JP7462636B2 - 磁気記録媒体用スパッタリングターゲット - Google Patents

磁気記録媒体用スパッタリングターゲット Download PDF

Info

Publication number
JP7462636B2
JP7462636B2 JP2021533123A JP2021533123A JP7462636B2 JP 7462636 B2 JP7462636 B2 JP 7462636B2 JP 2021533123 A JP2021533123 A JP 2021533123A JP 2021533123 A JP2021533123 A JP 2021533123A JP 7462636 B2 JP7462636 B2 JP 7462636B2
Authority
JP
Japan
Prior art keywords
magnetic
mol
sputtering target
oxide
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021533123A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2021010490A5 (https=
JPWO2021010490A1 (https=
Inventor
知成 鎌田
了輔 櫛引
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Publication of JPWO2021010490A1 publication Critical patent/JPWO2021010490A1/ja
Publication of JPWO2021010490A5 publication Critical patent/JPWO2021010490A5/ja
Application granted granted Critical
Publication of JP7462636B2 publication Critical patent/JP7462636B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H01J37/3429—Plural materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/656—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing Co
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Record Carriers (AREA)
JP2021533123A 2019-07-18 2020-07-16 磁気記録媒体用スパッタリングターゲット Active JP7462636B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019132859 2019-07-18
JP2019132859 2019-07-18
PCT/JP2020/028611 WO2021010490A1 (ja) 2019-07-18 2020-07-16 磁気記録媒体用スパッタリングターゲット

Publications (3)

Publication Number Publication Date
JPWO2021010490A1 JPWO2021010490A1 (https=) 2021-01-21
JPWO2021010490A5 JPWO2021010490A5 (https=) 2023-02-14
JP7462636B2 true JP7462636B2 (ja) 2024-04-05

Family

ID=74210926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021533123A Active JP7462636B2 (ja) 2019-07-18 2020-07-16 磁気記録媒体用スパッタリングターゲット

Country Status (5)

Country Link
US (1) US12230485B2 (https=)
JP (1) JP7462636B2 (https=)
CN (1) CN114144541B (https=)
TW (1) TWI812869B (https=)
WO (1) WO2021010490A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250182963A1 (en) * 2022-03-11 2025-06-05 Georgetown University Boron-Based and High-Entropy Magnetic Materials
CN121219435A (zh) * 2024-04-25 2025-12-26 Ｊｘ金属株式会社 磁性材料靶材和磁性材料靶材组装件

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016115379A (ja) 2014-12-15 2016-06-23 昭和電工株式会社 垂直記録媒体、垂直記録再生装置
JP2016160530A (ja) 2015-03-05 2016-09-05 光洋應用材料科技股▲分▼有限公司 磁気合金スパッタリングターゲット及び磁気記録媒体用記録層
WO2017170138A1 (ja) 2016-03-31 2017-10-05 Ｊｘ金属株式会社 強磁性材スパッタリングターゲット

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5988807A (ja) * 1982-11-12 1984-05-22 Nec Corp 磁気記憶体
JPH11175944A (ja) * 1997-12-10 1999-07-02 Hitachi Ltd 磁気記録媒体及び磁気記憶装置
US20060042938A1 (en) 2004-09-01 2006-03-02 Heraeus, Inc. Sputter target material for improved magnetic layer
CN103180481B (zh) 2010-12-22 2015-04-08 吉坤日矿日石金属株式会社 强磁性材料溅射靶
JP6958819B2 (ja) 2016-11-01 2021-11-02 田中貴金属工業株式会社 磁気記録媒体用スパッタリングターゲット
MY191374A (en) * 2016-12-28 2022-06-21 Jx Nippon Mining & Metals Corp Magnetic material sputtering target and method for manufacturing same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016115379A (ja) 2014-12-15 2016-06-23 昭和電工株式会社 垂直記録媒体、垂直記録再生装置
JP2016160530A (ja) 2015-03-05 2016-09-05 光洋應用材料科技股▲分▼有限公司 磁気合金スパッタリングターゲット及び磁気記録媒体用記録層
WO2017170138A1 (ja) 2016-03-31 2017-10-05 Ｊｘ金属株式会社 強磁性材スパッタリングターゲット

Also Published As

Publication number Publication date
JPWO2021010490A1 (https=) 2021-01-21
TWI812869B (zh) 2023-08-21
CN114144541B (zh) 2024-12-10
CN114144541A (zh) 2022-03-04
US20220262608A1 (en) 2022-08-18
WO2021010490A1 (ja) 2021-01-21
TW202120720A (zh) 2021-06-01
US12230485B2 (en) 2025-02-18

Similar Documents

Publication Publication Date Title
TWI702294B (zh) 磁氣記錄媒體用濺鍍靶
US10971181B2 (en) Sputtering target for magnetic recording media
US10636633B2 (en) Sputtering target and process for production thereof
JP7462636B2 (ja) 磁気記録媒体用スパッタリングターゲット
JP2023144067A (ja) スパッタリングターゲット、グラニュラ膜および垂直磁気記録媒体
JP7513667B2 (ja) スパッタリングターゲット、積層膜の製造方法および、磁気記録媒体の製造方法
JP7189520B2 (ja) スパッタリングターゲット
JP7554192B2 (ja) 非磁性層形成用スパッタリングターゲット部材
TW201732060A (zh) 濺鍍靶
US11939663B2 (en) Magnetic film and perpendicular magnetic recording medium
JP7610224B2 (ja) 熱アシスト磁気記録媒体用スパッタリングターゲット
WO2020053972A1 (ja) スパッタリングターゲット、磁性膜および、磁性膜の製造方法
TW202330964A (zh) 用以製造熱輔助磁記錄媒體之濺鍍靶
CN119110856A (zh) 溅射靶、层叠膜的制造方法、层叠膜以及磁记录介质

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230206

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230206

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20231128

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20240124

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240228

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240325

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240326

R150 Certificate of patent or registration of utility model

Ref document number: 7462636

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350