JP6601660B2 - OPTICAL ELEMENT AND DISPLAY DEVICE, ELECTRONIC DEVICE, AND LIGHTING DEVICE USING SAME - Google Patents

Description

  The present invention relates to an optical element that variably controls a range of an emission direction of transmitted light, and a display device, electronic apparatus, and illumination device using the optical element.

  Display devices such as liquid crystal display devices include televisions, personal computer monitors, notebook personal computers, feature phones, smartphones, tablet PCs, PDAs (Personal Digital Assistants) and other portable information processing terminals and ATMs (Automatic Tellers). It is used as information display means of various information processing apparatuses such as Machine.

In addition, display devices are required to have various light distribution characteristics as the display becomes larger and more versatile. In particular, from the viewpoint of information leakage, there is a request to limit the visible range so that it does not look into others or a request to prevent light from being emitted in unnecessary directions. An optical film capable of limiting (or emission range) has been proposed and put into practical use. However, when viewing a display device from multiple directions at the same time, it is necessary to remove the optical film each time, so there is a need to arbitrarily realize a state with a wide visible range and a narrow visible range without taking the trouble of removing it. Is growing.
In order to meet this type of request, an optical element that can switch the visible range of a display device between a wide-field mode and a narrow-field mode has been proposed.

As shown in FIG. 32, this optical element includes an electrophoretic element 140 composed of a dispersion material 142 and electrophoretic particles 141 between high-aspect-ratio light transmission regions 120 arranged on a substrate 110 independently in a plane. By arranging and controlling the dispersion state of the electrophoretic particles 141 in the electrophoretic element 140 by an electric field generated by an external voltage, a wide-field mode that emits light 650 in a wide range (see FIG. 32B). And a narrow-field mode (see FIG. 32A) for emitting the light 650 in a narrow range are arbitrarily realized.
This optical element uses, for example, a transparent substrate, a transparent photosensitive resin layer is applied, exposed, developed, and cured by heating to form a light transmission region 120, and the electrophoretic element 140 is formed between the light transmission regions. Is an optical element.

  FIG. 33 is a sectional view showing an optical element 900 according to related art. The optical element 900 includes a first transparent substrate 110, a transparent conductive film 123 formed on the surface of the first transparent substrate 110, and a plurality of light transmission regions formed on the upper surface of the transparent conductive film 123 so as to be separated from each other. 120, the electrophoretic element 140 disposed between these light transmission regions 120, and another transparent conductive film 125 disposed on the surface of the light transmission region 120 that is in contact with the light transmission region 120. And a second transparent substrate 115. This optical element 900 is disclosed in FIG.

US7,751,667 gazette

  However, in the related technique disclosed in FIG. 8 of Patent Document 1, both the transparent conductive film 123 and another transparent conductive film 125 are planar in the element regions of the first transparent substrate 110 and the second transparent substrate 115. Since the electrophoretic particles 141 in the electrophoretic element 140 are simultaneously moved in the same direction between the transparent conductive film 123 and another transparent conductive film 125, the operation can be realized stably. There is a problem that the mode is limited to two types, a narrow-field mode as shown in FIG. 32A and a wide-field mode as shown in FIG.

For example, as shown in FIGS. 39A and 39B, as shown in FIGS. 42A and 42B, the electrophoretic particles 141 in the electrophoretic element 140 are uniformly distributed in a narrow-field mode. FIG. 40A and FIG. 40B show a process in which the electrophoretic particles 141 in the electrophoretic element 140 are shifted to the state of the wide field mode in which they are aggregated in the vicinity of the transparent conductive film 123. Generation of an electric field by the transparent conductive film 123 and the transparent conductive film 125 is stopped in a state where the electrophoretic particles 141 in the element 140 are distributed in a section from the intermediate position between the transparent conductive film 123 and the transparent conductive film 125 to the transparent conductive film 123. By doing so, it is possible to obtain a temporary intermediate state, but thereafter, as shown in FIGS. 41 (a) and 41 (b), the electrophoretic particles 141 naturally diffuse and shift to the narrow-field mode. End up.
Further, this intermediate state is shown in FIG. 39 from the state of the wide-field mode in which the electrophoretic particles 141 in the electrophoretic element 140 are aggregated in the vicinity of the transparent conductive film 123 as shown in FIGS. As shown in FIGS. 43A and 43B, the process of transition to the state of the narrow-field mode in which the electrophoretic particles 141 in the electrophoretic element 140 are uniformly distributed is shown in FIGS. As shown, the electrophoretic particles 141 in the electrophoretic element 140 are distributed in a section from the intermediate position between the transparent conductive film 123 and the transparent conductive film 125 to the transparent conductive film 123. This can also be realized by stopping the generation of the electric field, but thereafter, as shown in FIGS. 44 (a) and 44 (b), the electrophoretic particles 141 naturally diffuse, and the mode is changed to the narrow field mode.

  As described above, an intermediate state between the narrow-field mode and the wide-field mode can be temporarily realized in the process of mode transition, but the electrophoretic particle 141 is intermediate between the wide-field mode and the narrow-field mode. Therefore, it is difficult to stably maintain an intermediate mode that is an intermediate state between the narrow field mode and the wide field mode.

  Accordingly, an object of the present invention is to provide an optical element capable of stably realizing an intermediate mode which is an intermediate state between both modes in addition to a narrow-field mode and a wide-field mode, and a display device and an electronic apparatus using the optical element It is to provide a lighting device.

In order to achieve the above object, an optical element according to the present invention is an optical element capable of controlling a light passing angle, and includes a first transparent substrate and a second transparent substrate that faces the first transparent substrate. Transparent substrate, a first conductive pattern and a second conductive pattern disposed on a surface of the first transparent substrate with respect to the second transparent substrate, and the first transparent substrate from the surface of the first transparent substrate. A light transmission region that is singly disposed between the first conductive pattern and the second conductive pattern so as to reach the surface of the second transparent substrate, and the pattern crosses the element region; An electrophoretic particle having a specific surface charge and light-shielding property, disposed between the transparent conductive film disposed on the surface of the second transparent substrate with respect to the first transparent substrate and the adjacent light transmission region And an electrophoretic element comprising a permeable dispersion material, Yes, and wherein the gap between the light transmitting region adjacent said electrophoretic particles said sandwiched between the transparent conductive film and the first conductive pattern is disposed region, and the transparent conductive film The regions where the electrophoretic particles sandwiched between the second conductive patterns are alternately provided, and the potentials of the first conductive pattern, the second conductive pattern, and the transparent conductive film are set. It is characterized by controlling light transmission or shading in the gap by controlling .

  According to the present invention, it is possible to operate electrophoretic particles for each conductive pattern by independently controlling a plurality of series of conductive patterns arranged on the first transparent substrate. In addition to the wide-field mode, an intermediate mode having characteristics intermediate between both modes can be stably realized regardless of the passage of time.

