JP6882908B2 - Board processing equipment - Google Patents

Description

The present invention relates to a substrate processing apparatus for processing a substrate and a vibration detection method.

The substrate processing apparatus described in Patent Document 1 includes a spin chuck. The spin chuck holds the substrate. Specifically, the spin chuck includes four holding members. The four holding members are attached to the spin base. Of the four holding members, two holding members are fixed, and the other two holding members (hereinafter, may be referred to as "movable holding members") are movable. Then, as the movable holding member moves toward the substrate, the four holding members come into contact with the peripheral edge of the substrate. As a result, the substrate is held by the four holding members while having a substantially horizontal posture.

However, if the holding member holds the substrate incompletely, or if the substrate is held at an angle with respect to the rotation axis of the spin chuck, the substrate may fall off due to the rotation of the spin chuck.

Therefore, the substrate processing apparatus detects the position of the movable holding member that has moved to the substrate side. Then, the substrate processing apparatus detects that the substrate is properly held or is not properly held based on the position of the movable holding member.

Japanese Unexamined Patent Publication No. 2016-25293

However, in the substrate processing apparatus described in Patent Document 1, even if the position of the movable holding member indicates that the substrate is properly held, the substrate is actually held properly due to various causes. It may not have been done.

Various causes are, for example, deterioration of the holding member or warpage of the substrate. Deterioration of the holding member is, for example, that the holding member is corroded by a chemical agent or that the holding member is worn.

Various causes are, for example, that the spin chuck is located at a different position from the proper position because the fixing member such as a bolt is loose.

As described above, in the substrate processing apparatus described in Patent Document 1, it is detected that the substrate is properly held or not properly held based on the position of the movable holding member, so that false detection occurs. Can occur.

The present invention has been made in view of the above problems, and an object of the present invention is a substrate processing apparatus and vibration capable of reducing false positives when detecting that a substrate is properly held or not properly held. The purpose is to provide a detection method.

According to the first aspect of the present invention, the substrate processing apparatus processes the substrate. The substrate processing device includes a rotating unit, a driving unit, an accommodating unit, and a first detecting unit. The rotating part can hold the substrate. The drive unit drives the rotating unit to rotate the rotating unit. The accommodating portion accommodates the rotating portion and the driving portion. The first detection unit detects vibration including vibration of the rotating unit via the driving unit. A drive unit different from the drive unit that rotates the rotating unit is further provided. The drive unit that rotates the rotating unit is arranged between the rotating unit and the first detection unit. The accommodating portion has a base portion to which the driving portion for rotating the rotating portion is attached. The base portion has a first region facing the driving unit that rotates the rotating portion, and a second region facing the driving unit that is different from the driving portion that rotates the rotating portion. The first detection unit is attached to the outer surface of the housing unit so as to face the driving unit that rotates the rotating unit via the housing unit in the first region different from the second region. apparatus.

In the substrate processing apparatus of the present invention, it is preferable that the first detection unit detects the vibration during the period during which the rotating unit is rotating and outputs a vibration signal representing the vibration. The substrate processing apparatus preferably includes a determination unit and an execution unit. The determination unit determines whether or not the level of the vibration signal exceeds a predetermined vibration range. The execution unit executes a predetermined process according to the affirmative determination by the determination unit.

In the substrate processing apparatus of the present invention, the predetermined process preferably includes a process of issuing an alarm and / or a process of controlling the drive unit to stop the rotation of the rotating unit.

The substrate processing apparatus of the present invention preferably further includes a storage unit. The storage unit preferably stores a first predetermined value indicating the value at one end of the predetermined vibration range and a second predetermined value indicating the value at the other end of the predetermined vibration range. The vibration signal preferably includes a vibration component in the first direction with respect to a predetermined base level and a vibration component in the second direction opposite to the first direction with respect to the base level. It is preferable that the first predetermined value is determined corresponding to the vibration component in the first direction, and the second predetermined value is determined corresponding to the vibration component in the second direction.

In the substrate processing apparatus of the present invention, it is preferable that the determination unit determines whether or not the number of times it is determined that the level of the vibration signal exceeds the predetermined vibration range is equal to or greater than a predetermined number within a predetermined time. The predetermined number preferably indicates a plurality. It is preferable that the execution unit executes the predetermined process according to the affirmative determination by the determination unit.

In the substrate processing apparatus of the present invention, it is preferable that the predetermined vibration range differs depending on the number of rotations of the rotating portion per unit time.

In the substrate processing apparatus of the present invention, the vibration signal includes a vibration component in the first direction with respect to a predetermined base level and a vibration component in the second direction opposite to the first direction with respect to the base level. Is preferably included. The substrate processing apparatus preferably further includes a storage unit. The storage unit preferably stores a first threshold value and a second threshold value for comparison with the level of the vibration component. The second threshold is preferably larger than the first threshold. It is preferable that the determination unit determines whether or not the absolute value of the level of the vibration component is larger than the first threshold value, and also determines whether or not the absolute value is larger than the second threshold value. When it is determined that the absolute value is larger than the first threshold value and the absolute value is determined to be equal to or less than the second threshold value, the execution unit performs the first process as the predetermined process. It is preferable to carry out.

In the substrate processing apparatus of the present invention, the first processing preferably includes a processing of stopping the rotation of the rotating portion after the processing being executed for the substrate is completed.

In the substrate processing apparatus of the present invention, when it is determined that the absolute value is larger than the second threshold value, the execution unit executes a second process different from the first process as the predetermined process. It is preferable to do so.

In the substrate processing apparatus of the present invention, it is preferable that the second process includes a process of immediately stopping the rotation of the rotating portion in response to the determination that the absolute value is larger than the second threshold value. ..

The substrate processing apparatus of the present invention preferably further includes a second detection unit. It is preferable that the second detection unit detects the vibration including the vibration of the rotating unit via the driving unit that rotates the rotating unit. The drive unit that rotates the rotating unit is preferably arranged between the rotating unit and the second detection unit. It is preferable that the second detection unit faces the driving unit that rotates the rotating unit, and the detection sensitivity of the first detection unit is higher than the detection sensitivity of the second detection unit.

In the substrate processing apparatus of the present invention, the first detection unit detects the vibration while the rotating unit is rotating, outputs a first vibration signal representing the vibration, and the second detection unit It is preferable to detect the vibration during the period during which the rotating portion is rotating and output a second vibration signal representing the vibration. The substrate processing apparatus preferably further includes a determination unit and an execution unit. It is preferable that the determination unit determines whether or not the level of the first vibration signal exceeds the first vibration range and whether or not the level of the second vibration signal exceeds the second vibration range. It is preferable that the execution unit determines the process to be executed after the determination based on the combination of the determination result for the first vibration signal and the determination result for the second vibration signal, and executes the determined process.

In the substrate processing apparatus of the present invention, the first vibration signal has a vibration component in the first direction with respect to a predetermined first base level and a first vibration component opposite to the first direction with respect to the first base level. It is preferable to include a vibration component in two directions. The second vibration signal includes a vibration component in a third direction with respect to a predetermined second base level and a vibration component in a fourth direction opposite to the third direction with respect to the second base level. Is preferable. The substrate processing apparatus preferably further includes a storage unit. The storage unit may store a third threshold value for comparing with the level of the vibration component of the first vibration signal and a fourth threshold value for comparing with the level of the vibration component of the second vibration signal. preferable. The determination unit determines whether or not the absolute value of the level of the vibration component of the first vibration signal is larger than the third threshold value, and the absolute value of the level of the vibration component of the second vibration signal is It is preferable to determine whether or not it is larger than the fourth threshold value. When it is determined that the absolute value is larger than the third threshold value and the absolute value is determined to be equal to or less than the fourth threshold value, the execution unit performs a third process as the process to be executed after the determination. It is preferable to carry out. When it is determined that the absolute value is larger than the third threshold value and the absolute value is determined to be larger than the fourth threshold value, the execution unit performs the process to be executed after the determination. 4 It is preferable to carry out the process. When the absolute value is determined to be equal to or lower than the third threshold value and the absolute value is determined to be larger than the fourth threshold value, the execution unit performs a fifth process as the process to be executed after the determination. It is preferable to carry out.

In the substrate processing apparatus of the present invention, each of the third process, the fourth process, and the fifth process issues an alarm and / or controls the drive unit to rotate the rotating unit. It is preferable to include a process of stopping.

In the substrate processing apparatus of the present invention, the third processing preferably includes a processing of stopping the rotation of the rotating portion after the processing being executed for the substrate is completed.

In the substrate processing apparatus of the present invention, the fourth process responds to the determination that the absolute value is larger than the third threshold value and that the absolute value is larger than the fourth threshold value. Therefore, it is preferable to include a process of immediately stopping the rotation of the rotating portion. In the fifth process, in response to the determination that the absolute value is equal to or less than the third threshold value and the absolute value is determined to be larger than the fourth threshold value, the rotation of the rotating portion is immediately stopped. It is preferable to include a process for processing.

The substrate processing apparatus of the present invention preferably further includes a third detection unit. The third detection unit preferably detects the vibration of the housing unit. The accommodating portion preferably further has a wall portion. The third detection unit is preferably attached to the wall portion.

In the substrate processing apparatus of the present invention, it is preferable that the first detection unit detects the vibration including the vibration of the rotating unit during the period during which the rotating unit is rotating and outputs the first vibration signal. .. It is preferable that the third detection unit detects the vibration of the accommodating unit and outputs a third vibration signal while the rotating unit is rotating. The substrate processing apparatus preferably further includes a determination unit and an execution unit. It is preferable that the determination unit determines whether or not the level of the first vibration signal exceeds the third vibration range and whether or not the level of the third vibration signal exceeds the fourth vibration range. It is preferable that the execution unit determines the process to be executed after the determination based on the combination of the determination result for the first vibration signal and the determination result for the third vibration signal, and executes the determined process.

In the substrate processing apparatus of the present invention, the first vibration signal has a vibration component in the first direction with respect to a predetermined first base level and a first vibration component opposite to the first direction with respect to the first base level. It is preferable to include a vibration component in two directions. The third vibration signal includes a vibration component in the fifth direction with respect to a predetermined third base level and a vibration component in the sixth direction opposite to the fifth direction with respect to the third base level. Is preferable. The substrate processing apparatus preferably further includes a storage unit. The storage unit may store a fifth threshold value for comparison with the level of the vibration component of the first vibration signal and a sixth threshold value for comparison with the level of the vibration component of the third vibration signal. preferable. The determination unit determines whether or not the absolute value of the level of the vibration component of the first vibration signal is larger than the fifth threshold value, and the absolute value of the level of the vibration component of the third vibration signal is It is preferable to determine whether or not it is larger than the sixth threshold value. When it is determined that the absolute value is larger than the fifth threshold value and the absolute value is determined to be equal to or less than the sixth threshold value, the execution unit performs the sixth process as the process to be executed after the determination. It is preferable to carry out. When it is determined that the absolute value is larger than the fifth threshold value and the absolute value is determined to be larger than the sixth threshold value, the execution unit performs the process to be executed after the determination. It is preferable to carry out 7 processes. When the absolute value is determined to be equal to or less than the fifth threshold value and the absolute value is determined to be larger than the sixth threshold value, the execution unit performs the eighth process as the process to be executed after the determination. It is preferable to carry out.

In the substrate processing apparatus of the present invention, each of the sixth process, the seventh process, and the eighth process issues an alarm and / or controls the drive unit to rotate the rotating unit. It is preferable to include a process of stopping.

In the substrate processing apparatus of the present invention, the sixth processing preferably includes a processing for stopping the rotation of the rotating portion after the processing being executed for the substrate is completed.

In the substrate processing apparatus of the present invention, the seventh process responds to the determination that the absolute value is larger than the fifth threshold value and that the absolute value is larger than the sixth threshold value. Therefore, it is preferable to include a process of immediately stopping the rotation of the rotating portion. In the eighth process, in response to the determination that the absolute value is equal to or less than the fifth threshold value and the absolute value is determined to be larger than the sixth threshold value, the rotation of the rotating portion is immediately stopped. It is preferable to include a process for processing.

In the substrate processing apparatus of the present invention, it is preferable that the first detection unit is attached to a portion of the drive unit that rotates the rotating unit, which is exposed from the accommodating unit.

According to the present invention, it is possible to reduce erroneous detection when detecting that the substrate is properly held or that the substrate is not properly held.

It is a top view which shows the substrate processing system which concerns on Embodiment 1 of this invention. It is a side view which shows the substrate processing system which concerns on Embodiment 1. FIG. It is a side sectional view which shows the processing apparatus which concerns on Embodiment 1. FIG. It is a bottom view which shows the processing apparatus which concerns on Embodiment 1. FIG. FIG. 1A is a diagram showing a waveform of a vibration signal when the vibration signal from the detection unit according to the first embodiment vibrates within a predetermined vibration range. FIG. 1B is a diagram showing a waveform of a vibration signal when the vibration signal from the detection unit according to the first embodiment vibrates beyond a predetermined vibration range. (A), (c), and (e) are plan views showing the spin chuck according to the first embodiment. (B), (d), and (f) are plan views showing the position detection unit of the spin chuck according to the first embodiment. FIG. 5 is a flowchart showing a vibration detection method executed by the substrate processing apparatus according to the first embodiment. It is a flowchart which shows the vibration analysis processing which the substrate processing apparatus which concerns on Embodiment 1 performs. It is a figure which shows the waveform of the vibration signal which the substrate processing apparatus which concerns on 1st modification of Embodiment 1 analyzes. (A) and (b) are diagrams showing the first predetermined vibration range and the second predetermined vibration range according to the second modification of the first embodiment. FIG. 5 is a flowchart showing a vibration analysis process executed by the substrate processing apparatus according to the second modification of the first embodiment. FIG. 5 is a flowchart showing a vibration analysis process executed by the substrate processing apparatus according to the third modification of the first embodiment. It is a flowchart which shows the vibration detection method executed by the substrate processing apparatus which concerns on 4th modification of Embodiment 1. (A) is a side sectional view showing a part of the processing apparatus according to the fifth modification of the first embodiment. (B) is a bottom view which shows the processing apparatus which concerns on 5th modification. (A) is a side sectional view showing a part of the processing apparatus of the substrate processing system according to the second embodiment of the present invention. (B) is a bottom view showing the processing apparatus according to the second embodiment. (A) is a figure which shows the 1st vibration range which concerns on Embodiment 2. (B) is a figure which shows the 2nd vibration range which concerns on Embodiment 2. It is a flowchart which shows the vibration analysis processing which the substrate processing apparatus which concerns on Embodiment 2 executes. It is a side sectional view which shows the processing apparatus of the substrate processing system which concerns on Embodiment 3 of this invention. (A) is a figure which shows the 3rd vibration range which concerns on Embodiment 3. (B) is a figure which shows the 4th vibration range which concerns on Embodiment 3. FIG. 5 is a flowchart showing a vibration analysis process executed by the substrate processing apparatus according to the third embodiment.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the drawings, a three-dimensional Cartesian coordinate system including an X-axis, a Y-axis, and a Z-axis that are orthogonal to each other will be described. The X-axis and Y-axis are parallel in the horizontal direction, and the Z-axis is parallel in the vertical direction. In the drawings, the same or corresponding parts are designated by the same reference numerals and the description is not repeated.

