JP6901905B2 - Polishing liquid manufacturing method - Google Patents

Description

The present invention relates to a method for producing a polishing liquid used for polishing.

In the process of manufacturing a semiconductor wafer, an ingot is sliced to take out a plate-like object, both sides of the plate-like object are flattened by a grinding machine or a lapping machine, and then mirror-polished by a polishing device to form an integrated circuit. The surface condition is such that it can be formed. Further, in the process of forming an integrated circuit on the surface of a plate-like object, polishing is performed by a polishing device in flattening an interlayer insulating film at the time of forming a multilayer wiring, forming a metal plug, forming an embedded metal wiring, and the like. There is. As described above, the polishing apparatus has become an indispensable and important apparatus in the processing of semiconductor wafers.

In CMP (Chemical Mechanical Polishing) polishing, a plate-shaped object is polished while supplying a polishing liquid to the polishing pad and the plate-shaped object. A tank containing the polishing liquid is attached to the polishing device, and the polishing liquid is pumped from the tank to supply the polishing liquid to the plate-shaped object and the polishing pad. A polishing liquid having a concentration suitable for polishing is stored in the tank, but the replacement work and transportation work of the tank are burdensome for the operator and a relatively large storage space is required. Therefore, a method has been proposed in which a concentrated solution (stock solution) of a polishing solution is prepared and the concentrated solution is diluted and used (see, for example, Patent Document 1).

Japanese Unexamined Patent Publication No. 2016-015469

In the method described in Patent Document 1, since the concentrated solution is diluted, the frequency of tank replacement can be reduced, but the replacement work is difficult because the weight of the tank itself does not change. It can be easily replaced by making the tank smaller and lighter, but the frequency of tank replacement increases. Furthermore, the concentrated solution of the polishing solution is alkaline or acidic, and care must be taken when handling the concentrated solution.

The present invention has been made in view of the above points, and one of the objects of the present invention is to provide a method for producing a polishing liquid capable of reducing a work load while ensuring safety.

The method for producing a polishing solution according to one aspect of the present invention is a method for producing a polishing solution used in a CMP polishing apparatus, in which a tablet-type drug in which a predetermined weight of the drug is solid and a solvent for dissolving the tablet-type drug are used. A solvent supply step of supplying a predetermined weight of solvent to the stirring tank, a drug charging step of charging a predetermined amount of the tablet-type drug to the solvent supplied to the stirring tank, and the tablet-type in the stirring tank. It is characterized by comprising a stirring step of stirring the drug and the solvent, and adjusting the polishing liquid concentration according to the amount of the tablet-type drug added to the solvent.

According to this configuration, since the solid tablet-type chemical is charged into the solvent during the production of the polishing liquid, it is easier and safer to carry than the case where the liquid chemical is used, and the polishing liquid tank is replaced. It is possible to reduce the work load by eliminating the problem. Further, since the tablet-type drug can be managed by the number of tablets instead of being managed by the amount and weight as in the case of liquid or powder, the burden of management can be reduced.

According to the present invention, the drug can be easily and safely transported by solidifying the drug into a tablet-type drug, and the management burden can be reduced by managing the number of tablet-type drugs.

It is a schematic diagram of the polishing apparatus of this embodiment. It is a perspective view of the tablet type drug of this embodiment. It is a schematic diagram of the drug supply mechanism of this embodiment. It is a figure which shows an example of the manufacturing method of the polishing liquid of this embodiment.

Hereinafter, the polishing apparatus of this embodiment will be described with reference to the attached drawings. FIG. 1 is a schematic view of the polishing apparatus of this embodiment. The polishing apparatus is not limited to the configuration shown in FIG. 1 as long as it has a structure capable of supplying the polishing liquid to the plate-shaped object as in the present embodiment. Note that FIG. 1 illustrates a polishing liquid manufacturing apparatus using an extrusion-type chemical supply mechanism for convenience of explanation.

As shown in FIG. 1, the polishing apparatus 1 presses the polishing pad 22 against the plate-shaped object W on the chuck table 10 to relatively rotate the chuck table 10 and the polishing pad 22 while supplying the polishing liquid (slurry). It is configured as follows. In such CMP (Chemical Mechanical Polishing) polishing, the plate-like material W is etched by the chemical components of the polishing liquid, and the plate-like material W is mechanically polished by the abrasive grains dispersed in the polishing pad 22. As a result, the polishing speed of the plate-shaped material W can be improved, and fine scratches on the surface of the plate-shaped material W remaining after polishing can be reduced to obtain a mirror surface.

