JP6362044B2 - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- JP6362044B2 JP6362044B2 JP2014103670A JP2014103670A JP6362044B2 JP 6362044 B2 JP6362044 B2 JP 6362044B2 JP 2014103670 A JP2014103670 A JP 2014103670A JP 2014103670 A JP2014103670 A JP 2014103670A JP 6362044 B2 JP6362044 B2 JP 6362044B2
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- Prior art keywords
- layer
- barium
- silicon
- semiconductor layer
- semiconductor
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- 239000004065 semiconductor Substances 0.000 title claims description 70
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000010410 layer Substances 0.000 claims description 176
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 129
- 229910052788 barium Inorganic materials 0.000 claims description 117
- 229910021332 silicide Inorganic materials 0.000 claims description 88
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 88
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 48
- 239000002344 surface layer Substances 0.000 claims description 48
- 229910052710 silicon Inorganic materials 0.000 claims description 47
- 239000010703 silicon Substances 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 21
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 13
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 9
- 238000004458 analytical method Methods 0.000 claims description 8
- 230000001590 oxidative effect Effects 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 230000000052 comparative effect Effects 0.000 description 17
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 14
- 238000001451 molecular beam epitaxy Methods 0.000 description 6
- 230000006798 recombination Effects 0.000 description 5
- 238000005215 recombination Methods 0.000 description 5
- 230000002238 attenuated effect Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 229910008045 Si-Si Inorganic materials 0.000 description 3
- 229910006411 Si—Si Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052712 strontium Inorganic materials 0.000 description 3
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 3
- 229910016066 BaSi Inorganic materials 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910021346 calcium silicide Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- YTHCQFKNFVSQBC-UHFFFAOYSA-N magnesium silicide Chemical compound [Mg]=[Si]=[Mg] YTHCQFKNFVSQBC-UHFFFAOYSA-N 0.000 description 1
- 229910021338 magnesium silicide Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Photovoltaic Devices (AREA)
Description
12 バリウムシリサイド層
14、38 表面層
18 種層
32 第1層
34 第2層
36 半導体層
40 第2電極
42 第1電極
Claims (8)
- 基板上にバリウムシリサイドを含む半導体層を形成する工程と、
前記半導体層の表面を酸化雰囲気に曝すことなく前記半導体層上に、バリウム層またはシリコン層を形成する工程と、
を含むことを特徴とする半導体装置の製造方法。 - 前記バリウム層またはシリコン層を形成した後、前記バリウム層またはシリコン層の表面を酸化雰囲気に曝す工程を含むことを特徴とする請求項1記載の半導体装置の製造方法。
- 前記バリウム層またはシリコン層を形成する温度は、前記バリウム層またはシリコン層と前記半導体層とが反応する温度より低いことを特徴とする請求項1または2記載の半導体装置の製造方法。
- 基板上に形成されたバリウムシリサイドを含む半導体層と、
前記半導体層上に、当該半導体層と直接接して設けられ、バリウム原子濃度とシリコン原子濃度との和に対するバリウム原子濃度の比が、前記半導体層における前記比より大きく、かつ酸化バリウムを含む表面層と、
を具備することを特徴とする半導体装置。 - 前記表面層の表面をXPS分析したときのC1s信号のCO3結合のピークは、バリウムシリサイド層の表面をXPS分析したときのC1s信号のCO3結合のピークより高いことを特徴とする請求項4記載の半導体装置。
- 基板上に形成されたバリウムシリサイドを含む半導体層と、
前記半導体層上に、当該半導体層と直接接して設けられ、バリウム原子濃度とシリコン原子濃度との和に対するシリコン原子濃度の比が、前記半導体層における前記比より大きく、かつ酸化シリコンを含む表面層と、
を具備することを特徴とする半導体装置。 - 前記表面層の表面をXPS分析したときのSi2p信号のSiO2結合のピークは、バリウムシリサイド層の表面をXPS分析したときのSi2p信号のSiO2結合のピークより高いことを特徴とする請求項6記載の半導体装置。
- 第1電極と第2電極とを具備し、
前記半導体層は、バリウムシリサイドを含むn型半導体層とバリウムシリサイドを含むp型半導体層とのいずれか一方の第1層と、前記一方の層上に形成された前記n型半導体層と前記p型半導体層との他方の第2層と、を含み、
前記第1電極は前記第1層に電気的に接続され、
前記第2電極は前記第2層に電気的に接続されたことを特徴とする請求項4から7のいずれか一項記載の半導体装置。
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JP2015220371A JP2015220371A (ja) | 2015-12-07 |
JP6362044B2 true JP6362044B2 (ja) | 2018-07-25 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2017082246A1 (ja) | 2015-11-10 | 2017-05-18 | 国立大学法人九州大学 | ジシアノピラジン化合物、発光材料、それを用いた発光素子、および2,5-ジシアノ-3,6-ジハロゲノピラジンの製造方法 |
JP7154496B2 (ja) * | 2018-09-04 | 2022-10-18 | 東ソー株式会社 | 珪化バリウム系膜及びその製造方法 |
US11626288B2 (en) | 2021-07-30 | 2023-04-11 | Applied Materials, Inc. | Integrated contact silicide with tunable work functions |
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US5084411A (en) * | 1988-11-29 | 1992-01-28 | Hewlett-Packard Company | Semiconductor processing with silicon cap over Si1-x Gex Film |
WO2010131639A1 (ja) * | 2009-05-12 | 2010-11-18 | 国立大学法人筑波大学 | 半導体装置およびその製造方法並びに太陽電池 |
JP2012009494A (ja) * | 2010-06-22 | 2012-01-12 | Fujifilm Corp | 光電変換素子の製造方法及び光電変換半導体層付き基板 |
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