(Embodiment 1)
The substrate processing system 100 according to the first embodiment of the present invention will be described with reference to FIGS. 1 to 8. FIG. 1 is a plan view showing a substrate processing system 100. As shown in FIG. 1, the substrate processing system 100 includes an indexer unit U1, a processing unit U2, and a computer unit U3. The computer unit U3 controls the indexer unit U1 and the processing unit U2. The indexer unit U1 includes a plurality of substrate containers C and an indexer robot IR. The processing unit U2 includes a plurality of processing devices 1, a transfer robot CR, and a delivery unit PS.

Each of the substrate accommodators C accommodates a plurality of substrates W in a laminated manner. In the first embodiment, the substrate W has a substantially disk shape. The indexer robot IR takes out one unprocessed substrate W from one of the plurality of substrate containers C and passes the substrate W to the delivery unit PS. The delivery unit PS receives the substrate W and delivers it to the transfer robot CR. The transfer robot CR receives the substrate W and carries the substrate W into any of the plurality of processing devices 1.

Then, the processing device 1 processes the unprocessed substrate W. The processing device 1 employs a single-wafer type that processes the substrate W one by one. For example, the processing apparatus 1 processes the substrate W with a processing liquid or a processing gas. For example, the processing device 1 processes the substrate W using a contact member such as a brush and a liquid such as water. For example, the processing device 1 processes the substrate W using electromagnetic waves such as ultraviolet rays. Hereinafter, in the first embodiment, the processing apparatus 1 processes the substrate W using the processing liquid.

After the processing by the processing device 1, the transfer robot CR takes out the processed substrate W from the processing device 1 and delivers the substrate W to the delivery unit PS. The delivery unit PS receives the substrate W and passes it to the indexer robot IR. The indexer robot IR receives the substrate W and accommodates the substrate W in one of the plurality of substrate accommodators C.

Next, the arrangement of the plurality of processing devices 1 will be described with reference to FIGS. 1 and 2. FIG. 2 is a side view showing the substrate processing system 100. As shown in FIGS. 1 and 2, the processing unit U2 includes a plurality of group GPs (four group GPs in the first embodiment). Each of the group GPs is composed of a predetermined number of processing devices 1 (three processing devices 1 in the first embodiment). In each of the group GPs, a predetermined number of processing devices 1 are stacked in a straight line along the vertical direction. Further, the plurality of groups are arranged so as to face each other.

Next, the details of the processing apparatus 1 will be described with reference to FIG. FIG. 3 is a side sectional view showing the processing device 1. As shown in FIG. 3, the processing device 1 and the computer unit U3 form a substrate processing device SP. The substrate processing apparatus SP processes the substrate W.

The processing device 1 includes a detection unit SN (first detection unit), a chamber 3 (accommodation unit), a spin unit 5, a first nozzle 9a, a second nozzle 9b, a third nozzle 9c, and a first nozzle. The arm 10a, the second nozzle arm 10b, the third nozzle arm 10c, the first nozzle arm drive unit 11a, the second nozzle arm drive unit 11b, the third nozzle arm drive unit 11c, and the first guard 13a. The second guard 13b, the third guard 13c, the first guard driving unit 15a, the second guard driving unit 15b, the third guard driving unit 15c, and a plurality of bolts 23 are included.

The chamber 3 has a substantially box shape, and has a spin unit 5, a first nozzle 9a to a third nozzle 9c, a first nozzle arm 10a to a third nozzle arm 10c, and a first nozzle arm drive unit 11a to a third nozzle arm drive unit. 11c, the first guard 13a to the third guard 13c, and the first guard drive unit 15a to the third guard drive unit 15c are housed. By accommodating the elements 5, 9a to 9c, 10a to 10c, 11a to 11c, 13a to 13c, and 15a to 15c in the chamber 3, the processing apparatus 1 can be easily laminated as shown in FIG. , It becomes easy to replace and repair each processing device 1.

Specifically, the chamber 3 includes a base portion 3a, a side wall portion 3b (wall portion), and a top wall portion 3c (wall portion). The base portion 3a has a substantially plate shape and is substantially parallel in the horizontal direction. The side wall portion 3b has a substantially square tubular shape and is substantially parallel in the vertical direction. The top wall portion 3c has a substantially plate shape and is substantially parallel in the horizontal direction.

The spin unit 5 holds the substrate W and rotates the substrate W. Specifically, the spin unit 5 includes a first drive unit 5a (drive unit), a shaft 5b, a spin chuck 5c (rotating unit), a second drive unit 5d, and a cover member 5e. The first drive unit 5a includes a motor body 17a and a case 17b that houses the motor body 17a. Therefore, the first drive unit 5a is a motor. The spin chuck 5c includes a substantially disk-shaped spin base 19 and a plurality of holding members 21.

The first drive unit 5a is arranged between the spin chuck 5c and the detection unit SN. Then, the first drive unit 5a is installed on the base unit 3a. Specifically, the first drive unit 5a is attached to the base unit 3a by a plurality of bolts 23. Further, since the first drive unit 5a is supported by the base unit 3a, the installation state of the first drive unit 5a is stable. Therefore, the spin chuck 5c can be rotated stably.

The first drive unit 5a drives the spin chuck 5c to rotate the spin chuck 5c around the rotation axis AX of the first drive unit 5a. Specifically, the motor body 17a rotates the shaft 5b to rotate the spin base 19 connected to the shaft 5b.

The spin chuck 5c can hold the substrate W. Specifically, a plurality of holding members 21 (at least three or more holding members 21) are arranged on the upper surface of the spin base 19 so as to surround the rotation axis AX. Then, a plurality of holding members 21 hold the substrate W. Since the spin base 19 is substantially parallel in the horizontal direction, the substrate W is held while having a substantially horizontal posture.

When the plurality of holding members 21 hold the substrate W, all the holding members 21 or some of the holding members 21 among the plurality of holding members 21 are driven by the second driving unit 5d, and the peripheral edge of the substrate W is driven. Rotate until it comes into contact with the part. As a result, the substrate W is held by all the holding members 21. For example, the second drive unit 5d has a drive source such as a motor or an air cylinder, and a motion conversion mechanism. Then, the second drive unit 5d drives the motion conversion mechanism by the drive source to convert the ascending / descending motion into the rotational motion of the holding member 21.

The spin chuck 5c is driven by the first drive unit 5a and rotates around the rotation axis AX while holding the substrate W. As a result, the substrate W rotates together with the spin chuck 5c. On the other hand, the spin chuck 5c can be driven by the first drive unit 5a and rotate around the rotation axis AX in a state where the substrate W does not exist on the spin chuck 5c.

The cover member 5e has a substantially tubular shape and surrounds the first drive unit 5a. The cover member 5e suppresses the treatment liquid from adhering to the first drive unit 5a. In FIG. 3, the cover member 5e is shown by a two-dot chain line for simplification of the drawing.

The detection unit SN detects the vibration vb via the first drive unit 5a. Specifically, the detection unit SN detects the vibration vb during the period in which the spin chuck 5c is rotating, and outputs a vibration signal Sv representing the vibration vb. The vibration vb includes the vibration sv of the spin chuck 5c and the vibration dv directly caused by the rotational operation of the first drive unit 5a itself.

In the first embodiment, the vibration vb is detected as an acceleration. Therefore, the vibration signal Sv is an acceleration signal representing the vibration vb. The acceleration signal is represented by, for example, the unit "G" based on the standard gravity, or the voltage value "volt (V)" proportional to the acceleration. For example, the detection unit SN includes an acceleration sensor.

The accelerometer is, for example, a capacitance type contact type accelerometer or a piezoresistive type contact type accelerometer. The acceleration sensor is, for example, a non-contact type acceleration sensor that employs an optical method. Further, as the acceleration sensor, for example, a mechanical displacement measurement method, a method using vibration, or a semiconductor method can be adopted.

Further, the detection unit SN is arranged outside the chamber 3 and faces the first drive unit 5a. The outside of the chamber 3 indicates that it is not inside the chamber 3, and includes, for example, the outer surface of the chamber 3. Specifically, the detection unit SN is attached to the outer surface of the chamber 3 (specifically, the base unit 3a) so as to face the first drive unit 5a via the chamber 3. The detection unit SN preferably faces the first drive unit 5a on the rotation axis AX. A part of the detection unit SN may face the first drive unit 5a.

As described above with reference to FIG. 3, according to the first embodiment, the detection unit SN detects the vibration vb including the vibration sv of the spin chuck 5c during the period during which the spin chuck 5c is rotating. Then, the vibration sv of the spin chuck 5c changes depending on the holding state of the substrate W by the spin chuck 5c. Therefore, by analyzing the vibration vb (specifically, the vibration signal Sv) including the vibration sv, the holding state of the substrate W by the spin chuck 5c can be detected. In the present specification, the detection of the holding state of the substrate W indicates that the substrate W is properly held by the spin chuck 5c or that the substrate W is not properly held by the spin chuck 5c.

The reason why the holding state of the substrate W can be detected by the analysis of the vibration vb is as follows.

That is, if the holding member 21 is deteriorated or the substrate W is warped, the holding member 21 may not be able to properly hold the substrate W, and the center of gravity of the substrate W may be eccentric with respect to the rotation axis AX. ..

When the center of gravity of the substrate W is eccentric with respect to the rotation axis AX, the vibration sv of the spinning spin chuck 5c during rotation becomes larger than when there is no eccentricity. As the vibration sv increases, the vibration vb increases. That is, abnormal vibration occurs. Therefore, by analyzing the vibration vb, it is possible to detect that the center of gravity of the substrate W is eccentric. If the center of gravity of the substrate W is eccentric, there is a high possibility that the substrate W is not properly held. Therefore, the detection of the eccentricity of the center of gravity of the substrate W means that the substrate W is not properly held by the spin chuck 5c. Show that.

Further, if the connection portion between the spin base 19 and the shaft 5b is loose, or the bolt 23 of the base portion 3a is loose and the first drive portion 5a is not sufficiently attached, the installation of the spin chuck 5c is not good. , The spin chuck 5c may be located at a position different from the specified position of the spin chuck. The specified spin chuck position indicates a specific position when the spin chuck 5c is installed on the base portion 3a, and is defined with respect to the chamber 3. If the spin chuck 5c is located at a position different from the specified position of the spin chuck, the holding member 21 may not properly hold the substrate W even when the substrate W is placed on the spin chuck 5c at the specified position of the substrate. obtain. The specified substrate position indicates a specific position when the substrate W is placed on the spin chuck 5c, and is defined with respect to the chamber 3.

Then, when the installation state of the spin chuck 5c is not good, the vibration sv of the spin chuck 5c during rotation becomes larger than when the installation state is good. As the vibration sv increases, the vibration vb increases. That is, abnormal vibration occurs. Therefore, by analyzing the vibration vb, it is possible to detect that the installation state of the spin chuck 5c is not good. If the installation state of the spin chuck 5c is not good, there is a high possibility that the substrate W is not held properly. Therefore, the detection that the installation state of the spin chuck 5c is not good means that the substrate W is appropriate for the spin chuck 5c. Indicates that it is not held in.

In particular, in the first embodiment, since the holding state of the substrate W can be detected by analyzing the vibration vb including the vibration sv of the spin chuck 5c, the holding state of the substrate W is detected based on the position of the holding member 21. In comparison with the above, erroneous detection can be reduced when detecting that the substrate W is properly held or not properly held.

Further, according to the first embodiment, the first drive unit 5a is arranged between the spin chuck 5c and the detection unit SN, and the detection unit SN faces the first drive unit 5a. Therefore, the detection unit SN faces the drive units other than the first drive unit 5a (first nozzle arm drive unit 11a to third nozzle arm drive unit 11c and first guard drive unit 15a to third guard drive unit 15c). Not. As a result, it is possible to prevent the vibrations of the drive units 11a to 11c and 15a to 15c other than the first drive unit 5a from being superimposed as noise on the vibration signal Sv representing the vibration vb. If the superposition of noise can be suppressed, the analysis accuracy of the vibration signal Sv is improved, so that the reliability of the detection can be improved when the holding state of the substrate W is detected.

Further, according to the first embodiment, before rotating the spin chuck in the presence of the substrate W, the spin chuck 5c can be rotated in the absence of the substrate W in the spin chuck 5c to analyze the vibration vb. it can. As a result, the cause of the abnormal vibration of the vibration vb can be narrowed down from a plurality of causes.

That is, it is highly possible that the cause of the vibration vb becoming abnormal vibration is either that the spin chuck 5c is not installed well or that the substrate W is eccentric. Therefore, when the spin chuck 5c is rotated in the absence of the substrate W, it is highly possible that the cause of the abnormal vibration of the vibration vb is that the spin chuck 5c is not properly installed. Therefore, the spin chuck 5c can be installed well in advance by rotating the spin chuck 5c in the absence of the substrate W and detecting the installation state of the spin chuck 5c.

Therefore, when the spin chuck 5c is rotated in the presence of the substrate W after the spin chuck 5c is installed well, it is highly possible that the cause of the abnormal vibration of the vibration vb is the eccentricity of the substrate W. .. In particular, since the eccentricity of the substrate W is likely to be caused by the deterioration of the holding member 21 or the warp of the substrate W, the cause of the abnormal vibration of the vibration vb is narrowed down to the deterioration of the holding member 21 or the warp of the substrate W. Can be done. Therefore, for example, the holding member 21 can be maintained, repaired, or replaced, or the substrate W can be replaced.

Further, according to the first embodiment, the cause of the abnormal vibration of the vibration vb can be narrowed down from a plurality of causes. Or the exchange can be performed quickly.

Subsequently, the details of the processing apparatus 1 will be described with reference to FIG. The first nozzle 9a discharges the first treatment liquid (for example, a sulfuric acid-containing liquid) toward the rotating substrate W. Specifically, the first nozzle 9a is attached to the tip of the first nozzle arm 10a. The first nozzle arm driving unit 11a drives the first nozzle arm 10a to rotate the first nozzle arm 10a around an axis extending in a substantially vertical direction. For example, the first nozzle arm drive unit 11a has a drive source such as a motor and a rotation mechanism, and the rotation mechanism is driven by the drive source to rotate the first nozzle arm 10a. The first nozzle arm drive unit 11a is attached to the base unit 3a.

The second nozzle 9b discharges the second treatment liquid (for example, a rinse liquid) toward the rotating substrate W. The third nozzle 9c discharges the third treatment liquid (for example, an organic solvent) toward the rotating substrate W. The second nozzle arm 10b and the third nozzle arm 10c have the same configuration and function as the first nozzle arm 10a. The second nozzle arm drive unit 11b and the third nozzle arm drive unit 11c have the same configuration and function as the first nozzle arm drive unit 11a, and are attached to the base unit 3a.

The first guard 13a receives the first treatment liquid scattered from the substrate W. Specifically, the first guard 13a has a substantially tubular shape, and surrounds the spin chuck 5c around the rotation axis AX. In FIG. 3, the first guard 13a is located at the standby position. The standby position indicates the position of the first guard 13a when the upper end of the first guard 13a is located below the holding member 21.

The first guard 13a is connected to the first guard driving unit 15a. The first guard drive unit 15a is attached to the base unit 3a. The first guard driving unit 15a drives the first guard 13a to raise or lower the first guard 13a along the elevating direction UD. The elevating direction UD is substantially parallel to the vertical direction.

Specifically, before processing the substrate W with the first processing liquid, the first guard driving unit 15a raises the first guard 13a from the standby position to the guard position. The guard position indicates the position of the first guard 13a when the upper end of the first guard 13a is located above the holding member 21. Then, after the entire processing of the substrate W is completed, the first guard drive unit 15a lowers the first guard 13a from the guard position to the standby position.