The holding surface 11 of the chuck table 10 is formed of a porous material, and the plate-like object W is sucked and held by the negative pressure generated on the holding surface 11. A motor 12 is connected to the lower part of the chuck table 10, and the chuck table 10 is rotationally driven by the motor drive. The spindle 20 is positioned above the chuck table 10, and the polishing pad 22 is attached to the mount 21 of the spindle 20. A motor 23 and an elevating mechanism 24 are connected to the spindle 20, and the polishing pad 22 is rotated by the motor drive, and the polishing pad 22 is separated from and detached from the plate-shaped object W by the elevating mechanism 24.

The polishing pad 22 is obtained by dispersing abrasive grains on a pad surface such as urethane, and the abrasive grains include silica, alumina, zirconia, manganese dioxide, ceria, bridal silica, fumed silica, boehmite, vialite, and diamond. Etc. are used. The polishing pad 22 is manufactured by mixing abrasive grains with a urethane material or the like in a predetermined ratio, and the abrasive grains are fixed to the entire polished surface of the polishing pad 22. In the present embodiment, instead of using the polishing liquid mixed with the abrasive grains, only the polishing liquid is supplied by using the polishing pad 22 to which the abrasive grains are fixed.

By the way, the polishing liquid generally used in the polishing apparatus is transported and managed in a liquid state. When transporting the polishing liquid to the factory, the transport cost increases depending on the load weight and the load space of the tank. For this reason, it is considered to reduce the transportation cost by diluting the concentrated solution (stock solution) of the polishing solution, but the concentration solution of the polishing solution must be controlled by the amount (volume) and weight. It doesn't become. Furthermore, in addition to the work load of tank replacement work, there is a risk of work-related accidents due to the handling of chemicals.

Therefore, in the present embodiment, paying attention to the work load, safety, and difficulty of management when handling the polishing liquid, a tablet-type chemical in which the main component (etching component) of the polishing liquid is solidified is added to the solvent. To manufacture the polishing liquid. Since the polishing liquid is produced by adding the tablet-type chemical to the solvent, it is possible to eliminate the tank replacement work and reduce the work load on the operator. In addition, the solidification of the drug makes it easier to carry, and it is possible to control the number of tablet-type drugs. Further, since it is easier to handle than a liquid chemical, the safety of transportation work and the like is enhanced.

In a general polishing device, a polishing liquid to which abrasive grains are added is used for polishing, and when an attempt is made to solidify the entire abrasive grains with this polishing liquid, the abrasive grains are solidified in an agglomerated state. Cannot be used as a tablet-type drug. Therefore, in the present embodiment, the abrasive grains are fixed to the polishing pad 22 as described above without using the polishing liquid containing the abrasive grains, and only the polishing liquid is supplied to the polishing pad 22. There is. Since the polishing liquid does not contain abrasive grains, the abrasive grains do not aggregate during molding of the tablet-type chemical, and the main component of the polishing liquid can be solidified to produce the tablet-type chemical.

Returning to FIG. 1, a manufacturing apparatus 30 for manufacturing a polishing liquid is provided above the chuck table 10. The manufacturing apparatus 30 includes a solvent tank 31 in which a solvent (for example, pure water) is stored, a drug supply mechanism 40 for supplying the tablet-type drug 39 to the solvent, and a stirring tank 32 for mixing the tablet-type drug 39 with the solvent. Is provided. Pure water is stored in the solvent tank 31 as a solvent, and the solvent is periodically supplied from the solvent tank 31 to the stirring tank 32 via the on-off valve 33. A plurality of tablet-type drugs 39 are stocked in the drug supply mechanism 40, and the tablet-type drugs 39 are sequentially supplied to the stirring tank 32 one by one from the drug supply mechanism 40. The details of the drug supply mechanism 40 will be described later.