1 is a diagram illustrating an optical element according to Embodiment 1 in a narrow-field mode, in which FIG. 1A is a longitudinal sectional view showing the optical element cut along a plane orthogonal to the display surface of the optical element, and FIG. (B) is the surface figure which showed the display surface from the normal line direction. FIG. 2A is a diagram illustrating the optical element of Embodiment 1 in an intermediate mode state, and FIG. 2A is a longitudinal sectional view showing the optical element cut along a plane orthogonal to the display surface of the optical element, and FIG. b) is a surface view showing the display surface from the normal direction. FIG. 3A is a diagram illustrating the optical element according to Embodiment 1 in a wide-field mode, and FIG. 3A is a longitudinal sectional view illustrating the optical element cut along a plane orthogonal to the display surface of the optical element. (B) is the surface figure which showed the display surface from the normal line direction. FIG. 4A is a cross-sectional view illustrating the manufacturing method of the optical element of Embodiment 1 step by step, and FIG. 4A is a process of forming a first conductive pattern and a second conductive pattern on the surface of the first transparent substrate. FIG. 4B is a longitudinal cross-sectional view schematically showing the process of forming a transparent photosensitive resin layer as a negative photoresist film serving as a light transmission region, and FIG. FIG. 4C is a simplified vertical sectional view showing the process of exposing the transparent photosensitive resin layer through the photomask, and FIG. 4D is a simplified process of forming the light transmission region by developing the transparent photosensitive resin layer. FIG. 4E is a longitudinal sectional view schematically showing the process of disposing a second transparent substrate having a transparent conductive film on the surface of the light transmission region, and FIG. The first conductive pattern and the second conductive pattern Is a longitudinal sectional view showing a simplified for filling an electrophoretic element in the gap between the over emissions and the transparent conductive film and the light transmissive region. FIG. 5A is a cross-sectional view showing another manufacturing method of the optical element of Embodiment 1 step by step, and FIG. 5A shows the formation of the first conductive pattern and the second conductive pattern on the surface of the first transparent substrate. FIG. 5B is a vertical cross-sectional view schematically showing the process of forming a transparent photosensitive resin layer as a negative photoresist film serving as a light transmission region, and FIG. 5 (c) is a longitudinal sectional view schematically showing the process of exposing the transparent photosensitive resin layer through a photomask, and FIG. 5 (d) shows the process of developing the transparent photosensitive resin layer to form a light transmission region. FIG. 5E is a simplified vertical cross-sectional view showing a process of filling an electrophoretic element in the gap between the first conductive pattern, the second conductive pattern, the transparent conductive film, and the light transmission region. Fig. 5 f) is a longitudinal sectional view showing a simplified for placing a second transparent substrate having a transparent conductive film on the surface of the light transmission region. FIG. 6A is a cross-sectional view showing still another manufacturing method of the optical element of Embodiment 1, step by step, and FIG. 6A is a simplified vertical section showing a process of forming a transparent conductive film on the surface of the second transparent substrate. FIG. 6B is a longitudinal sectional view schematically showing the process of forming a transparent photosensitive resin layer on the transparent conductive film, and FIG. 6C is a transparent photosensitive resin layer using a mask pattern. 6D is a simplified vertical cross-sectional view of the patterning process, FIG. 6D is a simplified vertical cross-sectional view of the steps of exposure, development, and annealing, and FIG. 6E is the light transmission region. FIG. 6F is a simplified vertical sectional view showing the step of arranging the first transparent substrate having the first conductive pattern and the second conductive pattern. FIG. 6F shows the first transparent substrate and the second transparent substrate. The process of filling the gap between the transparent substrates with the electrophoretic element Is a longitudinal sectional view showing a simplified. FIGS. 7A and 7B are diagrams showing an optical element of Embodiment 3, in which FIG. 7A is a longitudinal sectional view showing the optical element in a narrow-field mode state, and FIG. 7B is an intermediate mode state. FIG. 7C is a longitudinal sectional view showing the optical element in a wide-field mode state. FIG. 8A is a longitudinal sectional view showing the optical element of Embodiment 4 in a narrow-field mode state, and FIG. 8B shows the optical element in an intermediate mode state. FIG. 8C is a longitudinal sectional view showing the optical element in a wide-field mode. FIG. 9A is an operation principle diagram showing a state in which the narrow-field mode is selected in the optical element of Embodiment 1. FIG. 9A is a plan view showing a dispersion state of electrophoretic particles in the electrophoretic element, and FIG. FIG. 9B is a longitudinal sectional view thereof, and FIG. 9C is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. FIG. 10A is an operation principle diagram showing a state in which the intermediate mode is selected in the optical element of Embodiment 1. FIG. 10A is a plan view showing a dispersion state of electrophoretic particles in the electrophoretic element, and FIG. ) Is a longitudinal sectional view thereof, and FIG. 10C is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. FIG. 11A is an operation principle diagram showing a state in which the wide-field mode is selected in the optical element of Embodiment 1, FIG. 11A is a plan view showing a dispersion state of electrophoretic particles in the electrophoretic element, and FIG. b) is a longitudinal sectional view thereof, and FIG. 11C is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. It is a figure which shows the positional relationship of the light transmissive area | region in the optical element of Embodiment 1, a 1st conductive pattern, and a 2nd conductive pattern, Fig.12 (a) is the top view, FIG.12 (b) ) Is a perspective view thereof. It is a longitudinal cross-sectional view which shows the optical element of Embodiment 2 in the state of a narrow visual field mode. FIGS. 14A and 14B are cross-sectional views illustrating a method of manufacturing an optical element according to Embodiment 2 step by step, and FIG. 14A is a process of forming a first conductive pattern and a second conductive pattern on the surface of a first transparent substrate. FIG. 14B is a vertical cross-sectional view schematically showing the process of forming the transparent photosensitive resin layer on the surface of the first transparent substrate, and FIG. The process of patterning the transparent photosensitive resin layer by irradiating exposure light from the back side of the first transparent substrate using the first conductive light-shielding pattern and the second conductive light-shielding pattern as a photomask is shown in a simplified manner. FIG. 14 (d) is a longitudinal sectional view showing a simplified process of forming a light transmission region by developing a transparent photosensitive resin layer, and FIG. 14 (e) is transparent on the surface of the light transmission region. Second transparent substrate provided with a conductive film FIG. 14F is a vertical cross-sectional view schematically showing the process of arranging the electrophoretic element in the gap between the first conductive pattern, the second conductive pattern, the transparent conductive film, and the light transmission region. It is the longitudinal cross-sectional view simplified about the process of filling. It is a longitudinal cross-sectional view which shows the optical element of Embodiment 5 in the state of a narrow visual field mode. It is a longitudinal cross-sectional view which shows the optical element of Embodiment 5 in the state of the 1st intermediate mode. It is a longitudinal cross-sectional view which shows the optical element of Embodiment 5 in the state of a 2nd intermediate mode. It is a longitudinal cross-sectional view which shows the optical element of Embodiment 5 in the state of a wide visual field mode. FIG. 19A is an operation principle diagram showing a state in which a narrow-field mode is selected in the optical element of Embodiment 5, and FIG. 19A is a plan view showing a dispersion state of electrophoretic particles in the electrophoretic element, and FIG. FIG. 19B is a longitudinal sectional view thereof, and FIG. 19C is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. FIG. 20A is an operation principle diagram showing a state in which the first intermediate mode is selected in the optical element of Embodiment 5, and FIG. 20A is a plan view showing a dispersion state of electrophoretic particles in the electrophoretic element, and FIG. FIG. 20B is a longitudinal sectional view thereof, and FIG. 20C is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. FIG. 21A is an operation principle diagram showing a state where the second intermediate mode is selected in the optical element of Embodiment 5, and FIG. 21A is a plan view showing a dispersion state of electrophoretic particles in the electrophoretic element, and FIG. FIG. 21B is a longitudinal sectional view thereof, and FIG. 21C is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersed state of the electrophoretic particles. FIG. 22A is an operation principle diagram showing a state where the wide-field mode is selected in the optical element of Embodiment 5, and FIG. 22A is a plan view showing a dispersion state of electrophoretic particles in the electrophoretic element, and FIG. FIG. 22B is a longitudinal sectional view thereof, and FIG. 22C is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. It is a figure which shows the positional relationship of the light transmissive area | region in the optical element of Embodiment 5, a 1st electroconductive pattern, and a 2nd, 3rd electroconductive pattern, and Fig.23 (a) is the top view, Moreover, FIG. 23B is a perspective view thereof. It is the longitudinal cross-sectional view shown in the state by which the narrow-field mode was selected about the structural example at the time of providing the protective cover film | membrane in the optical element of Embodiment 5. FIG. It is the longitudinal cross-sectional view shown in the state in which the 1st intermediate mode was selected about the structural example at the time of providing the protective cover film | membrane in the optical element of Embodiment 5. FIG. It is the longitudinal cross-sectional view shown in the state in which the 2nd intermediate mode was selected about the structural example at the time of providing the protective cover film | membrane in the optical element of Embodiment 5. FIG. It is the longitudinal cross-sectional view shown in the state with which the wide-field mode was selected about the structural example at the time of providing the protective cover film | membrane in the optical element of Embodiment 5. FIG. It is the longitudinal cross-sectional view shown in the state in which the narrow-field mode was selected about the structural example at the time of providing the protective cover film and the 2nd protective cover film in the optical element of Embodiment 5. It is the longitudinal cross-sectional view shown in the state in which the 1st intermediate | middle mode was selected about the structural example at the time of providing the protective cover film and the 2nd protective cover film in the optical element of Embodiment 5. It is the longitudinal cross-sectional view shown in the state from which the 2nd intermediate mode was selected about the structural example at the time of providing the protective cover film and the 2nd protective cover film in the optical element of Embodiment 5. It is the longitudinal cross-sectional view shown in the state in which the wide-field mode was selected about the structural example at the time of providing the protective cover film and the 2nd protective cover film in the optical element of Embodiment 5. FIG. 32A is a longitudinal cross-sectional view showing the operation principle of an optical element according to the related art, FIG. 32A shows the state of the electrophoretic element in the narrow field mode, and FIG. 32B shows the state of the electrophoretic element in the wide field mode. Shows about. It is a longitudinal cross-sectional view which shows the structure of the optical element of related technology. It is sectional drawing which shows the structure of the display apparatus which provided the optical element in other embodiment in the display screen. It is sectional drawing which shows the structure of the display apparatus which fixed the optical element in other embodiment to the display screen. It is sectional drawing which shows the structure of the display apparatus which mounts the optical element in other embodiment inside. It is sectional drawing which shows the structure of the display apparatus which fixed the optical element in other embodiment inside. It is sectional drawing which shows the structure of the illumination optical apparatus which mounts the optical element in other embodiment. FIG. 39A is a principle diagram showing a state in which the narrow-field mode is selected in the related art optical element. FIG. 39A is a longitudinal sectional view showing a dispersion state of the electrophoretic particles in the electrophoretic element, and FIG. b) is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. FIG. 40A is a principle diagram showing an intermediate state when shifting from the narrow-field mode to the wide-field mode in the related art optical element. FIG. 40A shows the dispersion state of the electrophoretic particles in the electrophoretic element. FIG. 40B is a longitudinal sectional view, and FIG. 40B is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. FIG. 41A is an operation principle diagram showing the behavior of electrophoretic particles after the generation of an electric field is stopped in an intermediate state when shifting from the narrow-field mode to the wide-field mode in the related art optical element. Is a longitudinal sectional view showing the dispersion state of the electrophoretic particles in the electrophoretic element, and FIG. 41B is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. . FIG. 42A is a principle diagram showing a state in which the wide-field mode is selected in the related art optical element. FIG. 42A is a longitudinal sectional view showing a dispersion state of the electrophoretic particles in the electrophoretic element, and FIG. b) is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. FIG. 43 (a) shows the dispersion state of the electrophoretic particles in the electrophoretic element. FIG. 43 (a) is an operation principle diagram showing an intermediate state when shifting from the wide-field mode to the narrow-field mode in the related art optical element. FIG. 43B is a longitudinal sectional view, and FIG. 43B is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. FIG. 44A is an operation principle diagram showing the behavior of the electrophoretic particles after the generation of the electric field is stopped in an intermediate state when shifting from the wide-field mode to the narrow-field mode in the related art optical element. Fig. 44 is a longitudinal sectional view showing the dispersion state of the electrophoretic particles in the electrophoretic element, and Fig. 44 (b) is a diagram showing the relationship between the emission angle and the luminance corresponding to the dispersion state of the electrophoretic particles. . FIG. 45 is a longitudinal cross-sectional view showing the potential of the first and second conductive patterns and the transparent conductive film in the optical element of Embodiment 1, and FIG. 45A shows the state of the narrow-field mode in FIG. Shows the state of the intermediate mode, and FIG. 45C shows the state of the wide-field mode. It is a figure which shows the electronic device in the other embodiment, Fig.46 (a) shows the apparatus input with a touchscreen, FIG.46 (b) has shown about the apparatus input with a touchscreen, a keyboard, and a mouse | mouth. FIG. 5 is a longitudinal sectional view showing a case where the relative positions of the first and second conductive patterns and the light transmission region are shifted in the optical element of Embodiment 1. FIG. 48 is a longitudinal sectional view showing the state of potentials of the first, second, and third conductive patterns and the transparent conductive film in the optical element of Embodiment 5, and FIG. FIG. 48B shows the state of the first intermediate mode, FIG. 48C shows the state of the second intermediate mode, and FIG. 48D shows the state of the wide field mode. Other configurations of the optical element in the case where the first and second conductive patterns and the arrangement of the light transmissive regions in the optical element of Embodiment 1 are applied to realize the visible angle limitation in the four directions of up, down, left, and right It is the surface figure which showed the structure from the normal line direction of the display surface about the example. Still another optical element in the case where the first conductive pattern and the second conductive pattern in the optical element according to the first embodiment and the arrangement of the light transmission region are applied to limit the visible angle in four directions, up, down, left, and right. It is the surface figure which showed the structure about the structural example from the normal line direction of the display surface. Still another optical element in the case where the first conductive pattern and the second conductive pattern in the optical element according to the first embodiment and the arrangement of the light transmission region are applied to limit the visible angle in four directions, up, down, left, and right. It is the surface figure which showed the structure about the structural example from the normal line direction of the display surface. In the optical element of Embodiment 1, it is the figure which showed the structure by which all the both ends of the stripe-shaped light transmission area | region were sealed with resin, FIG. 52 (a) is the top view, FIG. ) Is a perspective view thereof. In the optical element of Embodiment 1, it is the figure which showed the structure by which resin is arrange | positioned at all the outer periphery of the stripe-shaped light transmission area | region. In the optical element of Embodiment 6, in all element regions where the first conductive pattern and the second conductive pattern are not arranged, the surface of the first transparent substrate reaches the surface of the second transparent substrate. FIG. 54 (a) is a plan view thereof, and FIG. 54 (b) is a perspective view thereof.

  Hereinafter, embodiments for carrying out the present invention (hereinafter referred to as “embodiments”) will be described with reference to the drawings. In the present specification and drawings, the same reference numerals are used for substantially the same components. Moreover, the shape drawn on drawing does not necessarily correspond with an actual dimension and ratio.

[Embodiment 1]
FIG. 1 is a diagram showing the optical element of Embodiment 1 in a state of a narrow field mode, in which FIG. 1A is a longitudinal section showing the optical element cut along a plane orthogonal to the display surface of the optical element. FIG. 1B is a surface view showing the display surface from the normal direction. FIG. 2 is a diagram showing the optical element of Embodiment 1 in an intermediate state between the narrow-field mode and the wide-field mode (hereinafter referred to as an intermediate mode). Of these, FIG. FIG. 2B is a front view showing the display surface from the normal direction. FIG. 2B is a longitudinal sectional view showing the optical element cut along a surface orthogonal to the display surface. FIG. 3 is a diagram showing the optical element of Embodiment 1 in the state of the wide field mode. Among these, FIG. 3A is a longitudinal section showing the optical element cut along a plane orthogonal to the display surface of the optical element. FIG. 3B is a surface view showing the display surface from the normal direction. Details of the optical element of Embodiment 1 will be described below.
Hereinafter, the case where the surface charge of the electrophoretic particle is (−) will be described. However, when the surface charge of the electrophoretic particle is (+), it can be dealt with by reversing the polarity of the electrode.

The optical element 100 according to the first embodiment includes a first transparent substrate 110, a second transparent substrate 115 that faces the first transparent substrate 110, and a second transparent substrate 115 of the first transparent substrate 110. The first conductive pattern 250 and the second conductive pattern 270 disposed on the surface of the first transparent substrate 110, and the first conductive pattern so as to reach the surface of the second transparent substrate 115 from the surface of the first transparent substrate 110 250 and the second conductive pattern 270, and the light transmission region 120 in which the pattern crosses the element region, and the second transparent substrate 115 with respect to the first transparent substrate 110 An electrophoretic element, which is disposed between a transparent conductive film 125 disposed on a surface and an adjacent light transmission region 120 and has a specific surface charge and includes light-shielding electrophoretic particles 141 and a transmissive dispersion material 142. It is equipped with a 140.
The light transmission region 120 is a structure (transparent resin pattern) provided so that the lower surface 121 and the upper surface 122 reach the first transparent substrate 110 and the second transparent substrate 115, respectively. The shape of the direction is continuous across the entire region in the horizontal direction of the element region, that is, the direction perpendicular to the paper surface in FIG. 1A and the vertical direction in FIG. 1B. Is the same as the edge of the element region. It should be noted that there is no problem even if the end position of the pattern extends outside the end of the element region. This also applies to the following embodiments.
The first conductive pattern 250 and the second conductive pattern 270 are also continuous over the entire area in the lateral direction of the element region, similarly to the light transmission region 120.

  More specifically, the optical element 100 according to the first embodiment includes a first transparent substrate 110, a second transparent substrate 115 that is opposed to the first transparent substrate 110 at an interval, and a first transparent substrate 110. In the transparent substrate 110, the first conductive pattern 250 and the second conductive material which are arranged in parallel and alternately on the surface of the transparent substrate 110 facing the second transparent substrate 115 at regular intervals and cross the element region. The pattern 270 is disposed between the first conductive pattern 250 and the second conductive pattern 270 so as to reach the surface of the second transparent substrate 115 from the surface of the first transparent substrate 110 and crosses the device region. Between the adjacent light transmission region 120 and the transparent conductive film 125 disposed over the entire surface of the second transparent substrate 115 on the side facing the first transparent substrate 110. And An optical element having an electrophoretic element 140 consisting of the electrophoretic particles 141 of and light-shielding tinged with constant surface charge transmissive dispersion material 142.