For example, the first guard drive unit 15a has a drive source such as a motor and an elevating mechanism, and the elevating mechanism is driven by the drive source to raise or lower the first guard 13a.

The second guard 13b receives the second treatment liquid scattered from the substrate W. The third guard 13c receives the third treatment liquid scattered from the substrate W. In addition, the second guard 13b and the third guard 13c have the same configuration and function as the first guard 13a. The second guard drive unit 15b and the third guard drive unit 15c have the same configuration and function as the first guard drive unit 15a, and are attached to the base unit 3a.

Next, with reference to FIG. 4, the arrangement of the detection unit SN will be described in relation to the drive units 11a to 11c and 15a to 15c other than the first drive unit 5a. FIG. 4 is a bottom view showing the processing device 1. As shown in FIG. 4, the bottom surface 3A of the base portion 3a has a first region 3aa and a second region 3ab. The bottom surface 3A is the outer surface of the inner surface and the outer surface of the base portion 3a. The first region 3aa indicates a region of the bottom surface 3A facing the first drive unit 5a. The second region 3ab indicates a region of the bottom surface 3A excluding the first region 3aa. The second region 3ab faces the first nozzle arm driving unit 11a to the third nozzle arm driving unit 11c and the first guard driving unit 15a to the third guard driving unit 15c.

The detection unit SN is attached to the first region 3aa of the base unit 3a. The plurality of bolts 23 surround the detection unit SN on the first region 3aa.

Hereinafter, the position where the detection unit SN is arranged may be described as "predetermined position SP1". The first drive unit 5a is arranged between the spin chuck 5c and the predetermined position SP1. Further, the predetermined position SP1 indicates a position facing the first drive unit 5a outside the chamber 3. Specifically, the predetermined position SP1 indicates a position on the first region 3aa.

As described above with reference to FIG. 4, according to the first embodiment, the first region 3aa to which the detection unit SN is attached faces the drive units 11a to 11c and 15a to 15c other than the first drive unit 5a. It is different from the second region 3ab. Therefore, the vibrations of the drive units 11a to 11c and 15a to 15c other than the first drive unit 5a may be attenuated by the time they reach the first region 3aa. As a result, it is possible to prevent the detection unit SN from detecting vibrations of the drive units 11a to 11c and 15a to 15c other than the first drive unit 5a as noise.

Further, according to the first embodiment, the detection unit SN is attached to the outer surface of the chamber 3 (specifically, the first region 3aa). Therefore, it is possible to prevent the treatment liquids (first treatment liquid to third treatment liquid) discharged inside the chamber 3 from splashing on the detection unit SN. As a result, deterioration of the detection unit SN can be suppressed, and the reliability of the detection unit SN can be maintained.

Next, the computer unit U3 will be described with reference to FIG. The computer unit U3 includes a control unit 51, a storage unit 53, and an output unit 55. The control unit 51 executes a computer program stored in the storage unit 53 to execute the spin unit 5, the first nozzle arm drive unit 11a to the third nozzle arm drive unit 11c, and the first guard drive unit 15a to the third guard. The drive unit 15c is controlled. The control unit 51 includes, for example, a processor such as a CPU (Central Processing Unit).

The storage unit 53 includes a storage device and stores data and computer programs. The storage unit 53 includes, for example, a memory such as a semiconductor memory, and may include a hard disk drive. Further, the storage unit 53 may include removable media. The output unit 55 displays an image based on the image data generated by the control unit 51, and / or outputs a sound based on the sound data generated by the control unit 51. For example, the output unit 55 includes a display and / or a speaker.

Next, the analysis of the vibration vb by the computer unit U3 will be described with reference to FIGS. 3 and 5. As shown in FIG. 3, the control unit 51 includes a determination unit 51a and an execution unit 51b. Specifically, the processor of the control unit 51 executes the computer program stored in the storage device of the storage unit 53, and functions as the determination unit 51a and the execution unit 51b.

The determination unit 51a receives the vibration signal Sv representing the vibration vb from the detection unit SN during the rotation period of the spin chuck 5c, and analyzes the vibration signal Sv. Specifically, the determination unit 51a determines whether or not the level of the vibration signal Sv exceeds the predetermined vibration range RG, and detects the holding state of the substrate W. Hereinafter, the analysis of the vibration signal Sv will be described with reference to specific examples.

FIG. 5A shows the waveform of the vibration signal Sv when the vibration signal Sv vibrates within the predetermined vibration range RG. FIG. 5B shows the waveform of the vibration signal Sv when the vibration signal Sv vibrates beyond the predetermined vibration range RG. In FIGS. 5 (a) and 5 (b), the horizontal axis represents time and the vertical axis represents the level (G or V) of the vibration signal Sv.

As shown in FIG. 5A, the spin chuck 5c is stopped during the period T1. In period T2, the spin chuck 5c is accelerating. In the period T3, the spin chuck 5c is rotating at a constant rotation speed. The rotation speed of the spin chuck 5c is represented by the number of rotations of the spin chuck 5c per unit time. In period T4, the spin chuck 5c is decelerating. During period T5, the spin chuck 5c is stopped. Hereinafter, periods T1 to T5 are similarly defined herein.

The determination unit 51a analyzes the vibration signal Sv received during the period T3. The vibration signal Sv is a vibration component in the first direction D1 (for example, plus direction) with respect to a predetermined base level BL (for example, zero level) and a second direction opposite to the first direction D1 for the base level BL. It includes a vibration component of D2 (for example, in the minus direction). However, the base level BL may be an allowable vibration level before the rotation of the spin chuck 5c. Hereinafter, the vibration component in the first direction D1 and the vibration component in the second direction may be collectively referred to as "vibration component Sc".

The storage unit 53 stores a first predetermined value A1 indicating the value at one end of the predetermined vibration range RG and a second predetermined value A2 indicating the value at the other end of the predetermined vibration range RG. The first predetermined value A1 is determined corresponding to the vibration component in the first direction D1. The second predetermined value A2 is determined corresponding to the vibration component in the second direction D2. In the first embodiment, the absolute value of the first predetermined value A1 and the absolute value of the second predetermined value A2 are the same. Specifically, the first predetermined value A1 indicates a first threshold value TH1 for comparison with the level of the vibration component Sc, and the storage unit 53 stores the first threshold value TH1. The predetermined vibration range RG is determined experimentally and / or empirically while considering the installation environment of the processing device 1.

The predetermined vibration range RG is constant regardless of the rotation speed of the spin chuck 5c. However, the predetermined vibration range RG may be different depending on the rotation speed of the spin chuck 5c. That is, the first predetermined value A1, the second predetermined value A2, and the first threshold value TH1 may be different depending on the rotation speed of the spin chuck 5c. For example, the higher the rotation speed of the spin chuck 5c, the larger the predetermined vibration range RG (for example, the first threshold value TH1) is set. Since the magnitude of the vibration vb differs depending on the rotation speed of the spin chuck 5c, the detection accuracy of the holding state of the substrate W can be improved by setting the predetermined vibration range RG for each rotation speed of the spin chuck 5c.

The determination unit 51a determines whether or not the level of the vibration signal Sv exceeds the predetermined vibration range RG. For the vibration signal Sv shown in FIG. 5A, the determination unit 51a determines that the level of the vibration signal Sv is within the predetermined vibration range RG. Determining that the level of the vibration signal Sv is within the predetermined vibration range RG corresponds to detecting that the substrate W is properly held by the spin chuck 5c.

On the other hand, with respect to the vibration signal Sv shown in FIG. 5B, the determination unit 51a determines that the level of the vibration signal Sv exceeds the predetermined vibration range RG. Determining that the level of the vibration signal Sv exceeds the predetermined vibration range RG corresponds to detecting that the substrate W is not properly held by the spin chuck 5c. When the level of the vibration signal Sv exceeds the predetermined vibration range RG, it is highly possible that the board W is not properly held because the board W is eccentric or the spin chuck 5c is not installed properly. Because.

Therefore, the execution unit 51b executes a predetermined process according to the affirmative determination by the determination unit 51a. The affirmative determination indicates that the level of the vibration signal Sv exceeds the predetermined vibration range RG. The predetermined process includes a process of controlling the output unit 55 to issue an alarm and / or a process of controlling the first drive unit 5a to stop the rotation of the spin chuck 5c. The output unit 55 issues an alarm by image or voice. The alarm includes, for example, a notification that the substrate W is not properly held by the spin chuck 5c. The alarm includes, for example, a notification that the rotation of the spin chuck 5c is stopped.

Then, the user can recognize by the alarm that the substrate W is not properly held, and can take appropriate measures for the processing device 1. Further, by stopping the rotation of the spin chuck 5c, it is possible to prevent the substrate W from falling off from the spin chuck 5c because the substrate W is not properly held.

As described above with reference to FIGS. 3 and 5, according to the first embodiment, the determination unit 51a determines whether or not the level of the vibration signal Sv exceeds the predetermined vibration range RG, and determines whether or not the level of the vibration signal Sv exceeds the predetermined vibration range RG, and the substrate W Detects the holding state of. Therefore, erroneous detection of the holding state of the substrate W can be reduced as compared with the case of detecting the holding state of the substrate W based on the position of the holding member 21. As a result, it is possible to prevent the execution unit 51b from erroneously executing a predetermined process (for example, alarm or rotation stop), so that a series of steps for processing the substrate W can be smoothly executed.

Further, according to the first embodiment, the predetermined vibration range RG is a range from the first predetermined value A1 corresponding to the first direction D1 to the second predetermined value corresponding to the second direction D2. Therefore, when either the vibration component of the first direction D1 or the vibration component of the second direction D2 exceeds the predetermined vibration range RG, it is detected that the substrate W is not properly held. As a result, it is possible to reduce the omission of detection that the substrate W is not properly held.

Next, an example of the spin chuck 5c will be described with reference to FIG. 6 (a), 6 (c), and 6 (e) are plan views showing the spin chuck 5c. As shown in FIG. 6A, the plurality of holding members 21 (in the first embodiment, the four holding members 21) are arranged on a predetermined circumference on the upper surface of the spin base 19 at regular intervals. The predetermined circumference corresponds to the peripheral edge of the substrate W. Each of the holding members 21 includes, for example, a substantially columnar contact portion P.

Of the plurality of holding members 21, the holding member FC is fixed to the spin base 19 and cannot rotate. Of the plurality of holding members 21, the holding member MC is rotatably supported by the spin base 19. The holding member MC is driven by the second drive unit 5d (FIG. 3) and rotates around an axis substantially parallel to the rotation axis AX.

As shown in FIG. 6A, the holding member MC is located in the closed position. The closed position indicates the position of the holding member MC when the contact portion P is closest to the rotation axis AX. As shown in FIG. 6C, the holding member MC is located in the open position. The open position indicates the position of the holding member MC when the contact portion P is farthest from the rotation axis AX, and is a standby position of the holding member MC.

As shown in FIG. 6E, the holding member MC is located at the holding position. The holding position indicates the position of the holding member MC when the contact portion P comes into contact with the peripheral edge portion of the substrate W located at the specified position on the board. The contact portion P of the holding member MC located at the holding position and the contact portion P of the holding member FC are in contact with the peripheral edge portion of the substrate W, and the substrate W is held.

Further, as shown in FIG. 6A, the spin chuck 5c includes a plurality of position detection units PSN corresponding to each of the plurality of holding members MC. The position detection unit PSN detects the position of the holding member MC.

6 (b), 6 (d), and 6 (f) are plan views showing the position detection unit PSN. As shown in FIG. 6B, the position detection unit PSN includes a resin arm 31, a metal member to be detected 33, a first magnetic sensor 35, a second magnetic sensor 37, and a third magnetic sensor. Includes 39 and.

The arm 31 rotates together with the holding member MC. The arm 31 is located below the upper surface of the spin base 19. The member to be detected 33 is attached to the tip of the arm 31. The first magnetic sensor 35, the second magnetic sensor 37, and the third magnetic sensor 39 are located below the arm 31 and the detected member 33 at intervals from the arm 31 and the detected member 33.

As shown in FIG. 6B, when the holding member MC is in the closed position, the first magnetic sensor 35 detects the detected member 33 and outputs a detection signal. As shown in FIG. 6D, when the holding member MC is located in the open position, the third magnetic sensor 39 detects the detected member 33 and outputs a detection signal. As shown in FIG. 6 (f), when the holding member MC is located at the holding position, the second magnetic sensor 37 detects the detected member 33 and outputs a detection signal.

The fact that each of the second magnetic sensors 37 detected the member to be detected 33 indicates that the substrate W is properly held. On the other hand, the fact that at least one first magnetic sensor 35 detects the member to be detected 33 indicates that the substrate W is not properly held. This is because if the substrate W is not properly held and the substrate W is eccentric, the holding member MC is located at the closed position and the first magnetic sensor 35 detects the detected member 33.

As described above with reference to FIG. 6, according to the first embodiment, in addition to detecting the holding state of the substrate W based on the vibration signal Sv, the holding state of the substrate W is determined based on the position of the holding member MC. It is being detected. Therefore, erroneous detection can be further reduced when detecting that the substrate W is properly held or not properly held.

Next, the vibration detection method according to the first embodiment executed by the substrate processing apparatus SP will be described with reference to FIGS. 3, 7, and 8. FIG. 7 is a flowchart showing a vibration detection method according to the first embodiment. As shown in FIG. 7, the vibration detection method includes steps S1 to S15 and detects the vibration of the substrate processing apparatus SP. Steps S1 to S15 constitute a main routine.

As shown in FIGS. 3 and 7, in step S1, the control unit 51 controls the transfer robot CR so that the substrate W is placed on the spin chuck 5c.

In step S3, the control unit 51 controls the second drive unit 5d so that the holding member MC rotates from the open position to the holding position.

In step S5, the control unit 51 detects the holding state of the substrate W based on the position of the holding member MC detected by the position detecting unit PSN (FIG. 6).

Specifically, when the control unit 51 receives a detection signal indicating that the member to be detected 33 has been detected from at least one first magnetic sensor 35 (No in step S5), the substrate W is properly held. Therefore, the process proceeds to step S7.

On the other hand, when the control unit 51 receives a detection signal indicating that the member to be detected 33 has been detected from each of the second magnetic sensors 37 (Yes in step S5), the substrate W is properly held. Since this is tentatively shown, the process proceeds to step S9.

In step S7, the control unit 51 executes the specific process and ends the process. In the first embodiment, the specific process is the issuance of an alarm. Therefore, the control unit 51 controls the output unit 55 so as to issue an alarm.

On the other hand, in step S9 (rotation step), the control unit 51 controls the first drive unit 5a so that the spin chuck 5c starts rotating. That is, the spin chuck 5c is rotated.

In step S11, the control unit 51 executes the vibration analysis process. Specifically, the control unit 51 analyzes the vibration signal Sv, detects the holding state of the substrate W, and executes a predetermined process based on the detection result.

In step S13, the control unit 51 determines whether or not all the processing steps have been completed. In the first embodiment, all the treatment steps include a first treatment step, a second treatment step, a third treatment step, and a fourth treatment step.

In the first processing step, the first processing liquid is discharged from the first nozzle 9a to process the rotating substrate W. In the second processing step, the second processing liquid is discharged from the second nozzle 9b to process the rotating substrate W. In the third processing step, the third processing liquid is discharged from the third nozzle 9c to process the rotating substrate W. The rotation speeds of the spin chucks in the first processing step to the third processing step are the same. In the fourth treatment step, the rotation speed of the spin chuck 5c is made larger than the rotation speed of the spin chuck 5c in the third treatment step to dry the substrate W.

