JP6442117B1 - 有機el表示装置の製造方法 - Google Patents
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- JP6442117B1 JP6442117B1 JP2018538895A JP2018538895A JP6442117B1 JP 6442117 B1 JP6442117 B1 JP 6442117B1 JP 2018538895 A JP2018538895 A JP 2018538895A JP 2018538895 A JP2018538895 A JP 2018538895A JP 6442117 B1 JP6442117 B1 JP 6442117B1
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- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 230000004888 barrier function Effects 0.000 claims abstract description 195
- 229920000015 polydiacetylene Polymers 0.000 claims abstract description 44
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 239000010409 thin film Substances 0.000 claims abstract description 29
- 238000007789 sealing Methods 0.000 claims abstract description 27
- ZPUDRBWHCWYMQS-UHFFFAOYSA-N pentacosa-10,12-diynoic acid Chemical compound CCCCCCCCCCCCC#CC#CCCCCCCCCC(O)=O ZPUDRBWHCWYMQS-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229920000642 polymer Polymers 0.000 claims abstract description 5
- 239000007787 solid Substances 0.000 claims description 37
- 239000011347 resin Substances 0.000 claims description 34
- 229920005989 resin Polymers 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 32
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 12
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 12
- 239000010408 film Substances 0.000 claims description 10
- 238000010894 electron beam technology Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 8
- 238000002834 transmittance Methods 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 7
- 238000000411 transmission spectrum Methods 0.000 claims description 7
- 238000007740 vapor deposition Methods 0.000 claims description 7
- 238000004380 ashing Methods 0.000 claims description 4
- 230000001747 exhibiting effect Effects 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims 1
- DZLWMPMXBUHMQV-UHFFFAOYSA-N pentacosa-2,4-diynoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCC#CC#CC(O)=O DZLWMPMXBUHMQV-UHFFFAOYSA-N 0.000 claims 1
- 230000035699 permeability Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 300
- 239000002245 particle Substances 0.000 description 54
- 238000005401 electroluminescence Methods 0.000 description 28
- 229910010272 inorganic material Inorganic materials 0.000 description 9
- 239000011147 inorganic material Substances 0.000 description 9
- 239000011368 organic material Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 239000012044 organic layer Substances 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000012788 optical film Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 229920001621 AMOLED Polymers 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- LKJPSUCKSLORMF-UHFFFAOYSA-N Monolinuron Chemical compound CON(C)C(=O)NC1=CC=C(Cl)C=C1 LKJPSUCKSLORMF-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
- H10K59/8731—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Optical Filters (AREA)
Abstract
Description
2 :回路
3 :OLED層
4 :偏光板
10 :TFE構造
12 :第1無機バリア層(SiN層)
14 :有機バリア層
14a :画素周辺中実部
16 :第2無機バリア層(SiN層)
30 :引出し配線
38 :端子
42 :下部電極
44 :有機層
46 :上部電極
48 :バンク層
52 :ポリジアセチレン層
100 :OLED表示装置
BS :バンク構造
P :パーティクル
Pix :画素
R1 :アクティブ領域
R2 :周辺領域
Claims (10)
- 複数の画素を有する有機EL表示装置の製造方法であって、
前記有機EL表示装置は、基板と、前記基板に支持された複数の有機EL素子であって、それぞれが前記複数の画素のそれぞれに配置された複数の有機EL素子と、前記複数の画素のそれぞれを規定するバンク層とを有する素子基板と、前記複数の画素を覆う薄膜封止構造とを有し、
前記薄膜封止構造は、第1無機バリア層と、前記第1無機バリア層の上面または下面に接する有機バリア層とを有し、
前記複数の画素は、赤色画素、緑色画素および青色画素を含み、前記青色画素上の前記薄膜封止構造の上に選択的に設けられた、青色を呈するポリジアセチレン層をさらに有し、前記ポリジアセチレン層は、10,12−ペンタコサジイン酸の重合体であり、
前記ポリジアセチレン層を形成する工程は、
前記薄膜封止構造を形成した後、前記薄膜封止構造上に、マスク蒸着法で、10,12−ペンタコサジイン酸を堆積する工程と、
前記10,12−ペンタコサジイン酸に、電子線または紫外線を照射する工程と
を包含し、
前記薄膜封止構造を形成する工程は、
前記第1無機バリア層が形成された前記素子基板をチャンバー内に用意する工程と、
前記チャンバー内に蒸気または霧状の光硬化性樹脂を供給する工程と、
前記第1無機バリア層上で前記光硬化性樹脂を凝縮させて、液膜を形成する工程と、
前記光硬化性樹脂の前記液膜に光を照射することによって、光硬化樹脂層を形成する工程と、
前記光硬化樹脂層を部分的にアッシングすることによって、前記有機バリア層を形成する工程と
を包含する、製造方法。 - 前記薄膜封止構造を形成する工程は、窒化シリコン層を形成する工程を包含し、前記窒化シリコン層を形成した後、前記窒化シリコン層を大気に晒すことなく、マスク蒸着法で10,12−ペンタコサジイン酸を堆積する、請求項1に記載の製造方法。
- 前記薄膜封止構造が有する前記有機バリア層は、前記第1無機バリア層の前記上面に接し、かつ、離散的に分布する複数の中実部を有し、前記薄膜封止構造は、前記第1無機バリア層の前記上面および前記有機バリア層の前記複数の中実部の上面に接する第2無機バリア層をさらに有し、前記ポリジアセチレン層は、前記第2無機バリア層の上に形成されている、請求項1または2に記載の製造方法。
- 前記ポリジアセチレン層は半導体性を有している、請求項1から3のいずれかに記載の製造方法。
- 前記ポリジアセチレン層の比抵抗は、1×10−1Ωcm以下である、請求項4に記載の製造方法。
- 前記ポリジアセチレン層上に配置された紫外線吸収層をさらに有する、請求項1から5のいずれかに記載の製造方法。
- 前記第1無機バリア層は窒化シリコンで形成されている、請求項1から6のいずれかに記載の製造方法。
- 前記ポリジアセチレン層の厚さは0.5μm以上2.0μm以下である、請求項1から7のいずれかに記載の製造方法。
- 前記ポリジアセチレン層の透過スペクトルにおける青色光のピーク波長は460nm以上470nm以下の範囲内にある、請求項1から8のいずれかに記載の製造方法。
- 前記ポリジアセチレン層の前記青色光のピーク波長における透過率は、80%以上である、請求項9に記載の製造方法。
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PCT/JP2018/003267 WO2019150505A1 (ja) | 2018-01-31 | 2018-01-31 | 有機el表示装置およびその製造方法 |
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JP2018219325A Division JP6726261B2 (ja) | 2018-11-22 | 2018-11-22 | 有機el表示装置 |
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JP6442117B1 true JP6442117B1 (ja) | 2018-12-19 |
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US (2) | US11088348B2 (ja) |
JP (1) | JP6442117B1 (ja) |
CN (1) | CN111630939A (ja) |
WO (1) | WO2019150505A1 (ja) |
Cited By (1)
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JP2022530379A (ja) * | 2019-04-25 | 2022-06-29 | アプライド マテリアルズ インコーポレイテッド | 低い屈折率及び低い水蒸気透過率を有する水分バリア膜 |
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CN110479110B (zh) * | 2014-04-15 | 2022-03-22 | 赛尔格有限责任公司 | 导电的、透明的、半透明的和/或反光的材料 |
JP6453579B2 (ja) * | 2014-08-08 | 2019-01-16 | 株式会社ジャパンディスプレイ | 有機el表示装置 |
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JP2017151313A (ja) * | 2016-02-25 | 2017-08-31 | 株式会社ジャパンディスプレイ | 表示装置の製造方法 |
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- 2018-01-31 JP JP2018538895A patent/JP6442117B1/ja not_active Expired - Fee Related
- 2018-01-31 US US16/472,801 patent/US11088348B2/en active Active
- 2018-01-31 WO PCT/JP2018/003267 patent/WO2019150505A1/ja active Application Filing
- 2018-01-31 CN CN201880085871.4A patent/CN111630939A/zh active Pending
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2021
- 2021-07-02 US US17/367,230 patent/US20210336215A1/en not_active Abandoned
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JP2022530379A (ja) * | 2019-04-25 | 2022-06-29 | アプライド マテリアルズ インコーポレイテッド | 低い屈折率及び低い水蒸気透過率を有する水分バリア膜 |
JP7304966B2 (ja) | 2019-04-25 | 2023-07-07 | アプライド マテリアルズ インコーポレイテッド | 低い屈折率及び低い水蒸気透過率を有する水分バリア膜 |
Also Published As
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CN111630939A (zh) | 2020-09-04 |
US20200411793A1 (en) | 2020-12-31 |
US11088348B2 (en) | 2021-08-10 |
JPWO2019150505A1 (ja) | 2020-02-06 |
WO2019150505A1 (ja) | 2019-08-08 |
US20210336215A1 (en) | 2021-10-28 |
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