In the narrow-field mode of FIGS. 1A and 1B, the first conductive pattern 250, the second conductive pattern 270, and the transparent conductive film 125 are set to the same potential by operating the voltage application control means 145. Thus, the electrophoretic particles 141 in the electrophoretic element 140 disposed in the gaps between the light transmission regions 120 are uniformly dispersed in the dispersion material 142 (see FIG. 45A). In the narrow-field mode, as shown in FIGS. 9A and 9B, between the transparent conductive film 125 and the first conductive pattern 250 and between the transparent conductive film 125 and the second conductive pattern 270. In all cases, since the electrophoretic particles 141 are uniformly dispersed in the dispersion material 142, all the gaps between the adjacent light transmission regions 120 are in a light-shielded state, as shown in FIGS. 9B and 9C. A narrow visible range will be realized.
On the other hand, in the intermediate mode of FIGS. 2A and 2B, the surface charge of the electrophoretic particles 141 is obtained by changing the relative potential of the transparent conductive film 125 with respect to the first conductive pattern 250 by operating the voltage application control unit 145. This is realized by aggregating the electrophoretic particles 141 in the vicinity of the surface of the first conductive pattern 250 (see FIG. 45B). At this time, the second conductive pattern 270 and the transparent conductive film 125 are at the same potential (see FIG. 45B), and between the transparent conductive film 125 and the second conductive pattern 270, FIG. ) And (b), the electrophoretic particles 141 are uniformly dispersed in the dispersion material 142. Accordingly, since the gap between the adjacent light transmission regions 120 can be transmitted through the electrophoretic element 140 in an oblique direction at a rate of one row out of two rows, as shown in FIGS. 10B and 10C. A wider visible range than the narrow field mode is realized.
3A and 3B, the electrophoretic particles 141 are moved to the vicinity of the surfaces of the first conductive pattern 250 and the second conductive pattern 270 by the operation of the voltage application control means 145. This is realized by agglomeration (see FIGS. 11A and 11B). At this time, the first conductive pattern 250 and the second conductive pattern 270 are at the same potential (see FIG. 45C), and the transparent conductive with respect to the first conductive pattern 250 and the second conductive pattern 270 is performed. The relative potential of the film 125 has the same polarity as the surface charge of the electrophoretic particles 141 (see FIG. 45C), and the electrophoretic particles 141 are dispersed between the transparent conductive film 125 and the first conductive pattern 250. The electrophoretic particles 141 aggregate into the first conductive pattern 250 in the dispersion material 142 between the transparent conductive film 125 and the second conductive pattern 270. Aggregate. Therefore, in the wide-field mode, light can be transmitted in an oblique direction in all the gaps between the adjacent light transmission regions 120. Therefore, as shown in FIGS. A wider visible range is achieved.
Thus, the potentials of the first conductive pattern 250, the second conductive pattern 270, and the transparent conductive film 125 by the voltage application control means 145 as shown in FIGS. 45 (a), (b), and (c). Can be controlled to realize display in the narrow field mode, intermediate mode, and wide field mode. The voltage application control unit 145 adjusts the voltage applied to the first conductive pattern 250, the second conductive pattern 270, and the transparent conductive film 125 according to a signal from the outside, and the first conductive pattern 250, This is means for changing the polarities of the second conductive pattern 270 and the transparent conductive film 125.

As described above, the two conductive patterns of the first conductive pattern 250 and the second conductive pattern 270 are arranged in parallel and alternately on the surface of the first transparent substrate 110, and the transparent conductive film 125 and each of the conductive patterns By independently controlling the potential difference between the conductive patterns 250 and 270 of the system by the voltage application control means 145,
In the narrow-field mode of FIGS. 1A and 1B, as shown in FIG. 45A, the first conductive pattern 250, the second conductive pattern 270, and the transparent conductive film 125 are all at the same potential. As a result, the electrophoretic particles 141 in all the electrophoretic elements 140 are uniformly dispersed,
2A and 2B, as shown in FIG. 45B, the relative potential of the transparent conductive film 125 with respect to the first conductive pattern 250 is set to the surface charge of the electrophoretic particles 141. The electrophoretic particles 141 in the electrophoretic element 140 between the first conductive pattern 250 and the transparent conductive film 125 are aggregated in the vicinity of the surface of the first conductive pattern 250, while the second polarity is The electrophoretic particles 141 in the electrophoretic element 140 between the second conductive pattern 270 and the transparent conductive film 125 are dispersed throughout the dispersion material 142 by setting the conductive pattern 270 and the transparent conductive film 125 to the same potential. Thus, the electrophoretic particles 141 are aggregated into the conductive pattern every other row in the pattern composed of the first conductive pattern 250 and the second conductive pattern 270. Realized deliberately dispersed state,
3A and 3B, as shown in FIG. 45C, the first conductive pattern 250 and the second conductive pattern 270 are set to the same potential, and the first By making the relative potential of the transparent conductive film 125 with respect to the conductive pattern 250 and the second conductive pattern 270 the same polarity as the surface charge of the electrophoretic particles 141, the first conductive pattern 250 and the second conductive pattern 250 In all the electrophoretic elements 140 between the pattern 270 and the transparent conductive film 125, the electrophoretic particles 141 are aggregated in the vicinity of the surfaces of the first conductive pattern 250 and the second conductive pattern 270, that is, the first The state in which the electrophoretic particles 141 are aggregated into the conductive pattern in all the rows of the pattern composed of the conductive pattern 250 and the second conductive pattern 270. To the current.

As described above, the optical element 100 according to the first embodiment is different from the related art as shown in FIGS. 40A and 43A, and is intermediate between the transparent conductive film 123 and the transparent conductive film 125. A known technical idea of retaining the electrophoretic particles 141 in a section from the position to the transparent conductive film 123, that is, a light shielding means for shielding light between adjacent light transmission regions 120 (the electrophoretic particles 141 of the dispersion material 142 are The technical idea on the premise of realizing the intermediate mode by changing the height of the dispersed part)
The state in which the electrophoretic particles 141 between the first conductive pattern 250 and the transparent conductive film 125 are completely dispersed between the first conductive pattern 250 and the transparent conductive film 125, that is, the first A state in which the light transmission regions 120 sandwiching the conductive pattern 250 are shielded by light shielding means (electrophoretic particles 141 dispersed over the entire region of the dispersion material 142), the first conductive pattern 250, the transparent conductive film 125, In a state where the electrophoretic particles 141 between the two are aggregated in the vicinity of the first conductive pattern 250, that is, in a state where the light shielding means between the light transmission regions 120 sandwiching the first conductive pattern 250 is removed. Select one of them,
The state in which the electrophoretic particles 141 between the second conductive pattern 270 and the transparent conductive film 125 are completely dispersed between the second conductive pattern 270 and the transparent conductive film 125, that is, the second A state in which the light transmission regions 120 sandwiching the conductive pattern 270 are shielded by light shielding means (electrophoretic particles 141 dispersed over the entire region of the dispersion material 142), the second conductive pattern 270, the transparent conductive film 125, In a state where the electrophoretic particles 141 in the middle are aggregated in the vicinity of the second conductive pattern 270, that is, in a state where the light shielding means between the light transmission regions 120 sandwiching the second conductive pattern 270 is removed. Select one of them,
By changing the mode of combination of these two selected states, there is a light shielding means (electrophoretic particles 141 dispersed over the entire region of the dispersion material 142) that shields light by separating between a series of light transmission regions 120. Since it is configured to adjust the angle of light that can pass obliquely through the optical element 100 by changing the interval, in addition to the narrow-field mode and wide-field mode, the intermediate mode is particularly stable regardless of the passage of time. Can be maintained.
The reason is that the state change due to the diffusion of the electrophoretic particles 141 does not occur even when time elapses.
In summary, the electrophoretic particles 141 are controlled by independently controlling the first conductive pattern 250 and the second conductive pattern 270 which are a plurality of conductive patterns arranged on the first transparent substrate 110. Can be operated for each of the conductive patterns 250 and 270, and the light shielding means (dispersion) can be performed by separating the light transmission regions 120 from each other without dispersing the electrophoretic particles 141 in a halfway state. The angle of light that can pass obliquely through the optical element 100 can be adjusted by variously changing the intervals at which the electrophoretic particles 141) dispersed over the entire region of the material 142 exist. In addition to the wide-field mode, it can be said that an intermediate mode having characteristics intermediate between both modes can be stably realized regardless of the passage of time.

The optical element 100 shown in FIGS. 1 to 3 has a structure capable of limiting the visible angle in two directions (for example, left and right directions) in the narrow field mode. When it is necessary to limit the visible angles in four directions (for example, up, down, left, and right directions) in the narrow field mode, the structure shown in any of FIGS. 49 to 51 may be used.
In FIG. 49, each of the first conductive pattern 250 and the second conductive pattern 270 is connected to the main portions 250a and 270a traversing the element region and the main portions 250a and 270a in an orthogonal state. 270a from the main portions 250a and 270a to the immediate vicinity of the main portions 270a and 250a, and the main portions 250a and 270a are shifted in pitch at a constant pitch so as to be aligned in a straight line along the extending direction of the main portions 250a and 270a. A plurality of sub-parts 250b and 270b formed on both sides of the parts 250a and 270a, and the sub-parts 250b of the adjacent first conductive pattern 250 and the sub-parts 270b of the second conductive pattern 270 are parallel and It is an example arrange | positioned so that it may align on a straight line alternately.
In FIG. 50, each of the first conductive pattern 250 and the second conductive pattern 270 is connected to the main portions 250a and 270a traversing the element region and the main portions 250a and 270a in an orthogonal state. 270a from the main portions 250a and 270a to the immediate vicinity of the main portions 270a and 250a, and aligned in a straight line along the extending direction of the main portions 250a and 270a without shifting the pitch at a constant pitch. It has a plurality of sub-parts 250b and 270b formed on both sides of the main parts 250a and 270a, and the sub-parts 250b of the adjacent first conductive pattern 250 and the sub-parts 270b of the second conductive pattern 270 are parallel to each other. In this example, they are alternately arranged on a straight line.
In FIG. 51, each of the first conductive pattern 250 and the second conductive pattern 270 is orthogonal to the first straight portions 250c and 270c and the first straight portions 250c and 270c extending in the direction crossing the element region. The second linear portions 250d and 270d extending in one direction are repeated, and the length of the first linear portion 250c of the first conductive pattern 250 and the length of the first linear portion 270c of the second conductive pattern 270 are included. In this example, the length of the second straight line portion 250d of the first conductive pattern 250 and the length of the second straight line portion 270d of the second conductive pattern 270 are the same.

49 and 50, the main portion 250a of the first conductive pattern 250 and the second conductive pattern 270 are the same as the example of the optical element 100 shown in FIGS. The main portions 270a are arranged in parallel and alternately so as to cross the element region at regular intervals, and the sub portions 250b of the first conductive pattern 250 and the sub portions 270b of the second conductive pattern 270 are arranged. Are arranged in parallel and alternately so as to cut through the element region in a direction perpendicular to the main part 250a and the main part 270a, so that in the narrow field mode, the combination of the main part 250a and the main part 270a parallel to each other in the upper and lower directions Further, the combination of the parallel sub part 250b and the sub part 270b makes it possible to limit the visible angle in two left and right directions, that is, in four convenient directions.
51, the first straight portion 250c constituting a part of the first conductive pattern 250 and the first straight portion 270c constituting a part of the second conductive pattern 270 are constant. Of the second linear pattern 250d and the second conductive pattern 270, which are arranged in parallel and alternately so as to cross the element region with an interval of the second linear portion 250d and part of the first conductive pattern 250. The second straight part 270d constituting the part is orthogonal to the first straight part 250c constituting a part of the first conductive pattern 250 and the first straight part 270c constituting a part of the second conductive pattern 270. Since the first straight line portions 250c and the first straight line portions 270c are parallel to each other, the left and right directions are combined, and the second straight line portions 250d and the second straight line portions 270d are parallel. Up and down Two directions, that is, similar to the above, it is possible to four directions of the viewing angle limited in a narrow field of view mode.

  FIG. 4 is a cross-sectional view illustrating a method for manufacturing the optical element 100 of the first embodiment. Hereinafter, an outline of an example of a method for manufacturing the optical element 100 of Embodiment 1 will be described.

  The manufacturing method of the optical element 100 of Embodiment 1 includes the following steps.

A step of forming the first conductive pattern 250 and the second conductive pattern 270 on the surface of the first transparent substrate 110, respectively (see FIG. 4A).
A step of forming a transparent photosensitive resin layer 150 as a negative photoresist film that becomes the light transmission region 120 (see FIG. 4B).
A step of exposing the transparent photosensitive resin layer 150 by irradiating the transparent photosensitive resin layer 150 with the exposure light 165 through the photomask 160 provided with the mask pattern 161 (see FIG. 4C). At this time, the positions of the photomask 160 and the first transparent substrate 110 are controlled so that the positions of the first conductive pattern 250 and the second conductive pattern 270 overlap with the mask pattern 161.
A step of developing the exposed transparent photosensitive resin layer 150 to form a plurality of light transmission regions 120 spaced apart from each other (see FIG. 4D).
A step of disposing a second transparent substrate 115 provided with a transparent conductive film 125 so as to be in close contact with the surface of the light transmission region 120 (see FIG. 4E).
Then, a step of filling the electrophoretic element 140 into the gap between the first conductive pattern 250 and the second conductive pattern 270, the transparent conductive film 125, and the light transmission region 120 (see FIG. 4F).

