 3 on the substrate 1.
ところで、上記の垂直磁気記録媒体の製造過程において
、基板は、加熱脱ガス処理時及び垂直磁化膜形成時に１
００℃以上の高温にさらされる。従ってＰＥＴフィルム
のようなガラス転位温度の低い基板を用いると、オリゴ
マーの発生や局所的な基板変形が起こり易く、記録媒体
の性能に悪影蓉を及ぼすことがある。そのため基板とし
ては、ガラス転位温度が高いポリイミドフィルムがよく
用いられている。By the way, in the manufacturing process of the above-mentioned perpendicular magnetic recording medium, the substrate is heated to 1.
Exposure to high temperatures of 00°C or higher. Therefore, when a substrate with a low glass transition temperature such as a PET film is used, oligomer generation and local substrate deformation are likely to occur, which may adversely affect the performance of the recording medium. Therefore, polyimide films with a high glass transition temperature are often used as substrates.
また軟磁性層は、垂直ヘッドによる記録・再生に際し、
ヘッド系の一部を構成することがら、その磁気特性は記
録効率や再生感度に強く影響し、軟磁性に冨むほど記録
効率や再生感度は良好である。従って、軟磁性膜は軟磁
特性に優れるほど好ましく、主にパーマロイが用いられ
ている。In addition, the soft magnetic layer is
Since it constitutes a part of the head system, its magnetic properties have a strong influence on recording efficiency and reproduction sensitivity, and the more soft the magnetism is, the better the recording efficiency and reproduction sensitivity are. Therefore, the soft magnetic film has better soft magnetic properties, and permalloy is mainly used.
さらに垂直磁化膜については、より真密度の記録を実現
するためには、結晶のＣ軸を基板面に垂直に配向させる
ことが肝要であり、しかもその分散角Δθ、。をより小
さくすることが要望される。Furthermore, for perpendicularly magnetized films, in order to achieve higher true density recording, it is important to orient the C-axis of the crystal perpendicular to the substrate surface, and the dispersion angle Δθ. It is desired to make it smaller.
そのため垂直磁化膜としては、上記の性能に優れたＣｏ
−Ｃｒ合金が好適とされている。なおＣ。Therefore, as a perpendicular magnetization film, Co
-Cr alloy is preferred. Furthermore, C.
−Ｃｒ合金は、パーマロイ膜上にエピタキシアルな成長
をするといわれており、従って上記の分散角Δθ、０を
小さくするためには、パーマロイの＜１１１＞軸の結晶
配向分散角Δθ５ｏ（１１１）を小さくすることが重要
である。-Cr alloys are said to grow epitaxially on permalloy films. Therefore, in order to reduce the above dispersion angle Δθ, 0, the crystal orientation dispersion angle Δθ5o(111) of the <111> axis of permalloy must be reduced. It is important to keep it small.
そしてプラスチックフィルム基板上に、軟磁性膜と垂直
磁化膜の２層膜媒体を形成する場合には、巻取り式のス
パッタ装置や蒸着装置が一般的に用いられている。When forming a two-layer film medium of a soft magnetic film and a perpendicular magnetization film on a plastic film substrate, a winding type sputtering device or vapor deposition device is generally used.
また上記の如き磁性膜の形成に当たっては、それに先立
ち加熱やグロー放電などの熱処理によって基板波めっき
材の吸着ガスを除去し、もって基板と磁性膜との付着強
度を高めている。Furthermore, in forming the magnetic film as described above, the adsorbed gas of the substrate wave plating material is removed by heat treatment such as heating or glow discharge prior to the formation, thereby increasing the adhesion strength between the substrate and the magnetic film.
（発明が解決しようとする問題点）
ポリイミドフィルムを基板とし、複雑なローラー糸を有
する巻取り弐のスパッタ装置を用い−ご磁性膜を被成す
る場合、吸着ガス除去のための熱処理を施したのち冷却
された基板上にパーマロイ膜を被成したとき、ともすれ
ば該パーマロイ膜に垂直磁気異方性が発生し、面内で測
定した抗磁力が大きくなって磁気記録能が劣化するとこ
ろに問題を残していた。(Problems to be Solved by the Invention) When a polyimide film is used as a substrate and a magnetic film is formed using a winding sputtering device having a complicated roller thread, heat treatment is performed to remove adsorbed gases. When a permalloy film is later formed on a cooled substrate, perpendicular magnetic anisotropy may occur in the permalloy film, increasing the coercive force measured in the plane and deteriorating the magnetic recording ability. I was left with a problem.
