JP7678810B2 - 反射フーリエプティコグラフィによる大型表面の撮像 - Google Patents

反射フーリエプティコグラフィによる大型表面の撮像 Download PDF

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JP7678810B2
JP7678810B2 JP2022532572A JP2022532572A JP7678810B2 JP 7678810 B2 JP7678810 B2 JP 7678810B2 JP 2022532572 A JP2022532572 A JP 2022532572A JP 2022532572 A JP2022532572 A JP 2022532572A JP 7678810 B2 JP7678810 B2 JP 7678810B2
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light sources
pattern
light source
selecting
illumination
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JPWO2021113131A5 (https=
JP2023504151A (ja
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アンダーソン・コリン・マイケル
モースリー・ロデリック
ドレガー・ネリッサ・スー
フバーチェク・ジェローム・エス．
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Lam Research Corp
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Lam Research Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4795—Scattering, i.e. diffuse reflection spatially resolved investigating of object in scattering medium
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/002—Scanning microscopes
    • G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
    • G02B21/0036—Scanning details, e.g. scanning stages
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/082—Condensers for incident illumination only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/14—Condensers affording illumination for phase-contrast observation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G02B21/367—Control or image processing arrangements for digital or video microscopes providing an output produced by processing a plurality of individual source images, e.g. image tiling, montage, composite images, depth sectioning, image comparison
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8883—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges involving the calculation of gauges, generating models

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2022532572A 2019-12-02 2020-11-24 反射フーリエプティコグラフィによる大型表面の撮像 Active JP7678810B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025076559A JP2025111782A (ja) 2019-12-02 2025-05-02 反射フーリエプティコグラフィによる大型表面の撮像

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962942636P 2019-12-02 2019-12-02
US62/942,636 2019-12-02
PCT/US2020/062108 WO2021113131A1 (en) 2019-12-02 2020-11-24 Reflective fourier ptychography imaging of large surfaces

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JP2023504151A JP2023504151A (ja) 2023-02-01
JPWO2021113131A5 JPWO2021113131A5 (https=) 2023-11-27
JP2023504151A5 JP2023504151A5 (https=) 2023-11-27
JP7678810B2 true JP7678810B2 (ja) 2025-05-16

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JP2025076559A Pending JP2025111782A (ja) 2019-12-02 2025-05-02 反射フーリエプティコグラフィによる大型表面の撮像

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US (1) US20220413276A1 (https=)
JP (2) JP7678810B2 (https=)
KR (1) KR20220104821A (https=)
CN (1) CN115053122A (https=)
TW (1) TW202136753A (https=)
WO (1) WO2021113131A1 (https=)

Families Citing this family (6)

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Publication number Priority date Publication date Assignee Title
US11689821B2 (en) * 2020-08-07 2023-06-27 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Incoherent Fourier ptychographic super-resolution imaging system with priors
FR3125893A1 (fr) * 2021-07-29 2023-02-03 Institut Mines Telecom Système d’éclairage, notamment à usage de microscopie
KR20240108945A (ko) 2023-01-03 2024-07-10 삼성전자주식회사 기판 검사 장치 및 기판 검사 방법
US20240353665A1 (en) * 2023-03-30 2024-10-24 California Institute Of Technology Angular ptychographic imaging with closed-form reconstruction
US12581754B2 (en) * 2023-05-16 2026-03-17 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus to enhance semiconductor device manufacturing
CN120254888B (zh) * 2025-05-30 2025-09-09 长春理工大学 基于偏振关联算法的水下溢油成像探测方法及设备

Citations (7)

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Publication number Priority date Publication date Assignee Title
JP2015535348A (ja) 2012-10-30 2015-12-10 カリフォルニア インスティチュート オブ テクノロジー フーリエ・タイコグラフィー撮像システム、装置、及び方法
JP2016530567A (ja) 2013-08-22 2016-09-29 カリフォルニア インスティチュート オブ テクノロジー 可変照明フーリエタイコグラフィー撮像装置、システム、及び方法
US20160341945A1 (en) 2015-05-21 2016-11-24 California Institute Of Technology Laser-based fourier ptychographic imaging systems and methods
CN106707486A (zh) 2017-01-24 2017-05-24 清华大学 基于fpm的宽视场显微成像方法及系统
JP2018504627A (ja) 2014-12-04 2018-02-15 カリフォルニア インスティチュート オブ テクノロジー 多重フーリエタイコグラフィイメージングシステム及び方法
JP2018504577A (ja) 2014-12-22 2018-02-15 カリフォルニア インスティチュート オブ テクノロジー 厚膜サンプル用落射照明フーリエタイコグラフィ撮像
US20180073993A1 (en) 2016-09-15 2018-03-15 Kla-Tencor Corporation Simultaneous multi-directional laser wafer inspection

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DE102014213198B4 (de) * 2014-07-08 2020-08-06 Carl Zeiss Ag Verfahren zur Lokalisierung von Defekten auf Substraten
AU2014280894A1 (en) * 2014-12-23 2016-07-07 Canon Kabushiki Kaisha Illumination systems and devices for Fourier Ptychographic imaging
CN108431692B (zh) * 2015-12-23 2021-06-18 Asml荷兰有限公司 量测方法、量测设备和器件制造方法
KR20190088277A (ko) * 2018-01-18 2019-07-26 서울대학교산학협력단 단일촬영 푸리에 타이코그래피 마이크로스코피 시스템

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JP2016530567A (ja) 2013-08-22 2016-09-29 カリフォルニア インスティチュート オブ テクノロジー 可変照明フーリエタイコグラフィー撮像装置、システム、及び方法
JP2018504627A (ja) 2014-12-04 2018-02-15 カリフォルニア インスティチュート オブ テクノロジー 多重フーリエタイコグラフィイメージングシステム及び方法
JP2018504577A (ja) 2014-12-22 2018-02-15 カリフォルニア インスティチュート オブ テクノロジー 厚膜サンプル用落射照明フーリエタイコグラフィ撮像
US20160341945A1 (en) 2015-05-21 2016-11-24 California Institute Of Technology Laser-based fourier ptychographic imaging systems and methods
US20180073993A1 (en) 2016-09-15 2018-03-15 Kla-Tencor Corporation Simultaneous multi-directional laser wafer inspection
CN106707486A (zh) 2017-01-24 2017-05-24 清华大学 基于fpm的宽视场显微成像方法及系统

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Publication number Publication date
JP2025111782A (ja) 2025-07-30
JP2023504151A (ja) 2023-02-01
CN115053122A (zh) 2022-09-13
TW202136753A (zh) 2021-10-01
US20220413276A1 (en) 2022-12-29
KR20220104821A (ko) 2022-07-26
WO2021113131A1 (en) 2021-06-10

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