JP7267413B2 - 流路部材 - Google Patents

流路部材 Download PDF

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Publication number
JP7267413B2
JP7267413B2 JP2021522824A JP2021522824A JP7267413B2 JP 7267413 B2 JP7267413 B2 JP 7267413B2 JP 2021522824 A JP2021522824 A JP 2021522824A JP 2021522824 A JP2021522824 A JP 2021522824A JP 7267413 B2 JP7267413 B2 JP 7267413B2
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JP
Japan
Prior art keywords
flow path
channel
projection
wall
member according
Prior art date
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Active
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JP2021522824A
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English (en)
Japanese (ja)
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JPWO2020241703A1 (https=
Inventor
敬一 関口
和彦 藤尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
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Publication date
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Publication of JPWO2020241703A1 publication Critical patent/JPWO2020241703A1/ja
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Publication of JP7267413B2 publication Critical patent/JP7267413B2/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F9/00—Casings; Header boxes; Auxiliary supports for elements; Auxiliary members within casings
    • F28F9/22—Arrangements for directing heat-exchange media into successive compartments, e.g. arrangements of guide plates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP2021522824A 2019-05-30 2020-05-27 流路部材 Active JP7267413B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019101507 2019-05-30
JP2019101507 2019-05-30
PCT/JP2020/020956 WO2020241703A1 (ja) 2019-05-30 2020-05-27 流路部材

Publications (2)

Publication Number Publication Date
JPWO2020241703A1 JPWO2020241703A1 (https=) 2020-12-03
JP7267413B2 true JP7267413B2 (ja) 2023-05-01

Family

ID=73553811

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021522824A Active JP7267413B2 (ja) 2019-05-30 2020-05-27 流路部材

Country Status (3)

Country Link
US (1) US12516416B2 (https=)
JP (1) JP7267413B2 (https=)
WO (1) WO2020241703A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12516416B2 (en) * 2019-05-30 2026-01-06 Kyocera Corporation Flow path member
JP7678120B2 (ja) * 2021-09-29 2025-05-15 京セラ株式会社 シャワープレート

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005123159A (ja) 2003-05-27 2005-05-12 Matsushita Electric Works Ltd プラズマ処理装置、プラズマ生成用の反応器の製造方法、及びプラズマ処理方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56162499U (https=) * 1980-05-07 1981-12-03
JPH0715132Y2 (ja) * 1989-02-23 1995-04-10 株式会社島津製作所 プラズマｃｖｄ装置の電極構造
US7543546B2 (en) 2003-05-27 2009-06-09 Matsushita Electric Works, Ltd. Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method
KR200452532Y1 (ko) * 2008-11-06 2011-03-07 주식회사 테스 가스 분사 유닛
JP5062144B2 (ja) * 2008-11-10 2012-10-31 東京エレクトロン株式会社 ガスインジェクター
JP2015095551A (ja) 2013-11-12 2015-05-18 東京エレクトロン株式会社 シャワーヘッドアセンブリ及びプラズマ処理装置
US10023959B2 (en) * 2015-05-26 2018-07-17 Lam Research Corporation Anti-transient showerhead
JP2018148143A (ja) 2017-03-08 2018-09-20 株式会社東芝 シャワープレート、処理装置、及び吐出方法
KR102204026B1 (ko) 2018-07-06 2021-01-18 주식회사 케이에스엠컴포넌트 세라믹 샤워 헤드 및 그를 구비한 화학 기상 증착 장치
US12516416B2 (en) * 2019-05-30 2026-01-06 Kyocera Corporation Flow path member

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005123159A (ja) 2003-05-27 2005-05-12 Matsushita Electric Works Ltd プラズマ処理装置、プラズマ生成用の反応器の製造方法、及びプラズマ処理方法

Also Published As

Publication number Publication date
US12516416B2 (en) 2026-01-06
JPWO2020241703A1 (https=) 2020-12-03
US20220298641A1 (en) 2022-09-22
WO2020241703A1 (ja) 2020-12-03

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