The control unit 51 executes the vibration analysis process (step S11) in parallel during the execution of the first processing step to the fourth processing step.

Therefore, the process proceeds to step S11 according to the negative determination (No in step S13) by the control unit 51. As a result, the vibration analysis process (step S11) is repeated until the control unit 51 makes an affirmative determination (Yes in step S13).

On the other hand, according to the affirmative determination (Yes in step S13) by the control unit 51, the process proceeds to step S15.

In step S15, the control unit 51 controls the first drive unit 5a so that the spin chuck 5c stops rotating. As a result, the spin chuck 5c stops. Then, the process ends.

FIG. 8 is a flowchart showing the vibration analysis process executed in the step S11 of FIG. In the vibration analysis process, the first threshold value TH1 is used to determine whether or not the level of the vibration signal Sv exceeds the predetermined vibration range RG.

As shown in FIG. 8, the vibration analysis process includes steps S20 to S27. In step S20 (detection step), the detection unit SN detects the vibration vb including the vibration sv of the spin chuck 5c via the first drive unit 5a. In step S20, the detection unit SN detects vibration at a predetermined position SP1 while the spin chuck 5c is rotating.

In step S21, the determination unit 51a receives the vibration signal Sv including the vibration component Sc from the detection unit SN.

In step S23, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc is larger than the first threshold value TH1 and detects the holding state of the substrate W.

The process returns to the main routine according to the negative determination (No in step S23). The negative determination indicates that the level of the vibration signal Sv is within the predetermined vibration range RG, and corresponds to detecting that the substrate W is properly held.

On the other hand, according to the affirmative determination (Yes in step S23), the process proceeds to step S25. The affirmative determination indicates that the level of the vibration signal Sv exceeds the predetermined vibration range RG, and corresponds to the detection that the substrate W is not properly held.

In step S25, the execution unit 51b controls the output unit 55 so as to issue an alarm.

In step S27, the execution unit 51b controls the first drive unit 5a so as to stop the rotation of the spin chuck 5c. Then, the process ends.

As described above with reference to FIGS. 3, 7, and 8, according to the first embodiment, the holding state of the substrate W is detected before the spin chuck 5c is rotated (step S5). Therefore, it can be detected at an early stage of a series of steps for processing the substrate W that the substrate W is not properly held (No in step S5). As a result, it is possible to reduce the waste of processing.

Further, according to the first embodiment, the holding state of the substrate W can be easily detected by using the first threshold value TH1 (step S23).

The first threshold TH1 (predetermined vibration range RG) in the vibration analysis process executed in parallel with the fourth processing step is set in the vibration analysis process executed in parallel with the first processing step to the third processing step. It is preferable to set the value larger than the first threshold value TH1 (predetermined vibration range RG). This is because the rotation speed of the spin chuck 5c in the fourth treatment step is higher than the rotation speed of the spin chuck 5c in the first treatment step to the third treatment step, and the normal vibration becomes larger in the fourth treatment step.

Next, the first modification to the fifth modification of the first embodiment of the present invention will be described with reference to FIGS. 3, 7, and 9 to 14. In particular, when explaining the control unit 51, the determination unit 51a, the execution unit 51b, the storage unit 53, and the output unit 55, FIG. 3 is referred to.

(First modification)
The substrate processing apparatus SP according to the first modification of the first embodiment will be described with reference to FIGS. 3 and 9. In the first modification, the fact that the abnormal vibration is continuously detected for a predetermined time or longer corresponds to the fact that the substrate W is not properly held, and has been described with reference to FIGS. 1 to 8. It is different from the first embodiment. Regarding other points, as shown in FIG. 3, the configuration of the substrate processing apparatus SP according to the first modification is the same as the configuration of the substrate processing apparatus SP according to the first embodiment. Hereinafter, the difference between the first modification and the first embodiment will be mainly described.

FIG. 9 shows the waveform of the vibration signal Sv output by the detection unit SN. The horizontal axis represents time, and the vertical axis represents the level (G or V) of the vibration signal Sv.

As shown in FIG. 9, in the period T3, the determination unit 51a determines whether or not the level of the vibration signal Sv exceeds the predetermined vibration range RG. Then, at time t0, when the determination unit 51a determines that the level of the vibration signal Sv exceeds the predetermined vibration range RG, the timer is started. Then, the timer starts measuring Tc for a predetermined time. The predetermined time Tc indicates the time from the time t0 to the time t1.

Further, the determination unit 51a determines whether or not the number of times Na of determining that the level of the vibration signal Sv exceeds the predetermined vibration range RG is a predetermined number Nb or more within the predetermined time Tc starting from the start time of the timer. To do. The number of times Na indicates the number of times that abnormal vibration is detected. The predetermined number Nb indicates a plurality (for example, an integer of 2 or more). The fact that the number of times Na is determined to be a predetermined number Nb or more within the predetermined time Tc indicates that the abnormal vibration continues to occur. The predetermined time Tc and the predetermined number Nb are determined experimentally and / or empirically while considering the installation environment of the processing device 1.

For example, the determination unit 51a determines whether or not the level of the vibration signal Sv exceeds the predetermined vibration range RG each time the vibration signal Sv is received at regular intervals. Alternatively, for example, the determination unit 51a determines whether or not the extreme value EV of the vibration signal Sv exceeds the predetermined vibration range RG. The number of times Na indicates the number of times it is determined that the extreme value EV exceeds the predetermined vibration range RG. The extreme value EV is a local maximum value or minimum value of the vibration signal Sv.

According to the affirmative determination by the determination unit 51a, the execution unit 51b executes a predetermined process (for example, issuing an alarm or stopping rotation). The affirmative determination indicates that the number of times Na is a predetermined number Nb or more within the predetermined time Tc, and corresponds to detecting that the substrate W is not properly held.

On the other hand, as a negative determination, the determination unit 51a resets the timer when it is determined that the number of times Na is less than the predetermined number Nb within the predetermined time Tc. The negative determination corresponds to detecting that the substrate W is properly held.

As described above with reference to FIG. 9, according to the first modification, it is determined whether or not the number of times Na at which abnormal vibration is detected is a predetermined number Nb or more within a predetermined time Tc, and the substrate W Detects the holding state of. Therefore, false detection based on sudden abnormal vibration or noise can be reduced, and the reliability of detection can be further improved when detecting the holding state of the substrate W.

Further, according to the first modification, the holding state of the substrate W can be easily detected by using the first threshold value TH1.

That is, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc is larger than the first threshold value TH1. Then, the determination unit 51a determines whether or not the number of times Na determined that the absolute value of the level of the vibration component Sc is larger than the first threshold value TH1 is equal to or greater than a predetermined number Nb within a predetermined time Tc, and determines whether or not the substrate is Detects the holding state of W.

(Second modification)
The substrate processing apparatus SP according to the second modification of the first embodiment will be described with reference to FIGS. 3, 7, 10, and 11. In the second modification, the first predetermined vibration range RG1 and the second predetermined vibration range RG2 are defined in order to detect the holding state of the substrate W. Different from 1. Regarding other points, as shown in FIG. 3, the configuration of the substrate processing apparatus SP according to the second modification is the same as the configuration of the substrate processing apparatus SP according to the first embodiment. Hereinafter, the difference between the second modification and the first embodiment will be mainly described.

10 (a) and 10 (b) show a first predetermined vibration range RG1 and a second predetermined vibration range RG2 according to the second modification. The horizontal axis represents time, and the vertical axis represents the level (G or V) of the vibration signal Sv.

As shown in FIG. 10A, a first predetermined vibration range RG1 and a second predetermined vibration range RG2 are defined. The storage unit 53 has a first predetermined value A1 indicating the value of one end of the first predetermined vibration range RG1, a second predetermined value A2 indicating the value of the other end of the first predetermined vibration range RG1, and a second predetermined vibration range. A third predetermined value A3 indicating the value at one end of the RG2 and a fourth predetermined value A4 indicating the value at the other end of the second predetermined vibration range RG2 are stored.

The first predetermined value A1 and the third predetermined value A3 are determined corresponding to the vibration component in the first direction D1. The second predetermined value A2 and the fourth predetermined value A4 are determined corresponding to the vibration component in the second direction D2. In the second modification, the absolute value of the first predetermined value A1 and the absolute value of the second predetermined value A2 are the same, and the absolute value of the third predetermined value A3 and the absolute value of the fourth predetermined value A4 are the same. is there. The absolute value of the third predetermined value A3 is larger than the absolute value of the first predetermined value A1. Therefore, the second predetermined vibration range RG2 is larger than the first predetermined vibration range RG1.

Specifically, the first predetermined value A1 indicates the first threshold value TH1 for comparison with the level of the vibration component Sc, and the third predetermined value A3 is the second threshold value for comparison with the level of the vibration component Sc. It shows the threshold TH2. Then, the storage unit 53 stores the first threshold value TH1 and the second threshold value TH2. The second threshold TH2 is larger than the first threshold TH1. The first predetermined vibration range RG1 and the second predetermined vibration range RG2 are experimentally and / or empirically determined in consideration of the installation environment of the processing device 1.

Subsequently, the determination unit 51a and the execution unit 51b will be described with reference to FIG. The determination unit 51a determines whether or not the level of the vibration signal Sv exceeds the first predetermined vibration range RG1 and determines whether or not the level of the vibration signal Sv exceeds the second predetermined vibration range RG2.

The determination by the determination unit 51a that the level of the vibration signal Sv is within the first predetermined vibration range RG1 corresponds to the detection that the substrate W is properly held by the spin chuck 5c.

On the other hand, with respect to the vibration signal Sv shown in FIG. 10A, in the determination unit 51a, the level of the vibration signal Sv exceeds the first predetermined vibration range RG1 and the level of the vibration signal Sv is the second predetermined vibration. It is determined that it is within the range RG2. Such a determination is referred to as a "first determination". The first determination made by the determination unit 51a corresponds to the detection that the substrate W is not properly held by the spin chuck 5c. When the first determination is made, the degree of the improper holding state of the substrate W is relatively small, and the degree of urgency is also relatively low. This is because the level of the vibration signal Sv is within the second predetermined vibration range RG2, and the abnormal vibration is relatively small.

The execution unit 51b executes the first process as a predetermined process according to the first determination. The first process includes, for example, a process of issuing a first alarm. The first alert includes, for example, notification of content according to a relatively low degree of urgency.

The first process includes, for example, a process of stopping the rotation of the spin chuck 5c after the process being executed for the substrate W is completed. This is because the degree of improper holding of the substrate W is relatively small, so that the processing being executed can be completed. This is also to suppress the extension of the processing time due to the re-execution of the processing being executed. The processing being executed is, for example, any one of the first processing step to the fourth processing step.

The first process includes, for example, a process of controlling the transfer robot CR so that the new substrate W is not carried into the processing device 1. This is to prohibit the carry-in work and secure the work time for maintenance, repair, or replacement of the part that caused the improper holding of the substrate W.

Further, with respect to the vibration signal Sv shown in FIG. 10B, the determination unit 51a determines that the level of the vibration signal Sv exceeds the second predetermined vibration range RG2. Such a determination is referred to as a "second determination". The second determination made by the determination unit 51a corresponds to the detection that the substrate W is not properly held by the spin chuck 5c. When the second determination is made, the degree of the improper holding state of the substrate W is relatively large, and the degree of urgency is also relatively high. This is because the level of the vibration signal Sv exceeds the second predetermined vibration range RG2, and the abnormal vibration is relatively large.

The execution unit 51b executes a second process different from the first process as a predetermined process according to the second determination. The second process includes, for example, a process of issuing a second alarm. The second alarm includes, for example, notification of content according to a relatively high degree of urgency.

The second process includes, for example, a process of immediately stopping the rotation of the spin chuck 5c in response to the second determination. This is because the degree of improper holding of the substrate W is relatively large and the degree of urgency is high.

In the second process, for example, at least one of the first guard drive unit 15a to the third guard drive unit 15c is used so that at least one of the first guard 13a to the third guard 13c does not descend from the guard position. Includes processing to control. This is to prevent the substrate W from colliding with each configuration in the chamber 3 by at least one of the first guard 13a to the third guard 13c when the substrate W falls off.

As described above with reference to FIG. 10, according to the second modification, the first predetermined vibration range RG1 and the second predetermined vibration range RG2 are provided in order to detect the holding state of the substrate W. Therefore, appropriate measures (first treatment or second treatment) can be taken depending on the degree of improper holding state of the substrate W.

Next, the vibration detection method according to the second modification will be described with reference to FIGS. 7 and 11. As shown in FIG. 7, the vibration detection method according to the second modification includes steps S1 to S15. However, the substrate processing apparatus SP according to the second modification executes the vibration analysis process shown in FIG. 11 in the vibration analysis process in step S11. Further, in the vibration analysis process according to the second modification, the first threshold value TH1 and the second threshold value TH1 and the second are used to determine whether or not the level of the vibration signal Sv exceeds the first predetermined vibration range RG1 or the second predetermined vibration range RG2. The threshold TH2 is used.

FIG. 11 is a flowchart showing a vibration analysis process according to the second modification. As shown in FIG. 11, the vibration analysis process includes steps S40 to S53. Step S40 and step S41 are the same as steps S20 and S21 shown in FIG. 8, respectively.

As shown in FIG. 11, in step S43, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc is larger than the first threshold value TH1 and detects the holding state of the substrate W.

The process returns to the main routine according to the negative determination (No in step S43). The negative determination indicates that the level of the vibration signal Sv is within the first predetermined vibration range RG1, and corresponds to detecting that the substrate W is properly held.

On the other hand, according to the affirmative determination (Yes in step S43), the process proceeds to step S45. The affirmative determination indicates that the level of the vibration signal Sv exceeds the first predetermined vibration range RG1, and corresponds to detecting that the substrate W is not properly held.

In step S45, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc is larger than the second threshold value TH2, and detects the holding state of the substrate W.

According to the negative determination (No in step S45), the process proceeds to step S47. The negative determination indicates that the level of the vibration signal Sv is within the second predetermined vibration range RG2, and corresponds to detecting that the degree of the inappropriate holding state of the substrate W is relatively small.

In step S47, the execution unit 51b controls the output unit 55 so as to issue the first alarm.

In step S49, the execution unit 51b controls the first drive unit 5a so as to stop the rotation of the spin chuck 5c after the processing being executed for the substrate W is completed. Then, the process ends.

On the other hand, according to the affirmative determination (Yes in step S45), the process proceeds to step S51. The affirmative determination indicates that the level of the vibration signal Sv exceeds the second predetermined vibration range RG2, and corresponds to the detection that the degree of the inappropriate holding state of the substrate W is relatively large.

In step S51, the execution unit 51b controls the output unit 55 so as to issue a second alarm.

In step S53, the execution unit 51b controls the first drive unit 5a so as to immediately stop the rotation of the spin chuck 5c in response to the affirmative determination (Yes in step S45).

As described above with reference to FIG. 11, according to the second modification, the determination unit 51a determines that the absolute value of the level of the vibration component Sc is larger than the first threshold value TH1 and is an absolute value. When is determined to be equal to or less than the second threshold value TH2, the execution unit 51b executes the first process as a predetermined process (step S47, step S49). Therefore, when the degree of improper holding state of the substrate W is relatively small, appropriate measures can be taken according to the degree.

