JP6241862B2 - Method of configuring highly clean environment system, method of using highly clean environment device, and assembly, startup or maintenance method of device manufacturing apparatus - Google Patents

Description

  The present invention relates to a highly clean environment apparatus, a highly clean environment system, a method for using the highly clean environment apparatus, and a device manufacturing apparatus assembly, start-up or maintenance method, and the assembly of a device manufacturing apparatus suitable for variable-variable production of semiconductor devices and the like. It is suitable for application to the realization of an aseptic environment treatment environment at the time of start-up, repair, raw material (material) replenishment, etc., or disaster sites.

  Conventionally, a semiconductor device production line has a layout that employs a job shop system that includes multiple units called bays that combine processing devices of the same function in a vast clean room, and the bays are connected by a transfer robot or belt conveyor. Was the mainstream. In addition, a wafer having a large diameter of 12 inches or the like is used for a workpiece (object to be processed) processed in such a production line, and a production system in which several thousand semiconductor chips are manufactured from one wafer is used. It was done.

  For this reason, although the throughput of the entire production line has been improved, capital investment of several hundred billion yen is required to construct such a mega fab, and the total investment amount has been increasing in recent years. Further, as the production line becomes larger in this way, the apparatus control becomes complicated, and the transport time and waiting time in the transport system have increased dramatically. For this reason, the number of in-process wafers staying in the production line has also increased dramatically, and the unit price of the large-diameter wafers used is very high. .

  Therefore, in order to solve the above-mentioned problems, a next-generation device manufacturing apparatus and a system using the same have been proposed, and a device manufacturing apparatus and device that can flexibly cope with variable-variable production of various devices such as semiconductor devices. Manufacturing methods are being realized rapidly.

  FIG. 12 shows such a device manufacturing apparatus (referred to as a minimal fab) 200 (see, for example, Patent Document 1). As illustrated in FIG. 12, the device manufacturing apparatus 200 includes at least one unit processing apparatus (referred to as a minimal fab module) 101 and is typically configured by combining a plurality of unit processing apparatuses 101. The unit processing device 101 is positioned on a predetermined line on the floor by placing a guide portion of the unit processing device 101 on a guide way 102 formed in a rail shape for forming a production line. Is done. In each unit processing apparatus 101, for example, a recipe ID or the like is recorded on the outer surface. By this recipe ID, for example, the unit processing apparatus 101 identifies what kind of single process (process corresponding to the recipe) in the process process is performed. Further, a transfer device 104 for transferring the hermetic transfer container 103 for storing the wafer is provided in parallel with the guide way 102. For example, a mechanism that is normally used in a semiconductor manufacturing apparatus such as a belt type or a mechanical type can be used as the transport device 104. The transfer device 104 is configured to transfer the sealed transfer container 103 between the front chamber 105 for wafer entry / exit provided for each unit processing device 101 and the outside. In the front chamber 105, for example, a docking port for the sealed transfer container 103 is provided, and a chamber (process processing unit) that takes out the wafer from the closed transfer container 103 and processes the wafer completely cut off from the external space. ) Is provided. When the sealed transfer container 103 enters the front chamber 105, the inside of the front chamber 105 is sealed and then highly purified, and the wafer is taken out by the above-described loading device and loaded into the process processing unit. In addition, the unit processing apparatus 101 is changed in arrangement or the like by the layout apparatus 106, and is rearranged or the like according to a device manufacturing recipe, for example. Regarding the connection between the unit processing apparatuses 101, since the wafer is accommodated in the hermetic transfer container 103 and further transferred through the front chamber, it is not necessary to directly connect the process processing units.

  FIG. 13 shows an arrangement example of a mass production type semiconductor manufacturing line using the device manufacturing apparatus 200. As shown in FIG. 13, in this arrangement example, a plurality of unit processing apparatuses 101 are arranged in the order of processes by a flow shop method in a normal building that is not a clean room. This device manufacturing apparatus 200 is characterized by single-wafer one-device processing, and since the wafer area used for manufacturing is very small, the number of steps in the conventional megafab can be greatly reduced. The number of unit processing devices corresponding to the number can be set.

JP 2012-54414 A International Publication No. 04/114378 Pamphlet

[Search February 8, 2013], Internet <URL: http://www.taiyokogyo.co.jp/maku_quick/> [Search February 8, 2013], Internet <URL: http://sv01.inter-bus.jp/~toku_icu/2009/10/> A. Ishibashi, H. Kaiju, Y. Yamagata and N. Kawaguchi: Electron. Lett. 41, 735 (2005) H. Kaiju, N. Kawaguchi and A. Ishibashi: Rev. Sci. Instrum. 76, 085111 (2005)

  Rome is a minimal fab that has evolved as described above and is approaching a complete form, as it does not happen in a day, but it can be used throughout the "spectrum" of completeness. If there is a way to prop up, it is important. The minimal fab module as shown in FIG. 12 and FIG. 13, which is the top end of the spectrum, is connected to a user in accordance with a predetermined method even in a normal dusty space. It is expected that a low-volume production system will be formed.

  On the other hand, there are many needs such as universities and small and medium-sized enterprises that do not have enough money and cannot buy the minimal fab at the top end, but want a minimal fab with the minimum necessary functions. Therefore, so-called “low-cost version of minimal fab” belonging to the lower part of the above spectrum, which responds to such users, is to try out quickly and bring it to be actually used as a component of a working minimal fab. is important. In order to realize this, it is required that the minimal fab can be produced at a low cost with a simple configuration.

  As an example of this low-cost version of the minimal fab, there is a form in which the above-described sealed transport container is not used in use by sealing and connecting the process processing units of the unit processing apparatus. In this form, the main target function of each minimal fab module is sufficiently satisfied, but when multiple minimal fab modules are connected, airtightness is secured (airtight connectivity), and raw materials (materials) are supplied to the minimal fab module. The "protocol" function required for the minimal fab module at the time of connection, separation, etc., such as ensuring airtightness (possibility of replenishment of airtight raw material (material)), is not necessarily perfectly equipped.

Further, even in the minimal fab using the hermetic transport container as shown in FIG. 12, there is a problem of ensuring airtightness (airtight maintenance performance) during the maintenance of the minimal fab module. In other words, in a minimal fab configured by connecting a plurality of minimal fab modules, a local clean production method using a hermetic transfer container is used, so the wafer is always independent of the minimal fab installation environment. Can be placed in a highly clean environment. For this reason, in normal process operation, there is no need to further improve the cleanliness of the environment in which the minimal fab module group is installed. However, for example, during maintenance of the minimal fab module, in order to open the interior of the minimal fab module, contaminants in the installation environment enter the process processing section of the minimal fab module. For this reason, at the time of maintenance, it is necessary to move the minimal fab to a large clean room, or it is necessary to install the minimal fab itself in a large clean room. Thus, in the practical use of the minimal fab system including maintenance, there is a big problem that the merit of the local cleaning which is a great feature of the minimal fab system can hardly be utilized. That is, in order to make the above-described minimal fab into a practical system, it is necessary to solve the problem of internal contamination during maintenance.
In addition, there is an air tent (see Non-Patent Documents 1 and 2) as an environment for urgent surgery and medical practice at the site of disasters and accidents, but a high cleanness has not been obtained.

  Therefore, the problem to be solved by the present invention is a device manufacturing apparatus configured by using a plurality of unit processing apparatuses such as a minimal fab module during maintenance of the unit processing apparatus or when connecting a plurality of unit processing apparatuses. Provided is a highly clean environment device capable of realizing local cleaning in units of one or a plurality of unit processing devices and preventing contamination inside the unit processing device, and a highly clean environment system using the same. That is.

In addition, another problem to be solved by the present invention is to replace the existing production system as soon as possible by a production system using a unit processing apparatus such as a minimal fab, and to obtain the results of research and development related to future device semiconductors and other device manufacturing. Another object is to provide a method of assembling, starting up or maintaining a device manufacturing apparatus that can be quickly and easily incorporated into an actual manufacturing line.
Furthermore, it is to realize a minimal fab that can greatly reduce the equipment price, product manufacturing cost, or maintenance cost at an early stage, and to make it a social capital.

