JPH01140821U - - Google Patents

Info

Publication number
JPH01140821U
JPH01140821U JP3718388U JP3718388U JPH01140821U JP H01140821 U JPH01140821 U JP H01140821U JP 3718388 U JP3718388 U JP 3718388U JP 3718388 U JP3718388 U JP 3718388U JP H01140821 U JPH01140821 U JP H01140821U
Authority
JP
Japan
Prior art keywords
plasma
electrode
cover
isolate
inner cover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3718388U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0610675Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988037183U priority Critical patent/JPH0610675Y2/ja
Publication of JPH01140821U publication Critical patent/JPH01140821U/ja
Application granted granted Critical
Publication of JPH0610675Y2 publication Critical patent/JPH0610675Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1988037183U 1988-03-23 1988-03-23 プラズマ処理装置 Expired - Lifetime JPH0610675Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988037183U JPH0610675Y2 (ja) 1988-03-23 1988-03-23 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988037183U JPH0610675Y2 (ja) 1988-03-23 1988-03-23 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPH01140821U true JPH01140821U (US06521211-20030218-C00004.png) 1989-09-27
JPH0610675Y2 JPH0610675Y2 (ja) 1994-03-16

Family

ID=31263762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988037183U Expired - Lifetime JPH0610675Y2 (ja) 1988-03-23 1988-03-23 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPH0610675Y2 (US06521211-20030218-C00004.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0541135U (ja) * 1991-11-01 1993-06-01 三洋電機株式会社 半導体薄膜形成装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767173A (en) * 1980-10-09 1982-04-23 Mitsubishi Electric Corp Plasma etching device
JPS58197733A (ja) * 1982-05-14 1983-11-17 Hitachi Ltd 半導体デバイス製造装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767173A (en) * 1980-10-09 1982-04-23 Mitsubishi Electric Corp Plasma etching device
JPS58197733A (ja) * 1982-05-14 1983-11-17 Hitachi Ltd 半導体デバイス製造装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0541135U (ja) * 1991-11-01 1993-06-01 三洋電機株式会社 半導体薄膜形成装置

Also Published As

Publication number Publication date
JPH0610675Y2 (ja) 1994-03-16

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