Further, according to the second modification, when it is determined that the absolute value of the level of the vibration component Sc is larger than the second threshold value TH2, the execution unit 51b executes the second process as a predetermined process. (Step S51, Step S53). Therefore, when the degree of improper holding state of the substrate W is relatively large, it is possible to take appropriate measures according to the degree.

(Third modification example)
The substrate processing apparatus SP according to the third modification of the first embodiment will be described with reference to FIGS. 3, 7, 10, and 12. The third modification is different from the first embodiment described with reference to FIGS. 1 to 8 in that the first modification and the second modification are combined. Regarding other points, as shown in FIG. 3, the configuration of the substrate processing apparatus SP according to the third modification is the same as the configuration of the substrate processing apparatus SP according to the first embodiment. Hereinafter, the differences between the third modification and the first embodiment, the first modification, and the second modification will be mainly described.

As shown in FIG. 10, the determination unit 51a determines whether or not the level of the vibration signal Sv exceeds the first predetermined vibration range RG1, and whether or not the level of the vibration signal Sv exceeds the second predetermined vibration range RG2. Is determined.

Then, whether the number of times Na that the determination unit 51a determines that the level of the vibration signal Sv exceeds the first predetermined vibration range RG1 within the second predetermined vibration range RG2 is a predetermined number Nb or more within the predetermined time Tc. Judge whether or not. The predetermined number Nb indicates a plurality (for example, an integer of 2 or more).

Specifically, when the substrate processing apparatus SP executes the vibration detection method according to the third modification, the determination unit 51a uses the first threshold value TH1 and the second threshold value TH2 to raise the level of the vibration signal Sv. It is determined whether or not the first predetermined vibration range RG1 or the second predetermined vibration range RG2 has been exceeded.

Next, the vibration detection method according to the third modification will be described with reference to FIGS. 7 and 12. As shown in FIG. 7, the vibration detection method according to the third modification includes steps S1 to S15. However, the substrate processing apparatus SP according to the third modification executes the vibration analysis process shown in FIG. 12 in the vibration analysis process in step S11.

FIG. 12 is a flowchart showing a vibration analysis process according to the third modification. As shown in FIG. 12, the vibration analysis process includes steps S60 to S75. Step S60 and step S61 are the same as steps S20 and S21 shown in FIG. 8, respectively. Steps S69 to S75 are the same as steps S47 to S53 shown in FIG. 11, respectively.

As shown in FIG. 12, in step S63, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc is larger than the first threshold value TH1 and detects the holding state of the substrate W.

The process returns to the main routine according to the negative determination (No in step S63). The negative determination indicates that the level of the vibration signal Sv is within the first predetermined vibration range RG1, and corresponds to detecting that the substrate W is properly held.

On the other hand, according to the affirmative determination (Yes in step S63), the process proceeds to step S65. The affirmative determination indicates that the level of the vibration signal Sv exceeds the first predetermined vibration range RG1.

In step S65, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc is larger than the second threshold value TH2, and detects the holding state of the substrate W.

According to the negative determination (No in step S65), the process proceeds to step S67. The negative determination indicates that the level of the vibration signal Sv is within the second predetermined vibration range RG2.

In step S67, the determination unit 51a determines whether or not a positive determination of a predetermined number Nb or more (Yes in step S63) is made within the predetermined time Tc.

The process returns to the main routine according to the negative determination (No in step S67). The negative determination corresponds to detecting that the substrate W is properly held.

On the other hand, according to the affirmative determination (Yes in step S67), the process proceeds to step S69. A positive judgment indicates that the level of the vibration signal Sv is within the second predetermined vibration range RG2, the number of times Na is a predetermined number Nb or more within the predetermined time Tc, and a relatively small abnormal vibration exceeding the first predetermined vibration range RG1. Corresponds to the detection that is continuously occurring. That is, the affirmative determination corresponds to detecting that the substrate W is not properly held. The degree of improper holding state of the substrate W is relatively small.

According to the third modification, it is detected that the substrate W is not properly held on condition that relatively small abnormal vibration continues (Yes in step S67). Therefore, when a relatively small abnormal vibration occurs in a single shot, it is possible to suppress erroneous detection of the holding state of the substrate W.

Further, according to the affirmative determination (Yes in step S65), the process proceeds to step S73. The affirmative determination indicates that the level of the vibration signal Sv exceeds the second predetermined vibration range RG2, and corresponds to detecting that the substrate W is not properly held. The degree of improper holding state of the substrate W is relatively large.

According to the third modification, when the level of the vibration signal Sv exceeds the second predetermined vibration range RG2 even once, the process proceeds to steps S73 and S75, and the same second process as in the second modification is executed. To. Therefore, when the degree of improper holding state of the substrate W is relatively large, the second process can be executed quickly.

(Fourth modification)
The substrate processing apparatus SP according to the fourth modification of the first embodiment will be described with reference to FIGS. 3, 8 and 13. The fourth modification is different from the first embodiment described with reference to FIGS. 1 to 8 in that the spin chuck 5c is rotated in a state where the substrate W does not exist on the spin chuck 5c. Regarding other points, as shown in FIG. 3, the configuration of the substrate processing apparatus SP according to the fourth modification is the same as the configuration of the substrate processing apparatus SP according to the first embodiment. Hereinafter, the fourth modification will be mainly described as different from the first embodiment.

The first drive unit 5a shown in FIG. 3 drives the spin chuck 5c in the absence of the substrate W, and rotates the spin chuck 5c in the absence of the substrate W. Then, the detection unit SN detects the vibration vb including the vibration sv of the spin chuck 5c during the period during which the spin chuck 5c is rotating. On the other hand, when the spin chuck 5c is rotated in the absence of the substrate W, it is highly possible that the cause of the abnormal vibration of the vibration vb is that the spin chuck 5c is not properly installed.

Therefore, according to the fourth modification, the installation state of the spin chuck 5c can be detected by rotating the spin chuck 5c in a state where the substrate W does not exist in the spin chuck 5c and analyzing the vibration vb. The detection of the installed state of the spin chuck 5c indicates that the spin chuck 5c is satisfactorily installed or the spin chuck 5c is not satisfactorily installed.

In particular, the fourth modification is effective for pre-shipment inspection of the substrate processing system 100, the substrate processing apparatus SP, or the processing apparatus 1. For example, as one of the pre-shipment inspections of the processing apparatus 1, the spin chuck 5c is rotated in the absence of the substrate W to detect the installation state of the spin chuck 5c. Then, when it is detected that the spin chuck 5c is not installed satisfactorily, the processing device 1 can be shipped after the spin chuck 5c is satisfactorily installed. For example, the bolt 23 is tightened to improve the installation of the first drive unit 5a connected to the spin chuck 5c. For example, a connecting portion between the spin base 19 and the shaft 5b is provided.

Next, with reference to FIG. 13, the vibration detection method executed by the substrate processing apparatus SP according to the fourth modification will be described. FIG. 13 is a flowchart showing a vibration detection method according to the fourth modification. As shown in FIG. 13, the vibration detection method includes steps S141 to S147 and detects vibration of the substrate processing apparatus SP.

As shown in FIG. 13, in step S141 (rotation step), the control unit 51 controls the first drive unit 5a so that the spin chuck 5c starts rotating in a state where the substrate W does not exist in the spin chuck 5c. To do.

In step S143, the control unit 51 executes a vibration analysis process as a preprocess. Specifically, the determination unit 51a determines whether or not the level of the vibration signal Sv exceeds the predetermined vibration range RG (FIG. 5A), detects the installation state of the spin chuck 5c, and determines the detection result. Based on this, a predetermined process is executed.

The vibration analysis process in step S143 is the same as the vibration analysis process shown in FIG. However, in the fourth modification, as shown in FIG. 8, in step S23, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc is larger than the first threshold value TH1, and the spin chuck 5c. Detects the installation status of. Then, the negative determination (No in step S23) indicates that the level of the vibration signal Sv is within the predetermined vibration range RG, and corresponds to detecting that the spin chuck 5c is satisfactorily installed. On the other hand, the affirmative determination (Yes in step S23) indicates that the level of the vibration signal Sv exceeds the predetermined vibration range RG, and corresponds to detecting that the spin chuck 5c is not satisfactorily installed.

Returning to FIG. 13, in step S145, the control unit 51 determines whether or not the vibration analysis process as the preprocess is completed.

According to the negative determination (No in step S145), the control unit 51 advances the process to step S143.

On the other hand, according to the affirmative determination (Yes in step S145), the control unit 51 advances the process to step S147.

In step S147, the control unit 51 controls the first drive unit 5a so that the spin chuck 5c stops rotating. As a result, the spin chuck 5c stops. Then, the process ends.

As described above with reference to FIG. 13, according to the vibration analysis method according to the fourth modification, the spin chuck 5c is rotated in the absence of the substrate W (step S141). As a result, the installed state of the spin chuck 5c can be detected.

In the fourth modification, the position of the detection unit SN is not particularly limited as long as the detection unit SN can detect the vibration sv of the spin chuck 5c or the vibration including the vibration sv. For example, the detection unit SN does not have to be located at the predetermined position SP1.

(Fifth modification)
The substrate processing apparatus SP according to the fifth modification of the first embodiment will be described with reference to FIGS. 3 and 14. The fifth modification is different from the first embodiment described with reference to FIGS. 1 to 8 in that the detection unit SN is attached to the first drive unit 5a. Regarding other points, as shown in FIG. 3, the configuration of the substrate processing apparatus SP according to the fifth modification is the same as the configuration of the substrate processing apparatus SP according to the first embodiment. Hereinafter, the fifth modification will be mainly described as different from the first embodiment.

FIG. 14A is a side sectional view showing a part of the processing apparatus 1 according to the fifth modification. FIG. 14B is a bottom view showing the processing device 1 according to the fifth modification.

As shown in FIG. 14A, the detection unit SN is arranged outside the chamber 3 and faces the first drive unit 5a. The first drive unit 5a is arranged between the spin chuck 5c and the detection unit SN.

Specifically, the detection unit SN is attached to a portion 41 (hereinafter, referred to as “exposed portion 41”) exposed from the chamber 3 of the first drive unit 5a. More specifically, the detection unit SN is attached to the bottom surface 41a of the exposed unit 41. Further, as shown in FIGS. 14 (a) and 14 (b), the exposed portion 41 protrudes from the first region 3aa. The detection unit SN is preferably attached to the exposed unit 41 on the rotation axis AX.

Hereinafter, in the fifth modification, the position where the detection unit SN is arranged may be described as “predetermined position SP2”. The predetermined position SP2 is the same as the predetermined position SP1 described with reference to FIG. However, the predetermined position SP2 indicates a position on the exposed portion 41 (specifically, a position on the bottom surface 41a).

As described above with reference to FIG. 14, according to the fifth modification, since the detection unit SN faces the first drive unit 5a, the embodiment described with reference to FIGS. 3 and 4 Similar to No. 1, it is possible to prevent the vibration of the drive units other than the first drive unit 5a from being superimposed as noise on the vibration signal Sv representing the vibration vb.

In particular, according to the fifth modification, the detection unit SN is attached to the exposed portion 41 of the first drive unit 5a. Therefore, the detection unit SN can directly detect the vibration vb. As a result, the detection accuracy of the vibration vb can be improved, so that the reliability of the detection can be further improved when the holding state of the substrate W is detected. Further, the exposed portion 41 protrudes from the base portion 3a. Therefore, it is possible to suppress the vibration of the drive units other than the first drive unit 5a from being transmitted to the detection unit SN via the base unit 3a. As a result, it is possible to further suppress the detection unit SN from detecting the vibration of the drive units other than the first drive unit 5a as noise.

Further, according to the fifth modification, the detection unit SN is attached to the exposed unit 41. Therefore, it is possible to prevent the treatment liquids (first treatment liquid to third treatment liquid) discharged inside the chamber 3 from splashing on the detection unit SN. As a result, deterioration of the detection unit SN can be suppressed, and the reliability of the detection unit SN can be maintained.

(Embodiment 2)
The substrate processing system 100 according to the second embodiment of the present invention will be described with reference to FIGS. 1, 7, 7, and 15 to 17. The substrate processing system 100 according to the second embodiment is different from the substrate processing system 100 according to the first embodiment in that it has a high-sensitivity first detection unit SN1 and a low-sensitivity second detection unit SN2. Regarding other points, as shown in FIGS. 1 and 2, the configuration of the substrate processing system 100 according to the second embodiment is the same as the configuration of the substrate processing system 100 according to the first embodiment. Then, the processing device 1 according to the second embodiment is described as "processing device 1A". Therefore, the substrate processing system 100 according to the second embodiment includes the processing device 1A instead of the processing device 1 according to the first embodiment. Hereinafter, the difference between the second embodiment and the first embodiment will be mainly described.

FIG. 15A is a side sectional view showing a part of the processing apparatus 1A of the substrate processing system 100 according to the second embodiment. As shown in FIG. 15A, the processing device 1A includes a first detection unit SN1 and a second detection unit SN2 in place of the detection unit SN of the processing device 1 shown in FIG. Other configurations of the processing device 1A are the same as the configurations of the processing device 1 shown in FIG. The processing device 1A and the computer unit U3 form a substrate processing device SP.

The detection sensitivity of the first detection unit SN1 is higher than the detection sensitivity of the second detection unit SN2. The detection sensitivity of the first detection unit SN1 is represented by the resolution of the first detection unit SN1 (hereinafter, referred to as "first resolution"). The detection sensitivity of the second detection unit SN2 is represented by the resolution of the second detection unit SN2 (hereinafter, referred to as “second resolution”). Since the detection sensitivity of the first detection unit SN1 is higher than the detection sensitivity of the second detection unit SN2, the first resolution is higher than the second resolution.

Each of the first detection unit SN1 and the second detection unit SN2 detects the vibration vb including the vibration sv of the spin chuck 5c via the first drive unit 5a. Specifically, the first detection unit SN1 detects the vibration vb during the period in which the spin chuck 5c is rotating, and outputs the first vibration signal Sv1 representing the vibration vb. The second detection unit SN2 detects the vibration vb during the period in which the spin chuck 5c is rotating, and outputs the second vibration signal Sv2 representing the vibration vb.

In the second embodiment, the vibration vb is detected as an acceleration. Therefore, each of the first vibration signal Sv1 and the second vibration signal Sv2 is an acceleration signal representing the vibration vb. For example, each of the first detection unit SN1 and the second detection unit SN2 includes an acceleration sensor.

The first vibration signal Sv1 has a vibration component in the first direction D1 (for example, a plus direction) with respect to a predetermined first base level BL1 (for example, zero level) and a first vibration component with respect to the first base level BL1. The vibration component in the second direction D2 (for example, the minus direction) opposite to the direction D1 is included. Hereinafter, the vibration component in the first direction D1 and the vibration component in the second direction D2 may be collectively referred to as "vibration component Sc1".

The second vibration signal Sv2 has a vibration component in the third direction D3 (for example, the plus direction) with respect to the predetermined second base level BL2 (for example, zero level) and a third vibration component with respect to the second base level BL2. The vibration component in the fourth direction D4 (for example, the minus direction) opposite to the direction D3 is included. Hereinafter, the vibration component in the third direction D3 and the vibration component in the fourth direction D4 may be collectively referred to as "vibration component Sc2".

The first base level BL1 and the second base level BL2 are not limited to the zero level, and may be an allowable vibration level before the rotation of the spin chuck 5c.