In addition, another problem to be solved by the present invention is that it requires a dust-free and sterile environment that is not superior to an advanced semiconductor device manufacturing environment, and is necessary for emergency surgery and medical treatment in the field of disasters and accidents. It is to provide a highly clean environment platform with high mobility.
In addition, another problem to be solved by the present invention is that it is possible to prevent contamination inside the unit processing apparatus when performing maintenance, connection, etc. of the unit processing apparatus. It is to provide a method for using a highly clean environment device that can be used for living, living, staying, etc. or receiving treatment.

In order to solve the above problems, the present invention provides:
A movable and foldable enclosure;
The enclosure includes a foldable skeleton that supports the enclosure, and a sheet-like enclosure that is detachably attached to the skeleton so as to cover the skeleton, and the enclosure is formed by the skeleton. It forms a closed space that can be sealed by being stretched, and the skeleton can be reduced to a volume that is not more than one-tenth of the volume of the closed space when folded,
The closed space has a suction port and an exhaust port, and is provided with a gas flow path that is isolated from the closed space and in which the entire amount of gas flowing out from the exhaust port reflows from the intake port. A high-clean environment device characterized in that a fan / filter unit is incorporated in a part of a flow path, and at least a part of the surrounding part is made of a material having a dustproof function.

  The shape of the surrounding body may be various shapes, and is selected as necessary. Specific examples include a rectangular parallelepiped shape or a cubic shape, or a shape obtained by deforming a rectangular parallelepiped shape or a cube. In addition, the size of the closed space formed by the enclosure can be appropriately determined by design according to the purpose of use and the like.

  In addition, the skeleton may basically have any configuration as long as a closed space can be formed by combining with the surrounding portion, for example, a hollow rod-like or log-like structure or Examples of the structure include a hollow cross-section having an I-shape or an L-shape. For example, the rod-shaped structure may be formed by combining a plurality of rod-shaped bodies, formed by bending, bending, or bending an integral rod-shaped body, or formed by combining these. When the skeleton is configured by combining a plurality of rod-like bodies, for example, the rod-like bodies are preferably connected with a rotatable hinge or the like. By rotating this hinge, for example, a plurality of rod-like bodies can be integrated together, and can be reduced to a small number of rod-like structures during storage. Also, depending on the desired size, a large and small air tent-like structure can be taken.

  In addition, the shape of the rod-like body is preferably a right column shape, and the cross-sectional shape can be appropriately selected. For example, it is preferably a circular shape, a square shape, a rectangular shape, or the like. Moreover, it is preferable that a rod-shaped body has a hollow shape which has a hollow part, for example, and it is preferable that the hollow rate is 70% or more, for example. Moreover, it is preferable that the material which comprises a rod-shaped body is comprised with the material which has elasticity, for example. Specifically as a rod-shaped body which has a hollow part, a pipe, a tube, a hose etc. are mentioned, for example. The rod-shaped body having the hollow portion is made of, for example, an elastic body. When a gas such as air is enclosed in the hollow portion, tension is generated in the elastic body due to internal pressure, thereby obtaining rigidity and the enclosure. The skeleton that supports the body of the can be configured. In this case, the volume of the skeleton when folded without a gas such as air can be reduced to 1/100 or less of the volume when forming a skeleton where a gas such as air is enclosed. It is preferable. In addition, when a gas such as air is not sealed in the hollow part, it is preferable that the hollow part is flexible enough to be bent easily. For example, a gas such as air is sealed in the hollow part. In such a case, it is preferable to have such a rigidity that human beings cannot be bent easily. The elastic body is not particularly limited, and a conventionally known elastic body can be used, and specific examples include polymer materials such as rubber and resin. Moreover, what is enclosed in the hollow part is not limited to gas but may be liquid such as water. When the skeleton 12 is configured as described above, it is possible to form the skeleton 12 that can be started in place and can be stored in place.

  In addition, for example, by forming a skeleton by combining a plurality of rod-shaped bodies having hollow portions, a part of the skeleton can be used as a gas flow path. In this case, for example, when a skeleton is formed by enclosing a gas such as air in a tube, a part of the skeleton constituting the gas flow path in which no gas is enclosed and a part of the skeleton in which the gas is enclosed are included. It is constructed integrally. Further, the skeleton is preferably formed by a closed circuit using, for example, a rod-like body, but is not limited thereto, and may be formed by, for example, a “cecum-like” circuit having an end. .

  The sheet-shaped surrounding part may be basically any one as long as it forms a closed space in combination with a skeleton, even if it is integrally formed, Although it may be formed by combining a plurality of members, it is preferable that at least a part is made of a wall material having a dustproof action. The wall material is not basically limited as long as it has a dustproof action, but it is preferably lightweight and flexible, for example, It is preferably flexible enough to be bent easily by human power. Examples of the flexible wall material include thin film bodies that are flexible bodies such as sheets and films. Specific examples of the thin film include a flexible sheet, a flexible film, and the like. For example, a resin sheet such as a vinyl sheet and a polyethylene sheet, a resin film such as a PET film, a rubber sheet, a nonwoven fabric, a shoji paper, and the like. Examples include paper pulp.

  Further, depending on the application of the highly clean environment device, it is preferable that the surrounding portion is made of a transparent wall material configured so as not to transmit a short wavelength light component to the inside of the surrounding body, for example. The transparent wall material is not basically limited as long as it is configured not to transmit the short wavelength light component, but other configurations are similar to the above-described wall material, for example. For example, a thin film body is particularly preferable. As this transparent wall material, for example, a material formed by mixing an ultraviolet absorbing material, an ultraviolet reflecting material, or the like, an ultraviolet absorbing material, an ultraviolet reflecting material or the like is provided on a surface on which visible light is incident or transmitted. Specifically, for example, in addition to UV-cut transparent glass / resin, UV-cut transparent sheet, UV-cut transparent film, and the like, transparent glass / resin typically having an orange color, transparent sheet, A transparent film etc. are mentioned. Moreover, the laminated structure of the at least 2 material chosen from these may be sufficient. In addition, for example, when at least a part of the surrounding portion is composed of the transparent wall material, the wall material other than the transparent wall material is composed of, for example, a material that completely blocks light. Preferably it is. Specifically, the light blocking surface is specifically configured such that the light incident surface is configured to totally reflect light, particularly visible light, for example, a metal surface is deposited on the light incident surface to form a mirror surface. In addition, for example, the light incident surface is configured to absorb all light, particularly visible light, for example, the light incident surface is a black material, a material dyed black. Examples thereof include a configured wall material and the like, and examples thereof include a structure in which these configurations are combined, for example, a laminated structure having these configurations. Moreover, a wall material can be suitably selected from what was mentioned above, for example, for example, it is preferable to be comprised with a thin film body. Further, in order to suppress dust generation, for example, all or a part of the surrounding portion except the visible light transmitting portion is coated with polytetrafluoroethylene on the surface of the surrounding portion constituting the inner wall of the surrounding body. It may be. As a typical example, the surrounding portion is constituted by a transparent sheet that does not transmit a short wavelength light component and a partition that does not allow 100% of dust particles to pass therethrough and allows gas molecules to pass therethrough.

  Further, for example, at least a part of the surrounding portion may be formed by a partition wall that does not allow 100% of the dust particles to pass and allows gas molecules to pass. By doing so, the oxygen concentration and the carbon dioxide concentration can be kept in balance inside and outside the enclosure. Here, “the dust particles do not pass through 100%” means that, for example, the rejection rate (transmittance) of the dust particles is not 100% (0%) but is preferably at least 95% (5% or less). Is 99% or more (1% or less). A typical example of the partition wall through which 100% of dust particles do not pass and gas molecules pass is a gas exchange membrane. Further, the partition wall that does not allow 100% of the dust fine particles and allows gas molecules to pass therethrough is preferably non-light transmissive, that is, light blocking, for example, a gas composed of a light absorbing material, a light reflecting material, etc. Specifically, for example, a gas exchange membrane made of a black material, a gas exchange membrane colored entirely black, for example, a nonwoven fabric impregnated with ink, a filter material, a shoji paper Etc.

  The gas channel may be provided inside the enclosure or may be provided outside, but is preferably provided inside the enclosure. In the case of being provided inside the enclosure, the gas flow path is connected to the exhaust port of the fan / filter unit placed on the floor of the enclosure with airtightness. Extends to the ceiling, and an exhaust port is provided at the tip.

  Here, the principle by which the inside of the enclosure is cleaned in this highly clean environment apparatus will be described.