A propeller-type stirrer 34 is attached to the stirrer tank 32, and the solvent supplied from the solvent tank 31 and the tablet-type drug 39 supplied from the drug supply mechanism 40 are mixed in the stirrer 34 by the stirrer 34. To. At this time, the tablet-type drug 39 is solidified at a predetermined weight corresponding to the solvent of the predetermined weight, and the tablet-type drug 39 is dissolved in the solvent of the predetermined weight in the stirring tank 32 to obtain a polishing liquid having a predetermined concentration. Generated. A supply nozzle 35 is attached to the lower part of the stirring tank 32, and the polishing liquid in the stirring tank 32 is gradually supplied from the supply nozzle 35 to the upper surface of the plate-shaped object W on the chuck table 10 for polishing.

In the polishing apparatus 1 configured in this way, the polishing pad 22 is pressed against the plate-shaped object W on the chuck table 10, and the plate-shaped object W and the polishing pad 22 rotate relative to each other while the polishing liquid is supplied from the supply nozzle 35. By being CMP polished. Further, since the tablet-type chemical 39 is dissolved in the solvent in the stirring tank 32 to generate the polishing liquid, it is not necessary to store the chemical in the polishing liquid in a liquid state. Since the tablet-type drug 39 is small and lightly molded, it is easy to carry, and since the drug is solidified for each predetermined weight, the concentration of the polishing liquid can be adjusted by the number of tablet-type drugs added. It has become.

Here, the tablet-type drug will be described with reference to FIG. FIG. 2 is a perspective view of the tablet-type drug of the present embodiment.

As shown in FIG. 2, the tablet-type drug 39 is formed into a flat shape by, for example, compression molding an alkaline powder as a solid drug at room temperature. When the tablet-type drug 39 is added to the solvent, the tablet-type drug 39 is dissolved in the solvent. At this time, since the tablet-type drug 39 has a flat shape, it has a large surface area and is easily dissolved in a solvent, and is easily disintegrated when it comes into contact with water. Therefore, the tablet-type drug 39 can be satisfactorily dissolved in the solvent, and the polishing liquid can be produced in a short time. The tablet-type drug 39 is not only solidified for convenience of transportation and management, but is also molded into a shape that is easily dissolved in a solvent in consideration of productivity.

As described above, the tablet-type drug 39 is formed into a flat shape in which width is prioritized over thickness. Although the strength is reduced by increasing the width (area) of the tablet-type drug 39, it is compacted so as to have at least a strength that does not collapse during transportation. Further, the tablet-type drug 39 is preferably transported in a state of being housed in a dedicated cartridge so that the tablet-type drug 39 can be protected from impact or the like during transportation.

The tablet-type drug 39 is not limited to the flat shape described above, and may be formed with a thickness such as a lens shape or a granule shape. In this case, a powder that generates carbon dioxide gas such as sodium hydrogen carbonate may be added to the tablet-type drug 39. The foaming of carbon dioxide gas from the tablet-type drug 39 in the solvent causes the tablet-type drug 39 to collapse in the solvent, making it easier for the tablet-type drug 39 to dissolve in the solvent. As a result, the tablet-type drug 39 is made thicker to ensure its strength, while the foaming of carbon dioxide gas makes the tablet-type drug 39 more likely to collapse, improving the solubility of the tablet-type drug 39 in the solvent. ..

Further, the outer surface of the tablet-type drug 39 may be coated with a water-soluble resin or the like. By coating the outer surface of the tablet-type drug 39, the strength of the tablet-type drug 39 can be increased. Even if the tablet-type drug 39 is formed into a flat shape and thinly formed, sufficient strength can be ensured by the coating. Further, by putting the tablet-type drug 39 into the solvent to dissolve the coating film, the tablet-type drug 39 collapses in the solvent and becomes easily dissolved in the solvent. The coating agent may be any as long as it is soluble in a solvent, and is not limited to the above-mentioned water-soluble resin, and may be appropriately changed depending on the type of solvent.

Further, the powder for forming the tablet-type drug 39 may be any as long as it is alkaline when dissolved in a solvent. For example, potassium acetate, potassium chloride, anhydrous piperazine, piperazine hexahydrate, potassium hydroxide, water. Sodium oxide, ammonium carbonate, potassium hydrogen carbonate, sodium hydrogen carbonate, 1,4-ethylene piperazine, imidazole, pyrazole, pyrazine may be used. The tablet-type drug 39 is not limited to the structure formed from one kind of alkaline powder, and may be formed from two or more kinds of alkaline powders.