Each of the first detection unit SN1 and the second detection unit SN2 is arranged outside the chamber 3 and faces the first drive unit 5a. The first drive unit 5a is arranged between the spin chuck 5c and the first detection unit SN1, and is arranged between the spin chuck 5c and the second detection unit SN2.

Specifically, the first detection unit SN1 and the second detection unit SN2 are attached to the outer surface of the chamber 3 (specifically, the base unit 3a) so as to face the first drive unit 5a via the chamber 3. It is preferable that the first detection unit SN1 and the second detection unit SN2 are arranged symmetrically with respect to the rotation axis AX while facing the first drive unit 5a. The first detection unit SN1 and the second detection unit SN2 are in close proximity to each other. A part of the first detection unit SN1 and / or a part of the second detection unit SN2 may face the first drive unit 5a.

FIG. 15B is a bottom view showing the processing device 1A. As shown in FIG. 15B, the first detection unit SN1 and the second detection unit SN2 are attached to the first region 3aa of the base unit 3a. The plurality of bolts 23 surround the first detection unit SN1 and the second detection unit SN2 on the first region 3aa.

Hereinafter, the position where the first detection unit SN1 is arranged may be described as "first predetermined position FPS", and the position where the second detection unit SN2 is arranged may be described as "second predetermined position SPS". The first drive unit 5a is arranged between the spin chuck 5c and the first predetermined position FPS, and is arranged between the spin chuck 5c and the second predetermined position SPS. Further, each of the first predetermined position FPS and the second predetermined position SPS indicates a position facing the first drive unit 5a outside the chamber 3. Specifically, each of the first predetermined position FPS and the second predetermined position SPS indicates a position on the first region 3aa.

As described above with reference to FIG. 15, according to the second embodiment, each of the first detection unit SN1 and the second detection unit SN2 detects the vibration vb including the vibration sv of the spin chuck 5c. Then, the vibration sv of the spin chuck 5c changes depending on the holding state of the substrate W. Therefore, by analyzing the first vibration signal Sv1 and the second vibration signal Sv2, the holding state of the substrate W can be detected as in the first embodiment. Further, in the second embodiment, as compared with the case where the holding state of the substrate W is detected based on the position of the holding member 21, erroneous detection is performed when detecting the holding state of the substrate W as in the first embodiment. Can be reduced. In addition, in the second embodiment, the first detection unit SN1 and the second detection unit SN2 are arranged to face the first drive unit 5a as in the detection unit SN of the first embodiment, and thus are the same as in the first embodiment. Has the effect of.

Further, according to the second embodiment, the first detection unit SN1 having a high detection sensitivity detects a relatively small abnormal vibration contained in the vibration vb, and the second detection unit SN2 having a low detection sensitivity includes the vibration vb. A relatively large abnormal vibration can be detected. That is, the characteristics of the first detection unit SN1 and the second detection unit SN2 can be effectively utilized.

Further, according to the second embodiment, by providing the second detection unit SN2 having a low detection sensitivity, the cost of the processing device 1A can be reduced as compared with the case where two first detection units SN1 having a high detection sensitivity are provided. .. This is because the second detection unit SN2 having a low detection sensitivity is often cheaper than the first detection unit SN1 having a high detection sensitivity.

Further, according to the second embodiment, when any of the detection units of the first detection unit SN1 and the second detection unit SN2 does not function normally, the vibration from the detection unit that is functioning normally By analyzing the signal, the holding state of the substrate W can be detected. Therefore, it is possible to avoid a situation in which the holding state of the substrate W cannot be detected at all.

Next, the analysis of the vibration vb by the computer unit U3 will be described with reference to FIG. 15 (a). The determination unit 51a determines whether or not the level of the first vibration signal Sv1 exceeds the first vibration range R1 and detects the holding state of the substrate W. Further, the determination unit 51a determines whether or not the level of the second vibration signal Sv2 exceeds the second vibration range R2, and detects the holding state of the substrate W.

Then, the execution unit 51b determines the process to be executed after the determination based on the combination of the determination result for the first vibration signal Sv1 and the determination result for the second vibration signal Sv2, and executes the determined process.

Specifically, one of the third process, the fourth process, and the fifth process is determined as the process to be executed after the determination by the determination unit 51a. Each of the third process, the fourth process, and the fifth process controls the output unit 55 to issue an alarm, and / or controls the first drive unit 5a to stop the rotation of the spin chuck 5c. Includes processing to do. Of the third process, the fourth process, and the fifth process, all the processes may be different, some processes may be different, or all the processes may be the same. For example, the third process is the same as the first process according to the second modification of the first embodiment, and each of the fourth process and the fifth process is the second process according to the second modification of the first embodiment. The same is true.

As described above with reference to FIG. 15A, according to the second embodiment, after the determination, based on the combination of the determination result for the first vibration signal Sv1 and the determination result for the second vibration signal Sv2. The process to be executed is decided. Therefore, an appropriate measure (normal / abnormal) that reflects the detection result of the holding state of the substrate W based on the two detection units (first detection unit SN1 and second detection unit SN2) and the state (normal / abnormal) of the two detection units (normal / abnormal). The third process, the fourth process, or the fifth process) can be taken.

Next, with reference to FIG. 16, the first vibration range R1 and the second vibration range R2 will be described in relation to the resolutions of the first detection unit SN1 and the second detection unit SN2. Hereinafter, as an example, a case where the first resolution is “m (G or V)” and the second resolution is “2 m (G or V)” will be described.

FIG. 16A shows the first vibration range R1. The horizontal axis represents time, and the vertical axis represents the level (G or V) of the first vibration signal Sv1. For convenience of explanation of the first resolution, the first vibration signal Sv1 is omitted, and the vibration vb to be detected by the first detection unit SN1 is described. Further, the vertical axis is provided with a scale corresponding to the first resolution.

FIG. 16B shows the second vibration range R2. The horizontal axis represents time, and the vertical axis represents the level (G or V) of the second vibration signal Sv2. For convenience of explanation of the second resolution, the second vibration signal Sv2 is omitted, and the vibration vb to be detected by the second detection unit SN2 is described. Further, the vertical axis is provided with a scale corresponding to the second resolution.

As shown in FIGS. 16A and 16B, the waveform of the vibration vb input to the first detection unit SN1 is the same as the waveform of the vibration vb input to the second detection unit SN2. This is because both the first detection unit SN1 and the second detection unit SN2 are attached to the first region 3aa (FIG. 15B).

Therefore, by defining the first vibration range R1 and the second vibration range R2 in consideration of the first resolution and the second resolution, the high-resolution first detection unit SN1 and the low-resolution second detection unit SN2 are effective. Can be used effectively.

Specifically, as shown in FIG. 16A, the first vibration range R1 is defined with respect to the first vibration signal Sv1. The storage unit 53 stores a first specific value B1 indicating the value at one end of the first vibration range R1 and a second specific value B2 indicating the value at the other end of the first vibration range R1. The first specific value B1 is determined corresponding to the vibration component in the first direction D1 of the first vibration signal Sv1. The second specific value B2 is determined corresponding to the vibration component in the second direction D2 of the first vibration signal Sv1. In the second embodiment, the absolute value of the first specific value B1 and the absolute value of the second specific value B2 are the same. Specifically, the first specific value B1 indicates a third threshold value TH3 for comparison with the level of the vibration component Sc1 of the first vibration signal Sv1, and the storage unit 53 stores the third threshold value TH3. ..

Then, the third threshold value TH3 is set to a value equal to or higher than the first resolution “m (G)”. This is because the first resolution is the lowest value of the signal level that can be output by the first detection unit SN1.

On the other hand, as shown in FIG. 16B, the second vibration range R2 is defined with respect to the second vibration signal Sv2. The storage unit 53 stores a third specific value B3 indicating the value at one end of the second vibration range R2 and a fourth specific value B4 indicating the value at the other end of the second vibration range R2. The third specific value B3 is determined corresponding to the vibration component in the third direction D3 of the second vibration signal Sv2. The fourth specific value B4 is determined corresponding to the vibration component in the fourth direction D4 of the second vibration signal Sv2. In the second embodiment, the absolute value of the third specific value B3 and the absolute value of the fourth specific value B4 are the same. Specifically, the third specific value B3 indicates a fourth threshold value TH4 for comparison with the level of the vibration component Sc2 of the second vibration signal Sv2, and the storage unit 53 stores the fourth threshold value TH4. ..

Then, the fourth threshold value TH4 is set to a value equal to or higher than the second resolution "2 m (G)". This is because the second resolution is the lowest value of the signal level that can be output by the second detection unit SN2.

The first vibration range R1 and the second vibration range R2 are determined experimentally and / or empirically while considering the installation environment of the processing device 1A.

Further, as shown in FIGS. 16A and 16B, the third threshold value TH3 for the first detection unit SN1 is smaller than the fourth threshold value TH4 for the second detection unit SN2. Since the first resolution of the first detection unit SN1 is higher than the second resolution of the second detection unit SN2, the high resolution first detection unit SN1 is made smaller than the fourth threshold TH4 by making the third threshold TH3 smaller than the fourth threshold TH4. This is to make effective use of it.

Further, the third threshold value TH3 with respect to the first detection unit SN1 is preferably smaller than the second resolution "2m (G)" of the second detection unit SN2. By setting the third threshold TH3 so as to correspond to the level of vibration vb that cannot be detected by the low-resolution second detection unit SN2 and can be detected by the high-resolution first detection unit SN1, the high-resolution first detection unit SN1 can be detected. 1 This is to make more effective use of the detection unit SN1.

On the other hand, the fourth threshold value TH4 with respect to the second detection unit SN2 is preferably set to the same value as the second resolution "2m (G)" of the second detection unit SN2. This is because the low resolution second detection unit SN2 is effectively utilized by setting the fourth threshold value TH4 to the minimum value "2m (G)" that can be output by the second detection unit SN2.

Next, the vibration detection method executed by the substrate processing apparatus SP will be described with reference to FIGS. 7 and 17. As shown in FIG. 7, the vibration detection method according to the second embodiment includes steps S1 to S15. However, the substrate processing apparatus SP according to the second embodiment executes the vibration analysis process shown in FIG. 17 in the vibration analysis process in step S11. Further, in the vibration analysis process according to the second embodiment, the third threshold value TH3 is used to determine whether or not the level of the first vibration signal Sv1 exceeds the first vibration range R1. Further, the fourth threshold value TH4 is used to determine whether or not the level of the second vibration signal Sv2 exceeds the second vibration range R2.

FIG. 17 is a flowchart showing the vibration analysis process according to the second embodiment. As shown in FIG. 17, the vibration analysis process includes steps S80 to S101.

In step S80 (detection step), the first detection unit SN1 detects the vibration vb including the vibration sv of the spin chuck 5c via the first drive unit 5a. In step S80, the first detection unit SN1 detects vibration at the first predetermined position FPS (predetermined position) while the spin chuck 5c is rotating.

In step S81, the determination unit 51a receives the first vibration signal Sv1 including the vibration component Sc1 from the first detection unit SN1.

In step S82 (detection step), the second detection unit SN2 detects the vibration vb including the vibration sv of the spin chuck 5c via the first drive unit 5a. In step S82, the second detection unit SN2 detects vibration at the second predetermined position SPS (predetermined position) while the spin chuck 5c is rotating.

In step S83, the determination unit 51a receives the second vibration signal Sv2 including the vibration component Sc2 from the second detection unit SN2.

In step S85, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc1 is larger than the third threshold value TH3, and detects the holding state of the substrate W.

According to the affirmative determination (Yes in step S85), the process proceeds to step S87. The affirmative determination indicates that the first vibration signal Sv1 has exceeded the first vibration range R1 and corresponds to detecting that the substrate W is not properly held.

In step S87, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc2 is larger than the fourth threshold value TH4, and detects the holding state of the substrate W.

According to the negative determination (No in step S87), the process proceeds to step S89. The negative determination indicates that the second vibration signal Sv2 is within the second vibration range R2, and corresponds to the detection that the degree of holding state of the substrate W is relatively small.

In step S89, the execution unit 51b controls the output unit 55 so as to issue a third alarm (corresponding to the third process). The third alarm is the same as the first alarm according to the second modification of the first embodiment.

In step S91, the execution unit 51b controls the first drive unit 5a so as to stop the rotation of the spin chuck 5c after the processing being executed for the substrate W is completed (corresponding to the third processing). Therefore, it is possible to suppress the dropping of the substrate W while suppressing the extension of the processing time due to the re-execution of the processing being executed.

On the other hand, according to the affirmative determination (Yes in step S87), the process proceeds to step S93. The affirmative determination indicates that the second vibration signal Sv2 has exceeded the second vibration range R2, and corresponds to the detection that the degree of the inappropriate holding state of the substrate W is relatively large.

In step S93, the execution unit 51b controls the output unit 55 so as to issue a fourth alarm (corresponding to the fourth process). The fourth alarm is the same as the second alarm according to the second modification of the first embodiment.

In step S95, the execution unit 51b controls the first drive unit 5a so as to immediately stop the rotation of the spin chuck 5c in response to the affirmative determination (Yes in step S87) (corresponding to the fourth process). This is because the degree of improper holding of the substrate W is relatively large and the degree of urgency is high.

Further, according to the negative determination (No in step S85), the process proceeds to step S97. The negative determination indicates that the first vibration signal Sv1 is within the first vibration range R1, and corresponds to detecting that the substrate W is properly held.

In step S97, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc2 is larger than the fourth threshold value TH4.

The process returns to the main routine according to the negative determination (No in step S97).

On the other hand, according to the affirmative determination (Yes in step S97), the process proceeds to step S99. The affirmative determination corresponds to the detection that the first detection unit SN1 and / or the second detection unit SN2 is not functioning normally. Since the fourth threshold value TH4 is larger than the third threshold value TH3, the absolute value of the level of the vibration component Sc1 is equal to or less than the third threshold value TH3 (No in step S85), and the absolute value of the level of the vibration component Sc2 is the fourth. It is logically impossible to be larger than the threshold value (Yes in step S97).

In step S99, the execution unit 51b controls the output unit 55 so as to issue a fifth alarm (corresponding to the fifth process). The fifth alarm includes, for example, a notification that the first detection unit SN1 and / or the second detection unit SN2 is not functioning normally.

In step S101, the execution unit 51b controls the first drive unit 5a so as to immediately stop the rotation of the spin chuck 5c in response to the affirmative determination (Yes in step S97) (corresponding to the fifth process). This is because the first detection unit SN1 and / or the second detection unit SN2 are not functioning normally and the degree of urgency is high.

As described above with reference to FIG. 17, according to the second embodiment, it is determined that the absolute value of the level of the vibration component Sc1 is larger than the third threshold value TH3, and the absolute value of the level of the vibration component Sc2. When is determined to be 4 or less threshold TH4 or less, the execution unit 51b executes a third process as a process to be executed after the determination (step S89, step S91). Therefore, when the degree of the inappropriate holding state of the substrate W by the spin chuck 5c is relatively small, appropriate measures can be taken according to the degree.

Further, according to the second embodiment, it is determined that the absolute value of the level of the vibration component Sc1 is larger than the third threshold value TH3, and the absolute value of the level of the vibration component Sc2 is larger than the fourth threshold value TH4. In this case, the execution unit 51b executes the fourth process as the process to be executed after the determination (step S93, step S95). Therefore, when the degree of the inappropriate holding state of the substrate W by the spin chuck 5c is relatively large, it is possible to take appropriate measures according to the degree.