The dust particle density n inside the enclosure is a function of location, and similarly, the dust particle desorption rate σ per unit area / unit time is most commonly considered to be a function of location. Dust does not occur or disappear inside the closed space of interest. At this time, the dust particle density n (x, t) at the time t in the location x in the closed space of interest is influenced by the boundary (edge) of the closed space (two-dimensional surface inside the closed space). Propagation will determine the change. The volume of the closed space to be cleaned inside the enclosure is V, the inner area of the closed space is S, the desorption rate of dust particles per unit area / unit time is σ, and the enclosure installation environment (ie, outside air) If the dust particle density is N ₀ and the dust collection efficiency of the dust filter is γ, the dust particle density n is
Satisfies the differential equation

If it can be approximated that the air flow in a closed space is uniform and independent of location,
(See Patent Document 2, Non-Patent Documents 3 and 4). When sufficient time has passed and the steady state is reached, the left side of equation (2) becomes zero, and the reached dust particle density n is
It becomes.

In this enclosure, the parameter governing the cleanliness is completely different from that of a conventional clean room. An important factor in the performance of a conventional clean room is the dust collection efficiency γ of the dust filter, which should be as close to 1 as possible (because a HEPA filter is required over a medium performance filter and a ULPA filter is required over a HEPA filter). . In this way, the filter's ability to remove dust particles directly affects the performance of the clean room, so expensive HEPA filters and ULPA filters are used, but one side of this filter is always in contact with the outside air, so the prefilter Is used, but the filter has been replaced in about 2 to 3 years. On the other hand, in the above-described enclosure, the dust collection efficiency of the filter is not so dominant, and rather, the dust outflow in the inner space of the enclosure is more important. The ultimate cleanliness is governed only by the internal environment of the enclosure, and as can be seen from the fact that N ₀ does not appear in Equation (3), it has a favorable characteristic that it is not affected at all by the environment of the enclosure. This is an advantage greatly different from the conventional super clean room. In other words, unlike the conventional super clean room where the construction cost is high, the above enclosure can be installed in any place in a production line or a laboratory as long as the environment can remove rain dew. Further, as can be seen from the equation (3), even if γ is not close to 1, even when compared with the ultimate case where γ = 1, there is a great feature that the degree of cleanliness hardly deteriorates.

  This highly clean environment apparatus can be provided with, for example, a front chamber provided in contact with the enclosure as necessary. In the following, the space surrounded by the enclosure in which the front chamber is provided will be referred to as a main chamber as necessary. This anterior chamber can be configured in the same manner as that described above as a highly clean environment device, for example. Specifically, the anterior chamber has, for example, a movable and foldable anterior chamber enclosure, and the anterior chamber enclosure includes a foldable anterior chamber skeleton that supports the anterior chamber enclosure, and an anterior chamber skeleton. An anterior chamber surrounding portion that is provided so as to be detachable from the anterior chamber skeleton so as to be covered. The front chamber surrounding portion can be formed by a front chamber skeleton to form a closed space that can be sealed. Further, the anterior chamber skeleton can be reduced to, for example, a volume equal to or less than one-tenth of the volume of the anterior chamber closed space when folded. The anterior chamber skeleton can be appropriately selected from those listed above as the skeleton of the highly clean environment apparatus. The anterior chamber skeleton may be configured separately from the skeleton (main chamber skeleton) or may be configured integrally. Moreover, the front chamber surrounding part can also be appropriately selected from those listed above as the surrounding part of the highly clean environment device. Further, the front chamber surrounding portion may form a surrounding body including the front chamber surrounding body by integrally surrounding the front chamber and the main chamber.

  In addition, the front chamber closed space has an inlet and an exhaust port, and is separated from the front chamber closed space so that the total amount of gas flowing out from the exhaust port in the front chamber closed space is the intake port in the front chamber closed space. A gas flow path that re-inflows from is provided. For example, a fan / filter unit is incorporated in a part of the gas flow path. In addition, for example, the closed space of the main chamber and the closed space of the front chamber are at least partially surrounded by an openable / closable enclosure and / or anterior chamber enclosure having a partition wall through which dust particles do not pass 100% and gas molecules pass. The enclosure portion and / or the front chamber enclosure portion has an opening / closing portion.

In addition, this invention
At least one highly clean environmental device;
Having at least one unit processing device,
The high clean environment device is
A movable and foldable enclosure,
The enclosure includes a foldable skeleton that supports the enclosure, and a sheet-like enclosure that is detachably attached to the skeleton so as to cover the skeleton, and the enclosure is formed by the skeleton. It forms a closed space that can be sealed by being stretched, and the skeleton can be reduced to a volume that is not more than one-tenth of the volume of the closed space when folded,
The closed space has a suction port and an exhaust port, and is provided with a gas flow path that is isolated from the closed space and in which the entire amount of gas flowing out from the exhaust port reflows from the intake port. A fan / filter unit is incorporated in a part of the flow path, and at least a part of the surrounding part is made of a material having a dustproof action,
The unit processing apparatus has a sealed internal space for processing a single process of the device manufacturing process,
A highly clean environment system, wherein at least one of the unit treatment devices is provided inside the enclosure.

  A unit processing apparatus (for example, a minimal fab module) is the smallest of the configurations of a device manufacturing apparatus (for example, a minimal fab), and has an internal space for processing a single process of the device manufacturing process. If there is, it is not basically limited, but it is preferable to set the wafer to be a workpiece to a wafer size for producing a device of an extremely small unit. Further, it is preferable to adopt a single wafer processing system in which the wafers are processed one by one. In addition, “single processing process” indicates one processing process among conventional device processing processes, and includes a plurality of conventional processing processes, or conventionally performed by one processing process. A thing may be divided into a plurality of parts. For example, a device manufacturing apparatus is configured by connecting a plurality of unit processing apparatuses to which process processes are assigned.

  Further, the unit processing device is preferably provided inside the highly clean environment device when the internal space communicates with the external space. That is, typically, the closed space and the internal space are communicated with each other while the inside of the enclosure is cleaned by driving the fan / filter unit. The unit treatment device provided inside the high clean environment device may be basically arranged in any way. For example, the boundary (edge) of the unit treatment device is the enclosure of the high clean environment device. It is preferable to be provided so as to be enclosed, and in this case, it is preferable that the enclosure is provided in the center of a plurality of unit processing devices, but it is intermediate between adjacent unit processing devices and the second near rest unit. The enclosure may be provided such that the connecting portion is in the center. In addition, when a highly clean environment device is configured so that, for example, the above-described on-site startup and on-site storage are possible, a high-clean environment is required for some of the unit processing devices. Then, the unit processing apparatus can be quickly placed in a highly clean environment.

In addition, this invention
A method of using a highly clean environment device,
The high clean environment device is
A movable and foldable enclosure;
The enclosure includes a foldable skeleton that supports the enclosure, and a sheet-like enclosure that is detachably attached to the skeleton so as to cover the skeleton, and the enclosure is formed by the skeleton. It forms a closed space that can be sealed by being stretched, and the skeleton can be reduced to a volume that is not more than one-tenth of the volume of the closed space when folded,
The closed space has a suction port and an exhaust port, and is provided with a gas flow path that is isolated from the closed space and in which the entire amount of gas flowing out from the exhaust port reflows from the intake port. A fan / filter unit is incorporated in a part of the flow path, and at least a part of the surrounding part is made of a material having a dustproof action,
This is a method of using a highly clean environment device that performs maintenance of the unit processing device, connection of the unit processing device, life, residence, stay, or treatment inside the enclosure.
Here, the maintenance of the unit processing device includes repair, cleaning, raw material (material) supply, and the like.

In addition, this invention
An assembly, start-up or maintenance method for a device manufacturing apparatus composed of a plurality of unit processing apparatuses,
A movable and foldable enclosure;
The enclosure includes a foldable skeleton that supports the enclosure, and a sheet-like enclosure that is detachably attached to the skeleton so as to cover the skeleton, and the enclosure is formed by the skeleton. It forms a closed space that can be sealed by being stretched, and the skeleton can be reduced to a volume that is not more than one-tenth of the volume of the closed space when folded,
The closed space has a suction port and an exhaust port, and is provided with a gas flow path that is isolated from the closed space and in which the entire amount of gas flowing out from the exhaust port reflows from the intake port. A fan / filter unit is incorporated in a part of the flow path, and at least a part of the surrounding part is made of a material having a dustproof action,
The unit processing apparatus has a sealable internal space for processing a single process among the device manufacturing processes,
A highly clean environment system, wherein at least one of the unit treatment devices is provided inside the enclosure.