Among these, the step of disposing the second transparent substrate 115 provided with the transparent conductive film 125 on the surface of the light transmission region 120, the first conductive pattern 250, the second conductive pattern 270, and the transparent conductive film The order of filling the electrophoretic element 140 into the gap between the light transmission region 120 and the light transmission region 120 may be reversed.
That is, after performing the steps of FIG. 4A to FIG. 4D, as shown in FIG. 5, the step of filling the electrophoretic element 140 between the light transmission regions 120 (see FIG. 5E). Then, a step of disposing the second transparent substrate 115 including the transparent conductive film 125 on the surfaces of the light transmission region 120 and the electrophoretic element 140 (see FIG. 5F) is performed.

In addition, when the transparent photosensitive resin layer 150 is exposed using the photomask 160 as described above, the position of the mask pattern 161 is shifted from the first conductive pattern 250 and the second conductive pattern 270. Is an optical element 950 having a structure in which a part of the first conductive pattern 250 and the second conductive pattern 270 are arranged so as to overlap a part of the light transmission region 120 in a plan view (see FIG. 47). .
Also in this case, the first conductive pattern 250 and the second conductive pattern 270 are partially exposed from the light transmission region 120, in other words, the first conductive pattern 250 is partially formed on the light transmission region 120. Since the second conductive pattern 270 is disposed so that a part of the second conductive pattern 270 overlaps when viewed in plan view, that is, from the normal direction of the display surface of the optical element 950, the operation is possible.

  Next, the optical element 100 will be described in more detail.

As shown in FIGS. 1A and 1B, the optical element 100 has a first transparent substrate 110. The first transparent substrate 110 is made of a glass substrate, PET (Poly Ethylene Terephthalate), PC (Poly Carbonate), PEN (Poly Ethylene Naphthalate), or the like.
A first conductive pattern 250 and a second conductive pattern 270 are formed on the first transparent substrate 110. The first conductive pattern 250 and the second conductive pattern 270 are made of a conductive material such as aluminum, chromium, copper, chromium oxide, and carbon nanotube, or a transparent conductive material such as ITO, ZnO, IGZO, and conductive nanowire. Composed.
A light transmission region 120 is formed between the first conductive pattern 250 and the second conductive pattern 270 on the first transparent substrate 110.
An electrophoretic element 140 that is a mixture of the electrophoretic particles 141 and the transparent dispersion material 142 is disposed between the light transmission regions 120.
The range of 30 [μm] to 300 [μm] is appropriate for the height of the light transmission region 120, and is 60 [μm] in the first embodiment. The width of the light transmission region 120 is appropriately in the range of 1 [μm] to 150 [μm], and is 20 [μm] in the first embodiment.
In addition, the width between the light transmission regions 120 is appropriately in the range of 0.25 [μm] to 40 [μm], and is 5 [μm] in the first embodiment. In addition, the thickness of the first conductive pattern 250 and the second conductive pattern 270 is appropriately in the range of 10 [nm] to 1000 [nm], and in the first embodiment, is 300 [nm].

An arrangement example of the light transmission region 120 and the first and second conductive patterns 250 and 270 is shown in FIGS. The shape of the light transmission region 120 is a stripe shape.
Note that the visible angle in the narrow-field mode in the AB direction shown in FIG. 12B is limited to about ± 30 °.
Further, in the structure shown in FIGS. 12A and 12B, as shown in FIGS. 52A and 52B, both ends of the gap between the adjacent stripe-shaped light transmission regions 120 are sealed. The resin 128 is arranged so as to be As described above, both ends of the gap between the adjacent stripe-shaped light transmission regions 120 are sealed, so that the electric currents disposed on the first conductive pattern 250 and the second conductive pattern 270 are sealed. Since the electrophoretic elements 140 are completely separated from each other, when the electrophoretic element 140 is driven by one conductive pattern, a direct influence on the electrophoretic element 140 on the other conductive pattern is prevented. . As shown in FIG. 53, the resin 128 may be disposed not only at both ends of the stripe-shaped light transmission region 120 but also around the entire light transmission region 120.

  Next, the manufacturing process of the optical element 100 of Embodiment 1 is demonstrated in detail with reference to FIG.

  First, the first conductive pattern 250 and the second conductive pattern 270 are formed on the surface of the first transparent substrate 110 made of glass, PET, PC, and PEN (see FIG. 4A), and then A transparent photosensitive resin layer 150 is formed on the substrate (see FIG. 4B). The first conductive pattern 250 and the second conductive pattern 270 are made of a conductive material such as aluminum, chromium, copper, chromium oxide, and carbon nanotube, or a transparent conductive material such as ITO, ZnO, IGZO, and conductive nanowire. In Embodiment 1, ITO is used.

As a method for forming the transparent photosensitive resin layer 150, for example, any film forming method such as a slit die coater, a wire coater, an applicator, dry film transfer, spray coating, or screen printing can be used. The range of 30 [μm] to 300 [μm] is appropriate for the thickness of the transparent photosensitive resin layer 150, which is 60 [μm] in the first embodiment. The transparent photosensitive resin used for the transparent photosensitive resin layer 150 is, for example, a chemically amplified photoresist (trade name “SU-8”) manufactured by Kayaku Microchem.
The characteristics of this transparent photosensitive resin are as follows.
An epoxy-type negative resist (specifically, a glycidyl ether derivative of bisphenol A novolak) in which a photoinitiator generates an acid by irradiating ultraviolet rays and polymerizes a curable monomer using this protonic acid as a catalyst.
-It has very high transparency in the visible light region.
-The curable monomer contained in the transparent photosensitive resin has a relatively low molecular weight before curing, so cyclopentanone, propylene glycol methyl ether acetate (PEGMEA), gamma butyl lactone (GBL), isobutyl ketone (MIBK), etc. Since it dissolves very well in a solvent, it is easy to form a thick film.
-Light transmittance is very good even at wavelengths in the near ultraviolet region, so that even a thick film can transmit ultraviolet light.
-Since it has the above features, it is possible to form a high aspect ratio pattern with an aspect ratio of 3 or more.
-Since there are many functional groups in the curable monomer, it becomes a very high-density cross-link after curing, and is very stable both thermally and chemically. For this reason, processing after pattern formation is also facilitated.
Of course, the transparent photosensitive resin layer 150 is not limited to the transparent photosensitive resin (trade name “SU-8”) described here, and any photocuring property may be used as long as it has similar characteristics. Materials may be used.

  Subsequently, the transparent photosensitive resin layer 150 is patterned using the mask pattern 161 of the photomask 160 (see FIG. 4C). The light 165 used for this exposure is parallel light. A UV light source is used as a light source, and UV light having a wavelength of 365 [nm] is irradiated as exposure light 165. The exposure amount in this case is appropriately in the range of 50 [mJ / cm2] to 1000 [mJ / cm2], and in the first embodiment, it is 200 [mJ / cm2].

  Development is performed after the exposure, and then thermal annealing is performed under the conditions of 120 [° C.] and 30 [min], thereby forming the light transmission region 120 (see FIG. 4D). The refractive index of the light transmission region 120 formed of SU-8 is 1.5 to 1.6.

  Subsequently, the second transparent substrate 115 including the transparent conductive film 125 is disposed on the light transmission region 120 (see FIG. 4E). The second transparent substrate 115 is fixed by adhering the upper surface of the light transmission region 120 and the transparent conductive film 125, and further adhesively sealing the outer peripheral portion of the first transparent substrate 110 with a resin not shown in the drawing. To do. The adhesive used at this time may be either thermosetting or UV curable.

  Finally, the electrophoretic element 140 is filled in the gap between the first transparent substrate 110 and the second transparent substrate 115 (see FIG. 4F). The electrophoretic element 140 is a mixture of the electrophoretic particles 141 and the dispersion material 142.

  As already described, the arrangement of the second transparent substrate 115 provided with another transparent conductive film 125 shown in FIG. 4E and the space between the light transmission regions 120 shown in FIG. 4F. The order of filling the electrophoretic elements 140 into the electrodes may be reversed (see FIG. 5).

  FIG. 6 is a cross-sectional view showing still another manufacturing process of the optical element 100 according to the first embodiment. Hereinafter, still another manufacturing process of the optical element 100 will be described in more detail.

  First, a transparent conductive film 125 is formed on the surface of a second transparent substrate 115 made of glass or PET, PC, PEN (see FIG. 6A), and a transparent photosensitive resin layer 150 is formed thereon (see FIG. 6A). (Refer FIG.6 (b)).

  Subsequently, the transparent photosensitive resin layer 150 is patterned using the mask pattern 161 of the photomask 160 (see FIG. 6C). After the exposure, development is performed, and then thermal annealing is performed under the conditions of 120 [° C.] and 30 [min], thereby forming the light transmission region 120 (see FIG. 6D).

  Subsequently, the first transparent substrate 110 including the first conductive pattern 250 and the second conductive pattern 270 is disposed on the light transmission region 120 (see FIG. 6E), and finally, The electrophoretic element 140 is filled in the gap between the first transparent substrate 110 and the second transparent substrate 115 (see FIG. 6F). At this time, the position of the first transparent substrate 110 is such that the first conductive pattern 250 and the second conductive pattern 270 are at least partially exposed from the light transmission region 120 toward the gap between the light transmission regions 120. To control.

  The arrangement of the first transparent substrate 110 having the first and second transparent conductive patterns 250 and 270 shown in FIG. 6 (e) and each light transmission region 120 shown in FIG. 6 (f). The order of filling the electrophoretic element 140 into the space may be reversed.

[Embodiment 2]
FIG. 13 is a cross-sectional view showing the optical element 200 of the second embodiment. Hereinafter, details of the optical element 200 in Embodiment 2 will be described.

  As shown in FIG. 13, in the second embodiment, the first conductive light shielding pattern 220 and the second conductive light shielding pattern 230 are arranged on the surface of the first transparent substrate 110. The film thickness of the first conductive light-shielding pattern 220 and the second conductive light-shielding pattern 230 is appropriate in the range of 10 [nm] to 1000 [nm], and in the second embodiment, is 300 [nm]. The constituent materials of the first conductive light shielding pattern 220 and the second conductive light shielding pattern 230 are aluminum, chromium, copper, chromium oxide, carbon nanotubes, etc., and in the second embodiment, aluminum.

In the second embodiment, the method of forming the light transmission region 120 is different from that in the first embodiment. FIG. 14 is a cross-sectional view illustrating a method for manufacturing the optical element 200 of the second embodiment.
First, the 1st conductive pattern 220 and the 2nd conductive pattern 230 are formed in the surface of the 1st transparent substrate 110 which consists of glass, PET, PC, and PEN (refer Fig.14 (a)), and the top A transparent photosensitive resin layer 150 is formed on the substrate (see FIG. 14B).
Then, the patterning of the transparent photosensitive resin layer 150 is performed using the first conductive light shielding pattern 220 and the second conductive light shielding pattern 230 as a photomask and irradiating the exposure light 165 from the back surface side of the first transparent substrate 110. (See FIG. 14C). The exposure amount at this time is suitably in the range of 100 [mJ / cm2] to 1000 [mJ / cm2], and is 200 [mJ / cm2] in the second embodiment.
In this way, by forming the pattern of the transparent photosensitive resin layer 150 using the first conductive light shielding pattern 220 and the second conductive light shielding pattern 230 as a photomask, the light transmission region 120 and the first conductive property are formed. The relative position of the pattern 220 and the second conductive pattern 230 is naturally complementary. As a result, a state in which the first conductive light shielding pattern 220 and the second conductive light shielding pattern 230 are completely exposed from the light transmission region 120 toward the gap between the light transmission regions 120 is ensured.

  Other configurations, operations, and effects in the second embodiment are the same as those described in the first embodiment.

[Embodiment 3]
7A and 7B are diagrams showing the optical element 300 according to the third embodiment. FIG. 7A is a longitudinal sectional view showing the optical element 300 in a narrow-field mode, and FIG. FIG. 7C is a longitudinal sectional view showing the optical element 300 in the wide-field mode state. 7 (a), (b), and (c), the same portions as those in FIGS. 1 (a), 2 (a), and 3 (a) are shown in FIGS. 1 (a), 2 (a), and FIG. The same reference numerals as in FIG. Hereinafter, details of the optical element 300 of Embodiment 3 will be described.

