JPH01105520A - Sputtering target - Google Patents

Sputtering target

Info

Publication number
JPH01105520A
JPH01105520A JP26318587A JP26318587A JPH01105520A JP H01105520 A JPH01105520 A JP H01105520A JP 26318587 A JP26318587 A JP 26318587A JP 26318587 A JP26318587 A JP 26318587A JP H01105520 A JPH01105520 A JP H01105520A
Authority
JP
Japan
Prior art keywords
magnetic
lt
contains
rare earth
out
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26318587A
Inventor
Masaya Ishida
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP26318587A priority Critical patent/JPH01105520A/en
Publication of JPH01105520A publication Critical patent/JPH01105520A/en
Application status is Pending legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183Sputtering targets therefor

Abstract

PURPOSE:To form a magnetic film which ensures reliability for a long period, by making a sputtering target contain 400PPM or less carbon by weight rate and displaying magnetic performance which is held by a magnetic thin film originally. CONSTITUTION:A sputtering target forms magnetic thin films comprising heavy rare earth and transition metals as principal compositions by a sputtering process. In such a case, its target contains 400PPM or less carbon by weight rate. Its compositions are represented by an expression in terms of atomic rate: {(LR)X(HR)1-X}YA100-Y where LR contains a kind or more of light rare earth metals selected out of those; Ce, Pr, Nd, and Sm and HR contains a kind or more of the heavy rare earth metals out of those; Gd, Tb, and Dy and A contains an either one out of Fe and Co and further, X and Y are as follows: 0.05<=X<=0.60, 15<=Y<=40. In this way, magnetic performance held by the magnetic thins film originally is displayed to form the magnetic films which ensure reliability for a long period.
JP26318587A 1987-10-19 1987-10-19 Sputtering target Pending JPH01105520A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26318587A JPH01105520A (en) 1987-10-19 1987-10-19 Sputtering target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26318587A JPH01105520A (en) 1987-10-19 1987-10-19 Sputtering target

Publications (1)

Publication Number Publication Date
JPH01105520A true JPH01105520A (en) 1989-04-24

Family

ID=17385950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26318587A Pending JPH01105520A (en) 1987-10-19 1987-10-19 Sputtering target

Country Status (1)

Country Link
JP (1) JPH01105520A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8179776B2 (en) 1999-03-02 2012-05-15 Panasonic Corporation OFDM transmission/reception apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8179776B2 (en) 1999-03-02 2012-05-15 Panasonic Corporation OFDM transmission/reception apparatus

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