JP7115716B2 - 汚れ剥離を伴う消費者用摺洗物品及びその製造方法 - Google Patents
汚れ剥離を伴う消費者用摺洗物品及びその製造方法 Download PDFInfo
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- JP7115716B2 JP7115716B2 JP2018555847A JP2018555847A JP7115716B2 JP 7115716 B2 JP7115716 B2 JP 7115716B2 JP 2018555847 A JP2018555847 A JP 2018555847A JP 2018555847 A JP2018555847 A JP 2018555847A JP 7115716 B2 JP7115716 B2 JP 7115716B2
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- 238000004804 winding Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Images
Classifications
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- A47L13/10—Scrubbing; Scouring; Cleaning; Polishing
- A47L13/16—Cloths; Pads; Sponges
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Landscapes
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Description
基材20は、種々の材料から、種々の形態で形成され得る。種々の不織布、(例えば、織られた又は編まれた)布地、発泡体、スポンジ及びフィルム材料を含むが、これらに限定されない、消費者用摺洗物品としての使用に適した任意の基材材料、又は材料の組み合わせを使用できる。基材20の材料及び形態は、所与の摺洗作業に特に適した、及び/又はテクスチャ層組成物を基材20上に堆積させること若しくは形成することに特に適した、伸展性、弾性、耐久性、可撓性、印刷適性などの、種々の範囲の所望の特性を提供するように選択され得る。示されるとおり、基材20に好適な材料は、広範囲の耐久特性を有するように選択されてもよい。例えば、摺洗物品の使用に好適な材料の耐久性は、多くの場合、「使い捨て」(その材料から形成される物品が、使用直後に廃棄されることを意図されることを意味する)、「半使い捨て」(その材料から形成される物品が、限定された回数洗濯され、再使用され得ることを意味する)、又は「再使用可能」(その材料から形成される物品が、洗濯され、再使用されることを意図されることを意味する)に分類される。また、上記で示したように、材料はそれらの可撓性に基づいて選択してもよい。用途によっては、消費者は比較的可撓性のある、しなやかな又はドレープ性がある摺洗物品を好む場合があるのに対して、他の用途では、消費者はある程度の可撓性を維持しながら、比較的堅い物品を好む。比較的しなやかな摺洗物品が好まれる(例えば、ドレープ性がある)用途では、より可撓性のある基材20を提供することで、使用者が摺洗物品10を特定の摺洗作業に最も適した手法で、容易に折畳む、絞る、又は別の方法で扱うことを可能にする。基材20の所望のしなやかさは、その乾燥坪量を参照することによって特徴付けることができる。基材20が不織布材料である任意の実施形態では、不織布基材20は、約300g/m2未満、あるいは約200g/m2未満、かつ約30g/m2超の乾燥坪量を有することができる。「ドレープ性」は、不規則又は非平坦な表面に順応する固有の能力として定義される。あるいは、基材20のしなやかさは、ドレープ性の観点から表すことができる。ドレープ性又は「ドレープ」は、「Handle-O-Meter Stiffness of Nonwoven Fabrics」IST 90.3(95)のINDA基準を使用して測定される。これを念頭に置くと、基材20の不織布態様は、いくつかの実施形態では、約250未満のドレープ性の値を有することができる。比較的硬質であるが、なお可撓性のある基材が所望される摺洗用途の他の実施形態では、基材20は、使用者により軽く把持されたとき、又は不規則表面に配置されたときの両方において、その形状を実質的に保持する組成物及び形態で形成してもよい。