本発明は、上記の問題を有利に解決するもので、複雑な
ローラー糸を有する巻取り弐のスパッタ装置を用いてポ
リイミドフィルム基板上にパーマロイとＣｏ−Ｃｒ合金
からなる２層磁性膜を形成する場合であっても、パーマ
ロイ層の垂直磁気異方性の発生を効果的に抑制して、抗
磁力の小さい磁気記録能に優れた垂直磁気記録媒体の有
利な製造方法を提案することを目的とする。The present invention advantageously solves the above problems by forming a two-layer magnetic film of permalloy and Co-Cr alloy on a polyimide film substrate using a two-winding sputtering device with a complex roller thread. The purpose of this study is to propose an advantageous manufacturing method for a perpendicular magnetic recording medium that effectively suppresses the occurrence of perpendicular magnetic anisotropy in a permalloy layer even when do.
（問題点を解決するための手段）
さて、本発明者らは、上記の問題を解決すべく鋭意研究
を重ねた結果、パーマロイ層におケル垂直磁気異方性の
発生はポリイミドフィルムの熱処理法と密接な関係にあ
ることの知見を得た。(Means for Solving the Problems) As a result of extensive research to solve the above problems, the inventors of the present invention have found that the generation of perpendicular magnetic anisotropy in the permalloy layer can be achieved by heat treatment of polyimide films. We obtained knowledge that there is a close relationship with
すなわち、２層膜形式に先立つポリイミド基板の熱処理
は、従来、吸着ガスの除去能率を高めるべく、１５０〜
２００℃程度の温度で行われていたのであるが、かよう
な高温処理によってパーマロイ膜の垂直磁気異方性が発
現すること、これに対し処理温度を１５０°Ｃ以下に低
減してやれば、上記の問題が有利に解消されることを見
出したのである。That is, the heat treatment of the polyimide substrate prior to the two-layer film format has conventionally been performed at a temperature of 150 to
This process was carried out at a temperature of about 200°C, but such high-temperature processing causes the permalloy film to exhibit perpendicular magnetic anisotropy.However, if the processing temperature is lowered to 150°C or less, the above-mentioned effects can be achieved. They found that the problem could be solved advantageously.
本発明は、上記の知見に立脚するものである。The present invention is based on the above findings.
すなわち本発明は、巻取り弐のスパッタ装置を用いて、
熱処理により被めっき材の吸着ガスを除去したポリイミ
ドフィルム基板上に、磁歪定数が正であるＦｅ−Ｎｉ系
パーマロイからなる軟磁性層とＣｏ−Ｃｒ合金からなる
垂直磁化膜とを被成することによって、２層膜垂直磁気
記録媒体を製造するに当たり、上記２層膜被成前におけ
るポリイミドフィルム基板の熱処理を、１５０℃以下で
行うことからなる垂直磁気記録媒体の製造方法である。That is, the present invention uses a sputtering device with two windings,
By forming a soft magnetic layer made of Fe-Ni permalloy with a positive magnetostriction constant and a perpendicular magnetization film made of Co-Cr alloy on a polyimide film substrate from which adsorbed gas of the material to be plated has been removed by heat treatment. , is a method for manufacturing a perpendicular magnetic recording medium, which comprises heat-treating a polyimide film substrate at a temperature of 150° C. or lower before forming the two-layer film.
（作 用）
ポリイミドフィルムの熱処理温度によって、パーマロイ
層の磁気特性が大きな影響を受ける理由については、ま
だ明確に解明されたわけではないが、次のとおりと考え
られる。(Function) Although the reason why the magnetic properties of the permalloy layer are greatly affected by the heat treatment temperature of the polyimide film has not yet been clearly elucidated, it is thought to be as follows.
すなわちポリイミドフィルム上に被成するパーマロイの
磁歪定数が正の符号を有する場合、パーマロイ膜の面内
に強い圧縮応力が存在すると、その磁気歪み異方性は膜
面に垂直方向に磁化容易軸を有するものとなる。ここに
かかる圧縮性残留応力は、熱処理温度によって異なるフ
ィルム基板上の残留ガスや、該基板上に残存している溶
剤、さらにはスパッタ装置内部に残留している不純物ガ
スなどから微妙な影響を受ける。In other words, when the magnetostriction constant of permalloy formed on a polyimide film has a positive sign, if strong compressive stress exists in the plane of the permalloy film, the magnetostriction anisotropy will have an axis of easy magnetization perpendicular to the film surface. Become what you have. The compressive residual stress applied here is subtly influenced by the residual gas on the film substrate, which varies depending on the heat treatment temperature, the solvent remaining on the substrate, and even the impurity gas remaining inside the sputtering equipment. .
