JP7502000B2 - 透明導電性フィルム - Google Patents
透明導電性フィルム Download PDFInfo
- Publication number
- JP7502000B2 JP7502000B2 JP2019115550A JP2019115550A JP7502000B2 JP 7502000 B2 JP7502000 B2 JP 7502000B2 JP 2019115550 A JP2019115550 A JP 2019115550A JP 2019115550 A JP2019115550 A JP 2019115550A JP 7502000 B2 JP7502000 B2 JP 7502000B2
- Authority
- JP
- Japan
- Prior art keywords
- transparent conductive
- conductive layer
- glass substrate
- conductive film
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 claims description 86
- 239000011521 glass Substances 0.000 claims description 70
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 239000002131 composite material Substances 0.000 claims description 3
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 103
- 238000004544 sputter deposition Methods 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 14
- 239000007789 gas Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 229920006254 polymer film Polymers 0.000 description 6
- 229910001887 tin oxide Inorganic materials 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000002425 crystallisation Methods 0.000 description 5
- 230000008025 crystallization Effects 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 241000692870 Inachis io Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000000333 X-ray scattering Methods 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000002447 crystallographic data Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Non-Insulated Conductors (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019115550A JP7502000B2 (ja) | 2019-06-21 | 2019-06-21 | 透明導電性フィルム |
KR1020217032205A KR20220021450A (ko) | 2019-06-21 | 2020-06-16 | 투명 도전성 필름 |
PCT/JP2020/023553 WO2020255947A1 (ja) | 2019-06-21 | 2020-06-16 | 透明導電性フィルム |
TW109120786A TW202110767A (zh) | 2019-06-21 | 2020-06-19 | 透明導電性膜 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019115550A JP7502000B2 (ja) | 2019-06-21 | 2019-06-21 | 透明導電性フィルム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021002473A JP2021002473A (ja) | 2021-01-07 |
JP7502000B2 true JP7502000B2 (ja) | 2024-06-18 |
Family
ID=73994079
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019115550A Active JP7502000B2 (ja) | 2019-06-21 | 2019-06-21 | 透明導電性フィルム |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7502000B2 (zh) |
KR (1) | KR20220021450A (zh) |
TW (1) | TW202110767A (zh) |
WO (1) | WO2020255947A1 (zh) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013071380A (ja) | 2011-09-28 | 2013-04-22 | Toppan Printing Co Ltd | 透明導電性フィルム及びタッチパネル |
WO2013115125A1 (ja) | 2012-02-02 | 2013-08-08 | 株式会社カネカ | 透明電極付き基板の製造方法 |
JP2016050131A (ja) | 2014-08-29 | 2016-04-11 | 日本電気硝子株式会社 | 膜付きガラス基板の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110033879A (zh) | 2014-05-20 | 2019-07-19 | 日东电工株式会社 | 透明导电性薄膜及其制造方法 |
-
2019
- 2019-06-21 JP JP2019115550A patent/JP7502000B2/ja active Active
-
2020
- 2020-06-16 KR KR1020217032205A patent/KR20220021450A/ko unknown
- 2020-06-16 WO PCT/JP2020/023553 patent/WO2020255947A1/ja active Application Filing
- 2020-06-19 TW TW109120786A patent/TW202110767A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013071380A (ja) | 2011-09-28 | 2013-04-22 | Toppan Printing Co Ltd | 透明導電性フィルム及びタッチパネル |
WO2013115125A1 (ja) | 2012-02-02 | 2013-08-08 | 株式会社カネカ | 透明電極付き基板の製造方法 |
JP2016050131A (ja) | 2014-08-29 | 2016-04-11 | 日本電気硝子株式会社 | 膜付きガラス基板の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20220021450A (ko) | 2022-02-22 |
JP2021002473A (ja) | 2021-01-07 |
TW202110767A (zh) | 2021-03-16 |
WO2020255947A1 (ja) | 2020-12-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6526118B2 (ja) | 銀層の熱処理方法 | |
WO2012086484A1 (ja) | 透明導電性フィルムおよびその製造方法 | |
JP6530118B2 (ja) | 調光フィルム | |
WO2015159798A1 (ja) | 透明導電性フィルム | |
JP7278372B2 (ja) | 透明導電性フィルム | |
JPH08111123A (ja) | 透明導電膜とその製造方法およびスパッタリングターゲット | |
JP7502000B2 (ja) | 透明導電性フィルム | |
JP6526255B2 (ja) | 低放射率コーティング用のチタンニッケルニオブ合金バリア | |
JP7323293B2 (ja) | 導電性フィルムおよびタッチパネル | |
JP3511337B2 (ja) | 透明導電性積層体及びその製造方法 | |
KR102164629B1 (ko) | 복합체 투명 전극 | |
WO2021001691A4 (ja) | 透明導電性フィルム | |
US20170051398A1 (en) | Transparent conductive film and method for producing the same | |
JP2024067499A (ja) | 透明導電性フィルムおよび透明導電性フィルムの製造方法 | |
WO2021024944A1 (ja) | 透明導電性フィルム | |
WO2021024945A1 (ja) | 透明導電性フィルム | |
CN114628061A (zh) | 透明导电性薄膜 | |
KR20220085596A (ko) | 투명 도전성 필름 | |
CN114628060A (zh) | 透明导电性薄膜 | |
JP7240513B2 (ja) | 透明導電性フィルム | |
JP6161763B2 (ja) | 透明導電性フィルム | |
JP7492916B2 (ja) | 透明導電性フィルム | |
JP2022107600A (ja) | 透明導電性フィルムの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220518 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230704 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231205 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20240129 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240604 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240606 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7502000 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |