JP6537883B2 - 半導体発光素子および半導体発光素子アレイ - Google Patents
半導体発光素子および半導体発光素子アレイ Download PDFInfo
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- JP6537883B2 JP6537883B2 JP2015098880A JP2015098880A JP6537883B2 JP 6537883 B2 JP6537883 B2 JP 6537883B2 JP 2015098880 A JP2015098880 A JP 2015098880A JP 2015098880 A JP2015098880 A JP 2015098880A JP 6537883 B2 JP6537883 B2 JP 6537883B2
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- 239000004065 semiconductor Substances 0.000 title claims description 222
- 239000010410 layer Substances 0.000 claims description 206
- 239000000758 substrate Substances 0.000 claims description 116
- 230000003287 optical effect Effects 0.000 claims description 99
- 238000000605 extraction Methods 0.000 claims description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 8
- 238000003475 lamination Methods 0.000 claims description 8
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000011241 protective layer Substances 0.000 claims description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 238000009751 slip forming Methods 0.000 claims description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 description 30
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 16
- 238000000034 method Methods 0.000 description 11
- 238000001312 dry etching Methods 0.000 description 9
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 7
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- -1 CuW Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 3
- 230000003044 adaptive effect Effects 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- HADKRTWCOYPCPH-UHFFFAOYSA-M trimethylphenylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C1=CC=CC=C1 HADKRTWCOYPCPH-UHFFFAOYSA-M 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LAQFLZHBVPULPL-UHFFFAOYSA-N methyl(phenyl)silicon Chemical compound C[Si]C1=CC=CC=C1 LAQFLZHBVPULPL-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Substances [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/08—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
- F21S41/00—Illuminating devices specially adapted for vehicle exteriors, e.g. headlamps
- F21S41/10—Illuminating devices specially adapted for vehicle exteriors, e.g. headlamps characterised by the light source
- F21S41/14—Illuminating devices specially adapted for vehicle exteriors, e.g. headlamps characterised by the light source characterised by the type of light source
- F21S41/141—Light emitting diodes [LED]
- F21S41/151—Light emitting diodes [LED] arranged in one or more lines
- F21S41/153—Light emitting diodes [LED] arranged in one or more lines arranged in a matrix
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Description
Claims (8)
- 支持基板と、
前記支持基板の上方に配置される光半導体積層であって、
該支持基板側から、第1の導電型を有する第1の半導体層、発光性を有する活性層、および、該第1の導電型とは異なる第2の導電型を有する第2の半導体層、が順次積層する構造を有し、
該支持基板側から少なくとも該活性層を超える高さを有する溝が、外縁に沿って設けられている、
光半導体積層と、
前記支持基板と前記光半導体積層との間に配置され、前記溝に囲まれる領域内において、前記第1の半導体層に接触する部分を有する第1の電極と、
前記支持基板と前記光半導体積層との間に配置され、前記溝に囲まれる領域内において、前記第1の電極、ならびに、前記第1の半導体層および前記活性層を貫通し、前記第2の半導体層に接触する部分を有する第2の電極と、
を含み、
前記光半導体積層において、前記第2の半導体層は、前記溝よりも内側の領域から外側の領域にかけて、連続的に形成されている半導体発光素子。 - 前記第2の半導体層の上面は、所定の平面形状にパターニングされた凹凸領域と、前記溝に対応する領域近傍に設けられ、該凹凸領域よりも表面が平坦な平坦領域と、を有する請求項1記載の半導体発光素子。
- 前記光半導体積層は、
前記溝よりも内側の領域において、前記支持基板側から、前記第1の半導体層、前記活性層および前記第2の半導体層が順次積層する構造を有し、
前記溝よりも外側の領域において、前記支持基板側から、透光層および前記第2の半導体層が順次積層する構造を有する、
請求項1または2記載の半導体発光素子。 - さらに、前記支持基板と前記光半導体積層との間に、該光半導体積層に接触して配置され、前記溝よりも内側の領域から外側の領域にかけて設けられ、酸化シリコン、窒化シリコン、酸化チタン、ジルコニアのいずれかの材料により形成される光引き出し層と、を含む請求項1〜3いずれか1項記載の半導体発光素子。
- マウント基板と、
前記マウント基板上に配置される複数の半導体発光素子と、
前記複数の半導体発光素子を覆うように配置され、蛍光体材料を含有する保護層と、
を具備し、
前記半導体発光素子各々は、
支持基板と、
前記支持基板の上方に配置される光半導体積層であって、
該支持基板側から、第1の導電型を有する第1の半導体層、発光性を有する活性層、および、該第1の導電型とは異なる第2の導電型を有する第2の半導体層、が順次積層する構造を有し、
該支持基板側から少なくとも該活性層を超える高さを有する溝が、前記半導体発光素子同士が対向する辺に沿って設けられている、
光半導体積層と、
前記支持基板と前記光半導体積層との間に配置され、前記溝によって区画され前記半導体発光素子同士が対向する辺とは反対側の領域内において、前記第1の半導体層に接触する部分を有する第1の電極と、
前記支持基板と前記光半導体積層との間に配置され、前記溝によって区画され前記半導体発光素子同士が対向する辺とは反対側の領域内において、前記第1の電極、ならびに、前記第1の半導体層および前記活性層を貫通し、前記第2の半導体層に接触する部分を有する第2の電極と、
を含み、
前記光半導体積層において、前記第2の半導体層は、前記溝よりも内側の領域から外側の領域にかけて、連続的に形成されている、半導体発光素子アレイ。 - 前記第2の半導体層の上面は、所定の平面形状にパターニングされた凹凸領域と、前記溝に対応する領域近傍に設けられ、該凹凸領域よりも表面が平坦な平坦領域と、を有する請求項5記載の半導体発光素子アレイ。
- 前記光半導体積層は、
前記溝よりも、前記半導体発光素子同士が対向する辺とは反対側の領域内において、前記支持基板側から、前記第1の半導体層、前記活性層および前記第2の半導体層が順次積層する構造を有し、
前記溝よりも、前記半導体発光素子同士が対向する側の領域内において、前記支持基板側から、透光層および前記第2の半導体層が順次積層する構造を有する、
請求項5または6記載の半導体発光素子アレイ。 - さらに、前記支持基板と前記光半導体積層との間に、該光半導体積層に接触して配置され、前記溝よりも、前記半導体発光素子同士が対向する辺とは反対側の領域内から前記溝よりも、前記半導体発光素子同士が対向する側の領域内にかけて設けられ、酸化シリコン、窒化シリコン、酸化チタン、ジルコニアのいずれかの材料により形成される光引き出し層と、を含む請求項5〜7いずれか1項記載の半導体発光素子アレイ。
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JP2015098880A JP6537883B2 (ja) | 2015-05-14 | 2015-05-14 | 半導体発光素子および半導体発光素子アレイ |
US15/144,267 US9680063B2 (en) | 2015-05-14 | 2016-05-02 | Semiconductor light-emitting device and semiconductor light-emitting device array |
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JP2018085456A (ja) * | 2016-11-24 | 2018-05-31 | 日機装株式会社 | 半導体発光素子の製造方法 |
US11437353B2 (en) * | 2019-11-15 | 2022-09-06 | Seoul Viosys Co., Ltd. | Light emitting device for display and display apparatus having the same |
CN213071133U (zh) | 2019-11-15 | 2021-04-27 | 首尔伟傲世有限公司 | 显示器用发光元件及显示装置 |
KR20210062777A (ko) | 2019-11-21 | 2021-06-01 | 삼성전자주식회사 | 반도체 발광 소자 및 그 제조 방법 |
US11987172B1 (en) * | 2023-01-19 | 2024-05-21 | Plusai, Inc. | Automatic control of high beam operation |
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TWI222756B (en) * | 2002-11-12 | 2004-10-21 | Epitech Corp Ltd | Lateral current blocking light emitting diode and method of making the same |
JP4201609B2 (ja) * | 2003-01-24 | 2008-12-24 | 三洋電機株式会社 | 半導体発光素子および半導体素子 |
JP4238693B2 (ja) * | 2003-10-17 | 2009-03-18 | 豊田合成株式会社 | 光デバイス |
TWI396307B (zh) * | 2009-02-05 | 2013-05-11 | Huga Optotech Inc | 發光二極體 |
TWI399869B (zh) * | 2009-02-05 | 2013-06-21 | Huga Optotech Inc | 發光二極體 |
EP2445018B1 (en) * | 2009-06-15 | 2016-05-11 | Panasonic Intellectual Property Management Co., Ltd. | Semiconductor light-emitting device, light-emitting module, and illumination device |
DE102009035429A1 (de) | 2009-07-31 | 2011-02-03 | Osram Opto Semiconductors Gmbh | Leuchtdiodenchip |
KR20110062128A (ko) | 2009-12-02 | 2011-06-10 | 엘지이노텍 주식회사 | 발광 소자, 발광 소자 패키지 및 발광 소자 제조방법 |
JP2011187616A (ja) * | 2010-03-08 | 2011-09-22 | Toshiba Corp | 半導体発光素子およびその製造方法 |
JP5050109B2 (ja) * | 2011-03-14 | 2012-10-17 | 株式会社東芝 | 半導体発光素子 |
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