Further, according to the second embodiment, in the fourth process, it is determined that the absolute value of the level of the vibration component Sc1 is larger than the third threshold value TH3, and the absolute value of the level of the vibration component Sc2 is higher than the fourth threshold value TH4. In response to the determination that the spin chuck 5c is also large, the process of immediately stopping the rotation of the spin chuck 5c is included (step S95). Therefore, it is possible to immediately prevent the substrate W from falling off.

Further, according to the second embodiment, when it is determined that the absolute value of the level of the vibration component Sc1 is equal to or less than the third threshold value TH3, and the absolute value of the level of the vibration component Sc2 is determined to be larger than the fourth threshold value TH4. In addition, the execution unit 51b executes the fifth process as a process to be executed after the determination (step S99, step S101). Therefore, when the first detection unit SN1 and / or the second detection unit SN2 is not functioning normally, appropriate measures can be taken.

Further, according to the second embodiment, in the fifth process, the absolute value of the level of the vibration component Sc1 is determined to be equal to or less than the third threshold value TH3, and the absolute value of the level of the vibration component Sc1 is larger than the fourth threshold value TH4. In response to the determination, the process of immediately stopping the rotation of the spin chuck 5c is included. Therefore, when the first detection unit SN1 and / or the second detection unit SN2 is not functioning normally, an emergency stop is performed to inspect, repair, or replace the first detection unit SN1 and / or the second detection unit SN2. can do.

(Embodiment 3)
The substrate processing system 100 according to the third embodiment of the present invention will be described with reference to FIGS. 1, 2, 7, and 18 to 20. The substrate processing system 100 according to the third embodiment is different from the substrate processing system 100 according to the first embodiment in that it has a third detection unit SN3 located on the side wall portion 3b of the chamber 3. Regarding other points, as shown in FIGS. 1 and 2, the configuration of the substrate processing system 100 according to the third embodiment is the same as the configuration of the substrate processing system 100 according to the first embodiment. Then, the processing device 1 according to the third embodiment is described as "processing device 1B". Therefore, the substrate processing system 100 according to the third embodiment includes the processing device 1B instead of the processing device 1 according to the first embodiment. Hereinafter, the differences between the third embodiment and the first embodiment will be mainly described.

FIG. 18 is a side sectional view showing a processing device 1B of the substrate processing system 100 according to the third embodiment. As shown in FIG. 18, the processing device 1B further includes a third detection unit SN3 in addition to the configuration of the processing device 1 shown in FIG. Other configurations of the processing device 1B are the same as the configurations of the processing device 1 shown in FIG. The processing device 1B and the computer unit U3 form a substrate processing device SP.

The third detection unit SN3 detects the vibration cv of the chamber while the spin chuck 5c is rotating, and outputs the third vibration signal Sv3 representing the vibration cv. The third detection unit SN3 is attached to the side wall portion 3b (wall portion) of the chamber 3. For example, it is preferable that the third detection unit SN3 is attached to the substantially central portion of the side wall portion 3b in the vertical direction, or is attached above the substantially central portion of the side wall portion 3b in the vertical direction. This is because the vibration cv of the chamber 3 is larger at the position above the substantially central portion or the substantially central portion than at the position below the substantially central portion, and it is easy to detect the vibration cv. The third detection unit SN3 may be attached to the top wall portion (wall portion) of the chamber 3.

According to the third embodiment, the vibration cv of the chamber 3 can be detected by the third detection unit SN3. Therefore, by analyzing the vibration cv, it is possible to take appropriate measures according to the degree of the vibration cv of the chamber 3. For example, in a situation where the vibration cv of the chamber 3 becomes large, there is a high possibility that the entire processing device 1B vibrates greatly. Therefore, when it is detected that the vibration cv of the chamber 3 is large, for example, the processing device 1B can be stopped urgently.

In the third embodiment, the vibration cv is detected as an acceleration. Therefore, the third vibration signal Sv3 is an acceleration signal representing the vibration cv. For example, the third detection unit SN3 includes an acceleration sensor.

The arrangement, configuration, and operation of the first detection unit SN1 are the same as the arrangement, configuration, and operation of the detection unit SN according to the first embodiment. However, in the description of the detection unit SN according to the first embodiment, "vibration signal Sv" is read as "first vibration signal Sv1". That is, the first detection unit SN1 detects the vibration vb during the period in which the spin chuck 5c is rotating, and outputs the first vibration signal Sv1 representing the vibration vb. The first vibration signal Sv1 is analyzed in the same manner as the vibration signal Sv of the first embodiment, and the holding state of the substrate W is detected.

Further, in the description of the "vibration signal Sv" of the first embodiment, "base level BL" is read as "first base level BL1", and "vibration component Sc" is read as "vibration component Sc1". That is, the first vibration signal Sv1 is the vibration component of the first direction D1 with respect to the predetermined first base level BL1 and the second direction D2 opposite to the first direction D1 with respect to the first base level BL1. Includes vibration components. Further, the vibration component in the first direction D1 and the vibration component in the second direction may be collectively referred to as "vibration component Sc1".

According to the third embodiment, since the processing device 1B includes the same first detection unit SN1 as the detection unit SN according to the first embodiment, the substrate is analyzed by analyzing the first vibration signal Sv1 as in the first embodiment. The holding state of W can be detected. Further, in the third embodiment, as compared with the case where the holding state of the substrate W is detected based on the position of the holding member 21, erroneous detection is performed when detecting the holding state of the substrate W as in the first embodiment. Can be reduced. In addition, the third embodiment has the same effect as that of the first embodiment due to the first detection unit SN1 similar to the detection unit SN of the first embodiment.

Next, the analysis of the vibration vb and the vibration cv by the computer unit U3 will be described with reference to FIG. The determination unit 51a determines whether or not the level of the first vibration signal Sv1 exceeds the third vibration range R3, and detects the holding state of the substrate W. Further, the determination unit 51a determines whether or not the level of the third vibration signal Sv3 exceeds the fourth vibration range R4, and detects the vibration state of the chamber 3. The detection of the vibration state of the chamber 3 indicates that the vibration of the chamber 3 is abnormal or the vibration of the chamber 3 is normal.

Then, the execution unit 51b determines the process to be executed after the determination based on the combination of the determination result for the first vibration signal Sv1 and the determination result for the third vibration signal Sv3, and executes the determined process.

Specifically, one of the sixth process, the seventh process, and the eighth process is determined as the process to be executed after the determination by the determination unit 51a. Each of the sixth process, the seventh process, and the eighth process controls the output unit 55 to issue an alarm, and / or controls the first drive unit 5a to stop the rotation of the spin chuck 5c. Includes processing to do. Of the sixth process, the seventh process, and the eighth process, all the processes may be different, some processes may be different, or all the processes may be the same. For example, the sixth process is the same as the first process according to the second modification of the first embodiment, and each of the seventh process and the eighth process is the second process according to the second modification of the first embodiment. The same is true.

As described above with reference to FIG. 18, according to the third embodiment, the process to be executed after the determination is based on the combination of the determination result for the first vibration signal Sv1 and the determination result for the third vibration signal Sv3. Is determined. Therefore, appropriate measures can be taken according to the detection result of the holding state of the substrate W based on the first detection unit SN1 and the detection result of the vibration state of the chamber 3 based on the third detection unit SN3.

Next, the third vibration range R3 and the fourth vibration range R4 will be described with reference to FIG. FIG. 19A shows a third vibration range R3. The horizontal axis represents time, and the vertical axis represents the level (G or V) of the first vibration signal Sv1.

As shown in FIG. 19A, a third vibration range R3 is defined with respect to the first vibration signal Sv1. The storage unit 53 stores a fifth specific value B5 indicating the value at one end of the third vibration range R3 and a sixth specific value B6 indicating the value at the other end of the third vibration range R3. The fifth specific value B5 is determined corresponding to the vibration component in the first direction D1 of the first vibration signal Sv1. The sixth specific value B6 is determined corresponding to the vibration component in the second direction D2 of the first vibration signal Sv1. In the third embodiment, the absolute value of the fifth specific value B5 and the absolute value of the sixth specific value B6 are the same. Specifically, the fifth specific value B5 indicates a fifth threshold value TH5 for comparison with the level of the vibration component Sc1 of the first vibration signal Sv1, and the storage unit 53 stores the fifth threshold value TH5. ..

FIG. 19B shows the fourth vibration range R4. The horizontal axis represents time, and the vertical axis represents the level (G or V) of the third vibration signal Sv3. As shown in FIG. 19B, a fourth vibration range R4 is defined with respect to the third vibration signal Sv3. The third vibration signal Sv3 has a vibration component in the fifth direction D5 (for example, the plus direction) with respect to a predetermined third base level BL3 (for example, zero level) and a fifth vibration component with respect to the third base level BL3. The vibration component in the sixth direction D6 (for example, the minus direction) opposite to the direction D5 is included. The third base level BL3 is not limited to the zero level, and may be an allowable vibration level before the rotation of the spin chuck 5c. Hereinafter, the vibration component in the fifth direction D5 and the vibration component in the sixth direction D6 may be collectively referred to as “vibration component Sc3”.

The storage unit 53 stores a seventh specific value B7 indicating the value at one end of the fourth vibration range R4 and an eighth specific value B8 indicating the value at the other end of the fourth vibration range R4. The seventh specific value B7 is determined corresponding to the vibration component in the fifth direction D5 of the third vibration signal Sv3. The eighth specific value B8 is determined corresponding to the vibration component in the sixth direction D6 of the third vibration signal Sv3. In the third embodiment, the absolute value of the seventh specific value B7 and the absolute value of the eighth specific value B8 are the same. Specifically, the seventh specific value B7 indicates a sixth threshold value TH6 for comparison with the level of the vibration component Sc3 of the third vibration signal Sv3, and the storage unit 53 stores the sixth threshold value TH6. ..

The third vibration range R3 and the fourth vibration range R4 are determined experimentally and / or empirically while considering the installation environment of the processing device 1B.

Next, the vibration detection method executed by the substrate processing apparatus SP will be described with reference to FIGS. 7, 18, and 20. As shown in FIG. 7, the vibration detection method according to the third embodiment includes steps S1 to S15. However, the substrate processing apparatus SP according to the third embodiment executes the vibration analysis process shown in FIG. 20 in the vibration analysis process in step S11. Further, in the vibration analysis process according to the third embodiment, the fifth threshold value TH5 is used to determine whether or not the level of the first vibration signal Sv1 exceeds the third vibration range R3. Further, the sixth threshold value TH6 is used to determine whether or not the level of the third vibration signal Sv3 exceeds the fourth vibration range R4.

FIG. 20 is a flowchart showing the vibration analysis process according to the third embodiment. As shown in FIG. 20, the vibration analysis process includes steps S110 to S131.

In step S110 (detection step), the first detection unit SN1 detects the vibration vb including the vibration sv of the spin chuck 5c via the first drive unit 5a. In step S110, the first detection unit SN1 detects vibration at a predetermined position SP1 while the spin chuck 5c is rotating.

In step S111, the determination unit 51a receives the first vibration signal Sv1 including the vibration component Sc1 from the first detection unit SN1.

In step S112, the third detection unit SN3 detects the vibration cv of the chamber 3. In step S112, the third detection unit SN3 detects vibration at a specific position while the spin chuck 5c is rotating. The specific position indicates a position on the side wall portion 3b or the top wall portion 3c.

In step S113, the determination unit 51a receives the third vibration signal Sv3 including the vibration component Sc3 from the third detection unit SN3.

In step S115, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc1 is larger than the fifth threshold value TH5, and detects the holding state of the substrate W.

According to the affirmative determination (Yes in step S115), the process proceeds to step S117. The affirmative determination indicates that the first vibration signal Sv1 has exceeded the third vibration range R3, and corresponds to detecting that the substrate W is not properly held.

In step S117, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc3 is larger than the sixth threshold value TH6, and detects the vibration state of the chamber 3.

According to the negative determination (No in step S117), the process proceeds to step S119. The negative determination indicates that the third vibration signal Sv3 is within the fourth vibration range R4, and corresponds to the detection that the vibration cv of the chamber 3 is normal.

In step S119, the execution unit 51b controls the output unit 55 so as to issue the sixth alarm (corresponding to the sixth process). The sixth alarm is the same as the first alarm according to the second modification of the first embodiment.

In step S121, the execution unit 51b controls the first drive unit 5a so as to stop the rotation of the spin chuck 5c after the processing being executed for the substrate W is completed (corresponding to the sixth processing). Therefore, it is possible to suppress the dropping of the substrate W while suppressing the extension of the processing time due to the re-execution of the processing being executed.

On the other hand, according to the affirmative determination (Yes in step S117), the process proceeds to step S123. The affirmative determination indicates that the third vibration signal Sv3 has exceeded the fourth vibration range R4, and corresponds to detecting that the vibration cv of the chamber 3 is abnormal. The abnormality of the vibration cv of the chamber 3 corresponds to a large vibration of the chamber 3, and indicates that the vibration of the entire processing device 1B is large.

In step S123, the execution unit 51b controls the output unit 55 so as to issue the seventh alarm (corresponding to the seventh process). The seventh alarm includes, for example, a notification that the chamber 3 is vibrating significantly.

In step S125, the execution unit 51b controls the first drive unit 5a so as to immediately stop the rotation of the spin chuck 5c in response to the affirmative determination (Yes in step S117) (corresponding to the seventh process). This is because the vibration of the entire processing device 1B is large and the degree of urgency is high.

Further, according to the negative determination (No in step S115), the process proceeds to step S127. The negative determination indicates that the first vibration signal Sv1 is within the third vibration range R3, and corresponds to detecting that the substrate W is properly held.

In step S127, the determination unit 51a determines whether or not the absolute value of the level of the vibration component Sc3 is larger than the sixth threshold value TH6.

The process returns to the main routine according to the negative determination (No in step S127).

On the other hand, according to the affirmative determination (Yes in step S127), the process proceeds to step S129. The affirmative determination indicates that the third vibration signal Sv3 has exceeded the fourth vibration range R4, and corresponds to detecting that the vibration cv of the chamber 3 is abnormal.

In step S129, the execution unit 51b controls the output unit 55 so as to issue the eighth alarm (corresponding to the eighth process). The eighth alarm is, for example, the same as the seventh alarm.

In step S131, the execution unit 51b controls the first drive unit 5a so as to immediately stop the rotation of the spin chuck 5c in response to the affirmative determination (Yes in step S127) (corresponding to the eighth process). This is because the vibration of the entire processing device 1B is large and the degree of urgency is high.

As described above with reference to FIG. 20, according to the third embodiment, the determination unit 51a determines that the absolute value of the level of the vibration component Sc1 is larger than the fifth threshold value TH5, and the vibration component Sc3 When it is determined that the absolute value of the level of is equal to or less than the sixth threshold value TH6, the execution unit 51b executes the sixth process as the process to be executed after the determination (step S119, step S121). That is, when the substrate W is not properly held, appropriate measures can be taken. As a result, the substrate W can be prevented from falling off.

Further, according to the third embodiment, it is determined that the absolute value of the level of the vibration component Sc1 is larger than the fifth threshold value TH5, and the absolute value of the level of the vibration component Sc3 is larger than the sixth threshold value TH6. In this case, the execution unit 51b executes the seventh process as a process to be executed after the determination (step S123, step S125). That is, when the substrate W is not properly held and the vibration cv of the chamber 3 is abnormal, appropriate measures can be taken. As a result, the substrate W can be prevented from falling off, and damage to the moving portion of the processing device 1B can be suppressed.