そしてパーマロイの残留応力は、ポリイミドフィルムの
熱処理温度が１５０℃を超えた場合に大きくなり、一方
１５０℃以下では小さ（なるものと考えられる。The residual stress of permalloy becomes large when the heat treatment temperature of the polyimide film exceeds 150°C, while it is thought to become small when the heat treatment temperature of the polyimide film exceeds 150°C.
そこで本発明では、２層磁性膜の被成に先立つポリイミ
ドフィルムの熱処理温度につき、１５０℃以下に抑制し
たのである。しかしながら、熱処理温度があまりにも低
いと付着強度が弱くなる弊害があるので、１００℃以上
とするのが好ましい。Therefore, in the present invention, the heat treatment temperature of the polyimide film prior to the formation of the two-layer magnetic film is suppressed to 150° C. or less. However, if the heat treatment temperature is too low, the adhesion strength will be weakened, so it is preferably 100° C. or higher.
なお、第９回日本応用磁気学会での講演（講演概要集２
６ａＡ −８１９８５年発行）によれば、ポリイミドフ
ィルムの熱処理温度は、１９０℃以下であればパーマロ
イ膜の磁気特性に影響はないと報告されているが、これ
は使用したパーマロイの磁歪定数の符号が負であるか、
または用いた巻取り式スパッタ装置の規模の違いによる
ものと考えられる。In addition, the lecture given at the 9th Japan Society of Applied Magnetics (Lecture summary collection 2)
6aA-8 published in 1985), it is reported that the heat treatment temperature of polyimide film is 190°C or less, which has no effect on the magnetic properties of the permalloy film, but this is because the sign of the magnetostriction constant of the permalloy used is Is it negative?
This may also be due to the difference in scale of the winding type sputtering equipment used.
（実施例）
第２図に示す巻取り式スパッタ装置を用いて、ポリイミ
ドフィルム基板上に磁歪定数が正のＦｅ−Ｎｉ系パーマ
ロイ （組成： Ｆｅ＋ａＮｉｔｓＭＯａ）とＣ。(Example) Fe-Ni permalloy having a positive magnetostriction constant (composition: Fe+aNitsMOa) and C were deposited on a polyimide film substrate using the winding type sputtering apparatus shown in FIG.
−Ｃｒ合金（組成： Ｃｏ、、。Ｃｒ２゜）を被成した
。-Cr alloy (composition: Co,...Cr2°) was formed.
第２図中、番号４は真空槽、５は排気系への接続部、６
，７はＣｒパーマロイとＧｏ−Ｃｒ合金用のマグネトロ
ンカソード、８，９はそれぞれフィルム基板の巻取り及
び巻出し兼用のローラー、１０ａ、 １０ｂ、 ｌｌａ
、 ｌｌｂ、 １２ａ、 １２ｂはいずれもガイドロー
ラー、１３ａ、 １３ｂはダンサ−ローラー、１４はキ
ャンローラー、１５はマスク、１６はアルゴンガスなど
の不活性ガスの導入口、そして１７がポリイミドフィル
ムである。なお同図では、真空排気系やカソード用のＤ
Ｃ電源は省略しである。In Figure 2, number 4 is the vacuum chamber, 5 is the connection to the exhaust system, and 6
, 7 is a magnetron cathode for Cr permalloy and Go-Cr alloy, 8 and 9 are rollers that are used for both winding and unwinding of the film substrate, respectively, 10a, 10b, lla
, 12a and 12b are guide rollers, 13a and 13b are dancer rollers, 14 is a can roller, 15 is a mask, 16 is an inlet for inert gas such as argon gas, and 17 is a polyimide film. In the same figure, D for the vacuum exhaust system and cathode is shown.
C power supply is omitted.
さて、ポリイミドフィルム基板上へのパーマロイ膜及び
Ｃｏ−Ｃｒ合金膜の被成は次のようにして行う。Now, the permalloy film and the Co--Cr alloy film are formed on the polyimide film substrate in the following manner.
まず真空槽４内を真空排気し、キャンローラー１４を加
熱してから、フィルム１７を５〜１５ｃｍ／ｍｉｎの通
板速度で巻出しローラー９から巻取りローラー８側に移
動させることにより、フィルム１７を種々の速度で熱処
理した。First, the inside of the vacuum chamber 4 is evacuated, the can roller 14 is heated, and then the film 17 is moved from the unwinding roller 9 to the winding roller 8 side at a passing speed of 5 to 15 cm/min. were heat treated at different rates.