Further, not only the alkaline powder which is the main component but also the powdery additive may be added to the tablet-type drug 39. As the additive, for example, a surfactant, a chelating agent, a disintegrant, a binder, and a type-forming agent may be used. Not only one kind of additive but also two or more kinds of additives may be added to the tablet-type drug 39.

The solvent may be any one that is mixed with the tablet-type drug 39 and exhibits alkalinity, and a polar solvent such as alcohol may be used in addition to pure water. The ratio of the solvent to the tablet-type drug is preferably adjusted so that the polishing liquid has a pH of 10-pH 12.5, and more preferably adjusted to a pH of 12.5. Further, the solvent is configured to be supplied from the solvent tank 31 to the stirring tank 32, but is not limited to this configuration. When the solvent is pure water, it may be directly supplied to the stirring tank 32 from the pure water equipment in the factory through a pipe.

Further, the tablet-type drug 39 is formed into pellets by compression molding an alkaline powder, but the structure is not limited to this. The tablet-type drug 39 may be formed by agglomerating alkaline powders, and may be formed into granules by granulation molding, for example. As described above, when the tablet-type drug 39 is formed only from the alkaline dry powder, it may be formed into pellets by compression molding or may be formed into granules by dry granulation molding. Further, the tablet-type drug 39 may be formed by containing an alkaline powder in a tablet-shaped capsule.
Further, it may contain a liquid component, be molded into pellets, and then dried.

Further, the tablet-type drug 39 is not limited to a structure formed by drying only a solid powder, and may be molded by containing a liquid component. For example, the tablet-type drug 39 may be formed into granules by wet granulation molding with an alkaline powder and an alkaline / neutral (pure water) liquid, or the tablet-type drug 39 may be compression-molded after the wet granulation molding. 39 may be formed in the form of pellets. In wet granulation molding, the content of the liquid with respect to the tablet-type drug 39 is preferably 30% or less. The type of alkaline liquid is not particularly limited, and the tablet-type drug 39 may contain two or more kinds of alkaline liquids.

Further, in the present embodiment, the tablet-type drug 39 is molded with an alkaline powder, but it may be molded with an acidic powder. Further, the tablet-type drug 39 may be formed by adding a powdery additive such as a surfactant, a chelating agent, a disintegrant, a binder, and a type-forming agent. As the solvent, a solvent that is mixed with the tablet-type drug 39 and exhibits acidity is used. Further, the tablet-type drug 39 may be formed by agglomerating acidic powders in the same manner as alkaline powders, and may be formed by the above-mentioned compression molding, dry granulation molding, wet granulation molding, or wet molding. It may be molded by any of compression molding after grain molding.

The drug supply mechanism will be described with reference to FIG. FIG. 3 is a schematic view of the drug supply mechanism of the present embodiment. The drug supply mechanism may be configured in any way as long as the tablet-type drug can be added to the solvent. For example, in the polishing liquid manufacturing apparatus of the present embodiment, the extrusion type drug supply mechanism shown in FIG. 3A, the revolver type drug supply mechanism shown in FIG. 3B, the screw type drug supply mechanism shown in FIG. 3C, and FIG. 3D. Any of the conveyor-type drug supply mechanisms shown may be used.

As shown in FIG. 3A, in the extrusion type drug supply mechanism 40, the tablet-type drug 39 is vertically stacked on the cylindrical cartridge 41, and the tablet-type drug 39 dropped from the lower end of the cartridge 41 is pushed out by the extrusion mechanism 42. I'm pushing them out one by one. A saucer 43 for receiving the tablet-type drug 39 is provided below the cartridge 41, and the tablet-type drug 39 that has fallen on the saucer 43 is extruded by the extrusion mechanism 42 and directly above the stirring tank 32 along the slope 44. It has been sent out. A photo sensor 45 for counting the quantity of the tablet-type drug 39 is provided at the outlet of the slope 44, and the number of tablets-type drug 39 added is counted each time the photo sensor 45 is shielded from light.

