JP7512567B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP7512567B2
JP7512567B2 JP2023550761A JP2023550761A JP7512567B2 JP 7512567 B2 JP7512567 B2 JP 7512567B2 JP 2023550761 A JP2023550761 A JP 2023550761A JP 2023550761 A JP2023550761 A JP 2023550761A JP 7512567 B2 JP7512567 B2 JP 7512567B2
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Japan
Prior art keywords
cathode electrode
hollow cathode
plasma processing
flat
cooling body
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JP2023550761A
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English (en)
Japanese (ja)
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JPWO2023053171A5 (https=
JPWO2023053171A1 (https=
Inventor
厚文 大岸
佑 徳嵩
悟 尾崎
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Shimadzu Industrial Systems Co Ltd
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Shimadzu Industrial Systems Co Ltd
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Treatment Of Fiber Materials (AREA)
JP2023550761A 2021-09-28 2021-09-28 プラズマ処理装置 Active JP7512567B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/035547 WO2023053171A1 (ja) 2021-09-28 2021-09-28 プラズマ処理装置

Publications (3)

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JPWO2023053171A1 JPWO2023053171A1 (https=) 2023-04-06
JPWO2023053171A5 JPWO2023053171A5 (https=) 2023-12-15
JP7512567B2 true JP7512567B2 (ja) 2024-07-09

Family

ID=85781464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023550761A Active JP7512567B2 (ja) 2021-09-28 2021-09-28 プラズマ処理装置

Country Status (4)

Country Link
JP (1) JP7512567B2 (https=)
CN (1) CN117204124A (https=)
TW (1) TWI834148B (https=)
WO (1) WO2023053171A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801839A (en) 1986-12-08 1989-01-31 Applied Electron Corporation Mounting of a cold cathode directly to a vacuum chamber wall
JP2008028087A (ja) 2006-07-20 2008-02-07 Nisshinbo Ind Inc プラズマエッチング電極
JP2010248548A (ja) 2009-04-13 2010-11-04 Shinmaywa Industries Ltd ホローカソード型放電管
JP2012054377A (ja) 2010-09-01 2012-03-15 Toray Ind Inc プラズマｃｖｄ装置
JP2015086471A (ja) 2013-10-28 2015-05-07 ベイパー テクノロジーズ、インコーポレイテッド 低圧アーク・プラズマ浸漬被膜気相堆積及びイオン処理

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0648826Y2 (ja) * 1988-07-25 1994-12-12 三井東圧化学株式会社 着脱式の放電電極
JP2705190B2 (ja) * 1989-02-16 1998-01-26 富士通株式会社 ドライエッチング装置
JP3113796B2 (ja) * 1995-07-10 2000-12-04 東京エレクトロン株式会社 プラズマ処理装置
JP2001135626A (ja) * 1999-11-02 2001-05-18 Hitachi Kokusai Electric Inc プラズマｃｖｄ装置及びプラズマｃｖｄ膜形成方法
JP4493932B2 (ja) * 2003-05-13 2010-06-30 東京エレクトロン株式会社 上部電極及びプラズマ処理装置
KR101046335B1 (ko) * 2008-07-29 2011-07-05 피에스케이 주식회사 할로우 캐소드 플라즈마 발생방법 및 할로우 캐소드플라즈마를 이용한 대면적 기판 처리방법
JP6745643B2 (ja) * 2016-05-17 2020-08-26 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
JP7246154B2 (ja) * 2018-10-02 2023-03-27 東京エレクトロン株式会社 プラズマ処理装置及び静電吸着方法
JP7134863B2 (ja) * 2018-12-27 2022-09-12 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801839A (en) 1986-12-08 1989-01-31 Applied Electron Corporation Mounting of a cold cathode directly to a vacuum chamber wall
JP2008028087A (ja) 2006-07-20 2008-02-07 Nisshinbo Ind Inc プラズマエッチング電極
JP2010248548A (ja) 2009-04-13 2010-11-04 Shinmaywa Industries Ltd ホローカソード型放電管
JP2012054377A (ja) 2010-09-01 2012-03-15 Toray Ind Inc プラズマｃｖｄ装置
JP2015086471A (ja) 2013-10-28 2015-05-07 ベイパー テクノロジーズ、インコーポレイテッド 低圧アーク・プラズマ浸漬被膜気相堆積及びイオン処理

Also Published As

Publication number Publication date
JPWO2023053171A1 (https=) 2023-04-06
WO2023053171A1 (ja) 2023-04-06
TW202315464A (zh) 2023-04-01
TWI834148B (zh) 2024-03-01
CN117204124A (zh) 2023-12-08

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