As shown in FIGS. 7A, 7B, and 7C, in the third embodiment, the first transparent substrate 110 on which the first conductive pattern 250 and the second conductive pattern 270 are disposed and the light transmission. A protective cover film 130 is disposed between the regions 120.
The film thickness of the protective cover film 130 is appropriate in the range of 10 [nm] to 1000 [nm], and in the third embodiment, it is 300 [nm]. The constituent material of the protective cover film 130 is a silicon oxide film, a silicon nitride film, a silicon oxynitride film, or the like. In the third embodiment, a silicon oxide film is used. 7A, 7B, and 7C, the protective cover film 130 is formed on the entire surface of the first transparent substrate 110 on which the first conductive pattern 250 and the second conductive pattern 270 are arranged. Although formed, this is not essential, as long as the surfaces of the first conductive pattern 250 and the second conductive pattern 270 are covered.
According to the above configuration, the first conductive pattern 250 and the second conductive pattern 270 are covered with the protective cover film 130, so that the first conductive pattern 250 and the second conductive pattern 270 are electrically connected to the first conductive pattern 250 and the second conductive pattern 270. Since the contact of the electrophoretic element 140 can be prevented, the deterioration of the operation due to adhesion of the electrophoretic element 140 to the first conductive pattern 250 and the second conductive pattern 270 does not occur, and the visible range has a good operation stability. Control can be realized. Further, as an environment for holding the electrophoretic element 140, in addition to the structure of the first embodiment, a protective cover film is added, thereby improving airtightness and realizing an optical element 300 with good reliability.

  Other configurations, operations, and effects in the third embodiment are as described in the first and second embodiments.

[Embodiment 4]
8A and 8B are diagrams showing the optical element 400 of the fourth embodiment. FIG. 8A is a longitudinal sectional view showing the optical element 400 in a narrow-field mode, and FIG. FIG. 8C is a longitudinal sectional view showing the optical element 400 in the wide-field mode state. 8 (a), (b), and (c), the same parts as those in FIGS. 1 (a), 2 (a), and 3 (a) are shown in FIGS. 1 (a), 2 (a), and FIG. The same reference numerals as in FIG. Hereinafter, details of the optical element 400 of Embodiment 4 will be described.

As shown in FIGS. 8A, 8B, and 8C, in the fourth embodiment, the first conductive pattern 250 and the second conductive are formed on the first transparent substrate 110 as in the third embodiment. A pattern 270, a protective cover film 130, and a light transmission region 120 are formed, and a second transparent substrate in which a second protective cover film 135 is laminated on the surface of the transparent conductive film 125 on the upper surface of the light transmission region 120. 115 is arranged.
The film thickness of the second protective cover film 135 is appropriate in the range of 10 [nm] to 1000 [nm], and in the fourth embodiment, it is 300 [nm]. The constituent material of the second protective cover film 135 is a silicon oxide film, a silicon nitride film, a silicon oxynitride film, or the like. In the fourth embodiment, a silicon oxide film is used. 8A, 8B, and 8C, the second protective cover film 135 is also formed between the transparent conductive film 125 and the light transmission region 120, but this is not essential. Of the transparent conductive film 125, it is only necessary to cover a region not in contact with the light transmission region 120.
According to the above configuration, since the contact between the transparent conductive film 125 and the electrophoretic element 140 can be prevented, adhesion of the electrophoretic element 140 to the transparent conductive film 125 does not occur, and as a result, operational stability is further improved. Visible range control can be realized. Further, as an environment for holding the electrophoretic element 140, in addition to the structure of the third embodiment, the second protective cover film 135 is added, thereby further improving the airtightness and realizing the optical element 400 with good reliability. .

  Other configurations, operations, and effects in the fourth embodiment are as described in the first, second, and third embodiments.

[Embodiment 5]
FIGS. 15 to 18 are views showing an optical element 600 according to Embodiment 5. FIG. 15 is a longitudinal sectional view showing the optical element 600 in a narrow-field mode, and FIG. FIG. 17 is a longitudinal sectional view showing the optical element 600 in the second intermediate mode state, and FIG. 18 is a longitudinal sectional view showing the optical element 600 in the wide field mode state. FIG. FIG. 23 is a diagram showing the positional relationship between the light transmission region 120, the first conductive pattern 250, the second conductive pattern 270, and the third conductive pattern 290 in the optical element 600 of the fifth embodiment. FIG. 23 (a) is a plan view thereof, and FIG. 23 (b) is a perspective view thereof. 15 to 18 and FIGS. 23 (a) and (b), the same parts as those in FIGS. 1 (a), 2 (a), 3 (a) and 12 (a), (b) The same reference numerals as those in FIGS. 1A, 2A, 3A, 12A, and 12B are used. Hereinafter, details of the optical element 600 of Embodiment 5 will be described.

  The optical element 600 according to the fifth embodiment includes a first transparent substrate 110, a second transparent substrate 115 that faces the first transparent substrate 110, and a second transparent substrate 115 of the first transparent substrate 110. The first conductive pattern 250 and the second conductive pattern 270 and the third conductive pattern 290 arranged on the surface of the first transparent substrate 110 and the surface of the second transparent substrate 115 from the surface of the first transparent substrate 110 As described above, the light-transmitting region is singly disposed between the first conductive pattern 250, the second conductive pattern 270, and the third conductive pattern 290, and the pattern crosses the device region. 120, a transparent conductive film 125 disposed on the surface of the second transparent substrate 115 with respect to the first transparent substrate 110, and the adjacent light transmission region 120, and has a specific surface charge and is shielded. Comprises an electrophoretic element 140 consisting of a sex electrophoretic particles 141 transmissive dispersion material 142.

  More specifically, the optical element 600 according to the fifth embodiment includes a first transparent substrate 110, a second transparent substrate 115 that faces the first transparent substrate 110 with a space therebetween, and a first transparent substrate 110. In the transparent substrate 110, the first conductive pattern 250 and the second conductive layer which are repeatedly arranged in parallel on the surface of the transparent substrate 110 facing the second transparent substrate 115 in order and cross the element region. The pattern 270, the third conductive pattern 290, and between the first conductive pattern 250 and the second conductive pattern 270 so as to reach the surface of the second transparent substrate 115 from the surface of the first transparent substrate 110. Light transmission between the second conductive pattern 270 and the third conductive pattern 290 and between the third conductive pattern 290 and the first conductive pattern 250 and across the device region. Between the region 120 and the transparent conductive film 125 disposed over the entire surface of the second transparent substrate 115 on the side facing the first transparent substrate 110, and the adjacent light transmission region 120; The optical element includes an electrophoretic element 140 having a specific surface charge and light-shielding electrophoretic particles 141 and a transmissive dispersion material 142.

In the narrow field mode of FIG. 15, the first conductive pattern 250, the second conductive pattern 270, the third conductive pattern 290, and the transparent conductive film 125 are set to the same potential by operating the voltage application control unit 145. By doing so (see FIG. 48A), the electrophoretic particles 141 in the electrophoretic element 140 arranged in the gaps between the light transmission regions 120 are uniformly dispersed in the dispersion material 142. In the narrow field mode, as shown in FIGS. 19A and 19B, between the transparent conductive film 125 and the first conductive pattern 250, between the transparent conductive film 125 and the second conductive pattern 270, In all of the space between the transparent conductive film 125 and the third conductive pattern 290, the electrophoretic particles 141 are uniformly dispersed in the dispersion material 142, so that all the gaps between the adjacent light transmission regions 120 are in a light shielding state. As shown in 19 (b) and (c), the narrowest visible range is realized.
On the other hand, in the first intermediate mode of FIG. 16, the relative potential of the transparent conductive film 125 with respect to the first conductive pattern 250 is set to the same polarity as the surface charge of the electrophoretic particles 141 by the operation of the voltage application control means 145 ( This is achieved by aggregating only the electrophoretic particles 141 between the transparent conductive film 125 and the first conductive pattern 250 in the vicinity of the surface of the first conductive pattern 250, as shown in FIG. At this time, the second conductive pattern 270, the third conductive pattern 290, and the transparent conductive film 125 have the same potential (see FIG. 48B), and the transparent conductive film 125 and the second conductive pattern 270 have the same potential. Between the transparent conductive film 125 and the third conductive pattern 290, the electrophoretic particles 141 are uniformly dispersed in the dispersion material 142 as shown in FIGS. 20 (a) and 20 (b). Accordingly, light can be transmitted through the electrophoretic element 140 in an oblique direction with a gap between adjacent light transmission regions 120 of 1 out of 3 rows, as shown in FIGS. 20B and 20C. A wider visible range than the narrow field mode is realized.
In the second intermediate mode of FIG. 17, the first conductive pattern 250 and the second conductive pattern 270 are set to the same potential by the operation of the voltage application control unit 145, and the first conductive pattern 250 and the second conductive pattern 270. By setting the relative potential of the transparent conductive film 125 to the second conductive pattern 270 to have the same polarity as the surface charge of the electrophoretic particles 141 (see FIG. 48C), the transparent conductive film 125 and the first conductive pattern 250 are set. The electrophoretic particles 141 between the transparent conductive film 125 and the second conductive pattern 270 are aggregated in the vicinity of the surface of the first conductive pattern 250, and the electrophoretic particles 141 between the transparent conductive film 125 and the second conductive pattern 270 are aggregated in the second conductive pattern. This is realized by agglomerating near the surface of 270. At this time, the third conductive pattern 290 and the transparent conductive film 125 are at the same potential (see FIG. 48C), and between the third conductive pattern 290 and the transparent conductive film 125, FIG. ), (B), only the electrophoretic particles 141 in the electrophoretic element 140 are uniformly dispersed in the dispersion material 142. Accordingly, since the gap between the adjacent light transmission regions 120 is in a state in which oblique incident light can be transmitted at a rate of 2 rows out of 3 rows, as shown in FIGS. A wider visible range is achieved.
In the wide-field mode of FIG. 18, the first conductive pattern 250, the second conductive pattern 270, and the third conductive pattern 290 are set to the same potential by the operation of the voltage application control unit 145. The relative potential of the transparent conductive film 125 with respect to the conductive pattern 250, the second conductive pattern 270, and the third conductive pattern 290 is set to the same polarity as the surface charge of the electrophoretic particles 141 (see FIG. 48D). ) Electrophoretic particles 141 between the transparent conductive film 125 and the first conductive pattern 250 are aggregated in the vicinity of the surface of the first conductive pattern 250, and the transparent conductive film 125 and the second conductive pattern 270 are aggregated. The electrophoretic particles 141 between the transparent conductive film 125 and the third conductive pattern 290 are further aggregated in the vicinity of the surface of the second conductive pattern 270. Realized by aggregating the 1 in the vicinity of the surface of the third conductive pattern 290 (see FIG. 22 (a), (b)). In the wide-field mode, light can be transmitted in an oblique direction in all the gaps between the adjacent light transmission regions 120. Therefore, as shown in FIGS. 22 (b) and 22 (c), as compared with the second intermediate mode. A wider visible range is achieved.
As described above, the first conductive pattern 250, the second conductive pattern 270, and the third conductive pattern are applied by the voltage application control means 145 as shown in FIGS. 48 (a), (b), (c), and (d). By controlling the potentials of the conductive pattern 290 and the transparent conductive film 125, display in the narrow-field mode, the first intermediate mode, the second intermediate mode, and the wide-field mode can be realized. The voltage application control unit 145 adjusts the voltage applied to the first conductive pattern 250, the second conductive pattern 270, the third conductive pattern 290, and the transparent conductive film 125 according to a signal from the outside, This is means for changing the polarities of the first conductive pattern 250, the second conductive pattern 270, the third conductive pattern 290, and the transparent conductive film 125.