In this way, by counting the number of the tablet-type drug 39 charged by the photosensor 45, the amount of the tablet-type drug 39 charged into the stirring tank 32 can be controlled, and the remaining amount of the tablet-type drug 39 in the cartridge 41 can be controlled. You can manage the number. Further, each time the extrusion mechanism 42 pushes out the tablet-type drug 39 from the saucer 43, the tablet-type drug 39 is supplied to the saucer 43 by free fall, so that the structure of the drug supply mechanism 40 can be simplified. The extrusion speed of the extrusion mechanism 42 is preferably suppressed to such an extent that the tablet-type drug 39 is not disintegrated by the impact at the time of extrusion.

As shown in FIG. 3B, in the revolver type drug supply mechanism 50, the tablet-shaped drug 39 is vertically stacked on the cylindrical cartridge 51, and the tablet-shaped drug 39 dropped from the lower end of the cartridge 51 is revolved in a disk shape. It is sent out one by one by 52. A plurality of recesses are formed in the circumferential direction on the upper surface of the revolver 52, and a motor 54 is connected to the lower surface of the revolver 52. Each time the tablet-type drug 39 is placed in the recess of the revolver 52, the revolver 52 rotates intermittently at a predetermined angle to deliver the tablet-type drug 39 to the inlet 56. A photo sensor 55 is provided below the charging port 56, and the number of tablet-type drugs 39 charged into the stirring tank 32 is counted.

Even with such a configuration, the number of tablet-type agents 39 charged into the stirring tank 32 can be controlled, and the remaining number of tablet-type agents 39 in the cartridge 51 can be controlled. Further, each time the revolver 52 rotates intermittently, the tablet-type drug 39 is supplied to the recess by free fall, so that the structure of the drug supply mechanism 50 can be simplified. Since the tablet-type drug 39 is charged every time the revolver 52 rotates intermittently at a predetermined angle, the number of steps of the motor 54 may be monitored instead of the photo sensor 55. The rotation speed of the revolver 52 is preferably suppressed to such an extent that the tablet-type drug 39 does not pop out from the recess.

As shown in FIG. 3C, in the screw-type drug supply mechanism 60, the tablet-type drug 39 is housed in the cylindrical cartridge 61, and one tablet-type drug 39 that has fallen from the lower end of the cartridge 61 is separated by the screw plate 63. It is being sent out one by one. A transport cartridge 62 is connected to the lower end of the cartridge 61, and a screw plate 63 is housed inside the transport cartridge 62. A motor 64 is connected to one end of the screw plate 63, and the tablet-type drug 39 in the transport cartridge 62 is pushed out by the rotation of the screw plate 63. A photo sensor 65 is provided below the outlet of the transport cartridge 62, and the number of tablet-type drugs 39 charged into the stirring tank 32 is counted.

Even with such a configuration, the number of tablet-type agents 39 charged into the stirring tank 32 can be controlled, and the remaining number of tablet-type agents 39 in the cartridge 61 can be controlled. Further, since the tablet-type drug 39 is supplied to the screw plate 63 by free fall as the screw plate 63 rotates, the structure of the drug supply mechanism 60 can be simplified. The tablet-type drug 39 is transported at a low speed in the transport cartridge 62 by the rotation of the screw plate 63. Therefore, the wear and disintegration of the tablet-type drug 39 are suppressed, and the tablet-type drug 39 can be supplied to the stirring tank 32 with an appropriate weight.

As shown in FIG. 3D, in the conveyor-type drug supply mechanism 70, the tablet-type drug 39 is vertically stacked on the cylindrical cartridge 71, and one tablet-type drug 39 dropped from the lower end of the cartridge 71 is delivered by the conveyor 72. It is being sent out one by one. In the conveyor 72, a belt 74 is bridged over a pair of pulleys 73, and a large number of trays 76 are attached to the outer surface of the belt 74. A motor is connected to the pulley 73 on one side, and the tablet-type drug 39 contained in the tray 76 is sent out directly above the stirring tank 32 by the orbital movement of the belt 74. A photo sensor 75 is provided below the conveyor 72, and the number of tablet-type chemicals 39 charged into the stirring tank 32 is counted.