ステインリリースコーティング22は、様々な形態をとることができ、一般にステインリリース剤を含む。いくつかの実施形態において、ステインリリースコーティング22は、実質的にフルオロケミカルを含まない(即ち、フルオロケミカル0.1重量%未満)である。言及すべき点として、本開示の摺洗物品を家庭用又は台所用の洗浄作業で使用する間、摺洗物品が時折食品に接触することがある。したがって、いくつかのフルオロケミカル薬剤は、(たとえ所望のステインリリース特性を呈しても)これらの物品には望ましくないことがある。本開示において有用である非フルオロケミカルステインリリース剤の非限定例として、ミネソタ州セントポールの3M Company社からFC-226の商品名で入手可能な、ステインリリース剤を含有するポリエチレンオキシドと、ニュージャージー州フローラムパークのBASF Corp.社からSokalan K-230の商品名で入手可能な、ポリビニルピロリドンステインリリース剤とが挙げられる。以下でより詳細に説明するように、ポリエチレンオキシド系ステインリリース剤又はポリビニルピロリドン系ステインリリース剤を使用したステインリリースコーティングは、テクスチャ層14がステインリリースコーティング22上にプリントされる実施形態で、意外にも、テクスチャ層14との良好な接着又は接合をもたらすことが判明した。本開示において有用な他の例示的な非フルオロケミカルステインリリース剤として、スチレン-無水マレイン酸ポリマー、アクリレート、及びフェノールが挙げられる。
上記で説明したように、テクスチャ層14は、基材構造体12に付与される研磨組成物である。テクスチャ層14の厳密な組成物は、所望の最終的な性能性質に応じて異なり得る。この目的のため、まずテクスチャ層組成物が構築され、次に基材構造体12上に堆積又は形成され、その後固化されて(能動的又は受動的)、テクスチャ層14が完成する。言及すべき点として、「テクスチャ層組成物」(又は「テクスチャ層マトリックス」)は、最終的な混合時、及び基材構造体12に適用又は形成(例えば、印刷、コーティング、エンボス加工など)する前の、構成成分若しくは成分を意味する。「テクスチャ層前駆体」は、基材構造体12に形成された直後、かつ固化前のテクスチャ層組成物を言う。「テクスチャ層」(即ち、テクスチャ層14)がある場合、形成後処理(例えば、熱、紫外線、eビームなど)の後を含む固化後に形成されるか、又は付与されるテクスチャ層を意味する。
本開示の摺洗物品10の製造又は形成は、図4の簡易ブロック形態で図示されており、一般的に、基材構造体12を準備する工程と、適切なテクスチャ層組成物を構築する工程と、次にこの組成物を(例えば、印刷、コーティング、エッチング、エンボス加工、マイクロレプリケーション、成形などにより)基材構造体12上に付与する工程と、を含む。図4に示すように、本開示のいくつかの方法の一部又は全体は、連続的であり、即ち一列に並んでいる。例えば、基材構造体12のウェブは、第1の操作において準備することができ、後に基材構造体12の連続ウェブは他の処理ステーションに搬送され、テクスチャ層14の付与を実行することができる。いずれにせよ、下記でより詳細に説明するように、テクスチャ層14が基材構造体12に印刷される実施形態によれば、意外にも、テクスチャ層14は、洗浄及び摺洗用途で得られた摺洗物品10の使用に十分なレベルで、ステインリリースコーティング22に接着することが確認された。
基材に処理組成物を適用して、ステインリリースコーティングを含む実施例の基材構造体を準備した。実施例A~Oの処理組成物は、以下に述べる以外は、表1-1及び表1~2に挙げた割合で25℃において脱イオン水(DI)と混合した(表1-1及び表1~2に挙げた)、選択されたステインリリース剤(RA)からなる。RA8(実施例M)は固形物であり、20グラムのRA8に80グラムのホット脱イオン水を予め混合して、固形分20%のポリマー溶液を作った。実施例P~Rの処理組成物は、表1~2に挙げたように、25℃の脱イオン水と混合した、選択されたステインリリース剤(RA)、ラテックス(ラテックス1)、顔料(顔料1)、及び殺生物剤(殺生物剤)からなる。全ての成分は、別個のプラスチック容器に、所望の量で、ほぼ0.1グラムの単位まで量り取られた。実施例A~Oの処理組成物は、基材1の乾燥サンプルに適用された。実施例Pの処理組成物は、基材2の乾燥サンプルに適用された。実施例Qの処理組成物は、基材3の乾燥サンプルに適用された。実施例Rの処理組成物は、基材4の乾燥サンプルに適用された。全てのケースにおいて、処理組成物は、ニップ圧を5.5×105Pa(80psi)に設定したパディング設備(米国サウスカロライナ州グリーンビルのPoterala Manufacturing Co.社から市販されている、Model HP-1700)を使用して乾燥基材に適用した。基材1の含浸量は概ね95%であり、実施例A~G及び実施例M~Oの処理組成物は、対応する基材に適用したステインリリース剤の固形分(即ち、0.57%の「布地上固形分」(% SOF))に匹敵するレベルに作られた。