次イでキャンローラー１４を水冷しながら、カソード６
上の磁歪定数が正のパーマロイターゲントにより、８か
ら９側へ移動中のフィルム１７上に厚み０．５μｍのパ
ーマロイ膜を被成した。In the next step, while cooling the can roller 14 with water,
A permalloy film having a thickness of 0.5 μm was formed on the film 17 moving from the 8 side to the 9 side using the above permalloy agent having a positive magnetostriction constant.
次にパーマロイ膜が被成されたフィルム基板１７を、９
から８側へ送りながら、キャンローラーを所定の温度に
加熱しつつカソード７上のＧｏ−Ｃｒターゲットにより
スパッタを行って垂直磁化膜を被成し、２層膜媒体を形
成した。Next, the film substrate 17 on which the permalloy film was formed was placed at 9
While feeding the film to the 8 side, a can roller was heated to a predetermined temperature and sputtering was performed using a Go-Cr target on the cathode 7 to form a perpendicularly magnetized film, thereby forming a two-layer film medium.
なお、パーマロイ膜及びＣｏ−Ｃｒ合金膜のスパッタ条
件は次のとおりである。Note that the sputtering conditions for the permalloy film and the Co-Cr alloy film are as follows.
・パーマロイ膜
アルゴン圧： ０．５〜１．０ ｍＴｏｒｒスパッタ電
流：６〜ＩＯＡ
基板温度：室温（キャンローラー水冷）・Ｃｏ−Ｃｒ膜
アルゴン圧： ５ ｍＴｏｒｒ
スパッタ電流：６〜ＩＯＡ
基板温度 ：１５０℃
かくして得られた長尺の垂直磁気記録媒体から、５Ｘ６
ｍ２の試料を切り出し、振動試料型磁力計（ＶＳＭ）を
用いて２０００ｅ以下の磁界中におけるパーマロイ膜の
ヒステリシスループを測定した。・Permalloy film argon pressure: 0.5-1.0 mTorr Sputtering current: 6-IOA Substrate temperature: Room temperature (can roller water cooling) ・Co-Cr film argon pressure: 5 mTorr Sputtering current: 6-IOA Substrate temperature: 150°C From the long perpendicular magnetic recording medium thus obtained, 5×6
A sample of m2 was cut out, and the hysteresis loop of the permalloy film in a magnetic field of 2000 e or less was measured using a vibrating sample magnetometer (VSM).
第３図に、ポリイミドフィルム基板の熱処理温度とパー
マロイ膜の抗磁力との関係について調べた結果を示す。FIG. 3 shows the results of an investigation into the relationship between the heat treatment temperature of the polyimide film substrate and the coercive force of the permalloy film.
同図より明らかなように、熱処理温度が１５０″Ｃを超
えると抗磁力が急激に大きくなるのに対し、１５０℃以
下では抗磁力は５０ｅ以下と極めて小さく、またその増
大はほとんどない。ここに１５０’Ｃを超えると抗磁力
が急激に増大したのは、垂直磁気異方性が発生したこと
によるものである。As is clear from the figure, when the heat treatment temperature exceeds 150"C, the coercive force increases sharply, whereas when the heat treatment temperature exceeds 150"C, the coercive force is extremely small, 50e or less, and there is almost no increase. The reason why the coercive force increased rapidly above 150'C is due to the occurrence of perpendicular magnetic anisotropy.
なお、Ｘ線回折によって調べたパーマロイ膜の結晶配向
分散角Δθ、。（１１１）は、熱処理温度にはほとんど
無関係でいずれも７〜９°程度と良好な値を呈していた
。In addition, the crystal orientation dispersion angle Δθ of the permalloy film was investigated by X-ray diffraction. (111) was almost unrelated to the heat treatment temperature, and all exhibited good values of about 7 to 9 degrees.
（発明の効果）
かくして本発明によれば、２層膜磁性層として、磁歪定
数が正のパーマロイ膜とＣｏ−Ｃｒ合金膜を用いる垂直
磁気記録媒体の製造において、パーマロイ膜における垂
直磁気異方性の発生を効果的に抑制して、抗磁力が小さ
い磁気記録能に優れた垂直磁気記録媒体を得ることがで
きる。(Effects of the Invention) Thus, according to the present invention, in manufacturing a perpendicular magnetic recording medium using a permalloy film with a positive magnetostriction constant and a Co-Cr alloy film as a two-layer magnetic layer, the perpendicular magnetic anisotropy in the permalloy film can be improved. By effectively suppressing the occurrence of , it is possible to obtain a perpendicular magnetic recording medium with low coercive force and excellent magnetic recording performance.