Even with such a configuration, the number of tablet-type agents 39 charged into the stirring tank 32 can be controlled, and the remaining number of tablet-type agents 39 in the cartridge 71 can be controlled. Further, since the tablet-type drug 39 is supplied to the tray 76 by free fall in accordance with the movement of the tray 76 by the conveyor 72, the structure of the drug supply mechanism 70 can be simplified. Since the tablet-type drug 39 is transported while being placed on the tray 76, no external force is applied to the tablet-type drug 39 during transportation. Therefore, the wear and disintegration of the tablet-type drug 39 are suppressed, and the tablet-type drug 39 can be supplied to the stirring tank 32 with an appropriate weight.

Subsequently, a method for producing the polishing liquid will be described with reference to FIG. FIG. 4 is a diagram showing an example of a method for producing a polishing liquid according to the present embodiment. Although the configuration for producing the polishing liquid by using the extrusion type chemical supply mechanism is illustrated here, the polishing liquid can be produced by the same method with the other chemical supply mechanism described above.

As shown in FIG. 4A, a solvent supply step is first carried out. In the solvent supply step, the opening / closing valve 33 is opened to supply a predetermined weight of solvent from the solvent tank 31 to the stirring tank 32. In this case, the opening / closing valve 33 may be opened for a predetermined time to supply the solvent at a predetermined flow rate from the solvent tank 31 to the stirring tank 32, or the weight of the solvent in the stirring tank 32 is measured by a load cell or the like and the predetermined weight is measured. The supply of the solvent may be stopped when the value is reached. Further, the configuration is not limited to the configuration in which the solvent is supplied from the solvent tank 31 to the stirring tank 32, and a predetermined weight of the solvent may be supplied to the stirring tank 32 from the water supply pipe or the like in the factory via the opening / closing valve 33.

Next, as shown in FIG. 4B, a drug charging step is carried out after the solvent supply step. In the drug charging step, a predetermined amount of tablet-shaped drug 39 is charged to the solvent supplied to the stirring tank 32. In this case, the tablet-type drug 39 that has fallen from the cartridge 41 is extruded by the extrusion mechanism 42, and the tablet-type drug is charged one by one into the stirring tank 32 to which the solvent is supplied. Each time the tablet-type drug 39 is charged into the stirring tank 32, the photosensor 45 counts the number of tablets-type drug 39 charged, and when the count reaches a predetermined quantity, the tablet-type drug 39 is extruded by the extrusion mechanism 42. Is stopped.

Next, as shown in FIG. 4C, a stirring step is performed after the drug charging step. In the stirring step, the tablet-type drug 39 and the solvent are stirred in the stirring tank 32 by the stirring machine 34. The solvent is agitated by the stirrer 34 in the stirring tank 32, and the tablet-type drug 39 is dissolved in a predetermined amount of solvent to produce a polishing liquid having a predetermined concentration. In this case, since the tablet-type drug 39 is formed in a flat shape, the tablet-type drug 39 collapses due to stirring of the solvent and dissolves in a short time to produce a polishing liquid having a predetermined concentration. When the stirrer 34 is stopped and the polishing liquid is produced, the count of the number of inputs is reset and the number of inputs is set to zero.

In this way, since the polishing liquid is produced by adding the solidified tablet-type drug 39 to the solvent, the concentration of the polishing liquid can be adjusted by the amount of the tablet-type drug 39 added. Therefore, the polishing liquid can be adjusted to an appropriate concentration depending on the number of the tablet-type chemicals 39 added without measuring the weight of the tablet-type chemicals 39. Since the tablet-type drug 39 is solidified to a predetermined weight, the tablet-type drug 39 can be added only by a predetermined weight, but the concentration of the polishing liquid is finely adjusted by adjusting the supply amount of the solvent. be able to. The concentration of the polishing liquid is adjusted by, for example, the following equation (1).

As described above, according to the polishing apparatus 1 of the present embodiment, since the solid tablet-type chemical 39 is charged into the solvent at the time of producing the polishing liquid, it is easier to transport than the case where the liquid chemical is used. It is safe, and the work load can be reduced by eliminating the work of replacing the polishing liquid tank. Further, since the tablet-type drug 39 can be managed by the number of tablets instead of being managed by the amount and weight as in the case of liquid or powder, the burden of management can be reduced.

Further, in the present embodiment, the chemical charging step is performed after the solvent supply step, but the configuration is not limited to this. The drug addition step may be carried out before the solvent supply step, or the solvent supply step and the drug addition step may be carried out at the same time.