  For example, when this highly clean environment system is applied to a minimal fab, for example, the minimal fab module to which the highly clean environment device is applied is started on the spot, and the minimal fab module (unit Processing equipment) can be housed, and the conditions of the minimal fab module can be set and the connection to the minimal fab (device manufacturing apparatus) can be performed in the highly clean environment apparatus.

  Thus, by applying this highly clean environment system to, for example, the above-mentioned minimal fab, the minimal fab module constituting the minimal fab becomes a specification that achieves the original goal of the minimal fab module. Because it is possible to connect to the entire line, it is possible to start up the minimal fab at an early stage, and it is possible to start up the minimal fab anywhere as long as there is an environment that can surpass rain dew. Moreover, it helps the point where the so-called “translational symmetry” is broken, that is, the startup of the minimal fab and the shutdown (with relocation). In addition, the completed version of each unit of the minimal fab, and the fully autonomous version of the dew disbursement role, form the marginal system of the minimal fab full version. As a result, it is possible to build an inexpensive system, and even for users who do not have an expensive full-version or self-contained version of the minimal fab system, such as universities, the minimal fab system is minimal. The core essence can be enjoyed, and the base of the total introduction user is expanded. In addition, by applying this highly clean environment system to, for example, a highly clean medical environment, it is possible to provide a highly clean medical environment that can be set up at a disaster site or the like. In other words, this highly clean environment system is constructed so that the skeleton constituting the enclosure is greatly reduced when it is stored, so that when operations such as equipment maintenance and medical activities become necessary, it immediately stands on the spot. It is possible to provide a comprehensive and highly clean environment that can be immediately withdrawn as soon as this operation is completed and that is not bulky when moving.

  In addition, since any unit processing equipment can be connected in a highly clean environment, it is possible to ensure airtightness at the time of connection without airtight containers (airtight connectivity, airtight raw material (material) supply) It is possible to provide a “protocol” function required for the minimal fab module at the time of connection, separation, etc. As a result, even in a device manufacturing apparatus that does not have a hermetic transfer container, a “low-cost version of a minimal fab” in which the configuration of the minimal fab can be easily changed according to the manufacturing recipe. In this way, it is possible to provide side support for the minimal fab lineup. In addition, even unit processing devices with different configurations can be easily connected in a highly clean environment. On the contrary, it is possible to form a side support system that does not allow the side-by-side version of the minimal fab, and converges the “fabrication system” of the minimal fab to the minimalist family.

  According to the present invention, the enclosure constituting the highly clean environment device is composed of a foldable skeleton that supports the enclosure, and a sheet-like enclosure that is detachable from the skeleton so as to cover the skeleton. Therefore, for example, when the skeleton is formed by a tube made of an elastic body, it is possible to realize a highly clean environment device that can be started up on the spot and stored in place. Further, by using this highly clean environment apparatus for at least one unit processing apparatus, it becomes possible to connect the unit processing apparatus to another unit processing apparatus when the specification of only the original target of the apparatus is achieved. . In addition, the unit processor alone can be used in a clean environment. Furthermore, even if there is no function corresponding to a common protocol such as connection / disassembly among a plurality of unit processing devices, it can contribute to practical use at an early stage. In addition, a high-performance minimal fab system can be launched at a low cost and can be repaired as well. Furthermore, it is possible to quickly establish an advanced medical environment in disaster areas such as earthquakes and tsunamis.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing a highly clean environment device according to a first embodiment of the present invention, a skeleton constituting the highly clean environment device, and a schematic diagram showing an example of operating characteristics of the highly clean environment device. It is a drawing substitute photograph which shows an example of the frame | skeleton which comprises the highly clean environment apparatus by 1st Embodiment of this invention. It is a perspective view which shows the unit processing apparatus used for the highly clean environment system by the 2nd Embodiment of this invention. It is a perspective view which shows the highly clean environment system by the 2nd Embodiment of this invention. It is the top view which showed the example by which the highly clean environment system by 2nd Embodiment of this invention is applied to a device manufacturing apparatus. It is a perspective view which shows the highly clean environment system by 3rd Embodiment of this invention. It is a perspective view which shows the highly clean environment system by 4th Embodiment of this invention. It is a drawing substitute photograph which shows an example of the frame | skeleton which comprises the highly clean environment system by 4th Embodiment of this invention. It is a perspective view which shows the frame | skeleton only of the front chamber which comprises the highly clean environment system by 6th Embodiment of this invention, and the frame | skeleton of an anterior chamber integrated type. It is a perspective view which shows the frame | skeleton of the front chamber provided in the highly clean environment system by 6th Embodiment of this invention, and the highly clean environment system by 6th Embodiment of this invention. It is a perspective view which shows the skeleton of a gas flow path integrated type used for the highly clean environment system by 7th Embodiment of this invention. It is a perspective view which shows an example of a device manufacturing apparatus. It is a top view which shows an example of a device manufacturing apparatus.

  Hereinafter, modes for carrying out the invention (hereinafter referred to as “embodiments”) will be described.

<1. First Embodiment>
FIG. 1A shows a highly clean environment device 10 according to a first embodiment. FIG. 1B shows a skeleton 12 constituting the highly clean environment apparatus 10. As shown in FIG. 1A, the highly clean environment device 10 includes a vertically long rectangular parallelepiped enclosure 11. The enclosure 11 includes a foldable skeleton 12 that supports the enclosure 11, and an enclosure 11 a that is detachably provided on the skeleton 12 so as to cover the skeleton 12. The enclosure portion 11a is provided with an airtight fastener 14 for entering and leaving the room, which can be opened and closed by opening and closing. A gas exchange membrane 16 is provided on at least a part of the surrounding portion 11a. The gas exchange membrane 16 is provided, for example, when a specific gas, for example, oxygen or the like is required inside the enclosure 11. The surrounding part 11a forms a rectangular parallelepiped surrounding body 11 by receiving tension from the skeleton 12, for example. Thereby, a closed space 13 having the same size as the inner dimension of the enclosure 11 is formed inside the enclosure 11.

  A fan / filter unit 20 having an air inlet 21 is provided inside the closed space 13. A gas flow path 23 is connected to the exhaust port of the fan / filter unit 20 with airtightness. The gas flow path 23 is provided so as to extend to the ceiling portion along the side surface of the enclosure 11, bend at a right angle at the ceiling portion, and extend along the ceiling portion. The gas flow path 23 is provided so as to be isolated from the closed space 13. The fan / filter unit 20 and the gas flow path 23 are provided, for example, in a form that does not block the inlet / outlet airtight fastener 14 and the gas exchange membrane 16. An exhaust port 22 is provided at the tip of the gas flow path 23. The exhaust port 22 is provided, for example, so as to face the bottom surface of the enclosure 11. When the exhaust port 22 is provided in this way, for example, it is preferable that the exhaust port 22 be provided almost directly above the intake port 21. The exhaust port 22 may be provided, for example, so as to face the side surface of the enclosure 11 as necessary. By configuring the gas flow path 23 in the closed space 13 as described above, 100% hermetic circulation in which the entire amount of gas flowing out from the exhaust port 22 is re-inflowed from the intake port 21 when the fan / filter unit 20 is driven. A food bag system is formed.

  Although the material of the surrounding part 11a can be suitably selected from what was mentioned above, For example, a resin sheet is selected suitably. As the resin sheet, for example, a vinyl sheet is preferably selected. Further, the resin sheet may be transparent or opaque, but for example, at least a part is constituted by a transparent sheet that blocks ultraviolet rays, and the other part is, for example, a sheet that completely blocks light. Preferably, it is configured.