As described above, the optical element 600 of the fifth embodiment is different from the related art as shown in FIGS. 40A and 43A, and is intermediate between the transparent conductive film 123 and the transparent conductive film 125. A known technical idea of retaining the electrophoretic particles 141 in a section from the position to the transparent conductive film 123, that is, a light shielding means for shielding light between adjacent light transmission regions 120 (the electrophoretic particles 141 of the dispersion material 142 are The technical idea is based on the premise that the intermediate mode is realized by changing the height of the dispersed part)
The state in which the electrophoretic particles 141 between the first conductive pattern 250 and the transparent conductive film 125 are completely dispersed between the first conductive pattern 250 and the transparent conductive film 125, that is, the first A state in which the light transmission regions 120 sandwiching the conductive pattern 250 are shielded by light shielding means (electrophoretic particles 141 dispersed over the entire region of the dispersion material 142), the first conductive pattern 250, the transparent conductive film 125, In a state where the electrophoretic particles 141 between the two are aggregated in the vicinity of the first conductive pattern 250, that is, in a state where the light shielding means between the light transmission regions 120 sandwiching the first conductive pattern 250 is removed. Select one of them,
The state in which the electrophoretic particles 141 between the second conductive pattern 270 and the transparent conductive film 125 are completely dispersed between the second conductive pattern 270 and the transparent conductive film 125, that is, the second A state in which the light transmission regions 120 sandwiching the conductive pattern 270 are shielded by light shielding means (electrophoretic particles 141 dispersed over the entire region of the dispersion material 142), the second conductive pattern 270, the transparent conductive film 125, In a state where the electrophoretic particles 141 in the middle are aggregated in the vicinity of the second conductive pattern 270, that is, in a state where the light shielding means between the light transmission regions 120 sandwiching the second conductive pattern 270 is removed. Select one of them,
Further, the electrophoretic particles 141 between the third conductive pattern 290 and the transparent conductive film 125 are completely dispersed between the third conductive pattern 290 and the transparent conductive film 125, that is, the first A state in which the light transmission regions 120 sandwiching the third conductive pattern 290 are shielded by light shielding means (electrophoretic particles 141 dispersed over the entire region of the dispersion material 142), the third conductive pattern 290, and the transparent conductive film The state in which the electrophoretic particles 141 between the first and second electrodes 125 are aggregated in the vicinity of the third conductive pattern 290, that is, the light shielding means between the light transmission regions 120 sandwiching the third conductive pattern 290 is removed. Select one of the states,
By changing the mode of combination of these three selected states, there is a light shielding means (electrophoretic particles 141 dispersed over the entire region of the dispersion material 142) that shields light by separating a series of light transmission regions 120. Since the angle of light that can pass obliquely through the optical element 600 is adjusted by changing the interval, in addition to the narrow-field mode and the wide-field mode, in particular, the first intermediate mode and the second intermediate mode. Can be stably maintained regardless of the passage of time.
The reason is that the state change due to the diffusion of the electrophoretic particles 141 does not occur even when time elapses.
In summary, the first conductive pattern 250, the second conductive pattern 270, and the third conductive pattern 290, which are a plurality of conductive patterns arranged on the first transparent substrate 110, are independent of each other. It is possible to operate the electrophoretic particles 141 for each of the conductive patterns 250, 270, and 290 by controlling the electrophoretic particles 141 so that the electrophoretic particles 141 are not dispersed in a halfway state. The angle of light that can pass obliquely through the optical element 600 is adjusted by changing the interval of the light shielding means (electrophoretic particles 141 dispersed over the entire region of the dispersion material 142) that shields light by separating the light. Therefore, in addition to the narrow-field mode and the wide-field mode, an intermediate mode that realizes an intermediate characteristic between the two modes, that is, in this case, the first intermediate mode and the second field mode. During mode it can be referred to can be stably realized irrespective of the lapse of time.

  Other configurations, operations, and effects in the fifth embodiment are as described in the first embodiment.

  Further, as shown in FIGS. 24 to 27, an optical element 700 in which a protective cover film 130 is formed on the first conductive pattern 250, the second conductive pattern 270, and the third conductive pattern 290, and As shown in FIGS. 28 to 31, an optical element 800 in which a second protective cover film 135 is formed on the surface of the transparent conductive film 125 can be used. This is as described in the fourth embodiment.

[Embodiment 6]
FIGS. 54A and 54B show the optical element 1000 according to the sixth embodiment. FIG. 54A shows the light transmission region 120, the first conductive pattern 250, and the second of the optical element 1000. FIG. 54B is a perspective view of the optical element 1000. FIG. 54B is a plan view showing the positional relationship between the conductive pattern 270 and the resin 128. Since the light transmission region 120 is configured by one pattern, and the first conductive pattern 250 and the second conductive pattern 270 are separated by the light transmission region 120, the resin 128 is used for the first conductive pattern. The conductive pattern 250 and the second conductive pattern 270 may be formed only in the extracted portion, and the amount of the resin 128 used can be reduced.

[Other Embodiments]
The optical element of the present invention described above is not only a liquid crystal display device but also other display devices including a display panel, such as an organic EL display, an inorganic EL display, an LED display, a plasma display, a field emission display, a cathode ray tube, a fluorescent tube It can also be applied to a display tube or the like.
In addition, as the usage pattern of the optical element of the present invention, various usage patterns such as a mode in which the optical element is directly attached to the surface of the display panel and a mode in which the optical element is mounted in a display device are possible.
Below, the structure in each usage form is demonstrated concretely. The optical element will be described using the optical element 100 described in Embodiment 1 as an example.

  First, a display device in which the optical element of the present invention is mounted will be described.

  FIG. 36 shows a configuration of a display device 1400 in which the optical element of the present invention is mounted. The display device 1400 includes an optical control element 1800 that functions as a display, an illumination optical device 1700 that functions as a backlight that illuminates the optical control element 1800, and an optical device provided between the optical control element 1800 and the illumination optical device 1700. An element 1100 is included.

  As described in the first embodiment, the optical element 1100 is a micro louver capable of realizing a narrow field mode and an intermediate mode wide field mode. The illumination optical device 1700 includes a light source 1021, a reflection sheet 1022, a light guide plate 1023, a diffusion plate 1024, a prism sheet 1025a, and a prism sheet 1025b represented by a cold cathode tube shown in FIG. 36, and passes through the prism sheets 1025a and 1025b. The optical control element 1800 is illuminated through the optical element 1100.

  The light guide plate 1023 is made of acrylic resin or the like so that light from the light source 1021 enters one end face, and the incident light propagates through the light guide plate and is uniformly emitted from the surface (predetermined side face) side. It is configured. On the back surface side of the light guide plate 1023, a reflection sheet 1022 that reflects light emitted from the back surface in the front surface direction is provided. Although not shown in the drawing, a reflecting means is also provided on the other end face and side face of the light guide plate 1023.

  Light emitted from the surface of the light guide plate 1023 enters the optical control element 1800 through the diffusion plate 1024 and the prism sheets 1025a and 1025b. The diffusion plate 1024 is for diffusing the light incident from the light guide plate 1023. At the left and right ends of the light guide plate 1023, the brightness of the emitted light is different due to its structure. For this reason, the light from the light guide plate 1023 is diffused by the diffusion plate 1024.

  The prism sheets 1025a and 1025b improve the luminance of light incident from the light guide plate 1023 via the diffusion plate 1024. The prism sheet 1025a is composed of a plurality of prisms arranged at a constant period in a constant direction. The prism sheet 1025b has the same configuration, but the regular arrangement direction of the prisms intersects the regular arrangement direction of the prisms of the prism sheet 1025a. The prism sheets 1025a and 1025b can enhance the directivity of the light diffused by the diffusion plate 1024.

  In the embodiment of FIG. 36, the cold cathode tube is described as an example of the light source. However, the present invention is not limited to this, and a white LED, a three-color LED, or the like may be used as the light source. In this embodiment, a side light type light source is described as an example. However, the present invention is not limited to this, and a direct light source may be used.

  The optical control element 1800 has a structure in which a liquid crystal layer 1032 is held between two substrates 1030a and 1030b. The substrate 1030a has a color filter 1033 formed on one surface (the surface on the liquid crystal layer 1032 side) and a polarizing plate / retardation plate 1031a on the other surface. A polarizing plate / retardation plate 1031b is provided on the surface of the substrate 1030b opposite to the surface on the liquid crystal layer 1032 side. In the color filter 1033, R (red), G (green), and B (blue) color filters are arranged in a matrix in an area partitioned by a black matrix formed of a layer that absorbs light. Each color filter corresponds to a pixel, and its pitch is constant. The liquid crystal layer 1032 can be switched between a transparent state and a light-shielding state in units of pixels according to a control signal from a control device (not shown), and the incident light is spatially modulated by this state switching.

  In the display device 1400 shown in FIG. 36, the light that has passed through the prism sheets 1025a and 1025b enters the polarizing plate / retardation plate 1031b. The light that has passed through the polarizing plate / retardation plate 1031b enters the liquid crystal layer 1032 through the substrate 1030b, and is spatially modulated on a pixel-by-pixel basis. The light (modulated light) that has passed through the liquid crystal layer 1032 passes through the color filter 1033 and the substrate 1030a in order, and enters the polarizing plate / retardation plate 1031a. The light that has passed through the polarizing plate / retardation plate 1031 a is emitted through the optical element 1100. Here, in FIG. 36, the polarizing plates / retardation plates 1031a and 1031b are used as the optical control elements. However, the present invention is not limited to this, and the polarizing plate alone may be used.

According to the display device 1400 described above, since the illumination light of the optical control element 1800 can be prevented from converging in the front direction of the screen by the optical element 1100, the viewing angle can be set according to the viewer's preference. The effect that the narrow state and the wide state can be appropriately selected is obtained.
In addition, as in the display device 1500 illustrated in FIG. 37, the optical element 1100 may be attached to the polarizing plate / retardation plate 1031 b of the optical control element 1800 using a transparent adhesive layer 1060. By sticking the optical element 1100 to the optical control element 1800, the generation of scattered light between them can be suppressed, so that a display device with higher transmittance and higher luminance can be realized.

  Next, a form of a display device that uses the optical element of the present invention on the surface of the display panel will be described.

FIG. 34 shows a configuration of a display device 1200 in which the optical element of the present invention is provided on a display screen. Referring to FIG. 34, a display device 1200 includes an optical control element 1800 that functions as a display, an illumination optical device 1700 that functions as a backlight, and an optical element 1100.
As described in the first embodiment, the optical element 1100 is a microlouver that can control the narrow-field mode, the intermediate mode, and the wide-field mode.
The illumination optical device 1700 includes a light source 1021, a reflection sheet 1022, a light guide plate 1023, a diffusion plate 1024, a prism sheet 1025a, and a prism sheet 1025b, and illuminates an optical control element with light that has passed through the prism sheets 1025a and 1025b. Here, on the surface of the optical element 1100, a hard coat layer for preventing damage or an antireflection layer for preventing reflection of external light may be formed.

  According to the display device 1200 described above, since the light emitted from the optical control element 1800 can be prevented from converging in the front direction of the screen by the optical element 1100 at the forefront of the display device 1200, the optical element 1100 can be prevented from converging. The light that has passed through the observer directly reaches the observer, so that the light emitted from the optical element 1100 is not scattered, refracted, reflected, or the like as compared with a display device in which the optical element 1100 is mounted. Can be realized.

  The optical element 1100 may be attached to the polarizing plate / retardation plate 1031a of the optical control element 1800 via a transparent adhesive layer 1060 as in the display device 1300 shown in FIG. With this configuration, the surface reflection loss at the interface between the optical element 1100 and the polarizing plate / retardation plate 1031a can be reduced, and a display device with higher luminance can be realized.

  As an application example of the present invention to portable information processing terminals such as televisions, monitors, notebook personal computers, feature phones, smartphones, tablet PCs, and PDAs which are other electronic devices, for example, FIG. A device equipped with any one of the display devices 1200, 1300, 1400, 1500 described above as display means in the device body of the electronic device, such as the electronic device 2000 shown and the electronic device 2010 shown in FIG. is there. Furthermore, the present invention may be applied to various plasma display devices.

  In this case, on the information processing terminal side, the control device accepts input from an input device such as a mouse, a keyboard, or a touch panel, and performs control for displaying necessary information on a display device equipped as a display means. It is configured to do.

Next, FIG. 38 shows a configuration of an illumination device 1600 equipped with the optical element of the present invention.
Referring to FIG. 38, the illumination device 1600 includes a planar light source 1900 and an optical element 1100. The planar light source includes a light source 1021, a reflection sheet 1022, a light guide plate 1023, a diffusion plate 1024, a prism sheet 1025a, and a prism sheet 1025b typified by a cold cathode tube. The optical element 1100 is configured by any one of the micro louvers of the first to third embodiments.

The light guide plate 1023 is made of acrylic resin or the like, and light from the light source 1021 enters one end face, and the incident light propagates through the light guide plate and is uniform from the surface (predetermined side face) side. It is comprised so that it may radiate | emit to.
On the back surface side of the light guide plate 1023, a reflection sheet 1022 is provided that reflects light emitted from the back surface in the surface direction. Although not shown in the drawing, a reflecting means is also provided on the other end face and side face of the light guide plate 1023.

  Light emitted from the surface of the light guide plate 1023 enters the optical element 1100 via the diffusion plate 1024 and the prism sheets 1025a and 1025b. The diffusion plate 1024 is for diffusing the light incident from the light guide plate 1023. At the left and right ends of the light guide plate 1023, the brightness of the emitted light differs due to its structure. For this reason, the light from the light guide plate 1023 is diffused by the light guide plate 1023.

  The prism sheets 1025a and 1025b improve the luminance of light incident from the light guide plate 1023 via the diffusion plate 1024.

  In the illumination device 1600, the light emitted from the surface side of the light guide plate 1023 is diffused by the diffusion plate 1024 and then enters the optical element 1100 via the prism sheets 1025a and 1025b.