Further, in the stirring step of the present embodiment, the tablet-type drug is dissolved in the solvent by stirring the solvent with a stirrer, but the structure is not limited to this. In the stirring step, it suffices if the tablet-type drug can be dissolved in the solvent. For example, the tablet-type drug may be dissolved in the solvent by ultrasonic vibration of the solvent.

Further, in the stirring step of the present embodiment, the input quantity of the tablet-type drug is counted by the photosensor, but the present invention is not limited to this configuration. The input quantity of the tablet-type drug may be any structure as long as the input number of the tablet-type drug can be detected.

Further, in the present embodiment, the slurry has been described as an example of the polishing liquid, but the present invention is not limited to this configuration. The polishing liquid may be any liquid that is supplied to the plate-like material during the polishing process, and may be, for example, a liquid for preventing metal adhesion and improving the cleaning ability. That is, the polishing process carried out is not limited to CMP polishing, but includes other wet polishing.

Further, in the present embodiment, a polishing device that separates the workpiece into individual pieces has been described as an example of the processing device, but the present invention is not limited to this configuration. The present invention can be applied to other processing devices that perform polishing treatment, and may be applied to other processing devices such as a cluster device provided with a polishing device.

Further, as the plate-shaped material to be processed, for example, various types such as semiconductor device wafers, optical device wafers, package substrates, semiconductor substrates, inorganic material substrates, oxide wafers, raw ceramic substrates, piezoelectric substrates, etc., depending on the type of processing. A workpiece may be used. As the semiconductor device wafer, a silicon wafer or a compound semiconductor wafer after device formation may be used. As the optical device wafer, a sapphire wafer or a silicon carbide wafer after device formation may be used. Further, a CSP (Chip Size Package) substrate may be used as the package substrate, silicon, gallium arsenide or the like may be used as the semiconductor substrate, and sapphire, ceramics, glass or the like may be used as the inorganic material substrate. Further, as the oxide wafer, lithium tantalate or lithium niobate after device formation or before device formation may be used.

Moreover, although the present embodiment and the modified example have been described, as another embodiment of the present invention, the above-described embodiment and the modified example may be combined in whole or in part.

Further, the embodiment of the present invention is not limited to the above-described embodiment, and may be variously modified, replaced, or modified without departing from the spirit of the technical idea of the present invention. Furthermore, if the technical idea of the present invention can be realized in another way by the advancement of technology or another technology derived from it, it may be carried out by using that method. Therefore, the scope of claims covers all embodiments that may be included within the scope of the technical idea of the present invention.

Further, in the present embodiment, the configuration in which the present invention is applied to the polishing apparatus has been described, but it can also be applied to other processing apparatus that requires the supply of the polishing liquid.

As described above, the present invention has an effect of being able to reduce the work load while ensuring safety, and is particularly useful in a method for producing a polishing liquid used in a CMP polishing apparatus.

1 Polishing equipment (CMP polishing equipment)
30 Manufacturing equipment 31 Solvent tank 32 Stirring tank 34 Stirrer 39 Tablet-type drug 40, 50, 60, 70 Drug supply mechanism 45, 55, 65, 75 Photosensor

Claims (2)

A method for producing a polishing liquid used in a CMP polishing apparatus.
A tablet drug predetermined weight of the drug was formed into pellets, separately used for the solvent for dissolving the tablet type agents,
Further, the tablet-type drug is formed of a drug having at least two kinds of components or a drug composed of a drug as a main component and an additive.
A solvent supply step of supplying a predetermined weight of solvent to the stirring tank, and
Using a drug supply mechanism provided with a cartridge for accommodating the tablet-type drug, the tablet-type drug is dropped from the cartridge with respect to the solvent supplied to the stirring tank, and a predetermined amount of the tablet-type drug is charged. Drug injection process and
A stirring step of stirring the tablet-type drug and the solvent in the stirring tank is provided.
A method for producing a polishing liquid, which comprises adjusting the polishing liquid concentration according to the amount of the tablet-type chemical added to the solvent. The method for producing an abrasive liquid according to claim 1, wherein the drug supply mechanism includes a sensor that counts the input quantity of the tablet-type drug.

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