The skeleton 12 can be appropriately selected from those listed above. Preferably, for example, a tube formed of an elastic body is selected. Examples of the tube formed of an elastic body include a rubber tube and a resin tube. Further, as shown in FIG. 1B, the shape of the skeleton 12 is a C-shape (a U-shape) having a bent portion in which both ends on the short side of the skeleton which is a rectangular closed circuit are bent at right angles in the same direction. Has a shape. In this case, the height of the skeleton 12, the length of the bent portion, and the like are not basically limited and can be appropriately selected depending on a device or a person accommodated in the enclosure 11. It is preferable that the two bent portions have the same length. For example, when a unit processing device 30 (minimal fab module) described later is accommodated in the enclosure 11, the height of the skeleton 12 and the length of the bent portion depend on the size of the unit processing device 30 used. It can be selected appropriately. At this time, the bent portion of the skeleton 12 corresponds to the length of the side parallel to the skeleton 12 among the sides constituting the upper projection plane of the unit processing device 30, and the length of the intermediate portion of the skeleton 12 is the unit processing device. It is preferable that the width (short side) of the skeleton 12 corresponds to the width of the unit processing device 30 corresponding to the height of 30. Since the skeleton 12 is configured in this manner, the length of the bent portion is shorter than the height of the skeleton 12 and has an opening on the front surface and no tubes on the upper and lower portions of the front surface. The unit processing device 30 can be easily enclosed by, for example. For example, the ratio of the volume V of the enclosed space to the volume v of the tube constituting the skeleton (for example, a radius of about 2 cm to 4 cm) is typically v = 50 cm × 120 cm × 180 cm to 10 ⁶ cm ³ . = 3.14 × (2 cm to 4 cm) ² × (50 cm × 2 + 120 cm × 4 + 180 cm × 2) to (12 to 50) × 900 cm to (1.1 to 5) × 10 ⁴ cm ³ , so that v is V Less than one tenth. This is satisfied even when the above U-shape stands on the floor (previous calculation) or covers the floor (replace 120 cm and 180 cm in the previous equation).

Further, the skeleton 12 is provided with an injection port 15, and a skeleton 12 having a rectangular parallelepiped shape is formed by enclosing and inflating a gas such as air or a liquid such as water from the injection port 15 into the skeleton 12. The Further, since the rigidity of the skeleton 12 is increased by enclosing a gas such as air or a liquid such as water, the enclosure 11 a can be stretched by the skeleton 12 to support the side surface of the enclosure 11, thereby the closed space 13. Is formed. FIG. 2 shows an example of the skeleton 12. As shown in FIG. 2, the skeleton 12 forms a closed circuit by connecting rubber tubes. By forming the skeleton 12 with a rubber tube, it is possible to reduce the weight of the skeleton 12 as a whole. For example, the volume at the time of storage in which air or the like is not enclosed is a skeleton formation in which air or the like is enclosed. The volume can be reduced to one tenth or less of the time volume. As a result, the skeleton 12 can be easily carried. Further, for example, if the gas flow path 23 is made of an elastic material such as a bellows and a small fan / filter unit 20 is selected, a highly clean environment device It becomes possible to carry 10 easily.
A method for assembling the highly clean environment device 10 will be described. First, it is assumed that both the skeleton 12 and the sheet-shaped surrounding portion 11a are folded compactly. First, a rectangular parallelepiped skeleton 12 is formed as shown in FIG. 1B by enclosing and inflating a gas such as air or a liquid such as water from the inlet 15 of the skeleton 12 into the inside of the skeleton 12. Next, the encircling body 11 having a rectangular parallelepiped shape is formed by spreading the sheet-shaped enclosing portion 11a from the top of the skeleton 12 and adjusting the shape. Next, the entrance / exit airtight fastener 14 is opened, and the fan / filter unit 20 is installed on the bottom surface of the enclosure 11. Next, the gas flow path 23 is connected to the exhaust port of the fan / filter unit 20 with airtightness, and the gas flow path 23 is fixed to the side surface and the ceiling of the enclosure 11. In this way, the highly clean environment device 10 can be assembled.
The high clean environment device 10 thus produced was operated. The bottom area of the highly clean environment device 10 is 0.9 m × 0.9 m, and the height is about 1.8 m. Here, as the fan filter unit 20, a commercially available fan filter unit [Panasonic Nanoe VXG35] was used and operated at an air volume of 1.6 m ³ / min. FIG. 1C shows the change over time in the number of dust particles inside the highly clean environment device 10. The vertical axis of FIG. 1C represents the total number of dust particles of 0.5 μm or more per cubic foot (1f ³ ). The interpolated view in FIG. 1C shows the reduction rate of the number of dust particles by particle size. In this operating environment, the number of particles having a particle size of 1 μm is larger than that in a typical typical environment, but as a whole, the total number of dust particles of 0.5 μm or more per 1 f ³ is 10 after 10 minutes. You can see that it becomes an order. That is, it can be seen that the degree of cleanliness of US209D class 10 is reached about 10 minutes after the start of operation. Considering that the cleanliness of the operating room of a medical institution is 100 in the same class, this highly clean environment device 10 is highly mobile, but can be cleaned anywhere in any location in about 10 minutes. It achieves a class 10 level of cleanliness that exceeds that level, so it can be seen that it exhibits sufficient performance as an emergency medical / surgical environment in the event of a disaster or accident. The result of FIG. 1C is a relatively small clean environment assuming the assistance of the minimal fab system. However, even if it is necessary to construct a slightly large space such as an operation at a disaster site, it can be obtained from the equation (2). Scaling based on the time constant, V / (γF), strictly adjusts the air volume necessary for obtaining a predetermined dust particle number convergence time, and conversely, the dust particle number convergence time when the air volume is set to a predetermined value. Needless to say, you can know.

  As described above, according to the highly clean environment device 10 according to the first embodiment, since the 100% circulating food back system is configured in the sealable enclosure 11, the interior of the enclosure 11 is In a short time, a highly clean air environment capable of semiconductor manufacturing can be obtained. In addition, the enclosure 11 is configured by a foldable skeleton 12 and a sheet-like enclosure portion 11a, and the skeleton 12 can be reduced to a volume of one-hundred or less of the volume of the closed space inside the enclosure 11 when folded. Therefore, the skeleton 12 and the surrounding portion 11a can be folded and carried in a compact size. Moreover, since the skeleton 12 is formed of a tube made of an elastic body and the surrounding portion 11a is formed of a resin sheet, both the skeleton 12 and the surrounding portion 11a can be configured to be lightweight, so that the highly clean environment device 10 is configured. The enclosure 11 occupying the maximum volume among the objects can be carried, and the highly clean environment device 10 can be easily carried.

<2. Second Embodiment>
In the second embodiment, a highly clean environment system having a unit processing device will be described.
FIG. 3 is a perspective view illustrating an example of a unit processing device (for example, a minimal fab module). As shown in FIG. 3, the unit processing apparatus 30 includes an apparatus upper part 30d, an apparatus lower part 30e, and an upper and lower connection spacer 30f for connecting them. The upper and lower connection spacers 30f require an apparatus upper part 30d and an apparatus lower part 30e. It is configured so as to be separable according to. The apparatus upper portion 30d constitutes a process processing main body 30a having a processing space for performing a single processing process.

  Further, a connection portion 31 with another unit processing device 30 is provided on the side surface of the process processing main body 30a. The connection unit 31 may be provided with a wafer entrance / exit chamber, for example. In this case, for example, a door (not shown) is formed on the side surface where the wafer entrance / exit chamber is provided to allow the wafer entrance / exit chamber and the process processing body 30a to be spatially connected and to pass the wafer temporarily. Is done.

  In addition, a raw material supply system, an exhaust system, a control device, and the like for the process processing main body 30a are built in the apparatus lower part 30e, and a unit processing apparatus side connector part 30b is provided in the outer casing. The connector section 30b includes a raw material supply pipe, a discharge pipe for discharging the discharge in the manufacturing process, a control signal line connecting to an external central control device, a power line connecting to an external power source, and the like. And connected to a post to be described later via a pipe connector 30g. Furthermore, a guide portion 30c is provided on the bottom of the apparatus lower portion 30e so as to be positioned at a predetermined position as the unit processing apparatus 30 moves.

  FIG. 4 shows a highly clean environment system 40 according to the second embodiment. In this figure, for the sake of clarity, only the skeleton 12 of the highly clean environment device 10 is shown, and other configurations are omitted, but the configuration of the highly clean environment device 10 is as described in the first embodiment. It is. As shown in FIG. 4, in the highly clean environment system 40, one unit processing device 30 is accommodated in the closed space 13 of the highly clean environment device 10.

