JP6610476B2 - 容器収納設備 - Google Patents
容器収納設備 Download PDFInfo
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- JP6610476B2 JP6610476B2 JP2016176976A JP2016176976A JP6610476B2 JP 6610476 B2 JP6610476 B2 JP 6610476B2 JP 2016176976 A JP2016176976 A JP 2016176976A JP 2016176976 A JP2016176976 A JP 2016176976A JP 6610476 B2 JP6610476 B2 JP 6610476B2
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- H—ELECTRICITY
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
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- H—ELECTRICITY
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67379—Closed carriers characterised by coupling elements, kinematic members, handles or elements to be externally gripped
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67383—Closed carriers characterised by substrate supports
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67386—Closed carriers characterised by the construction of the closed carrier
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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Description
複数の収納部を収納部群として有する収納棚と、
前記収納部群を構成するそれぞれの前記収納部に対して、供給配管を介して気体供給源から浄化気体を供給する気体供給装置と、
前記収納部に対して容器を搬送する搬送装置と、
前記搬送装置の動作を制御する制御部と、を備え、
前記収納部群毎に、前記供給配管が、前記気体供給源に接続される接続部を含む接続領域と、前記接続領域よりも気体通流方向で下流側にある端部領域と、を含むとともに、前記接続部を含み当該接続部で前記気体供給源に接続される1つの主管と、前記主管から分岐してそれぞれ対応する前記収納部まで延びる複数の分岐管と、を有し、
前記接続領域及び前記端部領域の両方に亘って前記主管が設けられ、前記接続領域及び前記端部領域のそれぞれに前記分岐管が設けられ、
前記気体供給装置が、前記収納部群毎に、前記気体供給源と前記接続部との間に1つの流量調整部を備え、
前記供給配管の前記端部領域に設けられている前記分岐管から供給される前記浄化気体の流量が、前記供給配管の前記接続領域に設けられている前記分岐管から供給される前記浄化気体の流量よりも大きく、
前記制御部は、前記収納部群に含まれる全ての前記収納部に前記容器が収納されていない状態から最初に前記容器を収納するにあたり、前記供給配管の前記端部領域に設けられている前記分岐管から前記浄化気体が供給される前記収納部に対して前記容器を搬送するように前記搬送装置の動作を制御する。
前記供給配管が、前記接続領域の両側に2つの前記端部領域を含み、
前記制御部は、2つの前記端部領域のうち、前記接続部からの流路長が相対的に長い方の配管部における前記端部領域に設けられている前記分岐管から前記浄化気体が供給される前記収納部に対して最初に前記容器を搬送するように前記搬送装置の動作を制御することが好ましい。
前記制御部は、前記供給配管の下流側端部に設けられている前記分岐管から前記浄化気体が供給される前記収納部に対して最初に前記容器を搬送するように前記搬送装置の動作を制御することが好ましい。
前記制御部は、前記供給配管の前記接続領域に設けられている前記分岐管から前記浄化気体が供給される前記収納部に対して劣後的に前記容器を搬送するように前記搬送装置の動作を制御することが好ましい。
容器収納設備の第1実施形態について、図面を参照して説明する。本実施形態の容器収納設備1は、物品収納設備の一種であり、物品としての容器7を収容する。この容器収納設備1は、例えば工業製品の製造プロセスにおいて、工程待ち等の間に原料や中間製品等を一時的に保管したり、完成品を保管したりするために用いられる。
容器収納設備の第2実施形態について、図面を参照して説明する。本実施形態の容器収納設備1は、気体供給装置3に含まれる供給配管35の具体的構成が上記の第1実施形態とは異なっている。また、それに伴い、浄化気体の流量均一化のための物品収納制御の具体的処理内容も、上記の第1実施形態とは一部異なっている。以下、本実施形態に係る容器収納設備1について、主に第1実施形態との相違点について説明する。なお、特に明記しない点に関しては、第1実施形態と同様であり、同一の符号を付して詳細な説明は省略する。
(1)上記の各実施形態では、それぞれの収納部群Gにおいて当該収納部群Gに含まれる収納部Sに容器7を収納するにあたり、供給配管35の下流側端部35eから浄化気体が供給される収納部Sに対して最初に容器7を搬送する構成を主に想定して説明した。しかし、そのような構成に限定されることなく、例えば図14に示すように、端部領域Reのうち、下流側端部35e以外の位置に設けられた分岐管35Bから浄化気体が供給される収納部Sに対して最初に容器7を搬送しても良い。
2 収納棚
3 気体供給装置
4 搬送装置
5 制御部
7 容器
31 気体供給源
33 流量調整部
35 供給配管
35B 分岐管
35c 接続部
35e 下流側端部
S 収納部
G 収納部群
Rc 接続領域
Re 端部領域
Rep 近位側端部領域
Red 遠位側端部領域
Claims (4)
- 複数の収納部を収納部群として有する収納棚と、
前記収納部群を構成するそれぞれの前記収納部に対して、供給配管を介して気体供給源から浄化気体を供給する気体供給装置と、
前記収納部に対して容器を搬送する搬送装置と、