Further, according to the third embodiment, in the seventh process, it is determined that the absolute value of the level of the vibration component Sc1 is larger than the fifth threshold value TH5, and the absolute value of the level of the vibration component Sc3 is higher than the sixth threshold value TH6. In response to the determination that the spin chuck 5c is also large, the process of immediately stopping the rotation of the spin chuck 5c is included (step S125). Therefore, it is possible to immediately prevent the substrate W from falling off.

Further, according to the third embodiment, when it is determined that the absolute value of the level of the vibration component Sc1 is equal to or less than the fifth threshold value TH5, and the absolute value of the level of the vibration component Sc3 is determined to be larger than the sixth threshold value TH6. In addition, the execution unit 51b executes the eighth process as a process to be executed after the determination (step S129, step S131). That is, when the vibration cv of the chamber 3 is abnormal, appropriate measures can be taken. As a result, the substrate W can be prevented from falling off, and damage to the moving portion of the processing device 1B can be suppressed.

Further, according to the third embodiment, in the eighth process, the absolute value of the level of the vibration component Sc1 is determined to be equal to or less than the third threshold value TH3, and the absolute value of the level of the vibration component Sc3 is larger than the sixth threshold value TH6. In response to the determination, the process of immediately stopping the rotation of the spin chuck 5c is included. Therefore, it is possible to immediately prevent the substrate W from falling off.

The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above-described embodiment, and can be implemented in various aspects without departing from the gist of the present invention (for example, (1) to (4) shown below). In addition, various inventions can be formed by appropriately combining the plurality of components disclosed in the above embodiments. For example, some components may be removed from all the components shown in the embodiments. Furthermore, the components over the three different embodiments may be combined as appropriate. In order to make the drawings easier to understand, each component is schematically shown, and the thickness, length, number, spacing, etc. of each component shown are actual for the convenience of drawing creation. May be different. Further, the material, shape, dimensions, etc. of each component shown in the above embodiment are merely examples, and are not particularly limited, and various changes can be made without substantially deviating from the effects of the present invention. is there.

(1) Each of the detection units SN, SN1, SN2, and SN3 according to the first embodiment (including a modified example) to the third embodiment may include a speed sensor and detect vibration vb as a speed. Therefore, the vibration signals Sv, Sv1, Sv2, and Sv3 are velocity signals representing vibration. The velocity sensor is, for example, a non-contact type sensor using the principle of eddy current.

Further, each of the detection units SN, SN1, SN2, and SN3 may include a displacement sensor and detect the vibration vb as a displacement. Therefore, the vibration signals Sv, Sv1, Sv2, and Sv3 are displacement signals representing vibration. The displacement sensor is, for example, a non-contact type sensor using the principle of eddy current. The displacement sensor is, for example, a non-contact sensor using laser light, ultrasonic waves, or infrared rays.

Further, each of the detection units SN, SN1 and SN2 may be separated from the base unit 3a or the first drive unit 5a as long as they face the first drive unit 5a, and are located inside the chamber 3. You may be doing it. The detection unit SN3 may be separated from the chamber 3 or may be located inside the chamber 3.

(2) In the first modification to the fifth modification of the first embodiment, the second embodiment, and the third embodiment, the predetermined vibration range RG (first threshold value TH1) and the first predetermined vibration range RG1 (first threshold value TH1). , Second predetermined vibration range RG2 (second threshold TH2), first vibration range R1 (third threshold TH3), second vibration range R2 (fourth threshold TH4), third vibration range R3 (fifth threshold TH5), And the fourth vibration range R4 (sixth threshold TH6) may be different depending on the rotation speed of the spin chuck 5c as in the first embodiment. Further, the absolute value of the value A1 and the absolute value of the value A2 may be different, the absolute value of the value A3 and the absolute value of the value A4 may be different, and the absolute value of the value B1 and the absolute value of the value B2. The value may be different, the absolute value of the value B3 and the absolute value of the value B4 may be different, the absolute value of the value B5 and the absolute value of the value B6 may be different, and the absolute value of the value B7. The absolute value and the absolute value of the value B8 may be different (FIG. 5, FIG. 10, FIG. 16, FIG. 19).

(3) The determination unit 51a according to the first embodiment (including a modification) to the third embodiment may analyze the vibration vb based on the speed signal calculated by integrating the acceleration signal once. , The vibration vb may be analyzed based on the displacement signal calculated by integrating the acceleration signal twice.

(4) The first modification to the third modification according to the first embodiment can be applied to each of the first detection unit SN1 and the second detection unit SN2 according to the second embodiment, and the first detection unit according to the third embodiment can be applied. It can be applied to each of SN1 and the third detection unit SN3. The fifth modification according to the first embodiment can be applied to each of the first detection unit SN1 and the second detection unit SN2 according to the second embodiment, and can be applied to the first detection unit SN1 according to the third embodiment. The third detection unit SN3 according to the third embodiment may be provided in the processing device 1A according to the second embodiment.

In the fourth modification according to the first embodiment, the first to third modifications according to the first embodiment can be applied to the step S143 of FIG. Further, the steps S141 to S147 of FIG. 13 can be executed before the step S1 of FIG. Then, different vibration analysis processes may be executed in the steps S143 and S11. Further, different vibration ranges may be defined in the steps S143 and S11 as the vibration range for detecting the holding state of the substrate W, and the steps S143 and the step may be defined as the threshold value for comparison with the level of the vibration component. A different threshold value may be set in S11.

The present invention relates to a substrate processing apparatus for processing a substrate and a vibration detection method, and has industrial applicability.

1,1A, 1B processing equipment 3 chamber (accommodation)
3a Base part 3b Side wall part (wall part)
3c Top wall (wall)
5a 1st drive unit (drive unit)
5c spin chuck (rotating part)
51a Judgment unit 51b Execution unit 53 Storage unit SP board processing device SN detection unit (first detection unit)
SN1 1st detection unit SN2 2nd detection unit SN3 3rd detection unit W board

Claims (23)

It is a substrate processing device that processes substrates.
A rotating part capable of holding the substrate and
A drive unit that drives the rotating unit to rotate the rotating unit,
The accommodating portion accommodating the rotating portion and the driving portion, and
A first detector for detecting vibrations including vibration of the rotary portion via the driving portion,
A drive unit different from the drive unit for rotating the rotating unit is provided.
The drive unit that rotates the rotating unit is arranged between the rotating unit and the first detection unit.
The accommodating portion has a base portion to which the driving portion for rotating the rotating portion is attached.
The base portion
A first region facing the drive unit for rotating the rotating unit, and
With a second region facing the drive unit, which is different from the drive unit that rotates the rotating unit
Have,
The first detection unit is attached to the outer surface of the housing unit so as to face the driving unit that rotates the rotating unit via the housing unit in the first region different from the second region. apparatus. The first detection unit detects the vibration during the period during which the rotating unit is rotating, and outputs a vibration signal representing the vibration.
A determination unit that determines whether or not the level of the vibration signal exceeds a predetermined vibration range, and
The substrate processing apparatus according to claim 1, further comprising an execution unit that executes a predetermined process according to an affirmative determination by the determination unit. The substrate processing apparatus according to claim 2, wherein the predetermined process includes a process of issuing an alarm and / or a process of controlling the drive unit to stop the rotation of the rotating unit. Further, a storage unit for storing a first predetermined value indicating the value at one end of the predetermined vibration range and a second predetermined value indicating the value at the other end of the predetermined vibration range is provided.
The vibration signal includes a vibration component in the first direction with respect to a predetermined base level and a vibration component in the second direction opposite to the first direction with respect to the base level.
The first predetermined value is determined corresponding to the vibration component in the first direction.
The substrate processing apparatus according to claim 2 or 3, wherein the second predetermined value is determined corresponding to the vibration component in the second direction. The determination unit determines whether or not the number of times it is determined that the level of the vibration signal exceeds the predetermined vibration range is equal to or greater than a predetermined number within a predetermined time.
The predetermined number indicates a plurality,
The substrate processing apparatus according to any one of claims 2 to 4, wherein the executing unit executes the predetermined process according to an affirmative determination by the determination unit. The substrate processing apparatus according to any one of claims 2 to 5, wherein the predetermined vibration range differs depending on the number of rotations of the rotating portion per unit time. The vibration signal includes a vibration component in the first direction with respect to a predetermined base level and a vibration component in the second direction opposite to the first direction with respect to the base level.
A storage unit for storing a first threshold value and a second threshold value for comparison with the level of the vibration component is further provided.
The second threshold is larger than the first threshold,
The determination unit determines whether or not the absolute value of the level of the vibration component is larger than the first threshold value, and also determines whether or not the absolute value is larger than the second threshold value.
When it is determined that the absolute value is larger than the first threshold value and the absolute value is determined to be equal to or less than the second threshold value, the execution unit performs the first process as the predetermined process. The substrate processing apparatus according to claim 2 or 3, which is executed. The substrate processing apparatus according to claim 7, wherein the first processing includes a processing of stopping the rotation of the rotating portion after the processing being executed for the substrate is completed. Claim 7 or claim that when it is determined that the absolute value is larger than the second threshold value, the execution unit executes a second process different from the first process as the predetermined process. 8. The substrate processing apparatus according to 8. The substrate processing apparatus according to claim 9, wherein the second process includes a process of immediately stopping the rotation of the rotating portion in response to the determination that the absolute value is larger than the second threshold value. A second detection unit that detects the vibration including the vibration of the rotating unit via the driving unit that rotates the rotating unit is further provided.
The drive unit that rotates the rotating unit is arranged between the rotating unit and the second detection unit.
The second detection unit faces the drive unit that rotates the rotating unit, and is opposed to the driving unit.
The substrate processing apparatus according to claim 1, wherein the detection sensitivity of the first detection unit is higher than the detection sensitivity of the second detection unit. The first detection unit detects the vibration during the period during which the rotating unit is rotating, and outputs a first vibration signal representing the vibration.
The second detection unit detects the vibration during the period during which the rotating unit is rotating, and outputs a second vibration signal representing the vibration.
A determination unit that determines whether or not the level of the first vibration signal exceeds the first vibration range, and determines whether or not the level of the second vibration signal exceeds the second vibration range.
A claim that further includes an execution unit that determines a process to be executed after the determination based on a combination of the determination result for the first vibration signal and the determination result for the second vibration signal, and executes the determined process. 11. The substrate processing apparatus according to 11. The first vibration signal includes a vibration component in the first direction with respect to a predetermined first base level and a vibration component in the second direction opposite to the first direction with respect to the first base level. ,
The second vibration signal includes a vibration component in a third direction with respect to a predetermined second base level and a vibration component in a fourth direction opposite to the third direction with respect to the second base level. ,
Further, a storage unit for storing a third threshold value for comparing with the level of the vibration component of the first vibration signal and a fourth threshold value for comparing with the level of the vibration component of the second vibration signal is provided.
The determination unit determines whether or not the absolute value of the level of the vibration component of the first vibration signal is larger than the third threshold value, and the absolute value of the level of the vibration component of the second vibration signal is It is determined whether or not it is larger than the fourth threshold value, and it is determined.
When it is determined that the absolute value is larger than the third threshold value and the absolute value is determined to be equal to or less than the fourth threshold value, the execution unit performs a third process as the process to be executed after the determination. And
When it is determined that the absolute value is larger than the third threshold value and the absolute value is determined to be larger than the fourth threshold value, the execution unit performs the process to be executed after the determination. Execute 4 processes and
When the absolute value is determined to be equal to or lower than the third threshold value and the absolute value is determined to be larger than the fourth threshold value, the execution unit performs a fifth process as the process to be executed after the determination. 12. The substrate processing apparatus according to claim 12. Each of the third process, the fourth process, and the fifth process includes a process of issuing an alarm and / or a process of controlling the drive unit to stop the rotation of the rotating unit. Item 13. The substrate processing apparatus according to item 13. The substrate processing apparatus according to claim 13, wherein the third processing includes a processing of stopping the rotation of the rotating portion after the processing being executed for the substrate is completed. In the fourth process, it is determined that the absolute value is larger than the third threshold value, and in response to the determination that the absolute value is larger than the fourth threshold value, the rotation of the rotating portion is performed. Including processing to stop immediately
In the fifth process, in response to the determination that the absolute value is equal to or less than the third threshold value and the absolute value is determined to be larger than the fourth threshold value, the rotation of the rotating portion is immediately stopped. The substrate processing apparatus according to any one of claims 13 to 15, which includes the processing to be performed. A third detection unit for detecting the vibration of the housing unit is further provided.
The accommodating portion further has a wall portion and
The substrate processing apparatus according to claim 1, wherein the third detection unit is attached to the wall portion. The first detection unit detects the vibration including the vibration of the rotating unit during the period during which the rotating unit is rotating, and outputs a first vibration signal.
The third detection unit detects the vibration of the housing unit while the rotating unit is rotating, and outputs a third vibration signal.
A determination unit that determines whether or not the level of the first vibration signal exceeds the third vibration range, and determines whether or not the level of the third vibration signal exceeds the fourth vibration range.
A claim that further includes an execution unit that determines a process to be executed after the determination based on a combination of the determination result for the first vibration signal and the determination result for the third vibration signal, and executes the determined process. 17. The substrate processing apparatus according to 17. The first vibration signal includes a vibration component in the first direction with respect to a predetermined first base level and a vibration component in the second direction opposite to the first direction with respect to the first base level. ,
The third vibration signal includes a vibration component in the fifth direction with respect to a predetermined third base level and a vibration component in the sixth direction opposite to the fifth direction with respect to the third base level. ,
Further, a storage unit for storing a fifth threshold value for comparison with the level of the vibration component of the first vibration signal and a sixth threshold value for comparison with the level of the vibration component of the third vibration signal is provided.
The determination unit determines whether or not the absolute value of the level of the vibration component of the first vibration signal is larger than the fifth threshold value, and the absolute value of the level of the vibration component of the third vibration signal is It is determined whether or not it is larger than the sixth threshold value, and it is determined.
When it is determined that the absolute value is larger than the fifth threshold value and the absolute value is determined to be equal to or less than the sixth threshold value, the execution unit performs the sixth process as the process to be executed after the determination. And
When it is determined that the absolute value is larger than the fifth threshold value and the absolute value is determined to be larger than the sixth threshold value, the execution unit performs the process to be executed after the determination. Execute 7 processes and
When the absolute value is determined to be equal to or less than the fifth threshold value and the absolute value is determined to be larger than the sixth threshold value, the execution unit performs the eighth process as the process to be executed after the determination. 18. The substrate processing apparatus according to claim 18. Each of the sixth process, the seventh process, and the eighth process includes a process of issuing an alarm and / or a process of controlling the drive unit to stop the rotation of the rotating unit. Item 19. The substrate processing apparatus according to item 19. The substrate processing apparatus according to claim 19, wherein the sixth processing includes a processing for stopping the rotation of the rotating portion after the processing being executed for the substrate is completed. In the seventh process, the rotation of the rotating portion is performed in response to the determination that the absolute value is larger than the fifth threshold value and the absolute value is larger than the sixth threshold value. Including processing to stop immediately
In the eighth process, in response to the determination that the absolute value is equal to or less than the fifth threshold value and the absolute value is determined to be larger than the sixth threshold value, the rotation of the rotating portion is immediately stopped. The substrate processing apparatus according to any one of claims 19 to 21, which includes a process for processing. The substrate processing apparatus according to any one of claims 1 to 22, wherein the first detection unit is attached to a portion of the drive unit that rotates the rotating unit that is exposed from the accommodating unit.

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