他のSOFレベルが、表1-1、及び表1~2に挙げたように、実施例H及び実施例J~Lのために準備された。基材2の含浸量は概ね104%であり、実施例Pの処理組成物は、0.62% SOFのステインリリース剤の固形分レベルで適用した。基材3の含浸量は概ね90%であり、実施例Qの処理組成物は、0.54% SOFのステインリリース剤の固形分レベルで適用した。基材4の含浸量は概ね104%であり、実施例Rの処理組成物は、0.62% SOFのステインリリース剤の固形分レベルで適用した。処理組成物の適用後、試験サンプルは、試験室の熱風循環式オーブン(米国ミネソタ州ミネアポリスのDespatch Industries社から市販されている、Model V-35HD)で、2分間177℃(350°F)で乾燥、硬化させた。比較例Aは、(処理組成物を含まない)基材1単独のサンプルからなる。
摺洗物品のサンプルが、上記の実施例G~I、実施例L~N、実施例P及びQ、並びに比較例の基材構造体上に、テクスチャ層を印刷することによって準備された。詳細には、高せん断撹拌翼を用いて、堅いプラスチック容器の中で、表3で列挙した量の表3の成分を混合して、テクスチャ層組成が準備された。混合前に、全ての成分が別個のプラスチック容器に、所望の量でほぼ0.01グラムの単位まで量り取られた。成分は、表3に列挙された順に加えられた。全ての成分を加えた後、混合物を更に5~10分間攪拌した。
Claims (4)
- 互いに反対側を向いた第1及び第2の主表面を画定する基材と、
ステインリリース剤を含み、前記基材に適用され、少なくとも前記第1の主表面上に存在する、ステインリリースコーティングと、
前記ステインリリースコーティング上に、前記基材の反対側に形成されたパターンを画定するテクスチャ層と、
を備え、
前記ステインリリース剤が、ポリエチレンオキシド、ポリビニルピロリドン、カチオン性フルオロケミカル樹脂からなる群から選択される少なくとも1つを含み、
前記パターンを画定するテクスチャ層は前記ステインリリースコーティングと前記基材との間の前記第1の主表面には浸透しない、
摺洗物品。 - 前記第2の主面に取り付けられた補助的基材を更に備える、請求項1に記載の摺洗物品。
- 互いに反対側を向いた第1及び第2の主表面を画定する基材を準備する工程と、
ステインリリースコーティングが少なくとも前記第1の主表面上に存在するように、前記ステインリリースコーティングを前記基材に適用する工程と、
前記ステインリリースコーティング上に、前記基材の反対側に形成されたパターンを画定するように、かつ、前記ステインリリースコーティングと前記基材との間の前記第1の主表面には浸透しないように、テクスチャ層を形成する工程と
を含み、
前記ステインリリースコーティングが、ポリエチレンオキシド、ポリビニルピロリドン、カチオン性フルオロケミカル樹脂からなる群から選択される少なくとも1つを含む、
摺洗物品を製造する方法。 - テクスチャ層を形成する前記工程が、
流動性テクスチャ層組成物を準備する工程と、
前記流動性テクスチャ層組成物を前記ステインリリースコーティング上に転写する工程と、
を含む、請求項3に記載の方法。
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JP2019506992A (ja) | 2019-03-14 |
JP2022023898A (ja) | 2022-02-08 |
US11026552B2 (en) | 2021-06-08 |
KR20180101551A (ko) | 2018-09-12 |
US20190000294A1 (en) | 2019-01-03 |
EP3405091B1 (en) | 2019-07-31 |
AU2017210086A1 (en) | 2018-08-02 |
ES2750865T3 (es) | 2020-03-27 |
TW201741125A (zh) | 2017-12-01 |
CA3011706A1 (en) | 2017-07-27 |
MX2018008757A (es) | 2018-11-09 |
CN108471921A (zh) | 2018-08-31 |
EP3405091A1 (en) | 2018-11-28 |
CN108471921B (zh) | 2020-11-17 |
TWI742033B (zh) | 2021-10-11 |
BR112018014423A2 (pt) | 2018-12-11 |
WO2017127350A1 (en) | 2017-07-27 |
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