According to the illumination device 1600 described above, the light from the planar light source 1900 can be prevented from converging in the front direction of the screen by the optical element 1100, so that a wide range is illuminated according to the viewer's preference. It is possible to select a state where the light emission angle that can be emitted is wide and a state where the light emission angle that can illuminate only the vicinity immediately below the illumination device 1600 is narrow.
In the illuminating device 1600 that uses the optical elements of Embodiments 1 to 5 as the optical element 1100, the electrophoretic particles 141 are dispersed by the potential difference between the conductive patterns 220, 230, 250, 270, and 290 and the transparent conductive film 125. By changing the state, the range of the emission direction of the light transmitted through the light transmission region 120 and the dispersion material 142 is changed.
In the present embodiment, a cold cathode tube has been described as an example of the light source. However, the present invention is not limited to this, and a white LED, a three-color LED, or the like may be used as the light source. In the present embodiment, a side light type light source is described as an example. However, the present invention is not limited to this, and a direct light source may be used. Further, the planar light source 1900 is not limited to the content described in the present embodiment, and light sources that emit light such as LED illumination, organic EL illumination, inorganic EL illumination, fluorescent lamps, and light bulbs are arranged in a planar shape. Anything is acceptable.

  A part or all of the embodiment disclosed above can be appropriately expressed by the description shown in the following supplementary notes, but the form for carrying out the invention and the technical idea of the invention are not limited to these. Absent.

[Appendix 1]
A first transparent substrate (110);
A second transparent substrate (115) that faces the first transparent substrate (110);
A first conductive pattern (250) and a second conductive pattern (270) disposed on a surface of the first transparent substrate (110) with respect to the second transparent substrate (115);
Between the first conductive pattern (250) and the second conductive pattern (270) so as to reach the surface of the second transparent substrate (115) from the surface of the first transparent substrate (110). And a light transmission region (120) whose pattern is transverse to the device region,
A transparent conductive film (125) disposed on a surface of the second transparent substrate (115) with respect to the first transparent substrate (110);
An electrophoretic element (140) which is disposed between adjacent light transmission regions (120) and which has a specific surface charge and is composed of light-shielding electrophoretic particles (141) and a transmissive dispersion material (142). And an optical element (see FIGS. 1A and 1B).

[Appendix 2]
A first transparent substrate (110);
A second transparent substrate (115) present opposite to the first transparent substrate (110) at an interval;
First conductivity of the first transparent substrate (110) that is arranged in parallel and alternately with a certain interval on the surface facing the second transparent substrate (115) and crosses the element region. A pattern (250) and a second conductive pattern (270);
Between the first conductive pattern (250) and the second conductive pattern (270) so as to reach the surface of the second transparent substrate (115) from the surface of the first transparent substrate (110). A light transmissive region (120) disposed across the device region;
A transparent conductive film (125) disposed over the entire surface of the second transparent substrate (115) facing the first transparent substrate (110);
An electrophoretic element (140) which is disposed between adjacent light transmission regions (120) and which has a specific surface charge and is composed of light-shielding electrophoretic particles (141) and a transmissive dispersion material (142). And an optical element (see FIGS. 1A and 1B).

[Appendix 3]
In the optical element according to appendix 1 or appendix 2,
An optical element comprising a resin (128) arranged so as to seal all ends of a gap between the adjacent light transmission regions (120). (See FIGS. 52 (a) and (b))

[Appendix 4]
In the optical element according to attachment 2,
Each of the first conductive pattern (250) and the second conductive pattern (270)
A main part (250a, 270a) crossing the element region;
The main part (250a, 270a) is connected in an orthogonal state and extends from the main part (250a, 270a) to the main part (270a, 250a) adjacent to the main part (250a, 270a), A plurality of sub-portions (250b, 270b) formed on both sides of the main portion (250a, 270a) by shifting the pitch at a constant pitch so as to be aligned in a straight line along the extending direction of the main portion (250a, 270a). )
The adjacent sub-portions (250b) of the first conductive pattern (250) and the sub-portions (270b) of the second conductive pattern (270) are arranged in parallel and alternately in a straight line. Characteristic optical element (see FIG. 49).

[Appendix 5]
In the optical element according to attachment 2,
Each of the first conductive pattern (250) and the second conductive pattern (270)
A main part (250a, 270a) crossing the element region;
The main part (250a, 270a) is connected in an orthogonal state and extends from the main part (250a, 270a) to the main part (270a, 250a) adjacent to the main part (250a, 270a), A plurality of sub-portions (250b, 270a) formed on both sides of the main portion (250a, 270a) without shifting the pitch at a constant pitch so as to be aligned in a straight line along the extending direction of the main portion (250a, 270a). 270b)
The adjacent sub-portions (250b) of the first conductive pattern (250) and the sub-portions (270b) of the second conductive pattern (270) are arranged in parallel and alternately in a straight line. Characteristic optical element (see FIG. 50).

[Appendix 6]
In the optical element according to attachment 2,
Each of the first conductive pattern (250) and the second conductive pattern (270)
The first linear portion (250c, 270c) extending in the direction crossing the element region and the second linear portion (250d, 270d) extending in one direction perpendicular to the first linear portion (250c, 270c) are configured. And
The length of the first straight portion (250c) of the first conductive pattern (250), the length of the first straight portion (270c) of the second conductive pattern (270), and the first conductive pattern ( 250) the length of the second straight portion (250d) of the second conductive pattern (270) and the length of the second straight portion (270d) of the second conductive pattern (270) coincide with each other (see FIG. 51). .

[Appendix 7]
In the optical element according to any one of supplementary notes 1 to 6,
By making the first conductive pattern (250), the second conductive pattern (270), and the transparent conductive film (125) have the same potential, the electrophoretic particles (141) are dispersed throughout the dispersion material (142). An optical element (see FIGS. 1A and 45A).

[Appendix 8]
In the optical element according to any one of supplementary notes 1 to 6,
By making the relative potential of the transparent conductive film (125) with respect to the first conductive pattern (250) the same polarity as the surface charge of the electrophoretic particles (141), the first conductive pattern (250) and the transparent conductive film In the electrophoretic element (140) between (125), the electrophoretic particles (141) are aggregated in the vicinity of the surface of the first conductive pattern (250),
In the electrophoretic element (140) between the second conductive pattern (270) and the transparent conductive film (125), the second conductive pattern (270) and the transparent conductive film (125) are set to the same potential. Is an optical element in which electrophoretic particles (141) are dispersed throughout the dispersion material (142) (see FIGS. 2A and 45B).

[Appendix 9]
In the optical element according to any one of supplementary notes 1 to 6,
The first conductive pattern (250) and the second conductive pattern (270) are set to the same potential, and the transparent conductive film (125) with respect to the first conductive pattern (250) and the second conductive pattern (270). Is made to have the same polarity as the surface charge of the electrophoretic particles (141), so that the first conductive pattern (250), the second conductive pattern (270), and the transparent conductive film (125) In the electrophoretic element (140), the electrophoretic particles (141) are aggregated in the vicinity of the surfaces of the first conductive pattern (250) and the second conductive pattern (270), respectively. 3 (a) and FIG. 45 (c)).

[Appendix 10]
In the optical element according to any one of supplementary notes 1 to 9,
An optical element characterized in that a protective cover film (130) is formed so as to cover the first conductive pattern (250) and the second conductive pattern (270) (see FIG. 7A). ).

[Appendix 11]
In the optical element according to any one of supplementary notes 1 to 10,
An optical element (see FIG. 8A), wherein a second protective cover film (135) is formed so as to cover the transparent conductive film (125).

[Appendix 12]
A first transparent substrate (110);
A second transparent substrate (115) that faces the first transparent substrate (110);
A first conductive pattern (250), a second conductive pattern (270), and a third conductivity disposed on a surface of the first transparent substrate (110) with respect to the second transparent substrate (115). Pattern (290);
The first conductive pattern (250), the second conductive pattern (270), and the first conductive pattern (250) so as to reach the surface of the second transparent substrate (115) from the surface of the first transparent substrate (110). A light transmissive region (120), each singly disposed between the third conductive patterns (290), and the pattern crossing the device region;
A transparent conductive film (125) disposed on a surface of the second transparent substrate (115) with respect to the first transparent substrate (110);
An electrophoretic element (140) which is disposed between adjacent light transmission regions (120) and which has a specific surface charge and is composed of light-shielding electrophoretic particles (141) and a transmissive dispersion material (142). And an optical element (see FIG. 15).

[Appendix 13]
A first transparent substrate (110);
A second transparent substrate (115) present opposite to the first transparent substrate (110) at an interval;
First conductivity of the first transparent substrate (110), which is repeatedly arranged in parallel on the surface of the first transparent substrate (110) facing the second transparent substrate (115) in order, repeatedly in parallel and crossing the element region. A pattern (250) and a second conductive pattern (270) and a third conductive pattern (290);
Between the first conductive pattern (250) and the second conductive pattern (270) so as to reach the surface of the second transparent substrate (115) from the surface of the first transparent substrate (110). And between the second conductive pattern (270) and the third conductive pattern (290) and between the third conductive pattern (290) and the first conductive pattern (250). A light transmissive region (120) traversing the device region;
A transparent conductive film (125) disposed over the entire surface of the second transparent substrate (115) facing the first transparent substrate (110);
An electrophoretic element (140) which is disposed between adjacent light transmission regions (120) and which has a specific surface charge and is composed of light-shielding electrophoretic particles (141) and a transmissive dispersion material (142). And an optical element (see FIG. 15).

[Appendix 14]
In the optical element according to appendix 12 or appendix 13,
By making the first conductive pattern (250), the second conductive pattern (270), the third conductive pattern (290), and the transparent conductive film (125) the same potential, An electrophoretic particle (141) is dispersed in the entire dispersion material (142), and an optical element (see FIGS. 15 and 48A).

[Appendix 15]
In the optical element according to appendix 12 or appendix 13,
By making the relative potential of the transparent conductive film (125) with respect to the first conductive pattern (250) the same polarity as the surface charge of the electrophoretic particles (141), the first conductive pattern (250). In the electrophoretic element (140) between the transparent conductive film (125) and the transparent conductive film (125), the electrophoretic particles (141) are aggregated in the vicinity of the surface of the first conductive pattern (250).
By making the second conductive pattern (270) and the third conductive pattern (290) and the transparent conductive film (125) have the same potential, the second conductive pattern (270) and the second conductive pattern (270) In the electrophoretic element (140) between the conductive pattern (290) 3 and the transparent conductive film (125), the electrophoretic particles (141) are dispersed throughout the dispersion material (142). An optical element (see FIGS. 16 and 48B).

[Appendix 16]
In the optical element according to appendix 12 or appendix 13,
The first conductive pattern (250) and the second conductive pattern (270) are set to the same potential, and the transparent with respect to the first conductive pattern (250) and the second conductive pattern (270) is performed. By setting the relative potential of the conductive film (125) to the same polarity as the surface charge of the electrophoretic particles (141), the first conductive pattern (250), the second conductive pattern (270), and the In the electrophoretic element (140) between the transparent conductive films (125), the electrophoretic particles (141) are placed on the surfaces of the first conductive pattern (250) and the second conductive pattern (270), respectively. Agglomerate in the vicinity,
The electrophoretic element between the third conductive pattern (290) and the transparent conductive film (125) by setting the third conductive pattern (290) and the transparent conductive film (125) to the same potential. In (140), the electrophoretic particles (141) are dispersed throughout the dispersion material (142) (see FIGS. 17 and 48C).

[Appendix 17]
In the optical element according to appendix 12 or appendix 13,
The first conductive pattern (250), the second conductive pattern (270), and the third conductive pattern (290) are set to the same potential, and the first conductive pattern (250) and the first conductive pattern (250) By making the relative potential of the transparent conductive film (125) with respect to the second conductive pattern (270) and the third conductive pattern (290) the same polarity as the surface charge of the electrophoretic particles (141), In the electrophoretic element (140) between the first conductive pattern (250) and the second conductive pattern (270) and the third conductive pattern (290) and the transparent conductive film (125), The electrophoretic particles (141) are converted into the first conductive pattern (250), the second conductive pattern (270), and the third conductive pattern (290), respectively. Optical element characterized by agglomerating in the vicinity of the surface (see FIG. 18, FIG. 48 (d)).

[Appendix 18]
In the optical element according to appendix 12 or appendix 13,
A protective cover film (130) is formed to cover the first conductive pattern (250), the second conductive pattern (270), and the third conductive pattern (290). An optical element (see FIG. 24).

[Appendix 19]
In the optical element according to attachment 18,
An optical element (see FIG. 28), wherein a second protective cover film (135) is formed so as to cover the transparent conductive film (125).