  The arrangement relationship between the high-clean environment device 10 and the unit treatment device 30 is not particularly limited as long as the high-clean environment device 10 is arranged so that at least a part of the unit treatment device 30 is accommodated. The range in which the high clean environment device 10 is arranged comes to the middle connection portion 31 between the adjacent unit processing device 30 and the second nearest unit processing device 30 when it comes to the center of the adjacent unit processing device 30. There are cases.

  Specifically, for example, after the skeleton 12 is arranged so as to surround the unit processing device 30 and the connection portion 31, the highly clean environment system 40 is configured to include the configuration other than the skeleton 12 (the surrounding portion 11a). , Fan / filter unit 20, gas flow path 23, etc.) are preferably added. At this time, the highly clean environment system 40 may be configured by moving the skeleton 12 relative to the unit processing device 30, or by moving the unit processing device 30 relative to the skeleton 12. Although the highly clean environment system 40 may be configured, it is preferable to configure the highly clean environment system 40 by moving the skeleton 12 with respect to the unit processing apparatus 30 and arranging it as in the former case. In this case, for example, there are a method of arranging the skeleton 12 by sliding from the front or the back of the unit processing device 30 and a method of arranging the skeleton 12 so as to cover the upper portion of the unit processing device 30. It is preferable that the skeleton 12 is slid from the front surface or the back surface of the unit processing device 30 like the former. In that case, it is preferable that the skeleton 12 has a C-shape (U-shape) in which both end portions on the short side of the rectangular closed circuit described above are bent at right angles in the same direction. The unit processing device 30 is arranged so as to slide on the front surface or the back surface.

  Further, for example, when the skeleton 12 is configured to be portable as described above, a gas such as air or a liquid such as water is sealed from the inlet 15 into the skeleton 12 before the placement. The shape is the outline of the enclosure 11. After the arrangement of the skeleton 12, although not shown, the enclosure 11 is formed by providing the surrounding portion 11 a so as to cover the skeleton 12 so as to form the closed space 13, and the closed space 13 thus formed is formed. Inside, a fan / filter unit 20 and a gas flow path 23 are provided, and the exhaust port of the fan / filter unit 20 and the gas flow path 23 are connected so as to be airtight, whereby a 100% circulation food back system is provided. Is formed.

  When the fan / filter unit 20 is driven in this highly clean environment system 40, the cleanliness in the closed space 13 is drastically improved in a short time according to the above-described formula. The processing apparatus 30 can be operated in a highly clean environment. Moreover, by configuring the highly clean environment device 10 so that it can be easily carried as described above, even in a normal environment, a highly clean environment can be quickly established when a highly clean environment is required. For example, in the construction of a device manufacturing apparatus, the highly clean environment apparatus 10 is used for the unit processing apparatus 30 constituting the “edge” portion. Various operations required for start-up, such as injection and raw material injection, can be performed.

  FIG. 5A is a plan view showing the connection of the unit processing apparatuses 30 when the device manufacturing apparatus is started up. 5B is a plan view showing raw material injection, maintenance, and the like to the unit processing apparatus 30. FIG. FIG. 5C is a plan view showing separation of the unit processing apparatus 30 when the device manufacturing apparatus is lowered. As shown in FIG. 5A, in starting up the device manufacturing apparatus 50, the unit processing apparatus 30 to be added is provided inside the high clean environment apparatus 10, and the device manufacturing apparatus 50 is configured after the high clean environment apparatus 10 is driven. Connected to the unit processor 30. As shown in FIG. 5B, in the raw material injection, maintenance and the like of the device manufacturing apparatus 50, the unit processing device 30 is provided inside the high clean environment device 10, and after driving and cleaning the high clean environment device 10, the raw material Injection or the like is performed. As shown in FIG. 5C, in the fall of the device manufacturing apparatus 50, the unit processing apparatus 30 separated from the device manufacturing apparatus 50 is provided inside the high clean environment apparatus 10, and the high clean environment apparatus 10 is driven. After cleaning, the device is separated from the device manufacturing apparatus 50. Others are the same as in the first embodiment. In FIG. 5A, the side surface on the left side of the highly clean environment device 10 is set so as to share the left side surface of the unit processing device 30 that is included, thereby isolating the inside of the highly clean environment device 10 from the outside world. It is valid.

  As described above, according to the second embodiment, since the unit processing device 30 is provided in the closed space 13 of the highly clean environment device 10, the same advantages as those of the first embodiment can be obtained. In addition, various operations on the unit processing device 30 can be performed in a highly clean environment. Moreover, by configuring the highly clean environment device 10 so that it can be easily carried as described above, even in a normal environment, a highly clean environment can be quickly established when a highly clean environment is required. In other words, since the highly clean environment device 10 can be transported in a very compacted state, “in-situ startup” is performed so that the highly clean environment device 10 can be used in the vicinity of an arbitrary unit processing device 30. And a system that supports the construction of a device manufacturing apparatus. In addition, for example, the highly clean environment device 10 is moved in a bag or an attache case, and is “started up on the spot” at the site of daily activities or business, and the aseptic and dust-free environment can be used for disaster medical treatment and experiments. It can be used for analysis and the like. In addition, by miniaturizing the highly clean environment system 40, it is possible to show that an aseptic and dust-free environment can be realized very simply and at low cost in any place such as in front of the public, It can be used effectively as a support tool for enlightenment activities.

<3. Third Embodiment>
FIG. 6 shows a highly clean environment system 40 according to the third embodiment. In FIG. 6, for the sake of clarity, only the skeleton 12 of the highly clean environment device 10 is shown, and other configurations are omitted, but the configuration of the highly clean environment device 10 is as described in the first embodiment. It is. As shown in FIG. 4, the highly clean environment system 40 includes a plurality of unit processing devices 30 (three examples are shown in FIG. 6) in the closed space 13 of the highly clean environment device 10. They are connected and stored. In this case, the width (short side) of the skeleton 12 corresponds to the three unit processing devices 30 connected to each other. Others are the same as in the second embodiment.

  According to the third embodiment, advantages similar to those of the second embodiment can be obtained.

<4. Fourth Embodiment>
FIG. 7 shows a highly clean environment system 40 according to the fourth embodiment. In FIG. 7, for the sake of clarity, only the skeleton 12 of the highly clean environment device 10 is shown, and other configurations are omitted, but the configuration of the highly clean environment device 10 is as described in the first embodiment. It is. As shown in FIG. 7, this highly clean environment system 40 houses one unit processing device 30. In this case, the length of the bent portion of the skeleton 12 corresponds to the height of the unit processing device 30, and the length of the intermediate portion of the skeleton 12 is the skeleton 12 among the sides constituting the upper projection plane of the unit processing device 30. Corresponds to the length of the side parallel to.

  FIG. 8 shows an example of the skeleton 12. As shown in FIG. 8, the skeleton 12 forms a closed circuit by connecting rubber tubes. In this case, as the arrangement method of the skeleton 12, for example, a method of arranging the skeleton 12 by sliding from the side surface of the unit processing device 30, and a method of arranging the skeleton 12 so as to cover the upper portion of the unit processing device 30. However, it is preferable that the skeleton 12 is slid from the side surface of the unit processing device 30 as in the former case. In that case, the skeleton 12 is provided such that the opposed bent portions and the front and back surfaces of the unit processing device 30 face each other. Further, for example, the length of the intermediate portion of the skeleton 12 can be formed longer than the length of the side parallel to the skeleton 12 among the sides constituting the upper projection surface of the unit processing device 30, for example. In this case, the skeleton 12 is arranged so that the bent portion protrudes toward the front of the unit processing device 30, whereby a space is created between the unit processing device 30 and the enclosure 11, and the enclosure 11 is formed from the space. Can be accessed, for example, the device can be taken in and out. Others are the same as in the second or third embodiment.

  According to the fourth embodiment, the same advantages as those of the second and third embodiments can be obtained.

<5. Fifth embodiment>
In the highly clean environment system 40 according to the fifth embodiment, instead of the unit processing device 30 in the highly clean environment system 40 according to the fourth embodiment, a certain size operating table on which a person works beside. And the like are housed inside the highly clean environment device 10. Others are the same as in the fourth embodiment.

  According to the fifth embodiment, it is possible to realize a highly clean environment with good mobility at a necessary place and at a necessary time only for a necessary period, and can be used for emergency medical treatment and treatment at a disaster site or the like. Is preferred.