前記搬送装置の動作を制御する制御部と、を備え、
前記収納部群毎に、前記供給配管が、前記気体供給源に接続される接続部を含む接続領域と、前記接続領域よりも気体通流方向で下流側にある端部領域と、を含むとともに、前記接続部を含み当該接続部で前記気体供給源に接続される1つの主管と、前記主管から分岐してそれぞれ対応する前記収納部まで延びる複数の分岐管と、を有し、
前記接続領域及び前記端部領域の両方に亘って前記主管が設けられ、前記接続領域及び前記端部領域のそれぞれに前記分岐管が設けられ、
前記気体供給装置が、前記収納部群毎に、前記気体供給源と前記接続部との間に1つの流量調整部を備え、
前記供給配管の前記端部領域に設けられている前記分岐管から供給される前記浄化気体の流量が、前記供給配管の前記接続領域に設けられている前記分岐管から供給される前記浄化気体の流量よりも大きく、
前記制御部は、前記収納部群に含まれる全ての前記収納部に前記容器が収納されていない状態から最初に前記容器を収納するにあたり、前記供給配管の前記端部領域に設けられている前記分岐管から前記浄化気体が供給される前記収納部に対して前記容器を搬送するように前記搬送装置の動作を制御する容器収納設備。 - 前記供給配管が、前記接続領域の両側に2つの前記端部領域を含み、
前記制御部は、2つの前記端部領域のうち、前記接続部からの流路長が相対的に長い方の配管部における前記端部領域に設けられている前記分岐管から前記浄化気体が供給される前記収納部に対して最初に前記容器を搬送するように前記搬送装置の動作を制御する請求項1に記載の容器収納設備。 - 前記制御部は、前記供給配管の下流側端部に設けられている前記分岐管から前記浄化気体が供給される前記収納部に対して最初に前記容器を搬送するように前記搬送装置の動作を制御する請求項1又は2に記載の容器収納設備。
- 前記制御部は、前記供給配管の前記接続領域に設けられている前記分岐管から前記浄化気体が供給される前記収納部に対して劣後的に前記容器を搬送するように前記搬送装置の動作を制御する請求項1から3のいずれか一項に記載の容器収納設備。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016176976A JP6610476B2 (ja) | 2016-09-09 | 2016-09-09 | 容器収納設備 |
KR1020170113761A KR102428092B1 (ko) | 2016-09-09 | 2017-09-06 | 용기 수납 설비 |
US15/697,976 US10354898B2 (en) | 2016-09-09 | 2017-09-07 | Container storage facility |
CN201710805509.7A CN107808843B (zh) | 2016-09-09 | 2017-09-08 | 容器收纳设备 |
TW106130774A TWI738857B (zh) | 2016-09-09 | 2017-09-08 | 容器收納設備 |
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JP2016176976A JP6610476B2 (ja) | 2016-09-09 | 2016-09-09 | 容器収納設備 |
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JP2018041923A JP2018041923A (ja) | 2018-03-15 |
JP6610476B2 true JP6610476B2 (ja) | 2019-11-27 |
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JP2016176976A Active JP6610476B2 (ja) | 2016-09-09 | 2016-09-09 | 容器収納設備 |
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US (1) | US10354898B2 (ja) |
JP (1) | JP6610476B2 (ja) |
KR (1) | KR102428092B1 (ja) |
CN (1) | CN107808843B (ja) |
TW (1) | TWI738857B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6693356B2 (ja) * | 2016-09-09 | 2020-05-13 | 株式会社ダイフク | 物品搬送装置 |
US10703563B2 (en) * | 2017-11-10 | 2020-07-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Stocker |
JP7090513B2 (ja) * | 2018-09-06 | 2022-06-24 | 東京エレクトロン株式会社 | 基板処理装置及びパージ方法 |
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KR102247041B1 (ko) * | 2019-06-12 | 2021-04-30 | 세메스 주식회사 | 크레인 어셈블리 및 이를 포함하는 스토커 |
JP7322924B2 (ja) * | 2021-05-28 | 2023-08-08 | 株式会社ダイフク | 物品収容設備 |
US20230343621A1 (en) * | 2022-04-20 | 2023-10-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | High density semiconductor storage system |
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JP4692584B2 (ja) * | 2008-07-03 | 2011-06-01 | 村田機械株式会社 | パージ装置 |
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US10410894B2 (en) * | 2014-06-16 | 2019-09-10 | Murata Machinery, Ltd. | Purge stocker and purging method |
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