[Appendix 20]
A first transparent substrate (110);
A second transparent substrate (115) that faces the first transparent substrate (110);
A first conductive pattern (250) and a second conductive pattern (270) spaced from each other on a surface of the first transparent substrate (110) with respect to the second transparent substrate (115);
The second conductive pattern (270) and the second conductive pattern (270) are disposed in all element regions where the first conductive pattern (250) and the second conductive pattern (270) are not disposed from the surface of the first transparent substrate (110). A light transmissive region (120) arranged to reach the surface of the transparent substrate (115);
A transparent conductive film (125) disposed on a surface of the second transparent substrate (115) with respect to the first transparent substrate (110);
An electrophoretic element (140) which is disposed between adjacent light transmission regions (120) and which has a specific surface charge and is composed of light-shielding electrophoretic particles (141) and a transmissive dispersion material (142). And an optical element (see FIGS. 54A and 54B).

[Appendix 21]
In the optical element according to attachment 20,
The portion where the first conductive pattern (250) and the second conductive pattern (270) come out of the element region is sealed so that the light transmission region (120) is not formed. An optical element in which a resin (128) is arranged (see FIGS. 54A and 54B).

[Appendix 22]
A display (1800) having a display surface for displaying images;
34. A display device (see FIG. 34), comprising: the optical element (1100) according to any one of supplementary notes 1 to 21 disposed on the display surface of the display (1800).

[Appendix 23]
The display device according to appendix 22, wherein the display (1800) and the optical element (1100) are fixed by a transparent adhesive layer (1060) (see FIG. 35).

[Appendix 24]
Item 24 or Item 23, wherein the display (1800) is any one of a liquid crystal display, a plasma display, an organic EL display, an inorganic EL display, an LED display, a field emission display, a cathode ray tube, and a fluorescent display tube. Display device (see paragraph 0061).

[Appendix 25]
A liquid crystal display (1800) having a display surface for displaying images;
A backlight (1700) disposed on the back side of the liquid crystal display (1800) to irradiate the liquid crystal display (1800) with light;
A display device comprising the optical element (1100) according to any one of supplementary notes 1 to 21 disposed between the liquid crystal display (1800) and the backlight (1700) (see FIG. 36).

[Appendix 26]
The display device according to appendix 25, wherein the liquid crystal display (1800) and the optical element (1100) are fixed by a transparent adhesive layer (1060) (see FIG. 37).

[Appendix 27]
An electronic device (FIG. 46 (FIG. 46)) equipped with the display device (1200, 1300, 1400, 1500) according to any one of Supplementary notes 22 to 26 as display means of the electronic device (2000, 2010) main body. a), see (b)).

[Appendix 28]
The optical element (1100) according to any one of Supplementary Notes 1 to 21, and a light source (1900) provided on a back surface of the first transparent substrate (110) in the optical element (1100). (Refer to FIG. 38).

[Appendix 29]
The optical element changes the dispersion state of the electrophoretic particles (141) according to a potential difference between each of the conductive patterns (250, 270, (290)) and the transparent conductive film (125). 29. The illumination device according to appendix 28, wherein a range of an emission direction of light transmitted through the transmission region (120) and the dispersion material (142) is changed (see FIGS. 45 and 48).

  The present invention can be applied to any optical element that controls the range of the emission direction of transmitted light. Examples of such optical elements include optical elements used in liquid crystal display devices, EL displays, plasma displays, FEDs, illumination optical devices, and the like.

100 Optical element 110 First transparent substrate 115 Second transparent substrate 120 Light transmission region 121 Lower surface of light transmission region 122 Upper surface of light transmission region 123 Transparent conductive film 125 Transparent conductive film 128 Resin 130 Protective cover film 135 Second protection Cover film 140 Electrophoretic element 141 Electrophoretic particle 142 Dispersant 145 Voltage application control means 150 Transparent photosensitive resin layer (photoresist film)
160 Photomask 161 Mask pattern 165 Exposure light 200 Optical element 220 First conductive light shielding pattern 230 Second conductive light shielding pattern 250 First conductive pattern 270 Second conductive pattern 290 Third conductive pattern 300 , 400, 600 Optical element 650 Light 700, 800, 900, 950, 1000 Optical element 1021 Light source 1022 Reflective sheet 1023 Light guide plate 1024 Diffuser plate 1025a, 1025b Prism sheet 1030a, 1030b Substrate 1031a, 1031b Deflector plate / retarder plate 1032 Liquid crystal Layer 1033 Color filter 1060 Transparent adhesive layer 1100 Optical element 1200, 1300, 1400, 1500 Display device 1600 Illumination device 1700 Illumination optical device (backlight)
1800 Optical control element (display)
1900 Planar light source 2000, 2010 Electronic equipment

Claims (22)

An optical element capable of controlling the light passing angle,
A first transparent substrate;
A second transparent substrate that faces the first transparent substrate;
A first conductive pattern and a second conductive pattern disposed on a surface of the first transparent substrate with respect to the second transparent substrate;
A single conductive pattern is disposed between the first conductive pattern and the second conductive pattern so as to reach the surface of the second transparent substrate from the surface of the first transparent substrate, and the pattern is A light transmissive region crossing the device region;
A transparent conductive film disposed on a surface of the second transparent substrate with respect to the first transparent substrate;
Disposed between the light transmitting region adjacent the electrophoretic element comprising a particular carry a surface charge and the light-shielding property of the electrophoretic particles and transparent dispersed material, were closed,
In the gap between the adjacent light transmission regions, the region in which the electrophoretic particles sandwiched between the transparent conductive film and the first conductive pattern are disposed, the transparent conductive film, and the second conductive film Regions where the electrophoretic particles sandwiched between conductive patterns are arranged alternately,
An optical element , wherein light transmission or light shielding in the gap is controlled by controlling potentials of the first conductive pattern, the second conductive pattern, and the transparent conductive film . The optical element according to claim 1,
An optical element comprising a resin disposed so as to seal all both ends of a gap between adjacent light transmission regions. The optical element according to claim 1 or 2,
An optical element, wherein the electrophoretic particles are dispersed throughout the dispersion material by setting the first conductive pattern, the second conductive pattern, and the transparent conductive film to the same potential. The optical element according to claim 1 or 2,
In the electrophoretic element between the first conductive pattern and the transparent conductive film, the relative potential of the transparent conductive film with respect to the first conductive pattern is set to the same polarity as the surface charge of the electrophoretic particles. Agglomerates the electrophoretic particles near the surface of the first conductive pattern;
By setting the second conductive pattern and the transparent conductive film to the same potential, in the electrophoretic element between the second conductive pattern and the transparent conductive film, the electrophoretic particles are dispersed in the dispersion material. An optical element characterized by being dispersed throughout. The optical element according to claim 1 or 2,
The first conductive pattern and the second conductive pattern are set to the same potential, and the relative potential of the transparent conductive film with respect to the first conductive pattern and the second conductive pattern is set to the surface of the electrophoretic particle. By setting the same polarity as the electric charge, in the electrophoretic element between the first conductive pattern and the second conductive pattern and the transparent conductive film, the electrophoretic particles are respectively converted into the first conductive pattern. And an agglomeration in the vicinity of the surface of the second conductive pattern. The optical element according to any one of claims 1 to 5,
An optical element, wherein a protective cover film is formed so as to cover the first conductive pattern and the second conductive pattern. The optical element according to any one of claims 1 to 6,
An optical element, wherein a second protective cover film is formed so as to cover the transparent conductive film. An optical element capable of controlling the light passing angle,
A first transparent substrate;
A second transparent substrate that faces the first transparent substrate;
A first conductive pattern and a second conductive pattern and a third conductive pattern disposed on a surface of the first transparent substrate with respect to the second transparent substrate;
Each of the first conductive pattern, the second conductive pattern, and the third conductive pattern is single from the surface of the first transparent substrate to the surface of the second transparent substrate. And a light transmissive region whose pattern crosses the device region, and
A transparent conductive film disposed on a surface of the second transparent substrate with respect to the first transparent substrate;
Disposed between the light transmitting region adjacent the electrophoretic element comprising a particular carry a surface charge and the light-shielding property of the electrophoretic particles and transparent dispersed material, were closed,
In the gap between the adjacent light transmission regions, the region in which the electrophoretic element sandwiched between the transparent conductive film and the first conductive pattern is disposed, the transparent conductive film, and the second conductive film A region where the electrophoretic element sandwiched between conductive patterns is disposed periodically and a region where the electrophoretic element sandwiched between the transparent conductive film and the third conductive pattern is disposed periodically. Provided,
The transmission or shielding of light in the gap is controlled by controlling the potential of the first conductive pattern, the second conductive pattern, the third conductive pattern, and the transparent conductive film. Optical element. The optical element according to claim 8, wherein
The electrophoretic particles are dispersed throughout the dispersion material by setting the first conductive pattern, the second conductive pattern, the third conductive pattern, and the transparent conductive film to the same potential. An optical element characterized by the above. The optical element according to claim 8, wherein
In the electrophoretic element between the first conductive pattern and the transparent conductive film, the relative potential of the transparent conductive film with respect to the first conductive pattern is set to the same polarity as the surface charge of the electrophoretic particles. Agglomerates the electrophoretic particles near the surface of the first conductive pattern;
By setting the second conductive pattern, the third conductive pattern, and the transparent conductive film to the same potential, the second conductive pattern, between the third conductive pattern, and the transparent conductive film In the electrophoretic element, the electrophoretic particles are dispersed throughout the dispersion material. The optical element according to claim 8, wherein
The first conductive pattern and the second conductive pattern are set to the same potential, and the relative potential of the transparent conductive film with respect to the first conductive pattern and the second conductive pattern is set to the surface of the electrophoretic particle. By setting the same polarity as the electric charge, in the electrophoretic element between the first conductive pattern and the second conductive pattern and the transparent conductive film, each of the electrophoretic particles is the first conductive pattern. Agglomerates near the surface of the pattern and the second conductive pattern;
By setting the third conductive pattern and the transparent conductive film to the same potential, in the electrophoretic element between the third conductive pattern and the transparent conductive film, the electrophoretic particles are dispersed in the dispersion material. An optical element characterized by being dispersed throughout. The optical element according to claim 8, wherein
The first conductive pattern, the second conductive pattern, and the third conductive pattern are set to the same potential, and the first conductive pattern, the second conductive pattern, and the third conductive pattern are set. By setting the relative potential of the transparent conductive film to the same polarity as the surface charge of the electrophoretic particles, the first conductive pattern, the second conductive pattern, the third conductive pattern, and the transparent In the electrophoretic element between the conductive films, the electrophoretic particles are aggregated in the vicinity of the surfaces of the first conductive pattern, the second conductive pattern, and the third conductive pattern, respectively. Optical element. An optical element capable of controlling the light passing angle,
A first transparent substrate;
A second transparent substrate that faces the first transparent substrate;
A first conductive pattern and a second conductive pattern disposed on a surface of the first transparent substrate with respect to the second transparent substrate;
To reach the surface of the second transparent substrate from the surface of the first transparent substrate in all element regions where the first conductive pattern and the second conductive pattern are not disposed. A light transmissive region disposed; and
A transparent conductive film disposed on a surface of the second transparent substrate with respect to the first transparent substrate;
Disposed between the light transmitting region adjacent the electrophoretic element comprising a particular carry a surface charge and the light-shielding property of the electrophoretic particles and transparent dispersed material, were closed,
In the gap between the adjacent light transmission regions, the region in which the electrophoretic element sandwiched between the transparent conductive film and the first conductive pattern is disposed, the transparent conductive film, and the second conductive film The regions where the electrophoretic elements sandwiched between conductive patterns are arranged alternately,
An optical element , wherein light transmission or light shielding in the gap is controlled by controlling potentials of the first conductive pattern, the second conductive pattern, and the transparent conductive film . The optical element according to claim 13.
A resin is disposed so as to seal a portion where the first conductive pattern and the second conductive pattern come out of the element region, where the light transmission region is not formed. An optical element. A display with a display surface for displaying images;
15. A display device comprising: the optical element according to claim 1 disposed on the display surface of the display.   The display device according to claim 15, wherein the display and the optical element are fixed with a transparent adhesive layer.   The said display is a liquid crystal display, a plasma display, an organic EL display, an inorganic EL display, an LED display, a field emission display, a cathode ray tube, and a fluorescent display tube, The Claim 15 or Claim 16 characterized by the above-mentioned. Display device. A liquid crystal display with a display surface for displaying images;
A backlight arranged on the back side of the liquid crystal display and irradiating the liquid crystal display with light;
15. A display device comprising: the optical element according to claim 1 disposed between the liquid crystal display and the backlight.   The display device according to claim 18, wherein the liquid crystal display and the optical element are fixed by a transparent adhesive layer.   An electronic apparatus comprising the display device according to any one of claims 15 to 19 as display means of an electronic apparatus main body.   15. An illuminating device comprising: the optical element according to claim 1; and a light source provided on a back surface of the first transparent substrate in the optical element.   The optical element is configured to change a dispersion state of the electrophoretic particles according to a potential difference between each of the conductive patterns and the transparent conductive film, so that the light transmission region and the range of the light emission direction that passes through the dispersion material The lighting device according to claim 21, wherein: changes.

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