<6. Sixth Embodiment>
FIG. 9A shows the skeleton of the anterior chamber provided in the highly clean environment system 40 according to the sixth embodiment. FIG. 9B shows a skeleton of the front chamber and main chamber integrated type of the highly clean environment system 40 of the fifth embodiment. Here, although the main room is not particularly limited, for example, the highly clean environment apparatus 10 used in any one of the first to fourth embodiments is used. As shown in FIG. 9A, the anterior chamber skeleton 62 has the same configuration as that of the skeleton 12 except that the end of the lower bent portion is open. The two lower ends of the anterior chamber skeleton 62 are closed, and even if gas or liquid is injected from the injection port 65, it does not leak from the lower end. As shown in FIG. 9B, the skeleton 67 has a shape that combines the skeleton 12 and the anterior chamber skeleton 62, and is integrally formed. The shape of the skeleton 67 is an integrated shape so that the front surface portion of the skeleton 12 and the back surface portion of the anterior chamber skeleton 62 are in contact with each other, and the hollow portions of the respective skeletons communicate with each other. When a gas such as air or a liquid such as water is sealed inside the skeleton 67 from the inlet 65, the skeleton of the front chamber and the main chamber can be formed at a time.

  FIG. 10A shows a front chamber skeleton 62 provided in the high clean environment device 10 when the front chamber 60 is additionally installed in the high clean environment device 10. FIG. 10B shows a highly clean environment system 40 having a highly clean environment device 10 provided with a front chamber 60.

  As shown in FIG. 10A, the anterior chamber skeleton 62 is provided on the surface having the airtight fastener 14 for entering and leaving and the gas exchange membrane 16 of the highly clean environment device 10 (hereinafter referred to as a main chamber as necessary). It is provided so that the end part (end side) of the bent part of the anterior chamber skeleton 62 contacts. The anterior chamber skeleton 62 can constitute a part of the anterior chamber enclosure 61 in the same manner as the skeleton 12 by enclosing a gas such as air or a liquid such as water inside the inlet 65. The main room is, for example, the high clean environment device 10 constituting the high clean environment device 10 according to the first embodiment and the high clean environment system 40 according to any one of the second to fourth embodiments. It is appropriately selected from the inside.

  As shown in FIG. 10B, the highly clean environment system 40 includes an anterior chamber enclosure 61a that is provided with an anterior chamber enclosure 61a so as to cover the anterior chamber skeleton 62 shown in FIG. 61 is formed. By being formed in this way, the front chamber 60 is provided so as to cover the surface of the main chamber (high clean environment device 10) having the entrance / exit airtight fastener 14 and the gas exchange membrane 16. A front chamber closed space 63 that can be sealed is formed inside the front chamber enclosure 61, and a fan / filter unit 70 having an intake port 71 is provided inside the front chamber closed space 63. A gas flow path 73 is connected to the exhaust port of the filter unit 70 with airtightness. The fan / filter unit 70 and the gas flow path 73 may be basically provided in any manner as long as they are provided so as not to block the entrance / exit airtight fastener 14 and the gas exchange membrane 16. The fan / filter unit 20 and the gas flow path 23 described above are provided. An entrance / exit airtight fastener 64 configured such that a person or the like can enter / exit between the external space and the front chamber 60 is provided in a portion of the front chamber surrounding portion 61a that forms the side surface of the front chamber envelope 61, for example. ing. In this case, the entrance / exit airtight fastener 14 is configured to be able to enter and exit between the highly clean environment device 10 and the front chamber 60. In addition, at least a part of the portion in contact with the external space of the front chamber surrounding portion 61 a is configured by the gas exchange membrane 66.

  Next, the operation of the highly clean environment system 40 will be described. First, after the person enters the front chamber 60 from the external space and enters the front chamber 60 and closes the airtight fastener 64 for entrance / exit, the front chamber 60 waits for several tens of seconds to several minutes, for example. By driving the fan / filter unit 70 during this time, the 100% hermetic circulation feedback system functions, and the cleanliness inside the front chamber 60 is dramatically improved. After the cleanliness of the interior of the front chamber 60 has been sufficiently improved, the entrance / exit airtight fastener 14 is opened to enter the interior of the main chamber, and then the entrance / exit airtight fastener 14 is closed. By doing so, a person can enter the main room from the external space without deteriorating the cleanliness of the main room having the unit processing device 30 at all. On the other hand, when a person or the like exits, the entrance / exit airtight fastener 14 is opened to enter the front chamber 60 from the main room, then the entrance / exit airtight fastener 14 is closed, and then the entrance / exit airtight fastener 64 is opened. By going outside, you can go outside without degrading the cleanliness of the main room. In this case, oxygen in the front chamber 60 is supplied from the outside through the gas exchange membrane 66, and oxygen in the main chamber is supplied from the front chamber 60 through the gas exchange membrane 16, so that the inside of both chambers The humans who entered can never suffocate. Others are the same as in the first to fourth embodiments.

  As mentioned above, according to this 6th Embodiment, the surface which has the airtight fastener 14 for entrance / exit and the gas exchange membrane 16 is covered among the enclosure 11 which comprises the highly clean environment apparatus 10 which is a main room. Since the front chamber 60 provided in this way is newly provided, the same advantages as those of the first to fourth embodiments can be obtained, and the cleanliness of the main chamber having the unit processing device 30 can be completely improved. A person can enter the main room from the outside space without deteriorating, and can go out to the outside space without degrading the cleanliness of the main room at all.

<7. Seventh Embodiment>
FIG. 11 shows a skeleton of the highly clean environment device 10 used in the highly clean environment system 40 according to the seventh embodiment. As shown in FIG. 11, the skeleton 12 is formed integrally with the gas flow path 23. Here, the gas flow path 23 is not tubular, but uses one parallel, for example, vinyl film on the side surface in the vertical direction of FIG. 11, and the air intake surface and the air blowing surface of the fan / filter unit 20 with this film. Can also be formed by partitioning.

  The gas passage 23 has an exhaust port 22 and an intake port 24 connected to the exhaust port of the fan / filter unit 20 at both ends, and has a penetrating shape. The material constituting the gas flow path 23 can be appropriately selected from, for example, those listed above as the material constituting the skeleton 12. For example, the material constituting the gas flow path 23 may be flexible enough to be bent by human force. It is preferable to be comprised with a flexible body. By configuring the gas flow path 23 with a flexible body, the storage area can be reduced by folding the skeleton 12 during storage without enclosing air. The hollow portion of the skeleton 12 and the flow passage portion of the gas flow path 23 are formed independently of each other, and a gas such as air or a liquid such as water sealed in the hollow portion of the skeleton 12 is provided in the gas flow path 23. It does not flow into the flow path part.

  When a gas such as air or a liquid such as water is injected from the inlet 15 into the inside of the skeleton 12 when stored, for example, as described above, tension is generated in the elastic body constituting the skeleton 12 by the internal pressure. When the gas flow path 23 receives this tension, the gas flow path 23 extends to a height similar to the height of the skeleton 12 in use, and the gas flow path 23 becomes usable. Others are the same as in any one of the first to fifth embodiments. This skeleton 12 can be applied to any of the highly clean environment devices 10 used in the second to fifth embodiments.

  As described above, according to the seventh embodiment, the skeleton 12 of the highly clean environment device 10 is configured integrally with the gas flow path 23 so that it can be folded during storage. Advantages similar to those of the sixth embodiment can be obtained, the storage area of the highly clean environment device 10 can be reduced, and the highly clean environment device 10 can be quickly started up.

  Although the embodiment of the present invention has been specifically described above, the present invention is not limited to the above-described embodiment, and various modifications based on the technical idea of the present invention are possible.

  For example, a wooden folding ruler-like structure can be used instead of the rubber tube. In this case, in order to make the structure of the above-described structure, which is a bundle of long and slender flat plates that can be rotated about one axis, effectively work on the formation of the skeleton structure of the present invention, the above-mentioned axis has three directions constituting a spatial dimension. It is desirable to provide at least two types, preferably three types so that they can be shared. When using a structure that can be rotated only in one direction (one axis) among the three directions of the vertical, horizontal, and depth of the space, it is bent 90 degrees in the middle of the segment of the wooden folding ruler-like structure. It is extremely effective to use a structure that can be used. In addition, the gas exchange membrane uses a non-woven fabric made of black fibers or the like, for example, to improve accuracy in repairing a unit processing apparatus that includes an element in the process that needs to be prevented from being exposed to light. It can be further increased. In addition, when an air tent-like structure which is one of the implementation methods of the present invention is used, the air to be introduced into the skeleton of the air tent may be hermetically sealed or air flow by a blower fan of a 100% circulation feedback system. It is also effective to use this for supporting the air tent by introducing the skeleton into the skeleton. In this case, a constant clean air flow constantly flows from the skeleton into the tent through a fine filter membrane or the like.