第１図は、２層膜垂直磁気記録媒体の断面図、第２図は
、この発明の実施に用いて好適な巻取り式スパッタ装置
の模式図、
第３図は、ポリイミドフィルム基板の熱処理温度とパー
マロイ膜の抗磁力との関係を示したグラフである。
１・・・基板、２・・・軟磁性膜、３・・・垂直磁化膜
、４・・・真空槽、５・・・接続部、６．７・・・マグ
ネトロンカソード、８，９・・・ローラー、
１０ａ、 １０ｂ、 ｌｌａ、 ｌｌｂ、 １２ａ、
１２ｂ−・・ガイドローラー、１３ａ、 １３ｂ・・・
ダンサ−ローラー、１４・・・キャンローラー、１５・
・・マスク、１６・・・ガスの導入口、１７・・・ポリ
イミドフィルム。
特許出願人 赤井電機株式会社
代理人 弁理士 小 川 順 三FIG. 1 is a cross-sectional view of a two-layer perpendicular magnetic recording medium, FIG. 2 is a schematic diagram of a winding type sputtering apparatus suitable for carrying out the present invention, and FIG. 3 is a heat treatment temperature of a polyimide film substrate. It is a graph showing the relationship between and the coercive force of the permalloy film. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Soft magnetic film, 3... Perpendicular magnetization film, 4... Vacuum chamber, 5... Connection part, 6.7... Magnetron cathode, 8, 9...・Roller, 10a, 10b, lla, llb, 12a,
12b--Guide roller, 13a, 13b...
Dancer roller, 14...Can roller, 15.
...Mask, 16...Gas inlet, 17...Polyimide film. Patent applicant Junzo Ogawa, agent of Akai Electric Co., Ltd., patent attorney
Claims (1)
めっき材の吸着ガスを除去したポリイミドフィルム基板
上に、磁歪定数が正であるＦｅ−Ｎｉ系パーマロイから
なる軟磁性膜とＣｏ−Ｃｒ合金からなる垂直磁化膜とを
被成することにより、２層膜垂直磁気記録媒体を製造す
るに当たり、 上記２層膜被成前におけるポリイミドフィルム基板の熱
処理を、１５０℃以下で行うことを特徴とする垂直磁気
記録媒体の製造方法。[Claims] 1. A soft magnetic material made of Fe-Ni permalloy with a positive magnetostriction constant is placed on a polyimide film substrate from which the adsorbed gas of the material to be plated has been removed by heat treatment using a winding sputtering device. In manufacturing a two-layer perpendicular magnetic recording medium by depositing a perpendicularly magnetized film made of a Co-Cr alloy and a perpendicularly magnetized film, the polyimide film substrate is heat-treated at a temperature of 150°C or less before forming the two-layer film. 1. A method of manufacturing a perpendicular magnetic recording medium, comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31428587A JPH01155520A (en) | 1987-12-14 | 1987-12-14 | Production of perpendicular magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31428587A JPH01155520A (en) | 1987-12-14 | 1987-12-14 | Production of perpendicular magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01155520A true JPH01155520A (en) | 1989-06-19 |
Family
ID=18051522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31428587A Pending JPH01155520A (en) | 1987-12-14 | 1987-12-14 | Production of perpendicular magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01155520A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG110083A1 (en) * | 2003-02-28 | 2005-04-28 | Toshiba Kk | Magnetic recording medium and magnetic recording/reproducing apparatus |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6226637A (en) * | 1985-07-26 | 1987-02-04 | Akai Electric Co Ltd | Manufacture of vertical magnetic recording medium having thin soft magnetic 'permalloy(r)' film |
-
1987
- 1987-12-14 JP JP31428587A patent/JPH01155520A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6226637A (en) * | 1985-07-26 | 1987-02-04 | Akai Electric Co Ltd | Manufacture of vertical magnetic recording medium having thin soft magnetic 'permalloy(r)' film |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG110083A1 (en) * | 2003-02-28 | 2005-04-28 | Toshiba Kk | Magnetic recording medium and magnetic recording/reproducing apparatus |
| US7166376B2 (en) | 2003-02-28 | 2007-01-23 | Showa Denko K.K. | Magnetic recording medium including a high-magnetostriction layer and magnetic recording/reproducing apparatus |
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