  For example, the numerical values, materials, shapes, arrangements, and the like given in the above-described embodiments are merely examples, and different numerical values, materials, shapes, arrangements, and the like may be used as necessary.

  DESCRIPTION OF SYMBOLS 10 ... Highly clean environment apparatus, 11 ... Enclosure, 11a ... Enclosure part, 12 ... Skeleton, 13 ... Closed space, 14 ... Airtight fastener for entrance / exit, 15 ... Inlet, 16 ... Gas exchange membrane, 20 ... Fan filter Unit: 21 ... Inlet port, 22 ... Exhaust port, 23 ... Gas flow path, 30 ... Unit processing device, 31 ... Connection unit, 40 ... Highly clean environment system, 50 ... Device manufacturing device, 60 ... Front chamber, 61 ... Front Chamber enclosure, 61a ... anterior chamber enclosure, 62 ... anterior chamber skeleton

Claims (8)

At least one highly clean environmental device;
Having at least one unit processing device or at least one medical facility having a sealable internal space for processing a single process of the device manufacturing process;
The high clean environment device is
A movable and foldable enclosure;
The enclosure includes a foldable skeleton that supports the enclosure, and a sheet-like enclosure that is detachably attached to the skeleton so as to cover the skeleton, and the enclosure is formed by the skeleton. It forms a closed space that can be sealed by being stretched, and the skeleton has a U-shape with a bent portion obtained by bending both ends on the short side of a rectangular closed circuit at right angles in the same direction, and is folded. Sometimes it can be reduced to a volume that is less than one tenth of the volume of the closed space,
The closed space has an intake port and an exhaust port, and is provided with a gas flow path that is isolated from the closed space and into which the entire amount of gas flowing out from the exhaust port flows again from the intake port. A fan filter unit is incorporated in a part of the flow path, and at least a part of the surrounding part is made of a material having a dustproof action,
A configuration method of a highly clean environment system in which at least one of the unit processing device or the medical facility is provided inside the enclosure,
After the skeleton is arranged so as to surround at least one of the unit processing apparatus or the medical equipment by sliding the skeleton from the front or back of the unit processing equipment or the medical equipment, the high-cleanness A configuration method of a highly clean environment system, wherein the highly clean environment device is configured by adding a configuration other than the skeleton of the environment device, thereby configuring the highly clean environment system.   2. The method of configuring a highly clean environment system according to claim 1, wherein at least a part of the surrounding portion is constituted by a partition wall that does not allow 100% of dust particles to pass through and allows gas molecules to pass therethrough.   The method of configuring a highly clean environment system according to claim 2, wherein the surrounding portion is configured by a transparent sheet that does not transmit a short wavelength light component to the inside of the envelope and the partition. The skeleton has a tube structure in which a gas or a liquid is injected into a hollow portion formed inside the skeleton so that rigidity sufficient to support the enclosure is obtained when the enclosure is stretched by the skeleton. The method of configuring a highly clean environment system according to any one of claims 1 to 3. The high clean environment device further includes a front chamber provided in contact with the enclosure,
The anterior chamber has a movable and foldable anterior chamber enclosure,
The anterior chamber enclosure includes a foldable anterior chamber skeleton that supports the anterior chamber enclosure, and a sheet-like anterior chamber enclosure that is detachably attached to the anterior chamber skeleton so as to cover the anterior chamber skeleton. The anterior chamber enclosure portion is stretched by the anterior chamber skeleton to form a closed anterior chamber closed space, and when the anterior chamber skeleton is folded, it is a tenth of the volume of the anterior chamber closed space. Can be reduced to the following volume,
The front chamber closed space has an intake port and an exhaust port, and is separated from the front chamber closed space so that the total amount of gas flowing out from the exhaust port of the front chamber closed space is the intake air of the front chamber closed space. A gas flow path that re-inflows from the mouth is provided, and a fan / filter unit is incorporated in a part of the gas flow path of the front chamber closed space, and at least a part of the front chamber enclosure portion is dust-proof. Composed of a material having
The closed space and the front chamber closed space are in contact with each other via the surrounding portion and / or the front chamber surrounding portion, and the surrounding portion and / or the front chamber surrounding portion have an opening / closing portion. The method of configuring a highly clean environment system according to any one of claims 1 to 4. A movable and foldable enclosure;
The enclosure includes a foldable skeleton that supports the enclosure, and a sheet-like enclosure that is detachably attached to the skeleton so as to cover the skeleton, and the enclosure is formed by the skeleton. It forms a closed space that can be sealed by being stretched, and the skeleton has a U-shape with a bent portion obtained by bending both ends on the short side of a rectangular closed circuit at right angles in the same direction, and is folded. Sometimes it can be reduced to a volume that is less than one tenth of the volume of the closed space,
The closed space has an intake port and an exhaust port, and is provided with a gas flow path that is isolated from the closed space and into which the entire amount of gas flowing out from the exhaust port flows again from the intake port. A fan / filter unit is incorporated in a part of a flow path, and at least a part of the surrounding part is a method of using a highly clean environment device configured of a material having a dustproof action,
At least one unit treatment of the skeleton by sliding the skeleton from the front or back of a unit processing apparatus or medical facility having a sealable internal space for processing a single process of the device manufacturing process. After arranging the device or the medical facility so as to surround it, the highly clean environment device is configured by adding a configuration other than the skeleton of the highly clean environment device,
After driving the highly clean environment device to clean the inside of the enclosure, maintenance of the unit processing device, connection of the unit processing device or treatment using the medical equipment is performed inside the enclosure. A method of using a highly clean environment device. A movable and foldable enclosure;
The enclosure includes a foldable skeleton that supports the enclosure, and a sheet-like enclosure that is detachably attached to the skeleton so as to cover the skeleton, and the enclosure is formed by the skeleton. It forms a closed space that can be sealed by being stretched, and the skeleton has a U-shape with a bent portion obtained by bending both ends on the short side of a rectangular closed circuit at right angles in the same direction, and is folded. Sometimes it can be reduced to a volume that is less than one tenth of the volume of the closed space,
The closed space has an intake port and an exhaust port, and is provided with a gas flow path that is isolated from the closed space and into which the entire amount of gas flowing out from the exhaust port flows again from the intake port. A single part of a device manufacturing process using a highly clean environment apparatus in which a fan / filter unit is incorporated in a part of the flow path and at least a part of the surrounding part is made of a material having a dustproof function. A method for assembling, starting up or maintaining a device manufacturing apparatus composed of a plurality of unit processing apparatuses having a sealable internal space for processing a process,
The skeleton is arranged so as to surround at least one of the unit treatment devices by sliding the skeleton from the front or back of the unit treatment device from the bent portion, and then the configuration of the highly clean environment device other than the skeleton. The above highly clean environment device is configured by adding
Assembling the device manufacturing apparatus characterized in that after driving the highly clean environment device to clean the inside of the enclosure, the unit processing device is connected, started up or maintained inside the enclosure. , Launch or maintenance method. In starting up the device manufacturing apparatus, the unit processing apparatus to be added is provided inside the highly clean environment apparatus, and after driving the highly clean environment apparatus to clean the inside of the enclosure, the device Connected to the unit processing device constituting the manufacturing device,
In the raw material injection or maintenance of the device manufacturing apparatus, the unit processing apparatus is provided inside the high clean environment device, and after driving the high clean environment device to clean the inside of the enclosure, the raw material injection or maintenance is performed. Perform maintenance,
In the start-up of the device manufacturing apparatus, the unit processing apparatus separated from the device manufacturing apparatus is provided inside the highly clean environment apparatus, and the highly clean environment apparatus is driven to clean the inside of the enclosure. The method for assembling, starting up, or maintaining the device manufacturing apparatus according to claim 7, wherein the device manufacturing apparatus is separated from the device manufacturing apparatus.